| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/30/2007 | CN2904636Y Disk for ion implant processing of organism |
| 05/30/2007 | CN1973364A 多频等离子体刻蚀反应器 Multi-frequency plasma etch reactor |
| 05/30/2007 | CN1973350A Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same |
| 05/30/2007 | CN1972553A An ion trap based on superconducting radio frequency accelerating electron |
| 05/30/2007 | CN1971836A Corrector for the correction of chromatic aberrations in a particle-optical apparatus |
| 05/30/2007 | CN1970822A Plasma lineation electrode |
| 05/30/2007 | CN1319141C Method and system for monitoring etch process |
| 05/29/2007 | USRE39657 Sterilization by low energy electron beam |
| 05/29/2007 | US7223990 Ion beam irradiation device |
| 05/29/2007 | US7223984 Helium ion generation method and apparatus |
| 05/29/2007 | US7223983 Charged particle beam column |
| 05/29/2007 | US7223976 Charged particle beam apparatus |
| 05/29/2007 | US7223975 Inspection apparatus for circuit pattern |
| 05/29/2007 | US7223974 Charged particle beam column and method for directing a charged particle beam |
| 05/29/2007 | US7223973 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former |
| 05/29/2007 | US7223699 Plasma etch reactor and method |
| 05/29/2007 | US7223676 Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer |
| 05/29/2007 | US7223448 Methods for providing uniformity in plasma-assisted material processes |
| 05/29/2007 | US7223446 Plasma CVD apparatus and dry cleaning method of the same |
| 05/29/2007 | US7223322 closed loop magnet arrangement received within a magnet receiving chamber and coupled to the drive unit; at least one of the plurality of magnets is a profiled magnet having a contoured top portion; higher target material utilization |
| 05/24/2007 | WO2007058925A2 Ion implanter with contaminant collecting surface |
| 05/24/2007 | WO2007058182A1 Phase contrast electron microscope |
| 05/24/2007 | WO2007028595A3 Particle -optical component |
| 05/24/2007 | WO2006020582A3 Cylinder magnetron with self cleaning target and collar |
| 05/24/2007 | US20070115468 Spectrometer for surface analysis and method therefor |
| 05/24/2007 | US20070114458 Apparatus for manufacturing semiconductor substrates |
| 05/24/2007 | US20070114457 Nano tip and fabrication method of the same |
| 05/24/2007 | US20070114456 Ion implanter and ion implantation control method thereof |
| 05/24/2007 | US20070114455 Ion beam device |
| 05/24/2007 | US20070114453 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 05/24/2007 | US20070114450 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/24/2007 | US20070114409 Electron beam apparatus with aberration corrector |
| 05/24/2007 | US20070114402 Object inspection and/or modification system and method |
| 05/24/2007 | US20070114399 Pattern measuring method |
| 05/24/2007 | US20070114398 Method and apparatus for observing a specimen |
| 05/24/2007 | US20070114206 Plasma chamber wall segment temperature control |
| 05/24/2007 | US20070113981 Etch system with integrated inductive coupling |
| 05/24/2007 | US20070113980 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 05/24/2007 | US20070113979 Slotted Electrostatic Shield Modification for Improved Etch and CVD Process Uniformity |
| 05/24/2007 | US20070113978 Plasma processing apparatus and method |
| 05/24/2007 | US20070113976 Plasma chamber wall segment temperature control |
| 05/24/2007 | US20070113788 Plasma processing equipment |
| 05/24/2007 | US20070113787 Plasma process apparatus |
| 05/24/2007 | DE102006049132A1 Teilchenstrahl-Bestrahlungsverfahren und Teichenstrahl-Bestrahlungsgerät Particle beam irradiation method and pond beam irradiation device |
| 05/23/2007 | EP1788613A2 Method of observing live cells under electron microscope |
| 05/23/2007 | EP1788445A1 A method of determining an exposure dose and exposure apparatus |
| 05/23/2007 | EP1787312A1 Magnetron assembly |
| 05/23/2007 | EP1787311A1 Cylindrical target obtained by hot isostatic pressing |
| 05/23/2007 | EP1787310A2 Directed multi-deflected ion beam milling of a work piece and determining and controlling extent thereof |
| 05/23/2007 | EP1787309A1 Device for obtaining the image and/or spectra of electron energy loss |
| 05/23/2007 | EP1559126B1 Energy filter image generator for electrically charged particles and the use thereof |
| 05/23/2007 | EP1200980B8 Adaptive gas cluster ion beam for smoothing surfaces |
| 05/23/2007 | CN1969365A Charge neutralization device |
| 05/23/2007 | CN1969364A Apparatus and method for investigating or modifying a surface with a beam of charged particles |
| 05/23/2007 | CN1967774A Sample structure of scanning electron microscope made by IC and its manufacturing method |
| 05/23/2007 | CN1967224A Spectrometer for surface analysis and method therefor |
| 05/23/2007 | CN1966770A Method for coating metals |
| 05/23/2007 | CN1317731C Adjustable dual frequency voltage dividing plasma reactor |
| 05/23/2007 | CN1317423C Method and device for atmospheric plasma processing |
| 05/22/2007 | US7221731 X-ray microscopic inspection apparatus |
| 05/22/2007 | US7220976 Ion source and ion implanter having the same |
| 05/22/2007 | US7220975 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/22/2007 | US7220973 Modular manipulation system for manipulating a sample under study with a microscope |
| 05/22/2007 | US7220963 Light weight portable scanning electron microscope |
| 05/22/2007 | US7220943 RF stand offs |
| 05/22/2007 | US7220937 Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination |
| 05/22/2007 | US7220497 plasma-exposed components of such apparatuses are erosion and corrosion resistant to such gases and plasma |
| 05/22/2007 | US7219565 Specimen holding apparatus |
| 05/22/2007 | CA2294715C Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma |
| 05/22/2007 | CA2294188C Calibration system for a photomultiplier tube |
| 05/18/2007 | WO2007056369A2 Batch photoresist dry strip and ash system and process |
| 05/18/2007 | WO2007056249A1 Dual mode ion source for ion implantation |
| 05/18/2007 | WO2007056190A2 Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator |
| 05/18/2007 | WO2007055154A1 Electron gun, electron beam exposure system and exposure method |
| 05/18/2007 | WO2007054048A1 Method and device for coating and/or treating surfaces |
| 05/18/2007 | WO2005095666A3 Magnetically enhanced capacitive plasma source for ionized physical vapour deposition-ipvd |
| 05/18/2007 | WO2005092025A3 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 05/17/2007 | US20070111116 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 05/17/2007 | US20070111114 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate |
| 05/17/2007 | US20070108395 Method and apparatus for extracting ions from an ion source for use in ion implantation |
| 05/17/2007 | US20070108394 Ion implantation ion source, system and method |
| 05/17/2007 | US20070108390 Technique for Shaping a Ribbon-Shaped Ion Beam |
| 05/17/2007 | US20070108042 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 05/17/2007 | US20070107846 Method and apparatus for an improved baffle plate in a plasma processing system |
| 05/17/2007 | US20070107843 Plasma processing apparatus |
| 05/16/2007 | EP1784932A2 Integrated ewp-stm spin resonance microscope |
| 05/16/2007 | EP1784690A2 Plasma ashing process for increasing photoresist removal rate and plasma apparatus with cooling means |
| 05/16/2007 | EP1269514B1 An enhanced resist strip in a dielectric etcher using downstream plasma and plasma apparatus used therefor |
| 05/16/2007 | CN1965101A Magnetron sputtering method and magnetron sputtering system |
| 05/16/2007 | CN1964620A Control of steam from solid subliming |
| 05/16/2007 | CN1964594A An atomic beam source of DC discharge |
| 05/16/2007 | CN1963985A A grid of transmission electronic microscope driven by thermal dual metal sheets |
| 05/16/2007 | CN1316580C Electrode assembly for the removal of surface oxides by electron attachment |
| 05/16/2007 | CN1316547C Plasma reactor coil magnet system |
| 05/16/2007 | CN1316546C Method for fault identification in plasma process |
| 05/16/2007 | CN1316539C External magnetic insulation ion diode for prdoucing large area strong flow pulse ionic beam |
| 05/15/2007 | US7218985 Semiconductor manufacturing apparatus |
| 05/15/2007 | US7218126 Inspection method and apparatus for circuit pattern |
| 05/15/2007 | US7217942 Plasma leak monitoring method, plasma processing apparatus and plasma processing method |
| 05/15/2007 | US7217934 Wafer scanning device |