| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/13/2007 | EP1796131A2 Ultra-thin liquid control plate and combination of box-like member and the control plate for electron microscopy |
| 06/13/2007 | EP1796130A1 Method for determining the aberration coefficients of the aberration function of a particle-optical lens. |
| 06/13/2007 | EP1794775A2 Improved ion beam utilization during scanned ion implantation |
| 06/13/2007 | EP1794774A2 Controlled dose ion implantation |
| 06/13/2007 | EP1794773A1 Portable electron microscope using micro-column |
| 06/13/2007 | EP1794772A2 Sample enclosure for inspection and methods of use thereof |
| 06/13/2007 | EP1794771A1 Motioning equipment for electron column |
| 06/13/2007 | EP1665323B1 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 06/13/2007 | EP1665320B1 Method for preparing a sample for electron microscope examination and a sample carrier and transport holder used therefor |
| 06/13/2007 | EP1435071A4 System and method for point pushing to render polygons in environments with changing levels of detail |
| 06/13/2007 | EP1374277B1 Inductive plasma processor including current sensor for plasma excitation coil |
| 06/13/2007 | EP1370846B1 Device for preparing specimens for a cryo-electron microscope |
| 06/13/2007 | CN1981361A Apparatus for generating and emitting xuv radiation |
| 06/13/2007 | CN1981243A 电子束绘制装置 Electron beam drawing device |
| 06/13/2007 | CN1979752A Super-thin liquid control board for electronic microscope and combination with its case |
| 06/13/2007 | CN1979751A Method for determining the aberration coefficients of the aberration function of a particle-optical lens |
| 06/13/2007 | CN1979750A Non-uniform magnetic-field parallel-beam lens system |
| 06/13/2007 | CN1979749A Uniform magnetic-field parallel beam lens system |
| 06/13/2007 | CN1979748A Closed observing environment for electronic microscope |
| 06/13/2007 | CN1979747A Semi-closed observing environment for electronic microscope |
| 06/13/2007 | CN1979119A Transmission electron microscope test sample manufacture method, observation method and structure |
| 06/12/2007 | US7230257 Electron beam exposure apparatus |
| 06/12/2007 | US7230256 Ion doping system, ion doping method and semiconductor device |
| 06/12/2007 | US7230254 Movable carriage for a lithographic apparatus and device manufacturing method |
| 06/12/2007 | US7230253 Carrier and analyzing apparatus including the carrier |
| 06/12/2007 | US7230252 Aberration adjusting method, device fabrication method, and charged particle beam lithography machine |
| 06/12/2007 | US7230251 Electron beam lens for micro-column electron beam apparatus and method of fabricating the same |
| 06/12/2007 | US7230243 Method and apparatus for measuring three-dimensional shape of specimen by using SEM |
| 06/12/2007 | US7230242 Methods for SEM inspection of fluid containing samples |
| 06/12/2007 | US7230240 Enhanced scanning control of charged particle beam systems |
| 06/12/2007 | US7230202 Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod |
| 06/12/2007 | US7229742 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system |
| 06/07/2007 | WO2007064956A1 System and method of electron beam writing |
| 06/07/2007 | WO2007064508A1 Ion implantation beam angle calibration |
| 06/07/2007 | WO2007064507A1 Beam current stabilization utilizing gas feed control loop |
| 06/07/2007 | WO2007041057A3 Electrostatic deflection system with impedance matching for high positioning accuracy |
| 06/07/2007 | WO2007008792A3 Apparatus and method for controlled particle beam manufacturing |
| 06/07/2007 | US20070128880 Process and apparatus for forming oxide film, and electronic device material |
| 06/07/2007 | US20070128871 Etching apparatus and etching method |
| 06/07/2007 | US20070128375 Method and device for continuously treating the surface of an elongate object |
| 06/07/2007 | US20070125966 Thermal Transfer Sheet for Ion Source |
| 06/07/2007 | US20070125956 Particle-optical projection system |
| 06/07/2007 | US20070125954 Beam optical component for charged particle beams |
| 06/07/2007 | US20070125494 Method and apparatus for an improved bellows shield in a plasma processing system |
| 06/06/2007 | EP1793418A1 Etching method and system |
| 06/06/2007 | EP1793410A1 Spherical aberration correction electrostatic lens, input lens, electron spectroscopic device, photoelectron microscope, and measurement system |
| 06/06/2007 | EP1552727A4 Inductively coupled plasma generator having lower aspect ratio |
| 06/06/2007 | EP1442471A4 System and method for fast focal length alterations |
| 06/06/2007 | EP1332509A4 Focused ion beam system |
| 06/06/2007 | CN1977353A Device and method for atomising with the aid of a displaceable planar target |
| 06/06/2007 | CN1977352A Plasma ion implantation monitoring systems for fault detection and process control |
| 06/06/2007 | CN1977351A In-situ process chamber preparation methods for plasma ion implantation systems |
| 06/06/2007 | CN1977350A Laser atom probe methods |
| 06/06/2007 | CN1977068A Showerhead electrode assembly for plasma processing apparatuses |
| 06/06/2007 | CN1976880A Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating |
| 06/06/2007 | CN1320594C Inductively coupled plasma etching apparatus and method |
| 06/05/2007 | US7227624 Method and apparatus for monitoring the condition of plasma equipment |
| 06/05/2007 | US7227160 Systems and methods for beam angle adjustment in ion implanters |
| 06/05/2007 | US7227159 Ion implantation apparatus and ion implanting method |
| 06/05/2007 | US7227155 Electrostatic deflection system with impedance matching for high positioning accuracy |
| 06/05/2007 | US7227142 Dual detector optics for simultaneous collection of secondary and backscattered electrons |
| 06/05/2007 | US7227141 Electron beam apparatus |
| 06/05/2007 | US7227140 Method, system and device for microscopic examination employing fib-prepared sample grasping element |
| 06/05/2007 | US7227097 Plasma generation and processing with multiple radiation sources |
| 06/05/2007 | US7226723 Providing a substrate having a resist thereon;exposing the resist to at least one generally rectangular-shaped shot from an electron beam, rotating at least one of the substrate and a path of the generally rectangular-shaped shot; andexposing the resist with rectangular-shaped shot from electron beam |
| 06/05/2007 | US7226524 Plasma processing apparatus |
| 06/05/2007 | US7225754 Plasma processing apparatus including a plurality of plasma processing units having reduced variation |
| 05/31/2007 | WO2007060385A1 Microwave plasma abatement apparatus |
| 05/31/2007 | WO2007060017A2 Particle-optical component |
| 05/31/2007 | WO2007059609A1 Radiation lamp and radiation source module incorporating same |
| 05/31/2007 | WO2007038368B1 Reactive dual magnetron sputtering device with synchronised gas supply |
| 05/31/2007 | WO2005024881A3 Particle-optical systems, components and arrangements |
| 05/31/2007 | US20070120078 Method of measuring pattern dimension and method of controlling semiconductor device process |
| 05/31/2007 | US20070120076 Integrated ionizers for process metrology equipment |
| 05/31/2007 | US20070120075 Beam current stabilization utilizing gas feed control loop |
| 05/31/2007 | US20070120074 Ion implantation beam angle calibration |
| 05/31/2007 | US20070120073 Ion implanation method and device using thereof |
| 05/31/2007 | US20070120071 Electron-beam device and detector system |
| 05/31/2007 | US20070120068 Charged particle beam apparatus |
| 05/31/2007 | US20070119814 Apparatus and method for detecting an endpoint in a vapor phase etch |
| 05/31/2007 | US20070119705 Back-biased face target sputtering based memory data sensing technique |
| 05/31/2007 | US20070119701 High-Power Pulsed Magnetron Sputtering |
| 05/31/2007 | US20070119546 Plasma immersion ion implantation apparatus including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
| 05/31/2007 | US20070119376 Matching device and plasma processing apparatus |
| 05/31/2007 | DE19838600B4 Energiefilter und Elektronenmikroskop mit Energiefilter Energy filter and electron energy filter |
| 05/31/2007 | CA2630609A1 Radiation lamp and radiation source module incorporating same |
| 05/31/2007 | CA2629333A1 Charged particle radiation therapy |
| 05/30/2007 | EP1791172A1 Plasma processing apparatus |
| 05/30/2007 | EP1790201A2 Plasma nozzle array for providing uniform scalable microwave plasma generation |
| 05/30/2007 | EP1556883B1 Method for magnetron sputtering |
| 05/30/2007 | EP1392200A4 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology |
| 05/30/2007 | EP1287549A4 An apparatus and a method for forming a pattern using a crystal structure of material |
| 05/30/2007 | EP1261752B1 Method for repairing lithography masks using a charged particle beam system |
| 05/30/2007 | EP1212777B1 Ion beam vacuum sputtering apparatus and method |
| 05/30/2007 | EP1073779A4 Reduced impedance chamber |
| 05/30/2007 | CN2907173Y Large-area parallel connected high density inductively coupled plasma source |
| 05/30/2007 | CN2906916Y Faraday device |
| 05/30/2007 | CN2906915Y Fixed Faraday cage device for beam sampling and measurement |
| 05/30/2007 | CN2906907Y Non-uniform magnetic field edge characteristic corrector for ion implantation machine |
| 05/30/2007 | CN2906906Y Ion source lead-out electrode system |