| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/27/2007 | EP1801846A1 Target arrangement for mounting/dismouting and method of manufacturing |
| 06/27/2007 | EP1801845A1 Plasmachemical microwave reactor |
| 06/27/2007 | EP1801844A2 Method and apparatus for distance measurement |
| 06/27/2007 | EP1801843A1 Arrangement and method for the treatment of substrates |
| 06/27/2007 | EP1801838A1 Charged particle beam emitting device and method for operating a charged particle beam emitting device |
| 06/27/2007 | EP1801259A2 Vacuum arc vapor deposition apparatus |
| 06/27/2007 | EP1799876A1 Flat end-block for carrying a rotatable sputtering target |
| 06/27/2007 | EP1474958B1 Microwave plasma source |
| 06/27/2007 | EP1305815A4 Film thickness measurement using electron-beam induced x-ray microanalysis |
| 06/27/2007 | CN1989588A Ion implanter power supply which is intended to limit the loading effect |
| 06/27/2007 | CN1989587A Blocker plate bypass to distribute gases in a chemical vapor deposition system |
| 06/27/2007 | CN1989586A Method of determining dose uniformity of a scanning ion implanter |
| 06/27/2007 | CN1989269A Ion implanter operating in pulsed plasma mode |
| 06/27/2007 | CN1988107A Ion beam irradiating apparatus and method of adjusting uniformity of a beam |
| 06/27/2007 | CN1988106A Langmuir probe plasma diagnostic method based on virtual instrument |
| 06/27/2007 | CN1987521A System for measuring electronic beam scan uniformity |
| 06/27/2007 | CN1987490A Method and device for detecting arcs |
| 06/26/2007 | US7236651 Image evaluation method and microscope |
| 06/26/2007 | US7235797 Method of implanting a substrate and an ion implanter for performing the method |
| 06/26/2007 | US7235795 Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process |
| 06/26/2007 | US7235794 System and method for inspecting charged particle responsive resist |
| 06/26/2007 | US7235784 Transmission electron microscope and image observation method using it |
| 06/26/2007 | US7235783 Gas blowing nozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method |
| 06/26/2007 | US7235782 Semiconductor inspection system |
| 06/26/2007 | US7235162 Cathode for vacuum sputtering treatment machine |
| 06/26/2007 | US7235160 Hollow cathode sputtering apparatus and related method |
| 06/26/2007 | US7235155 Method and apparatus for monitoring plasma conditions using a monitoring ring |
| 06/26/2007 | US7234413 Plasma processing apparatus |
| 06/21/2007 | WO2007070495A1 Ion beam angle measurement systems and methods for ion implantation systems |
| 06/21/2007 | WO2007070249A2 Sputtering and methods for depositing a film containing tin and niobium |
| 06/21/2007 | WO2007068768A1 Cathode evaporation machine |
| 06/21/2007 | WO2007068133A1 Improved sputter target utilization |
| 06/21/2007 | WO2007053553A3 Method and system for forming a nitrided germanium-containing layer using plasma processing |
| 06/21/2007 | WO2007051313B1 Methods for performing circuit edit operations with low landing energy electron beams |
| 06/21/2007 | WO2007048937B1 Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a pet hollow body |
| 06/21/2007 | WO2000068451A3 Magnetron negative ion sputter source |
| 06/21/2007 | US20070142956 Method for adjoining adjacent coatings on a processing element |
| 06/21/2007 | US20070139646 Lithographic apparatus and method |
| 06/21/2007 | US20070139541 Imaging system and methodology |
| 06/21/2007 | US20070138412 Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems |
| 06/21/2007 | US20070138404 Chamber with low electron stimulated desorption |
| 06/21/2007 | US20070138403 Particle optical apparatus |
| 06/21/2007 | US20070138390 Inspection method and inspection system using charged particle beam |
| 06/21/2007 | US20070137792 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring |
| 06/21/2007 | US20070137575 Plasma processing apparatus |
| 06/21/2007 | US20070137572 Plasma processing apparatus |
| 06/21/2007 | US20070137566 Modular device for coating surfaces |
| 06/21/2007 | CA2628343A1 Sputtering and methods for depositing a film containing tin and niobium |
| 06/20/2007 | EP1798751A1 Protecting aperture for charged particle emitter |
| 06/20/2007 | EP1797746A2 Microwave plasma apparatus with vorticular gas flow |
| 06/20/2007 | EP1797578A2 Method and apparatus to improve plasma etch uniformity |
| 06/20/2007 | EP1797220A2 Rf ground switch for plasma processing system |
| 06/20/2007 | EP1438732A4 Methods and apparatus for defect localization |
| 06/20/2007 | EP1437035A4 Antenna structure for inductively coupled plasma generator |
| 06/20/2007 | CN2914324Y High-voltage duplex calculating machine without oil |
| 06/20/2007 | CN2914323Y Air-feeding system of cold plasma shower |
| 06/20/2007 | CN2914113Y Fiber connection system applied to ion implantation apparatus |
| 06/20/2007 | CN2913386Y 离子束传输控制系统 Ion beam transmission control system |
| 06/20/2007 | CN1985345A Cylindrical target obtained by hot isostatic pressing |
| 06/20/2007 | CN1985344A Apparatus for shielding a charged particle beam |
| 06/20/2007 | CN1985022A Pulse type magnetron sputtering deposition with preionization |
| 06/20/2007 | CN1983518A Plasma processing apparatus and method |
| 06/20/2007 | CN1983504A Ion source and mould polisher therewith |
| 06/20/2007 | CN1981876A Plasma surface processor of multi-capacity coupled radio-frequency |
| 06/20/2007 | CN1322793C Surface wave plasma treatment apparatus using multi-slot antenna |
| 06/20/2007 | CN1322559C Plasma processor |
| 06/20/2007 | CN1322539C Wafer area pressure control for plasma confinement and method, device |
| 06/20/2007 | CN1322538C Adjustable conductance limiting aperture for ion implanters |
| 06/20/2007 | CN1322162C Vacuum evaporator |
| 06/19/2007 | US7233878 Method and system for monitoring component consumption |
| 06/19/2007 | US7233011 Method of generation of charged particle beam exposure data and charged particle beam exposure method using a block mask |
| 06/19/2007 | US7232997 Apparatus and method for investigating or modifying a surface with a beam of charged particles |
| 06/19/2007 | US7232996 Method and an apparatus of an inspection system using an electron beam |
| 06/19/2007 | US7232767 Slotted electrostatic shield modification for improved etch and CVD process uniformity |
| 06/19/2007 | US7232766 System and method for surface reduction, passivation, corrosion prevention and activation of copper surface |
| 06/19/2007 | US7232502 Sheet-fed treating device |
| 06/14/2007 | WO2007067318A2 Ion sources, systems and methods |
| 06/14/2007 | WO2007067317A2 Ion sources, systems and methods |
| 06/14/2007 | WO2007067316A2 Ion sources, systems and methods |
| 06/14/2007 | WO2007067314A2 Ion sources, systems and methods |
| 06/14/2007 | WO2007067313A2 Ion sources, systems and methods |
| 06/14/2007 | WO2007067310A2 Ion sources, systems and methods |
| 06/14/2007 | WO2007067177A1 Medium pressure plasma system for removal of surface layers without substrate loss |
| 06/14/2007 | WO2007066961A1 Method for focusing electron beam in electron column |
| 06/14/2007 | WO2007066544A1 Composite charged particle beam system |
| 06/14/2007 | WO2007065388A2 Electron-optical corrector for an aplanatic imaging system |
| 06/14/2007 | WO2007065382A1 Corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration |
| 06/14/2007 | WO2007041139A3 Electrostatic deflection system with low aberrations and vertical beam incidence |
| 06/14/2007 | WO2006107797A3 Methods and apparatus for glitch recovery in stationary-beam ion implantation process using east ion beam control |
| 06/14/2007 | US20070134414 Surface-treatment method and equipment |
| 06/14/2007 | US20070133919 Distributor and distributing method, plasma processing system and method, and process for fabricating lcd |
| 06/14/2007 | US20070132320 Positioning apparatus and charged-particle-beam exposure apparatus |
| 06/14/2007 | US20070131873 Unsupported, electron transparent films and related methods |
| 06/14/2007 | US20070131650 Plasma chamber wall segment temperature control |
| 06/14/2007 | US20070131171 Plasma process device and plasma process method |
| 06/14/2007 | US20070131170 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same |
| 06/13/2007 | EP1796154A1 Plasma treatment apparatus and method of plasma treatment |
| 06/13/2007 | EP1796134A2 Semi-closed observational environment for electron microscope |
| 06/13/2007 | EP1796133A2 Specimen box for electron microscope capable of observing general specimen and live cell |
| 06/13/2007 | EP1796132A2 Closed observational device for electron microscope |