| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/01/2015 | US20150001175 Method for Production of Optical Waveguides and Coupling and Devices Made from the Same |
| 01/01/2015 | US20150001069 Polycrystalline Silicon Sputtering Target |
| 01/01/2015 | US20150001068 Manufacturing apparatus |
| 01/01/2015 | US20150000844 Multiple-mode plasma generation apparatus |
| 01/01/2015 | US20150000843 Plasma etching apparatus and method |
| 01/01/2015 | US20150000842 Power supply system, plasma etching apparatus, and plasma etching method |
| 01/01/2015 | US20150000841 Plasma processing apparatus |
| 01/01/2015 | US20150000712 Gas injector particle removal process and apparatus |
| 01/01/2015 | US20150000707 Cleaning method and processing apparatus |
| 12/31/2014 | CN104254900A 带电粒子束调整支援装置以及方法 A charged particle beam adjustment support device and a method |
| 12/31/2014 | CN104254639A 用于对细长的、圆柱形的构件进行等离子涂覆的装置和方法 Apparatus and methods for an elongated, cylindrical member coated plasma |
| 12/31/2014 | CN104253011A 绘画装置和制造物品的方法 Drawing device and method of manufacturing goods |
| 12/31/2014 | CN104253010A 离子束测定装置及离子束测定方法 Ion beam and ion beam measuring device measuring method |
| 12/31/2014 | CN102569130B 基板处理装置及基板处理方法 Substrate processing apparatus and substrate processing method |
| 12/31/2014 | CN102308357B 带电粒子束装置 Charged particle beam device |
| 12/31/2014 | CN102224561B 射频溅射配置 RF sputtering configuration |
| 12/30/2014 | US8924001 Etching apparatus, control simulator, and semiconductor device manufacturing method |
| 12/30/2014 | US8921811 High pressure charged particle beam system |
| 12/30/2014 | US8921807 In situ cleaning device for lithographic apparatus |
| 12/30/2014 | US8921805 Ion beam system and method of operating an ion beam system |
| 12/30/2014 | US8921803 Electrostatic lenses and systems including the same |
| 12/30/2014 | US8921802 Mass analyzer apparatus and systems operative for focusing ribbon ion beams and for separating desired ion species from unwanted ion species in ribbon ion beams |
| 12/30/2014 | US8921787 Incoherent transmission electron microscopy |
| 12/30/2014 | US8921786 Charged particle beam apparatus |
| 12/30/2014 | US8921785 Cooperating capillary and cap for use in a high-pressure freezer |
| 12/30/2014 | US8921784 Scanning electron microscope |
| 12/30/2014 | US8921783 Method of collecting and processing electron diffraction data |
| 12/30/2014 | US8921782 Tilt-imaging scanning electron microscope |
| 12/30/2014 | US8921781 Measurement or inspecting apparatus |
| 12/30/2014 | US8921758 Modulation device and charged particle multi-beamlet lithography system using the same |
| 12/30/2014 | US8921740 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
| 12/30/2014 | US8921240 Ion implantation method |
| 12/30/2014 | US8921234 Selective titanium nitride etching |
| 12/30/2014 | US8920723 Sample support structure and methods |
| 12/30/2014 | US8920613 Offset magnet compensation for non-uniform plasma |
| 12/30/2014 | US8920611 Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency RF impedance tuning |
| 12/30/2014 | US8920600 Inductive plasma source with high coupling efficiency |
| 12/30/2014 | US8920599 High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity |
| 12/30/2014 | US8920598 Electrode and plasma processing apparatus |
| 12/30/2014 | US8920597 Symmetric VHF source for a plasma reactor |
| 12/30/2014 | US8920596 Plasma processing apparatus |
| 12/25/2014 | US20140377891 Charged particle beam irradiation apparatus and methods related thereto |
| 12/25/2014 | US20140375208 Ion generator mounting device |
| 12/25/2014 | US20140375207 Large-area plasma generating apparatus |
| 12/25/2014 | US20140374624 Sensitivity correction method for dose monitoring device and particle beam therapy system |
| 12/25/2014 | US20140374593 Detection method for use in charged-particle microscopy |
| 12/25/2014 | US20140374509 Process chamber gas flow improvements |
| 12/25/2014 | US20140374250 Sputtering apparatus |
| 12/25/2014 | US20140374024 Apparatus for removing particles from a twin chamber processing system |
| 12/25/2014 | US20140373867 Cleaning method and substrate processing apparatus |
| 12/25/2014 | US20140373782 Substrate support apparatus and substrate process apparatus having the same |
| 12/24/2014 | CN104246967A 用于提供顺序的功率脉冲的方法 Sequence of power pulses provided a method for |
| 12/24/2014 | CN104246966A 带电粒子线装置 Charged particle beam apparatus |
| 12/24/2014 | CN104246965A 带电粒子束装置 Charged particle beam device |
| 12/24/2014 | CN104246667A 用于触控面板的透明体及制造透明体的方法与系统 For the transparent touch panel body and a method and system for manufacturing a transparent body |
| 12/24/2014 | CN104246009A 在等离子体沉积期间确定薄膜的厚度的方法 Determining the thickness of thin films during plasma deposition process |
| 12/24/2014 | CN104245217A 用于计算带电粒子束的射束参数的方法、测量设备及带电粒子束装置 A method for calculating the charged particle beam parameters of the beam, the measuring equipment and the charged particle beam apparatus |
| 12/24/2014 | CN104241183A 静电吸盘的制造方法,静电吸盘及等离子体处理装置 The method of manufacturing an electrostatic chuck, an electrostatic chuck, and a plasma processing apparatus |
| 12/24/2014 | CN104241182A 静电吸盘的制造方法,静电吸盘及等离子体处理装置 The method of manufacturing an electrostatic chuck, an electrostatic chuck, and a plasma processing apparatus |
| 12/24/2014 | CN104241181A 静电吸盘的制造方法,静电吸盘及等离子体处理装置 The method of manufacturing an electrostatic chuck, an electrostatic chuck, and a plasma processing apparatus |
| 12/24/2014 | CN104241073A 基板支撑装置及具备其的基板处理装置 A substrate supporting device and a substrate processing apparatus which includes |
| 12/24/2014 | CN104241072A 用于高射频功率导体蚀刻系统的锤头tcp线圈支架 For high RF power conductor etch hammerhead tcp coil support system |
| 12/24/2014 | CN104241071A 等离子体处理装置及等离子体处理方法 Plasma processing apparatus and plasma processing method |
| 12/24/2014 | CN104241070A 用于感应耦合等离子体腔室的气体注入装置 For inductively coupled plasma chamber, gas injection means |
| 12/24/2014 | CN104241069A 等离子体装置内具有氧化钇包覆层的部件及其制造方法 The plasma apparatus having a member and method for manufacturing the coating layer of yttrium oxide |
| 12/24/2014 | CN104241068A 扫描头及运用此扫描头的扫描臂 Scan using the scan head and arm the scanning head |
| 12/24/2014 | CN104241067A 电子束感应蚀刻 Electron beam induced etching |
| 12/24/2014 | CN104241066A 对带电粒子设备中的样品成像的方法 Devices for charged particle imaging method of sample |
| 12/24/2014 | CN104241065A 直插式电子元件放置座 Electronic components are placed in-line seat |
| 12/24/2014 | CN104236968A 将冻结含水样本结合到微探针的方法 The aqueous sample bind to freeze method microprobe |
| 12/24/2014 | CN102768973B 一种用于离子注入的激光辅助装置及其使用方法 A laser-assisted ion implantation apparatus and method of use for |
| 12/24/2014 | CN102460635B 对容器进行等离子体处理的装置和方法 The containers are plasma processing apparatus and method |
| 12/24/2014 | CN102265375B 射频溅射配置 RF sputtering configuration |
| 12/24/2014 | CN102203856B 离子注入装置 Ion implantation apparatus |
| 12/24/2014 | CN102110573B 等离子体处理装置 Plasma processing apparatus |
| 12/23/2014 | US8917022 Plasma generation device and plasma processing device |
| 12/23/2014 | US8916843 Inner gantry |
| 12/23/2014 | US8916840 Lithography apparatus, and article manufacturing method |
| 12/23/2014 | US8916839 Sample preparation method and apparatus |
| 12/23/2014 | US8916837 Charged particle lithography system with intermediate chamber |
| 12/23/2014 | US8916823 Method and system for non-destructive distribution profiling of an element in a film |
| 12/23/2014 | US8916821 Assemblies for ion and electron sources and methods of use |
| 12/23/2014 | US8916793 Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow |
| 12/23/2014 | US8916484 Remote plasma radical treatment of silicon oxide |
| 12/23/2014 | US8916477 Polysilicon etch with high selectivity |
| 12/23/2014 | US8916315 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
| 12/23/2014 | US8916055 Method and device for controlling pattern and structure formation by an electric field |
| 12/23/2014 | US8916034 Thin-film forming sputtering system |
| 12/23/2014 | US8915999 Shower plate sintered integrally with gas release hole member and method for manufacturing the same |
| 12/18/2014 | US20140370205 Film deposition method |
| 12/18/2014 | US20140368186 Inspection apparatus and inspection method |
| 12/18/2014 | US20140368110 Plasma processing apparatus and plasma processing method |
| 12/18/2014 | US20140367687 Small-scale fabrication systems and methods |
| 12/18/2014 | US20140367588 Method and System for E-Beam Lithography with Multi-Exposure |
| 12/18/2014 | US20140367587 Scan head and scan arm using the same |
| 12/18/2014 | US20140367586 Charged particle beam system and method of operating thereof |
| 12/18/2014 | US20140367585 Method for axial alignment of charged particle beam and charged particle beam system |
| 12/18/2014 | US20140367584 Multi charged particle beam writing method, and multi charged particle beam writing apparatus |
| 12/18/2014 | US20140367571 Method of welding a frozen aqueous sample to a microprobe |
| 12/18/2014 | US20140367570 Substrate inspection method and a substrate processing method |