Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2007
07/12/2007US20070158592 Ion beam delivery equipment and an ion beam delivery method
07/12/2007US20070158591 Method and apparatus for processing a micro sample
07/12/2007US20070158590 Focused ion beam processing method
07/12/2007US20070158564 Method and apparatus for processing a micro sample
07/12/2007US20070158561 Single stage charged particle beam energy width reduction system for charged particle beam system
07/12/2007US20070158305 Apparatus and method for plasma treating a substrate
07/12/2007US20070158180 Magnetron sputtering method and magnetron sputtering apparatus
07/12/2007US20070158177 Monitoring the coating area density of a predetermined layer thickness in a simple manner with the aid of the integral measuring technique, x-ray fluorescence, of an an auxiliary substrate arranged between the first coating source and an area into which a substrate to be coated is to be received
07/12/2007US20070158027 Plasma treatment device
07/12/2007DE10359508B4 Verfahren und Vorrichtung zum Magnetronsputtern Method and apparatus for magnetron sputtering
07/12/2007DE102007001044A1 Elektronenstrahl-Bestrahlungssystem Electron beam exposure system
07/12/2007DE102005063142A1 Transmission electron microscope, has image recording unit attached to projection chamber, and forming photo image derived from electron image of sample, on screen, and user central level and ray axis running at right angle to each other
07/12/2007DE10102493B4 Rohrförmiges Target und Verfahren zur Herstellung eines solchen Targets Tubular target and process for producing such a target
07/11/2007EP1805778A2 Systems and methods for ion beam focusing
07/11/2007EP1616224B1 Micromachining process
07/11/2007EP1536910A4 Radial pulsed arc discharge gun for synthesizing nanopowders
07/11/2007EP1212611B1 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
07/11/2007CN2922117Y Crystal chip platform angle adjusting device
07/11/2007CN2922115Y Long-life ion source heating electronic gun filament fixing device
07/11/2007CN2922114Y Filament lead-out rod isolating structure
07/11/2007CN1998069A Method of plasma etch endpoint detection using a V-I probe diagnostics
07/11/2007CN1998062A Methods for stable and repeatable plasma ion implantation
07/11/2007CN1998059A Non-axisymmetric charged-particle beam system
07/11/2007CN1997773A Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
07/11/2007CN1996547A Electronic optical focusing, deflexion and signals collection method for the turning gear immerged object lens
07/11/2007CN1996546A The real-time control system and control method for the ion source in gas
07/11/2007CN1326224C Interferometric endpoint detection in a substrate etching process
07/11/2007CN1326190C Stacked RF excitation coil for inductive plasma processor
07/10/2007US7242485 Displacement gauge and displacement measuring method
07/10/2007US7242015 Patterned wafer inspection method and apparatus therefor
07/10/2007US7242014 Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device
07/10/2007US7242013 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
07/10/2007US7241996 Charged particle beam apparatus
07/10/2007US7241995 Electron microscope equipped with magnetic microprobe
07/10/2007US7241993 Inspection system by charged particle beam and method of manufacturing devices using the system
07/10/2007US7241991 Region-of-interest based electron beam metrology
07/10/2007US7241542 Process for controlling the proximity effect correction
07/10/2007US7241428 Highly efficient compact capacitance coupled plasma reactor/generator and method
07/10/2007US7241397 Honeycomb optical window deposition shield and method for a plasma processing system
07/10/2007US7241361 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
07/09/2007WO2007100978A2 Aberration-correcting cathode lens microscopy instrument
07/09/2007CA2636239A1 Aberration-correcting cathode lens microscopy instrument
07/05/2007WO2007075509A2 Methods and apparatus for downstream dissociation of gases
07/05/2007WO2007056369A3 Batch photoresist dry strip and ash system and process
07/05/2007WO2005079360A3 Advanced optics for rapidly patterned lasser profiles in analytical spectrometry
07/05/2007US20070153263 Method and apparatus for performing limited area spectral analysis
07/05/2007US20070152174 Focused ion beam apparatus and aperture
07/05/2007US20070152173 Ion implantation apparatus and ion implanting method
07/05/2007US20070152151 Method and sample for radiation microscopy including a particle beam channel formed in the sample source
07/05/2007US20070152150 Charged particle beam apparatus
07/05/2007US20070151956 Plasma processing device and ashing method
07/05/2007DE19781667B4 Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle Plasma generation method and apparatus using an inductively coupled plasma source
07/05/2007DE102005061687A1 Verfahren und Vorrichtung zur Abstandsmessung Method and apparatus for measuring distance
07/05/2007DE102005061663A1 Ionenimplantationsvorrichtung, Verfahren zur Steuerung einer Ionenimplantationsvorrichtung sowie Abbremseinrichtung An ion implantation apparatus, method of controlling an ion implantation apparatus, as well as braking means
07/04/2007EP1804275A1 Sputter device with a tubular cathode and process of operating the sputter device
07/04/2007EP1804274A2 Plasma processing apparatus
07/04/2007EP1804273A1 Method and equipment for specimen preparation
07/04/2007EP1804272A2 Method for determining the aberration coefficients of the aberration function of a particle-opticle lens.
07/04/2007EP1803144A1 An end-block for a rotatable target sputtering apparatus
07/04/2007EP1803143A2 Electrode device for plasma treatment of the inner surfaces of a container and treatment method thereby
07/04/2007EP1803142A1 Apparatus for generating high-current electrical discharges
07/04/2007EP1803141A1 Microreactor for a transmission electron microscope and heating element and method for the manufacture thereof
07/04/2007EP1803140A2 Device and method for milling of material using ions
07/04/2007EP1543175A4 High peak power plasma pulsed supply with arc handling
07/04/2007CN1993806A Impurity introducing method
07/04/2007CN1992169A System and method for implanting a wafer with an ion beam
07/04/2007CN1992142A Tapered carbon nano tube and electronic source used for the same
07/04/2007CN1324931C Plasma generation and processing with multiple radiation sources
07/04/2007CN1324648C Apparatus and method to confine plasma and reduce flow resistance in plasma reactor
07/04/2007CN1324641C Magnet array in conjunction with rotating magnetron for plasma sputtering
07/04/2007CN1324114C Plasma-assisted joining
07/03/2007US7240307 Pattern size correcting device and pattern size correcting method
07/03/2007US7239934 System and method for delivering writing data of a semiconductor device and fabricating a semiconductor device
07/03/2007US7239148 Method and device for measuring surface potential distribution
07/03/2007US7238956 Device for controlling an apparatus generating a charged particle beam
07/03/2007US7238953 Specimen holder for an electron microscope and method for reducing thermal drift in a microscope
07/03/2007US7238952 Metal ion emission device and process for producing the same, ion beam irradiation device, processing apparatus and analyzing apparatus provided with emission device
07/03/2007US7238939 Small electron gun
07/03/2007US7238616 Photo-assisted method for semiconductor fabrication
07/03/2007US7238597 Boron ion delivery system
07/03/2007US7238294 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
07/03/2007CA2305938C Filtered cathodic arc deposition method and apparatus
06/2007
06/28/2007WO2007071719A1 Method of manufacturing at least one sputter-coated substrate and sputter source
06/28/2007WO2007071074A1 Excimer radiation lamp assembly, and source module and fluid treatment system containing same
06/28/2007WO2007071043A2 Excimer radiation lamp assembly, and source module and fluid treatment system containing same
06/28/2007WO2007044344A3 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths
06/28/2007WO2006110253A3 Quantitative transmission/emission detector system and methods of detecting concealed radiation sources
06/28/2007US20070148364 RF power (Bottom RF) from a radio-frequency power source 12 is turned off (t5) and the supply of a He gas 14 to a back face of a wafer W is stopped (t5) when an end point detector 17 (EPD) detects an end point (t5), and a high-voltage DC power source 13 (HV) is turned off (t6) under the condition
06/28/2007US20070146697 Apparatus and method for testing defects
06/28/2007US20070146696 Apparatus and method for testing defects
06/28/2007US20070145302 Method and apparatus for specimen fabrication
06/28/2007US20070145301 Method and apparatus for specimen fabrication
06/28/2007US20070145300 Method and apparatus for specimen fabrication
06/28/2007US20070145299 Method and apparatus for specimen fabrication
06/28/2007US20070145298 Ion beam angle measurement systems and methods for ion implantation systems
06/28/2007US20070145023 Toroidal Low-Field Reactive Gas and Plasma Source Having a Dielectric Vacuum Vessel
06/28/2007US20070144671 Shower plate, plasma processing apparatus, and product manufacturing method
06/28/2007US20070144670 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring
06/28/2007DE102006021565A1 Magnetic field system for a cathode unit, is produced using one or more cluster magnetron cathodes
06/27/2007EP1801946A1 Method and device of arc detection in a plasma process