| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/02/2007 | DE10358329B4 Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen An apparatus for generating excited and / or ionized particles in a plasma and method for generating ionized particles |
| 08/02/2007 | DE102004019835B4 Beleuchtungskondensor für ein Partikeloptik-Projektionssystem Illumination condenser for a particle optics projection system |
| 08/01/2007 | EP1813695A1 Tubular sputtering target with improved stiffness |
| 08/01/2007 | EP1813693A1 Sputtering target, sputtering target backing plate assembly and film deposition system |
| 08/01/2007 | EP1812960A1 Dry etching apparatuses and methods of forming an electric device using the same |
| 08/01/2007 | EP1812949A2 Impedance matching of a capacitively coupled rf plasma reactor suitable for large area substrates |
| 08/01/2007 | EP1812948A1 Material deposition apparatus and method |
| 08/01/2007 | EP1812947A1 Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate |
| 08/01/2007 | EP1812946A1 System and method for focused ion beam data analysis |
| 08/01/2007 | EP1812945A2 Method and apparatus for the automated process of in-situ lift-out |
| 08/01/2007 | EP1415322B1 Dual frequency plasma etch reactor with independent plasma density/chemistry and ion energy control |
| 08/01/2007 | CN1330219C RF plasma reactor and method for manufacturing the substrate |
| 08/01/2007 | CN1329962C Flat panel display manufacturing apparatus |
| 08/01/2007 | CN1329961C Plasma processor electrode and plasma processor |
| 08/01/2007 | CN1329957C Surface processing device |
| 08/01/2007 | CN1329943C Secondary electron detector, especially in a scanning electron microscope |
| 08/01/2007 | CN101010775A Portable electron microscope using micro-column |
| 08/01/2007 | CN101010774A Motioning equipment for electron column |
| 08/01/2007 | CN101009191A Ion implantation system having variable screen apertures and method of implanting ions using the same |
| 07/31/2007 | US7250617 Ion beam neutral detection |
| 07/31/2007 | US7250601 Energy spectrum measuring apparatus, electron energy loss spectrometer, electron microscope provided therewith, and electron energy loss spectrum measuring method |
| 07/31/2007 | US7250599 Energy filter image generator for electrically charged particles and the use thereof |
| 07/26/2007 | WO2007083756A1 Liquid medium for preventing charge-up in electron microscope and method of observing sample using the same |
| 07/26/2007 | WO2007082380A1 Redeposition technique for membrane attachment |
| 07/26/2007 | WO2007050307A3 Sputtering target and means for cooling the target |
| 07/26/2007 | US20070170372 Dual mode ion source for ion implantation |
| 07/26/2007 | US20070170369 Technique for Improving Uniformity of a Ribbon Beam |
| 07/26/2007 | DE19838599B4 Chemische Ionisationsquelle für die Massenspektrometrie Chemical ionization source for mass spectrometry |
| 07/26/2007 | DE19617155B4 Sputterbeschichtungsstation, Verfahren zur Herstellung sputterbeschichteter Werkstücke und Verwendung der Station oder des Verfahrens zur Beschichtung scheibenförmiger Substrate Sputterbeschichtungsstation, methods of making sputter-coated workpieces and use of the station or of the method for coating disk shaped substrates |
| 07/25/2007 | EP1811553A1 Apparatus and method for depositing fine particles |
| 07/25/2007 | EP1811540A2 Multipole lens and charged-particle beam instrument fitted with multiple lens |
| 07/25/2007 | EP1810318A1 Substrate carrier for parallel wafer processing reactor |
| 07/25/2007 | EP1810312A1 Method and apparatus for producing electric discharges |
| 07/25/2007 | EP1810311A2 Improved dose uniformity during scanned ion implantation |
| 07/25/2007 | CN2927603Y High-speed cold plasma array generator of atmosphere radio-frequency discharge |
| 07/25/2007 | CN1328766C Process system and process method |
| 07/25/2007 | CN1328755C Low contaminatino, high density plasma etch chamber and method for making the same |
| 07/25/2007 | CN1328751C Device for coating of objects |
| 07/25/2007 | CN1328411C Laser CVD apparatus and laser CVD method |
| 07/25/2007 | CN101006565A Method for providing uniform removal of organic material |
| 07/25/2007 | CN101006545A Method for reciprocating a workpiece through an ion beam |
| 07/25/2007 | CN101006339A Integrated optic ionized sensor |
| 07/25/2007 | CN101006198A In situ surface contaminant removal for ion implanting |
| 07/25/2007 | CN101005011A 等离子体处理装置 Plasma processing apparatus |
| 07/25/2007 | CN101005007A Plasma processing apparatus and plasma processing method |
| 07/24/2007 | US7248353 Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples |
| 07/24/2007 | US7247867 Ion implanter and method of manufacturing semiconductor device |
| 07/24/2007 | US7247865 System and method of detecting, neutralizing, and containing suspected contaminated articles |
| 07/24/2007 | US7247864 Charged particle beam apparatus |
| 07/24/2007 | US7247863 System and method for rapidly controlling the output of an ion source for ion implantation |
| 07/24/2007 | US7247848 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 07/24/2007 | US7247221 System and apparatus for control of sputter deposition process |
| 07/24/2007 | US7247218 Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power |
| 07/24/2007 | US7246800 Sealing mechanism for sealing a vacuum chamber |
| 07/19/2007 | WO2007058925A3 Ion implanter with contaminant collecting surface |
| 07/19/2007 | WO2007041057B1 Electrostatic deflection system with impedance matching for high positioning accuracy |
| 07/19/2007 | US20070166477 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| 07/19/2007 | US20070164680 Plasma generation and processing with multiple radiation sources |
| 07/19/2007 | US20070164237 Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase |
| 07/19/2007 | US20070164236 Method for retrieving signal from circuit |
| 07/19/2007 | US20070164228 Aberration correction device and method for operating same |
| 07/19/2007 | US20070164226 Electron beam apparatus and device manufacturing method using the same |
| 07/19/2007 | US20070164218 SEM technique for imaging and measuring electronic transport in nanocomposites based on electric field induced contrast |
| 07/19/2007 | US20070164217 Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method |
| 07/19/2007 | US20070163617 Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning |
| 07/19/2007 | US20070163502 Substrate processing apparatus |
| 07/19/2007 | US20070163501 Plasma processing apparatus |
| 07/19/2007 | DE102004055149B4 Vorrichtung und Verfahren zum Abbilden eines Mehrfach-Partikelstrahls auf ein Substrat Apparatus and method for imaging a multiple particle beam onto a substrate |
| 07/18/2007 | EP1808882A2 Charged particle beam device |
| 07/18/2007 | EP1807547A1 An elongated gas ditribution system |
| 07/18/2007 | EP1807224A2 Novel methods for cleaning ion implanter components |
| 07/18/2007 | EP1573795A4 A system and method for controlling plasma with an adjustable coupling to ground circuit |
| 07/18/2007 | EP1506324A4 Replaceable target sidewall insert with texturing |
| 07/18/2007 | EP1451849A4 Information acquisition apparatus, cross section evaluating apparatus, and cross section evaluating method |
| 07/18/2007 | EP1444727A4 Process and apparatus for etching of thin, damage sensitive layers using high frequency pulsed plasma |
| 07/18/2007 | EP1366209A4 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 07/18/2007 | EP1204507A4 Arc-free electron gun |
| 07/18/2007 | CN1327493C Mechanism and method for assembling processing device parts |
| 07/18/2007 | CN1327475C Suspended gas distribution manifold for plasma chamber |
| 07/18/2007 | CN101002295A Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process |
| 07/18/2007 | CN101002294A Ion beam scanning systems and methods for improved ion implantation uniformity |
| 07/18/2007 | CN101001974A Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
| 07/18/2007 | CN101000870A Method and device for controlling ion implantation |
| 07/17/2007 | US7245696 Element-specific X-ray fluorescence microscope and method of operation |
| 07/17/2007 | US7245084 Transformer ignition circuit for a transformer coupled plasma source |
| 07/17/2007 | US7245068 Apparatus for controlled alignment of catalytically grown nanostructures |
| 07/17/2007 | US7244953 Beam exposure writing strategy system and method |
| 07/17/2007 | US7244949 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| 07/17/2007 | US7244933 Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method |
| 07/17/2007 | US7244932 Electron beam apparatus and device fabrication method using the electron beam apparatus |
| 07/17/2007 | US7244475 Plasma treatment apparatus and control method thereof |
| 07/17/2007 | US7244343 Sputtering apparatus |
| 07/17/2007 | US7244336 Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
| 07/17/2007 | US7243610 Plasma device and plasma generating method |
| 07/12/2007 | WO2007076793A1 Method and apparatus for producing a magnetic-field system |
| 07/12/2007 | WO2007045110A3 Cleaning means for large area pecvd devices using a remote plasma source |
| 07/12/2007 | WO2007021520A3 Substrate support for increasing substrate temperature in plasma reactors |
| 07/12/2007 | WO2005081940A3 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 07/12/2007 | US20070161044 Method for localizing and identifying isotopes |
| 07/12/2007 | US20070160932 Electron beam lithography apparatus |