Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/2007
09/05/2007EP1030788B1 Plasma processing methods and apparatus
09/05/2007CN101031989A Method for the production of magnetron-coated substrates and magnetron sputter source
09/05/2007CN101030537A Method and apparatus for plasma etching
09/05/2007CN101030518A Fixer andits scanning electronic microscope for testing sample
09/05/2007CN101030517A Igniter electrode assembly of plasma generator
09/05/2007CN100336156C Plasma-assisted gas generation
09/04/2007US7265963 Holding mechanism of object to be processed
09/04/2007US7264909 Exposure parameters for all of the selected exposure patterns to be corrected include position, focal point, astigmatism, rotation, and magnification
09/04/2007US7264849 Roll-vortex plasma chemical vapor deposition method
09/04/2007US7264676 Plasma apparatus and method capable of adaptive impedance matching
08/2007
08/30/2007WO2007070249A3 Sputtering and methods for depositing a film containing tin and niobium
08/30/2007US20070203564 Biodegradable implants having accelerated biodegradation properties in vivo
08/30/2007US20070200075 Ion beam current monitoring
08/30/2007US20070200070 Aberration-correcting cathode lens microscopy instrument
08/30/2007US20070200069 Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System
08/30/2007US20070200063 Wafer-level testing of light-emitting resonant structures
08/30/2007US20070200062 Energy-filtering cathode lens microscopy instrument
08/30/2007DE102007008228A1 Elektronenstrahlgenerator für mehrere Säulen Electron beam generator for multiple columns
08/30/2007DE102007006504A1 Ablenkvorrichtung für Gerät zur Elektronenstrahllithographie sowie Gerät zur Elektronenstrahllithographie For deflecting device for electron beam lithography and device for electron beam lithography
08/30/2007DE102006009160A1 Anordnung für die Separation von Partikeln aus einem Plasma Arrangement for the separation of particles from a plasma
08/29/2007EP1826811A1 Cooled target sputtering
08/29/2007EP1826810A2 Assembly for separating particles from a plasma
08/29/2007EP1826809A1 Particle-optical apparatus equipped with a gas ion source
08/29/2007EP1826808A1 Charged particle beam device with ozone supply
08/29/2007EP1825968A2 Tilting unit driven by cables for manipulators
08/29/2007EP1825494A1 Magnetron sputtering apparatus
08/29/2007EP1825493A1 Method and device for operating a plasma device
08/29/2007EP1825492A2 Focussing mask
08/29/2007EP1825491A2 Ion source with substantially planar design
08/29/2007EP1305453A4 Ring-shaped high-density plasma source and method
08/29/2007EP1287545B1 Configurable vacuum system
08/29/2007EP1198822B1 New methodologies to reduce process sensitivity to the chamber condition
08/29/2007CN101026085A Semiconductor device manufacturing equipment with vacuum system
08/29/2007CN101026080A Particle-optical apparatus equipped with a gas ion source
08/29/2007CN101026078A Ion injection device
08/29/2007CN100334924C Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
08/29/2007CN100334678C Multi directional mechanical scanning in an ion implanter
08/28/2007US7263447 Method and apparatus for electron density measurement and verifying process status
08/28/2007US7263216 Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereof
08/28/2007US7262500 Interconnection structure
08/28/2007US7262418 Method and apparatus for multiple charged particle beams
08/28/2007US7262411 Direct collection transmission electron microscopy
08/28/2007US7262410 Sample observing apparatus and sample observing method
08/28/2007US7262398 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
08/28/2007US7262139 Method suitable for batch ion etching of copper
08/28/2007US7261797 Passive bipolar arc control system and method
08/23/2007WO2007094721A1 Apparatus, method and simulation objetcs for simulation of the image formation in a transmission electron microscope
08/23/2007WO2007094432A1 Ion implanting apparatus
08/23/2007WO2007065388A3 Electron-optical corrector for an aplanatic imaging system
08/23/2007WO2007060017A3 Particle-optical component
08/23/2007WO2006083886A3 Ion source for use in an ion implanter
08/23/2007US20070194252 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
08/23/2007US20070194251 Ion sources, systems and methods
08/23/2007US20070194236 Semiconductor inspection system
08/23/2007US20070194235 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
08/23/2007US20070194234 Scanning electron microscope
08/23/2007US20070194039 Gas port assembly
08/23/2007US20070193687 Disturbance-free, recipe-controlled plasma processing system and method
08/23/2007US20070193518 Plasma generator
08/23/2007US20070193514 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
08/22/2007EP1821333A1 Component, device and method for creating a layered system
08/22/2007EP1821332A1 A non-polluting material coating device
08/22/2007EP1821146A1 Deposition of a protective layer by charged particle beam sputtering and processing of the layer by a charged particle beam
08/22/2007EP1820201A2 Method of correction for wafer crystal cut error in semiconductor processing
08/22/2007EP1566081B1 Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
08/22/2007EP1376668B1 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method
08/22/2007EP1190437B1 Plasma processing system and method for delivering RF power to a plasma processing chamber
08/22/2007CN101023508A Improved method and apparatus for the etching of microstructures
08/22/2007CN101023506A Electrostatic lens for ion beams
08/22/2007CN101022075A Scanning electron microscope and apparatus for detecting defect
08/22/2007CN101022074A Differential feed dielectric barrier discharging low-temperature plasma device
08/21/2007US7260500 Method and apparatus for monitoring and verifying equipment status
08/21/2007US7259866 Semiconductor fabricating apparatus with function of determining etching processing state
08/21/2007US7259380 Scanning mechanism of an ion implanter
08/21/2007US7259027 Low energy dose monitoring of implanter using implanted wafers
08/21/2007CA2254650C Sputtering method and apparatus with optical monitoring
08/16/2007WO2007091891A1 Short pulse atmospheric pressure glow discharge method and apparatus
08/16/2007WO2007090850A1 Device for coupling between a plasma antenna and a power signal generator
08/16/2007WO2007090282A1 Radio frequency ion guide
08/16/2007WO2007067317A3 Ion sources, systems and methods
08/16/2007WO2007059227A3 Technique for providing a segmented electrostatic lens in an ion implanter
08/16/2007WO2006070107A8 Device for gaseous plasma sterilization
08/16/2007US20070192059 Method and system for monitoring component consumption
08/16/2007US20070190802 Method for manufacturing semiconductor device, substrate treater, and substrate treatment system
08/16/2007US20070190801 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrate
08/16/2007US20070190771 System and method for stress free conductor removal
08/16/2007US20070190296 Electromagnetic-wave shielding and light transmitting plate, manufacturing method thereof, and display panel
08/16/2007US20070187625 Lithography system
08/16/2007US20070187623 Method, System and Device for Microscopic Examination Employing Fib-Prepared Sample Grasping Element
08/16/2007US20070187622 Charged particle beam apparatus, defect correcting method, etching method, deposition method, and charge preventing method
08/16/2007US20070187621 Ion sources, systems and methods
08/16/2007US20070187620 Apparatus and Method for Partial Ion Implantation
08/16/2007US20070187619 Electromagnet with active field containment
08/16/2007US20070187600 Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
08/16/2007US20070187598 Scanning electron microscope and apparatus for detecting defect
08/16/2007US20070187229 Lower plasma losses and higher output plasma current to input current efficiency; magnetic filter positioned to include the effects of at least three added magnetic coils located at the right angle bend of the filter path; fins and a magnetic cusp trap in the filter path achieve desirable flux paths
08/16/2007US20070186856 Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
08/16/2007US20070186854 Apparatus and method for plasma processing
08/16/2007DE19983134B4 Induktionsspulenanordnung Induction coil assembly
08/16/2007DE19502439B4 Verfahren und Messanordnung zum Messen der pro Zeiteinheit einen Vakuumvolumenbereich in gegebener Richtung durchströmenden elektrischen Ladungsmenge und deren Verwendung für Massenspektrometer Methods and measuring device for measuring the volume per unit of time a vacuum area flowing in a given direction amount of electric charge and their use for mass spectrometer