Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/2007
09/20/2007WO2007105939A1 Lithography system and projection method
09/20/2007WO2007105799A1 Recording device, recording control signal generation device, transfer type manufacturing method, and transfer type and magnetic disks
09/20/2007WO2007105389A1 Electron gun, energy ray generating device, electron beam generating device, and x-ray generating device
09/20/2007WO2007104504A1 Segmented electrical or optical delay line with interleaved tap for 3d image device readout
09/20/2007WO2007075509A3 Methods and apparatus for downstream dissociation of gases
09/20/2007US20070217800 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device
09/20/2007US20070217671 Method for the Characterisation of Surface Structures and use Thereof for the Modification Development and Production of Materials
09/20/2007US20070216767 Electron Beam Displacement Measuring Method, Electron Beam Displacement Measuring Device, and Electron Beam Recording Apparatus
09/20/2007US20070215814 Particle beam current measurement system
09/20/2007US20070215812 Correction Lens System for a Particle Beam Projection Device
09/20/2007US20070215803 Method and an apparatus of an inspection system using an electron beam
09/20/2007US20070215802 Systems and methods for a gas field ion microscope
09/20/2007DE102007004618A1 Focused ion beam device for producing test specimen, has focused ion beam tubes for irradiation of test specimen with focused ion beams, where irradiation directions of ion beams of tubes are opposite in top view
09/20/2007DE102006011615A1 Phasenkontrast-Elektronenmikroskop Phase contrast electron
09/20/2007DE102004044357B4 Vorrichtung zur Durchführung der Oberflächenbehandlung von Bauteilen in der Plasmatechnik Apparatus for carrying out the surface treatment of parts in the plasma technology
09/20/2007DE10190535B4 Emissionselektronenmikroskop Emission electron microscope
09/19/2007EP1835526A1 Mounting device for a sputter source
09/19/2007EP1835525A1 Target gripping device
09/19/2007EP1835524A1 Fastening means for sputtering source
09/19/2007EP1835523A2 Phase-contrast electron microscope
09/19/2007EP1835347A1 Image producing methods and image producing devices
09/19/2007EP1835307A1 Segmented electrical or optical delay line with interleaved tap for 3D image device readout
09/19/2007EP1834007A1 Oscillating shielded cylindrical target assemblies and their methods of use
09/19/2007CN200950127Y Electron beam breaker for electron microprobe electro-acoustics imaging
09/19/2007CN200949112Y Anode for ion source of optical auxiliary film plating machine
09/19/2007CN101040365A Ion beam measurement systems and methods for ion implant dose and uniformity control
09/19/2007CN101040061A An elongated gas ditribution system
09/19/2007CN101039544A Plasma processor with electrode simultaneously responsive to plural frequencies
09/19/2007CN101038869A Water-cooling plasma shower
09/19/2007CN101038861A Plasma etching method and computer-readable storage medium
09/19/2007CN101038860A Plasma processing apparatus and method
09/19/2007CN101038859A Plasma processing apparatus and electrode used therein
09/19/2007CN101038851A High voltage automatic discharge device for ion implanter
09/19/2007CN101038850A Ion implantation high temperature target
09/19/2007CN101038849A Plasma processing apparatus, plasma processing method and focus ring
09/19/2007CN100338976C Plasma-assisted process in production line
09/19/2007CN100338721C Gas distribution plate electrode for plasma reactor
09/19/2007CN100338720C Hybrid scanning system and methods for ion implantation
09/19/2007CN100338719C Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflector
09/18/2007US7271400 Methods, apparatus, and systems involving ion beam generation
09/18/2007US7271399 Manipulator assembly in ion implanter
09/18/2007US7271396 Method and device for aligning a charged particle beam column
09/18/2007US7271385 Inspection method and inspection apparatus using electron beam
09/18/2007US7270921 Energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etching process; resist on the target is developed to form a resist pattern; target is etched with the resist pattern as a mask, thus forming patterns
09/18/2007US7270729 System for, and method of, etching a surface on a wafer
09/18/2007US7270724 Scanning plasma reactor
09/18/2007US7270713 Tunable gas distribution plate assembly
09/18/2007US7269995 Method and apparatus of vibration isolation, in particular for electron beam metrology tools
09/13/2007WO2007102421A1 Pattern inspecting system and pattern inspecting method
09/13/2007WO2007102298A1 Rotary drive apparatus and electron beam irradiation apparatus
09/13/2007WO2007067605A3 Ion implanter with ionization chamber electrode design
09/13/2007WO2007067316A3 Ion sources, systems and methods
09/13/2007US20070212811 Low temperature CVD process with selected stress of the CVD layer on CMOS devices
09/13/2007US20070212254 coaxial waveguides; for medical equipment and foods within plastic package
09/13/2007US20070210721 Method And Apparatus For Stabilizing A Glow Discharge Plasma Under Atmospheric Conditions
09/13/2007US20070210260 Method And Apparatus For Extending Equipment Uptime In Ion Implantation
09/13/2007US20070210253 Methods for SEM inspection of fluid containing samples
09/13/2007US20070210249 Electron Spectroscope With Emission Induced By A Monochromatic Electron Beam
09/13/2007DE10319370B4 Verfahren zum Erfassen und Kompensieren von Lageverschiebungen bei photolithographischen Maskeneinheiten A method for detecting and compensating for positional shifts in photolithographic mask units
09/13/2007DE102005013532B4 EUV-Lithographiesystem und Retikelhalter zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and reticle for solving reticles in a vacuum-insulated environment
09/13/2007CA2582112A1 System and method for automatic measurements and calibration of computerized magnifying instruments
09/12/2007EP1833079A1 A method and apparatus for processing wafers
09/12/2007EP1831912A2 Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems
09/12/2007EP1374276B1 Plasma surface treatment method and device for carrying out said method
09/12/2007EP1185857B1 Method and apparatus for enhancing yield of secondary ions
09/12/2007CN101035405A Plasma treatment device
09/12/2007CN100337314C Plasma control using dual cathode frequency mixing
09/12/2007CN100337313C Plasma processing device and baffle plate thereof
09/12/2007CN100337301C Highly efficent compact capacitance coupled plasma reactor/generator and method
09/11/2007US7269819 Method and apparatus for generating exposure data
09/11/2007US7269280 Method and its apparatus for inspecting a pattern
09/11/2007US7268360 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
09/11/2007US7268358 Method of modulating laser-accelerated protons for radiation therapy
09/11/2007US7268357 Immersion lithography apparatus and method
09/11/2007US7267741 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
09/11/2007US7267731 close to the designed shape using a focused charged-particle beam by reducing the effects of etching and deposition which vary according to various conditions when a processing work is performed
09/11/2007US7267724 Thin-film disposition apparatus
09/11/2007CA2206679C Plasma processor for large workpieces
09/07/2007WO2007100873A2 Hybrid wafer -holding pin
09/07/2007WO2007100293A1 Method of applying alignment markers for cryo-microscopy
09/07/2007WO2007067313A3 Ion sources, systems and methods
09/07/2007WO2007065896A3 Removable liners for charged particle beam systems
09/07/2007WO2004085693A3 Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction
09/06/2007US20070205727 Plasma-generation power-supply device
09/06/2007US20070205376 Gas blowing nozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method
09/06/2007US20070205358 Laser Atom Probe
09/06/2007US20070204907 Apparatus and method of gas injection sequencing
09/06/2007US20070204794 Method and apparatus for an improved baffle plate in a plasma processing system
09/06/2007DE10337509B4 Gerät zur Herstellung von Halbleitern Apparatus for production of semiconductors
09/05/2007EP1830385A1 Ion beam apparatus and method for aligning same
09/05/2007EP1830384A2 Charged particle beamlet exposure system
09/05/2007EP1830383A2 Particle-optical apparatus equipped with a gas ion source
09/05/2007EP1830382A2 Electron beam gun
09/05/2007EP1829438A1 Device for gaseous plasma sterilization
09/05/2007EP1829091A2 Optimization of beam utilization
09/05/2007EP1828429A2 Dual anode ac supply for continuous deposition of a cathode material
09/05/2007EP1704756B1 Plasma treatment of large-scale components
09/05/2007EP1576641B1 Vacuum arc source comprising a device for generating a magnetic field
09/05/2007EP1390559B1 Method for producing a layer with a predefined layer thickness profile
09/05/2007EP1200981B1 Gas distribution apparatus for semiconductor processing