Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2007
10/10/2007CN100342480C Plasma confinement by use of preferred RF return path
10/10/2007CN100342056C Unitary removable shield assembly
10/09/2007US7279691 Ion implantation apparatus and method for implanting ions by using the same
10/09/2007US7279689 Contact opening metrology
10/09/2007US7279687 Technique for implementing a variable aperture lens in an ion implanter
10/04/2007WO2007112220A2 Method for treating thermoplastic polyurethane golf ball covers
10/04/2007WO2007111876A2 Determining ion beam parallelism using refraction method
10/04/2007WO2007111603A1 Optics for generation of high current density patterned charged particle beams
10/04/2007WO2007110323A1 Coating apparatus
10/04/2007WO2007109906A1 Method and apparatus for nanopowder and micropowder production using axial injection plasma spray
10/04/2007WO2007089468A3 Architecture for ribbon ion beam ion implanter system
10/04/2007WO2007075970A3 Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
10/04/2007WO2007075344A3 Technique for providing an inductively coupled radio frequency plasma flood gun
10/04/2007WO2007041194A3 Hyperthermal neutral beam source and method of operating
10/04/2007WO2006055379A3 Improved dose uniformity during scanned ion implantation
10/04/2007WO2006052622A3 Apparatus and methods for two-dimensional ion beam profiling
10/04/2007US20070232085 Method and apparatus for plasma processing
10/04/2007US20070231716 Plasma etching chamber and method for manufacturing photomask using the same
10/04/2007US20070230768 Method and apparatus for inspecting a substrate
10/04/2007US20070229337 Charged particle beam apparatus, abnormality detecting method for da converter unit, charged particle beam writing method, and mask
10/04/2007US20070228525 Substrate earthing mechanism for use in charged-particle beam writing apparatus
10/04/2007US20070228297 Charged beam drawing apparatus
10/04/2007US20070228294 Charge Neutralizing Device
10/04/2007US20070228293 Pattern writing and forming method
10/04/2007US20070228292 Adjusting device of an apparatus for generating a beam of charged particles
10/04/2007US20070227669 Method and apparatus for plasma processing
10/04/2007US20070227554 Semiconductor processing with a remote plasma source for self-cleaning
10/04/2007US20070227450 Plasma Cvd Equipment
10/04/2007DE4308632B4 Verfahren und Vorrichtung zum Nachbehandeln von Aluminium-beschichteten Kunststoff-Folien Method and apparatus for after-treatment of aluminum-coated plastic films
10/04/2007DE10164895B4 Emission electron microscope has optical lens system with objective, imaging system with lens, stigmator, second imaging system parallel to first, electron detectors
10/04/2007CA2647621A1 Method and apparatus for nanopowder and micropowder production using axial injection plasma spray
10/03/2007EP1840950A1 Plasma processing method
10/03/2007EP1840938A1 Plasma reactor
10/03/2007EP1840937A1 Plasma processing apparatus and plasma processing method
10/03/2007EP1840936A1 Sputtering chamber for coating a substrate
10/03/2007EP1840926A1 Isolating vacuum feedthrough for rotatable magnetrons
10/03/2007EP1839324A2 Dual-mode electron beam column
10/03/2007EP1839001A1 Low-temperature cryostat
10/03/2007EP1449234B1 Magnetron sputtering device
10/03/2007EP1269512B1 Inductively coupled plasma etching apparatus with active control of RF peak-to-peak voltage
10/03/2007EP1213749B1 Plasma processing apparatus and method of plasma processing
10/03/2007CN101048852A Substrate carrier for parallel wafer processing reactor
10/03/2007CN101048842A Method and apparatus to improve plasma etch uniformity
10/03/2007CN101048029A Microwave plasma processing apparatus, method for manufacturing microwave plasma processing apparatus and plasma processing method
10/03/2007CN101047118A Plasma processing apparatus and plasma processing method
10/03/2007CN101047085A Field emission electronic source and its manufacturing method
10/03/2007CN100341386C Inductive coupled antenna and plasma processor using the same
10/03/2007CN100341120C Plasma processing device and method thereof
10/03/2007CN100341107C Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
10/03/2007CN100341106C Method and device for aligning a charged particle beam column
10/02/2007US7276847 Cathode assembly for indirectly heated cathode ion source
10/02/2007US7276816 High-frequency matching network
10/02/2007US7276714 Advanced pattern definition for particle-beam processing
10/02/2007US7276713 Method for fabricating a metal-insulator-metal capacitor
10/02/2007US7276712 Method and apparatus for scanning a workpiece in a vacuum chamber of an ion beam implanter
10/02/2007US7276711 Beam space-charge compensation device and ion implantation system having the same
10/02/2007US7276709 System and method for electron-beam lithography
10/02/2007US7276707 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
10/02/2007US7276694 Defect detection using energy spectrometer
10/02/2007US7276693 Inspection method and apparatus using charged particle beam
10/02/2007US7276692 Beam adjusting sample, beam adjusting method and beam adjusting device
10/02/2007US7276691 Ion beam device and ion beam processing method
10/02/2007US7276688 Ion-optical phase volume compression
10/02/2007US7276135 Vacuum plasma processor including control in response to DC bias voltage
09/2007
09/27/2007WO2007109784A2 Surface treatments for spiral bevel gear sets
09/27/2007WO2007076004A3 Flourine based cleaning of an ion source
09/27/2007US20070224364 Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method
09/27/2007US20070222120 Method for Treating Thermoplastic Polyurethane Golf Ball Covers
09/27/2007US20070221872 Ion implanter with variable scan frequency
09/27/2007US20070221870 Technique for isocentric ion beam scanning
09/27/2007US20070221846 Scanning electron microscope
09/27/2007US20070221622 Plasma Chamber Having Plasma Source Coil and Method for Etching the Wafer Using the Same
09/27/2007US20070221130 Substrate Processing Apparatus
09/27/2007DE10235455B4 Teilchenoptische Vorrichtung und Verfahren zum Betrieb derselben Particle-optical apparatus and method for operating the same
09/27/2007DE102006012666A1 Vorrichtung und Verfahren zur Eigenschaftsänderung dreidimensionaler Formteile mittels Elektronen Apparatus and method for property change of three-dimensional molded parts by means of electron
09/26/2007EP1837893A1 Measuring device of an HF-plasma system
09/26/2007EP1836718A1 Microplasma array
09/26/2007EP1836717A2 Ion beam scanning control methods and systems for ion implantation
09/26/2007EP1373594A4 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly
09/26/2007EP1252647B1 Impedance adapted microwave energy coupling device
09/26/2007CN200953337Y Implantation machine vacuum tube line structure
09/26/2007CN200953336Y Indirect heating cathode fixing device in long-life ion source
09/26/2007CN101044586A An end-block for a rotatable target sputtering apparatus
09/26/2007CN101044257A An end-block for a rotatable target sputtering apparatus
09/26/2007CN101042996A Plasma treating apparatus and plasma treating method
09/26/2007CN101042991A Plasma processing apparatus
09/26/2007CN101042990A Plasma processing apparatus and method
09/26/2007CN101042989A Plasma processing apparatus
09/26/2007CN101042978A Apparatus for shielding process chamber port having dual zone and optical access features
09/26/2007CN101042977A Field emission type electron source and its manufacturing method
09/26/2007CN100339967C Ion irradiating device
09/26/2007CN100339943C Multirate processing for metrology of plasma RF source
09/26/2007CN100339768C Method and apparatus for pyroelectric lithography using patterned emitter
09/25/2007US7274029 Lithographic apparatus and device manufacturing method
09/25/2007US7274018 Charged particle beam apparatus and method for operating the same
09/25/2007US7274017 Electron beam apparatus and high-voltage discharge prevention method
09/25/2007US7273580 Ferromagnetic resonance excitation and its use for heating substrates that are filled with particles
09/25/2007US7273533 Plasma processing system with locally-efficient inductive plasma coupling
09/20/2007WO2007106449A2 Technique for monitoring and controlling a plasma process
09/20/2007WO2007106107A2 Wafer-level testing of light-emitting resonant structures