Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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10/10/2007 | CN100342480C Plasma confinement by use of preferred RF return path |
10/10/2007 | CN100342056C Unitary removable shield assembly |
10/09/2007 | US7279691 Ion implantation apparatus and method for implanting ions by using the same |
10/09/2007 | US7279689 Contact opening metrology |
10/09/2007 | US7279687 Technique for implementing a variable aperture lens in an ion implanter |
10/04/2007 | WO2007112220A2 Method for treating thermoplastic polyurethane golf ball covers |
10/04/2007 | WO2007111876A2 Determining ion beam parallelism using refraction method |
10/04/2007 | WO2007111603A1 Optics for generation of high current density patterned charged particle beams |
10/04/2007 | WO2007110323A1 Coating apparatus |
10/04/2007 | WO2007109906A1 Method and apparatus for nanopowder and micropowder production using axial injection plasma spray |
10/04/2007 | WO2007089468A3 Architecture for ribbon ion beam ion implanter system |
10/04/2007 | WO2007075970A3 Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems |
10/04/2007 | WO2007075344A3 Technique for providing an inductively coupled radio frequency plasma flood gun |
10/04/2007 | WO2007041194A3 Hyperthermal neutral beam source and method of operating |
10/04/2007 | WO2006055379A3 Improved dose uniformity during scanned ion implantation |
10/04/2007 | WO2006052622A3 Apparatus and methods for two-dimensional ion beam profiling |
10/04/2007 | US20070232085 Method and apparatus for plasma processing |
10/04/2007 | US20070231716 Plasma etching chamber and method for manufacturing photomask using the same |
10/04/2007 | US20070230768 Method and apparatus for inspecting a substrate |
10/04/2007 | US20070229337 Charged particle beam apparatus, abnormality detecting method for da converter unit, charged particle beam writing method, and mask |
10/04/2007 | US20070228525 Substrate earthing mechanism for use in charged-particle beam writing apparatus |
10/04/2007 | US20070228297 Charged beam drawing apparatus |
10/04/2007 | US20070228294 Charge Neutralizing Device |
10/04/2007 | US20070228293 Pattern writing and forming method |
10/04/2007 | US20070228292 Adjusting device of an apparatus for generating a beam of charged particles |
10/04/2007 | US20070227669 Method and apparatus for plasma processing |
10/04/2007 | US20070227554 Semiconductor processing with a remote plasma source for self-cleaning |
10/04/2007 | US20070227450 Plasma Cvd Equipment |
10/04/2007 | DE4308632B4 Verfahren und Vorrichtung zum Nachbehandeln von Aluminium-beschichteten Kunststoff-Folien Method and apparatus for after-treatment of aluminum-coated plastic films |
10/04/2007 | DE10164895B4 Emission electron microscope has optical lens system with objective, imaging system with lens, stigmator, second imaging system parallel to first, electron detectors |
10/04/2007 | CA2647621A1 Method and apparatus for nanopowder and micropowder production using axial injection plasma spray |
10/03/2007 | EP1840950A1 Plasma processing method |
10/03/2007 | EP1840938A1 Plasma reactor |
10/03/2007 | EP1840937A1 Plasma processing apparatus and plasma processing method |
10/03/2007 | EP1840936A1 Sputtering chamber for coating a substrate |
10/03/2007 | EP1840926A1 Isolating vacuum feedthrough for rotatable magnetrons |
10/03/2007 | EP1839324A2 Dual-mode electron beam column |
10/03/2007 | EP1839001A1 Low-temperature cryostat |
10/03/2007 | EP1449234B1 Magnetron sputtering device |
10/03/2007 | EP1269512B1 Inductively coupled plasma etching apparatus with active control of RF peak-to-peak voltage |
10/03/2007 | EP1213749B1 Plasma processing apparatus and method of plasma processing |
10/03/2007 | CN101048852A Substrate carrier for parallel wafer processing reactor |
10/03/2007 | CN101048842A Method and apparatus to improve plasma etch uniformity |
10/03/2007 | CN101048029A Microwave plasma processing apparatus, method for manufacturing microwave plasma processing apparatus and plasma processing method |
10/03/2007 | CN101047118A Plasma processing apparatus and plasma processing method |
10/03/2007 | CN101047085A Field emission electronic source and its manufacturing method |
10/03/2007 | CN100341386C Inductive coupled antenna and plasma processor using the same |
10/03/2007 | CN100341120C Plasma processing device and method thereof |
10/03/2007 | CN100341107C Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
10/03/2007 | CN100341106C Method and device for aligning a charged particle beam column |
10/02/2007 | US7276847 Cathode assembly for indirectly heated cathode ion source |
10/02/2007 | US7276816 High-frequency matching network |
10/02/2007 | US7276714 Advanced pattern definition for particle-beam processing |
10/02/2007 | US7276713 Method for fabricating a metal-insulator-metal capacitor |
10/02/2007 | US7276712 Method and apparatus for scanning a workpiece in a vacuum chamber of an ion beam implanter |
10/02/2007 | US7276711 Beam space-charge compensation device and ion implantation system having the same |
10/02/2007 | US7276709 System and method for electron-beam lithography |
10/02/2007 | US7276707 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus |
10/02/2007 | US7276694 Defect detection using energy spectrometer |
10/02/2007 | US7276693 Inspection method and apparatus using charged particle beam |
10/02/2007 | US7276692 Beam adjusting sample, beam adjusting method and beam adjusting device |
10/02/2007 | US7276691 Ion beam device and ion beam processing method |
10/02/2007 | US7276688 Ion-optical phase volume compression |
10/02/2007 | US7276135 Vacuum plasma processor including control in response to DC bias voltage |
09/27/2007 | WO2007109784A2 Surface treatments for spiral bevel gear sets |
09/27/2007 | WO2007076004A3 Flourine based cleaning of an ion source |
09/27/2007 | US20070224364 Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition method |
09/27/2007 | US20070222120 Method for Treating Thermoplastic Polyurethane Golf Ball Covers |
09/27/2007 | US20070221872 Ion implanter with variable scan frequency |
09/27/2007 | US20070221870 Technique for isocentric ion beam scanning |
09/27/2007 | US20070221846 Scanning electron microscope |
09/27/2007 | US20070221622 Plasma Chamber Having Plasma Source Coil and Method for Etching the Wafer Using the Same |
09/27/2007 | US20070221130 Substrate Processing Apparatus |
09/27/2007 | DE10235455B4 Teilchenoptische Vorrichtung und Verfahren zum Betrieb derselben Particle-optical apparatus and method for operating the same |
09/27/2007 | DE102006012666A1 Vorrichtung und Verfahren zur Eigenschaftsänderung dreidimensionaler Formteile mittels Elektronen Apparatus and method for property change of three-dimensional molded parts by means of electron |
09/26/2007 | EP1837893A1 Measuring device of an HF-plasma system |
09/26/2007 | EP1836718A1 Microplasma array |
09/26/2007 | EP1836717A2 Ion beam scanning control methods and systems for ion implantation |
09/26/2007 | EP1373594A4 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
09/26/2007 | EP1252647B1 Impedance adapted microwave energy coupling device |
09/26/2007 | CN200953337Y Implantation machine vacuum tube line structure |
09/26/2007 | CN200953336Y Indirect heating cathode fixing device in long-life ion source |
09/26/2007 | CN101044586A An end-block for a rotatable target sputtering apparatus |
09/26/2007 | CN101044257A An end-block for a rotatable target sputtering apparatus |
09/26/2007 | CN101042996A Plasma treating apparatus and plasma treating method |
09/26/2007 | CN101042991A Plasma processing apparatus |
09/26/2007 | CN101042990A Plasma processing apparatus and method |
09/26/2007 | CN101042989A Plasma processing apparatus |
09/26/2007 | CN101042978A Apparatus for shielding process chamber port having dual zone and optical access features |
09/26/2007 | CN101042977A Field emission type electron source and its manufacturing method |
09/26/2007 | CN100339967C Ion irradiating device |
09/26/2007 | CN100339943C Multirate processing for metrology of plasma RF source |
09/26/2007 | CN100339768C Method and apparatus for pyroelectric lithography using patterned emitter |
09/25/2007 | US7274029 Lithographic apparatus and device manufacturing method |
09/25/2007 | US7274018 Charged particle beam apparatus and method for operating the same |
09/25/2007 | US7274017 Electron beam apparatus and high-voltage discharge prevention method |
09/25/2007 | US7273580 Ferromagnetic resonance excitation and its use for heating substrates that are filled with particles |
09/25/2007 | US7273533 Plasma processing system with locally-efficient inductive plasma coupling |
09/20/2007 | WO2007106449A2 Technique for monitoring and controlling a plasma process |
09/20/2007 | WO2007106107A2 Wafer-level testing of light-emitting resonant structures |