Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2007
10/30/2007US7288774 Transverse magnetic field voltage isolator
10/30/2007US7288773 Electron source, and charged-particle apparatus comprising such an electron source
10/30/2007US7288772 Diagnostic system for profiling micro-beams
10/30/2007US7288764 Pattern measuring method
10/30/2007US7288763 Method of measurement accuracy improvement by control of pattern shrinkage
10/30/2007US7288491 Plasma immersion ion implantation process
10/30/2007US7288293 Applying pasma; activation surfaces
10/30/2007US7288173 Ion beam processing system and ion beam processing method
10/30/2007US7288166 Plasma processing apparatus
10/30/2007CA2248284C Tetracarbon coated medical implant
10/25/2007WO2007119873A1 Scanning type electronic microscope
10/25/2007WO2007119475A1 Disc master exposure device and method for adjusting same
10/25/2007WO2007118450A1 Electron-optical corrector for aplanatic imaging systems
10/25/2007WO2007065896B1 Removable liners for charged particle beam systems
10/25/2007US20070249256 Material for electrodes of low temperature plasma generators
10/25/2007US20070246658 Load lock control
10/25/2007US20070246355 Batch-Type Remote Plasma Processing Apparatus
10/25/2007DE20122776U1 Röntgensystem X-ray system
10/25/2007DE102007011346A1 Electron beam-pattern writing method, involves writing re-dimensioned design pattern on target-workpiece with iso-focal dose in accordance to pattern thickness in each of multiple small regions
10/25/2007DE102006017455A1 Tubular cathode for coating materials in a coating process comprises openings provided between a target carrier tube and a target for contacting the target with coolant
10/24/2007EP1846508A2 Laser-accelerated proton therapy units and superconducting eletromagnetig systems for same
10/24/2007EP1366468B1 Method for localizing and identifying epitopes
10/24/2007CN200964436Y Ion source leading seam adjustment control system
10/24/2007CN101061563A Improved ion beam utilization during scanned ion implantation
10/24/2007CN101060074A Apparatus and method for radio frequency decoupling and bias voltage control in a plasma reactor
10/24/2007CN101060060A An electrodeless RF induction coupled plasma dischargable atomic source
10/24/2007CN101060059A A high speed scanning mode of piezoelectric scanner
10/24/2007CN100345257C 等离子体处理装置 Plasma processing apparatus
10/23/2007US7285786 High-resolution scintillation screen for digital imaging
10/23/2007US7285785 Apparatus with permanent magnetic lenses
10/23/2007US7285780 Detector system for a scanning electron microscope and a scanning electron microscope incorporating said detector system
10/23/2007US7285779 Methods of scanning an object that includes multiple regions of interest using an array of scanning beams
10/23/2007US7285778 Probe current imaging
10/23/2007US7285777 Sample dimension measuring method and scanning electron microscope
10/23/2007US7285010 TDI detecting device, a feed-through equipment and electron beam apparatus using these devices
10/18/2007WO2007116033A1 Etching process
10/18/2007WO2007115819A1 A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus
10/18/2007WO2007100978A3 Aberration-correcting cathode lens microscopy instrument
10/18/2007WO2007041056A3 Critical dimension effects correction in raster pattern generator
10/18/2007WO2006063102A3 Method of correction for wafer crystal cut error in semiconductor processing
10/18/2007US20070241996 Plasma Display-Panel Comprising a Reduced-Section Discharge Expansion Zone
10/18/2007US20070241689 Method and apparatus for extending equipment uptime in ion implantation
10/18/2007US20070241291 Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system
10/18/2007DE19758343B4 Impedanzanpassungsgerät für eine SiO2-Beschichtungsanlage Impedance matching device for a SiO2 coating machine
10/18/2007DE102007015232A1 Ladungspartikelstrahlenvorrichtung, Anomalieerfassungsverfahren für eine DA-Wandlereinheit, Ladungspartikelstrahlenschreibverfahren und Maske Charged particle beam apparatus, anomaly detection method for a DA converter unit, charged particle beam writing method and mask
10/18/2007DE102006017686A1 Elektronenoptischer Korrektor für aplanatische Abbildungssysteme Electron optical corrector for aplanatic imaging systems
10/18/2007DE102004002199B4 Dreiachs-Linearbewegungseinheit und Vorrichtung zum Untersuchen einer Probe hiermit Three-axis linear motion unit and apparatus for inspecting a sample hereby
10/17/2007EP1845551A1 Phase plate for phase-contrast electron microscope, method for manufacturing the same and phase-contrast electron microscope
10/17/2007EP1844487A2 Ion source for use in an ion implanter
10/17/2007EP1843863A2 Method and apparatus for cleaning and surface conditioning objects with plasma
10/17/2007EP1269513B1 Inductively coupled plasma etching apparatus
10/17/2007EP1023819A4 System for plasma ignition by fast voltage rise
10/17/2007CN101057310A Impedance matching of a capacitively coupled RF plasma reactor suitable for large area substrates
10/17/2007CN101057309A Microreactor for a transmission electron microscope and heating element and method for the manufacture thereof
10/17/2007CN100343943C Inductively-coupled plasma processing system
10/17/2007CN100343942C Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
10/17/2007CN100343941C Cathode unit and open type X-Ray generator
10/17/2007CN100343771C Integrated electronic hardware for wafer processing control and diagnostic
10/16/2007US7283885 Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing
10/16/2007US7282726 Apparatus and method for irradiating electron beam
10/16/2007US7282725 Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and stencil mask
10/16/2007US7282722 Charged particle beam apparatus and charged particle beam irradiation method
10/16/2007US7282721 Method and apparatus for tuning ion implanters
10/16/2007US7282711 Multiple electron beam device
10/16/2007US7282709 Charged particle beam detection system
10/16/2007US7282708 Method of selecting ions in an ion storage device
10/16/2007US7282706 Advanced optics for rapidly patterned laser profiles in analytical spectrometry
10/16/2007US7282454 Switched uniformity control
10/16/2007US7282244 Replaceable plate expanded thermal plasma apparatus and method
10/16/2007US7282112 Method and apparatus for an improved baffle plate in a plasma processing system
10/11/2007WO2007114120A1 Ion implanter
10/11/2007WO2007112465A1 Particle-beam exposure apparatus with overall-modulation of a patterned beam
10/11/2007WO2007064515A3 Means to establish orientation of ion beam to wafer and correct angle errors
10/11/2007WO2007032779A3 Apparatus and method for inspection and testing of flat panel display substrates
10/11/2007US20070236690 Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples
10/11/2007US20070236148 Plasma processing apparatus
10/11/2007US20070236143 Small electron gun
10/11/2007US20070235659 Method and device for aligning a charged particle beam column
10/11/2007US20070235645 Charged particle beam device
10/11/2007US20070235644 Inspection system by charged particle beam and method of manufacturing devices using the same
10/11/2007US20070235412 Segmented radio frequency electrode apparatus and method for uniformity control
10/11/2007DE10358505B4 Plasmaquelle zur Erzeugung eines induktiv gekoppelten Plasmas Plasma source for generating an inductively coupled plasma
10/11/2007DE102005031537B4 Abbildender Energiefilter für geladene Teilchen, insbesondere Elektronen The imaging energy filter for charged particles, particularly electrons
10/10/2007EP1843126A1 Method and apparatus for measuring thin film sample, and method and apparatus for manufacturing thin film sample
10/10/2007EP1842222A1 Improved method and apparatus for monitoring a microstructure etching process
10/10/2007EP1842221A2 Laser atom probes
10/10/2007EP1842220A2 Microelectronic multiple electron beam emitting device
10/10/2007EP1842103A2 Synchronous raster scanning lithographic system
10/10/2007EP1565929B1 Method for the plasma treatment of surfaces under vacuum
10/10/2007EP1292819B1 Ion beam milling system and method for electron microscopy specimen preparation
10/10/2007CN200959328Y Rectifying board of high-voltage multiplicator
10/10/2007CN200959327Y Magnetic analytic system of ion filler
10/10/2007CN101053063A Apparatus and plasma ashing process for increasing photoresist removal rate
10/10/2007CN101052742A Remote chamber methods for removing surface deposits
10/10/2007CN101051609A High voltage protective interlock for ion injector
10/10/2007CN101051596A Carbon nano tube field transmitting electronic source and its producing method
10/10/2007CN101051595A Carbon nano tube field transmitting electronic source
10/10/2007CN101051086A Ion beam detection device and method, and ion beam irradiation device
10/10/2007CN100342518C Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus
10/10/2007CN100342490C Correction system and method of correcting deflection distortion, method for manufacturing a semiconductor device
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