| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 11/15/2007 | WO2006133309A3 Technique for ion beam angle spread control |
| 11/15/2007 | US20070264441 Plasma Processing Apparatus and Plasma Processing Method |
| 11/15/2007 | US20070263223 Time Resolution Measurement Device and Position Detection Election Multiplier |
| 11/15/2007 | US20070262723 Plasma Processing Apparatus Control Method for Plasma Processing Apparatus and Evaluation Method for Plasma Processing Apparatus |
| 11/15/2007 | US20070262272 Semiconductor mask correcting device and semiconductor mask correcting method |
| 11/15/2007 | US20070262271 Ribbon beam ion implanter cluster tool |
| 11/15/2007 | US20070262270 Insulator for high current ion implanters |
| 11/15/2007 | US20070262262 Ion implantation ion source, system and method |
| 11/15/2007 | US20070262255 Focussing Lens for Charged Particle Beams |
| 11/15/2007 | US20070262254 Electron microscope, methods to determine the contact point and the contact of the probe |
| 11/15/2007 | DE202007012796U1 Kammeranordnung für eine Elektronenstrahlbearbeitungsvorrichtung Chamber arrangement for an electron beam machining apparatus |
| 11/14/2007 | EP1855305A1 Method for plating a substrate |
| 11/14/2007 | EP1854907A2 Device for plasma-based chemical treatment of surfaces of substrates in a vacuum |
| 11/14/2007 | EP1854122A1 A housing for a micro-column |
| 11/14/2007 | EP1593142B1 Magnetically enhanced plasma processing installation for continuous material |
| 11/14/2007 | EP1355341B1 Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating. |
| 11/14/2007 | EP1299898B1 Particle radiation device comprising a particle source that is operated in an ultrahigh vacuum and a cascade pump assembly for a particle radiation device of this type |
| 11/14/2007 | EP0995086B1 Electron microscope and spectroscopy system |
| 11/14/2007 | CN200976707Y Scaling channel structure based atmosphere pressure discharging cold plasma generators and array |
| 11/14/2007 | CN200976340Y T-type RF plasma emitting set |
| 11/14/2007 | CN101073085A Apparatus and methods for improving the stability of RF power delivery to a plasma load |
| 11/14/2007 | CN101071752A High current ionic current implanted system and improved device and insulator thereof |
| 11/14/2007 | CN100349261C Method and device for plasma CVD |
| 11/14/2007 | CN100349249C Cold cathode Penning ion source capable of extracting low smelting point metallic ion |
| 11/14/2007 | CN100349043C Processing apparatus and method for removing particles therefrom |
| 11/13/2007 | US7296245 Combined e-beam and optical exposure semiconductor lithography |
| 11/13/2007 | US7294835 Scanning electron microscope |
| 11/13/2007 | US7294833 Method of alignment for efficient defect review |
| 11/13/2007 | US7294563 Semiconductor on insulator vertical transistor fabrication and doping process |
| 11/13/2007 | US7294283 Penning discharge plasma source |
| 11/13/2007 | US7294245 Cover ring and shield supporting a wafer ring in a plasma reactor |
| 11/13/2007 | US7294224 Magnet assembly for plasma containment |
| 11/08/2007 | WO2007127084A1 Dose uniformity correction technique |
| 11/08/2007 | WO2007126966A2 Insulator system for a terminal structure of an ion implantation system |
| 11/08/2007 | WO2007125652A1 Electron microscope and method for measuring aberration characteristic of objective lens system thereof |
| 11/08/2007 | WO2007125333A1 Front plate for an ion source |
| 11/08/2007 | WO2007111876A3 Determining ion beam parallelism using refraction method |
| 11/08/2007 | WO2007109784A3 Surface treatments for spiral bevel gear sets |
| 11/08/2007 | WO2007041444A3 Electron beam column for writing shaped electron beams |
| 11/08/2007 | WO2007035182A3 Field enhanced electrodes for additive-injection non-thermal plasma (ntp) processor |
| 11/08/2007 | WO2006074200A3 Ion beam scanning methods and system for ion implantation |
| 11/08/2007 | WO2005059960A3 Segmented radio frequency electrode apparatus and method for uniformity control |
| 11/08/2007 | US20070259130 System for Low-Energy Plasma-Enhanced Chemical Vapor Deposition |
| 11/08/2007 | US20070257212 Digital parallel electron beam lithography stamp |
| 11/08/2007 | US20070257211 Implant Optimization Scheme |
| 11/08/2007 | US20070257210 Preventing dosage drift with duplicate dose integrators |
| 11/08/2007 | US20070257207 Charged Particle Beam Device with Aperture |
| 11/08/2007 | US20070257200 Liquid metal ion gun |
| 11/08/2007 | US20070257191 Contact opening metrology |
| 11/08/2007 | US20070256927 Coating Apparatus for the Coating of a Substrate and also Method for Coating |
| 11/08/2007 | US20070256926 Hollow cathode sputtering apparatus and related method |
| 11/08/2007 | DE10240337B4 Vorrichtung und Verfahren zur Separation von Partikeln aus einem von einem Target zur Beschichtung eines Substrates erzeugten Plasma im Vakuum Device and method for separating particles from a generated from a target for coating a substrate plasma in the vacuum |
| 11/08/2007 | DE102006020290A1 Plasma source, has metal block that is electrically connected with anode and by insulator opposite to housing, where block has coupling device for electrical connection with high frequency generator |
| 11/07/2007 | EP1852891A2 Bi-directional filtered arc plasma source |
| 11/07/2007 | EP1852890A1 Electron microscope and composite irradiation lens |
| 11/07/2007 | EP1852889A2 Particle-optical apparatus with temperature switch |
| 11/07/2007 | EP1852888A1 Particle-optical apparatus with temperature switch |
| 11/07/2007 | EP1852694A2 Monitoring substrate processing using reflected radiation |
| 11/07/2007 | EP1852691A2 Monitoring substrate processing using reflected radiation |
| 11/07/2007 | EP1851784A1 Charged-particle exposure apparatus with electrostatic zone plate |
| 11/07/2007 | EP1851356A1 Tubular target comprising a connecting layer that is situated between the tubular target and the tubular support |
| 11/07/2007 | CN101069261A Bellows liner for an ion beam implanter |
| 11/07/2007 | CN101069260A Ion beam milling of a work piece and determining and controlling extent thereof |
| 11/07/2007 | CN101068614A Methods and apparatus for downstream dissociation of gases |
| 11/07/2007 | CN101067993A Particle-optical apparatus with temperature switch |
| 11/07/2007 | CN101067992A Apparatus for operating gas and providing for observing under vacuum or low-voltage environment |
| 11/07/2007 | CN100348078C Ecr等离子体源和ecr等离子体装置 Ecr plasma source and ecr plasma device |
| 11/07/2007 | CN100348077C Plasma treatment device and substrate surface treatment device |
| 11/07/2007 | CN100347817C Plasma processing apparatus |
| 11/07/2007 | CN100347229C Process and apparatus for depositing plasma coating onto a container |
| 11/07/2007 | CN100347115C Holding device for a screen |
| 11/06/2007 | US7291847 Specimen tip and tip holder assembly |
| 11/06/2007 | US7291566 Barrier layer for a processing element and a method of forming the same |
| 11/06/2007 | US7291545 Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage |
| 11/01/2007 | WO2007106449A3 Technique for monitoring and controlling a plasma process |
| 11/01/2007 | WO2007100873A9 Hybrid wafer -holding pin |
| 11/01/2007 | WO2007041530A3 Writing a circuit design pattern with shaped particle beam flashes |
| 11/01/2007 | WO2006084143A3 Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery |
| 11/01/2007 | US20070254113 Plasma processing apparatus having an evacuating arrangement to evacuate gas from gas-introducing part of a process chamber |
| 11/01/2007 | US20070252969 Stage apparatus and exposure apparatus |
| 11/01/2007 | US20070252092 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor |
| 11/01/2007 | US20070251920 Method of operating a plasma reactor having an overhead electrode with a fixed impedance match element |
| 11/01/2007 | US20070251453 Plasma processing apparatus having an evacuating arrangement to evacuate gas from a gas-introducing part of a process chamber |
| 10/31/2007 | EP1850370A1 Stage apparatus and exposure apparatus |
| 10/31/2007 | EP1850367A1 Inductively coupled plasma reactor with multiple magnetic cores |
| 10/31/2007 | EP1849180A2 Ac-excited microcavity discharge device and method |
| 10/31/2007 | EP1849175A2 Charged-particle exposure apparatus |
| 10/31/2007 | DE112005003045T5 Verfahren und Vorrichtung zum flussabwärtsdissoziieren von Gasen Method and apparatus for flussabwärtsdissoziieren of gases |
| 10/31/2007 | DE102007014301A1 Electron beam radiation device, has deviation control that initiates deflector and deviates electron beam produced from electron gun based on deviation amount of electron beam, and deflector that diffracts electron beam |
| 10/31/2007 | DE102006020291A1 Plasma source, has process gas supplying device formed as metallic block, in which gas channel with two channel areas runs, where channel areas flow under angle of specific degrees to one another |
| 10/31/2007 | CN200969335Y Plasma source |
| 10/31/2007 | CN101066000A Plasma nozzle array for providing uniform scalable microwave plasma generation |
| 10/31/2007 | CN101065824A Vacuum processing chamber for very large area substrates |
| 10/31/2007 | CN101065823A Controlled dose ion implantation |
| 10/31/2007 | CN101064987A Plasma processing apparatus and apparatus for supplying RF power |
| 10/31/2007 | CN101064265A Measuring device for ion beam |
| 10/31/2007 | CN101064238A Plasma reactor apparatus with independent capacitive and toroidal plasma sources |
| 10/31/2007 | CN101064234A Apparatus and method for ion implanatation leading to partial ion implant energy |
| 10/30/2007 | US7289866 Plasma processing method and apparatus |
| 10/30/2007 | US7288859 Wafer stage operable in a vacuum environment |