| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/11/2007 | US7306829 RF plasma reactor having a distribution chamber with at least one grid |
| 12/11/2007 | US7306745 Method and apparatus for stabilizing a plasma |
| 12/11/2007 | US7306707 Adaptable processing element for a processing system and a method of making the same |
| 12/11/2007 | US7306696 Interferometric endpoint determination in a substrate etching process |
| 12/11/2007 | US7305934 Plasma treatment apparatus and plasma generation method |
| 12/06/2007 | WO2007140169A1 Apparatus and method of detecting secondary electrons |
| 12/06/2007 | WO2007087213A3 Methods of implanting ions and ion sources used for same |
| 12/06/2007 | WO2007067315A3 Ion sources, systems and methods |
| 12/06/2007 | WO2006102248A3 Scanning probe characterization of surfaces |
| 12/06/2007 | WO2006099760A3 Method for operating a pulsed arc evaporation source and vacuum process system comprising said pulsed arc evaporation source |
| 12/06/2007 | US20070281221 Stencil mask |
| 12/06/2007 | US20070280559 Image evaluation method and microscope |
| 12/06/2007 | US20070278428 Apparatus and method for controlled particle beam manufacturing |
| 12/06/2007 | US20070278427 Closed loop dose control for ion implantation |
| 12/06/2007 | US20070278425 Method of operating emitter for electron-beam projection lithography system |
| 12/05/2007 | EP1863067A2 Beam processing system and beam processing method |
| 12/05/2007 | EP1863066A1 Sample carrier and sample holder |
| 12/05/2007 | EP1863065A2 Electrostatic beam deflection scanner and beam deflection scanning method |
| 12/05/2007 | EP1862879A1 High voltage linear regulator for an electron tube |
| 12/05/2007 | CN200986914Y Ion injection equipment |
| 12/05/2007 | CN101084567A Focussing mask |
| 12/05/2007 | CN101083868A Preionization igniting device based atmosphere pressure discharging cold plasma generators |
| 12/05/2007 | CN101083203A Plasma processing device and eletronode used |
| 12/05/2007 | CN100353816C Apparatus and method for radio frequency decoupling and bias voltage control in a plasma reactor |
| 12/05/2007 | CN100353485C Method and system for analyzing data from a plasma process |
| 12/05/2007 | CN100353484C Method for adjusting voltage on a powered faraday shield |
| 12/04/2007 | US7305333 Projection electron beam lithography apparatus and method employing an estimator |
| 12/04/2007 | US7304438 Method and apparatus for preventing instabilities in radio-frequency plasma processing |
| 12/04/2007 | US7304435 Device for confinement of a plasma within a volume |
| 12/04/2007 | US7304320 Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device |
| 12/04/2007 | US7304319 Wafer charge compensation device and ion implantation system having the same |
| 12/04/2007 | US7304318 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 12/04/2007 | US7304313 Low-pressure chamber for scanning electron microscopy in a wet environment |
| 12/04/2007 | US7304302 Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis |
| 12/04/2007 | US7303982 Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage |
| 12/04/2007 | US7303790 Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained |
| 12/04/2007 | US7302910 Plasma apparatus and production method thereof |
| 12/04/2007 | CA2285296C High resolution x-ray imaging of very small objects |
| 11/29/2007 | WO2007120623A3 Ion beam scanning control methods and systems for ion implantation uniformity |
| 11/29/2007 | US20070276620 Method of correcting coordinates, and defect review apparatus |
| 11/29/2007 | US20070274893 Microwave Plasma Apparatus |
| 11/29/2007 | US20070272861 Interferometer |
| 11/29/2007 | US20070272859 Electron beam apparatus and device production method using the electron beam apparatus |
| 11/29/2007 | DE10239130B4 Verfahren zur Bestimmung des Druckes im Arbeitsgas von Plasmen A method for determining the pressure in the working gas plasmas |
| 11/29/2007 | DE102005033443B4 Vorrichtung zum Ätzen von Halbleitern An apparatus for etching semiconductors |
| 11/28/2007 | EP1860681A1 Coating device and a method for coating a substrate |
| 11/28/2007 | EP1860680A1 Inductively coupled plasma reactor |
| 11/28/2007 | EP1860679A1 Charged particle beam device with a gas field ion source and a gas supply system |
| 11/28/2007 | EP1860506A1 Lithographic apparatus and device manufacturing method |
| 11/28/2007 | EP1018757B1 Charged particle beam emitting device |
| 11/28/2007 | CN101080802A Systems and methods for ion beam focusing |
| 11/28/2007 | CN101080801A Scan beam irradiation device |
| 11/28/2007 | CN101080508A Tubular target comprising a connecting layer that is situated between the tubular target and the tubular support |
| 11/28/2007 | CN101079375A Ion injection simulation method |
| 11/28/2007 | CN101079362A Method of measuring ion beam and device for implanting ions |
| 11/28/2007 | CN100352316C Plasma processor and plasma processing method |
| 11/28/2007 | CN100351989C Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition |
| 11/28/2007 | CN100351988C Plasma processing method and apparatus with control of plasma excitation power |
| 11/28/2007 | CN100351422C Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 11/27/2007 | US7301286 Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge |
| 11/27/2007 | US7301263 Multiple electron beam system with electron transmission gates |
| 11/27/2007 | US7301160 Ion sources |
| 11/27/2007 | US7301156 Controlling the characteristics of implanter ion-beams |
| 11/27/2007 | US7301146 Probe driving method, and probe apparatus |
| 11/27/2007 | US7300885 Film formation apparatus and method for semiconductor process |
| 11/27/2007 | US7300559 Filtered cathodic arc deposition method and apparatus |
| 11/27/2007 | US7300537 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 11/22/2007 | WO2007134020A1 Electrode systems and methods of using electrodes |
| 11/22/2007 | WO2007132922A1 Ion source and method for operating same |
| 11/22/2007 | WO2007131506A1 Vacuum coating apparatus |
| 11/22/2007 | WO2007112465A8 Particle-beam exposure apparatus with overall-modulation of a patterned beam |
| 11/22/2007 | WO2007056190A3 Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator |
| 11/22/2007 | WO2007028813A3 Method and device for igniting and generating an expanding diffuse microwave plasma and method and device for plasma treating surfaces and substances by using this plasma |
| 11/22/2007 | WO2007018575A3 Ion generation by the temporal control of gaseous dielectric breakdown |
| 11/22/2007 | WO2006133041A3 Beam stop and beam tuning methods |
| 11/22/2007 | US20070268089 Plasma Immersion Ion Implantation Using Conductive Mesh |
| 11/22/2007 | US20070267579 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 11/22/2007 | US20070267565 Time-Resolved Measurement Apparatus |
| 11/22/2007 | US20070266947 Plasma generating device |
| 11/22/2007 | DE10138156B4 Magnetron-Zerstäubungsanlage mit mehreren Plasmaringen, Verfahren zum Zerstäuben eines Targets sowie Verwendung der Anlage bzw. des Verfahrens Magnetron sputtering apparatus with multiple plasma rings, method of sputtering a target, and use of the plant or process |
| 11/22/2007 | CA2651512A1 Electrode systems and methods of using electrodes |
| 11/21/2007 | EP1858056A1 Plasma method for treating the surface of workpieces |
| 11/21/2007 | EP1858047A1 Electron source manufacturing method |
| 11/21/2007 | EP1856712A2 Reduced maintenance sputtering chambers |
| 11/21/2007 | EP1856303A1 Single, right-angled end-block |
| 11/21/2007 | CN101076875A Ion beam implantation current, point width and position regulation |
| 11/21/2007 | CN101076221A Multiple radiation sources plasma generating and processing |
| 11/21/2007 | CN101076219A Decoupling reactive ion etching chamber containing multiple processing platforms |
| 11/21/2007 | CN101075545A Electrostatic chuck device for cleaning ion implanter |
| 11/21/2007 | CN100350545C Plasma reaction chamber component having improved temp uniformity |
| 11/20/2007 | US7297949 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 11/20/2007 | US7297948 Column simultaneously focusing a particle beam and an optical beam |
| 11/20/2007 | US7297944 Ion beam device and ion beam processing method, and holder member |
| 11/20/2007 | US7297637 Use of pulsed grounding source in a plasma reactor |
| 11/20/2007 | US7297287 Method and apparatus for endpoint detection using partial least squares |
| 11/20/2007 | US7296534 Hybrid ball-lock attachment apparatus |
| 11/20/2007 | US7296533 Radial antenna and plasma device using it |
| 11/15/2007 | WO2007129376A1 Electronic lens |
| 11/15/2007 | WO2007129021A1 High power impulse magnetron sputtering vapour deposition |
| 11/15/2007 | WO2006133310A3 Technique for ion beam angle process control |