| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/01/2008 | US7315034 Irradiation system with ion beam/charged particle beam |
| 01/01/2008 | US7315024 Monochromator and scanning electron microscope using the same |
| 01/01/2008 | US7315022 High-speed electron beam inspection |
| 01/01/2008 | US7314574 Etching method and apparatus |
| 01/01/2008 | US7314537 Method and apparatus for detecting a plasma |
| 01/01/2008 | US7314525 Plasma CVD apparatus |
| 12/27/2007 | WO2007149727A2 Method and apparatus for extracting ions from an ion source for use in ion implantation |
| 12/27/2007 | WO2007148532A1 Illuminating device, illuminating method, light detector and light detecting method |
| 12/27/2007 | WO2007147757A1 Insert piece for an end-block of a sputtering installation |
| 12/27/2007 | WO2007147582A1 Method for controlling a reactive high-power pulsed magnetron sputter process and corresponding device |
| 12/27/2007 | WO2007096505A3 Nanofabrication installation and process |
| 12/27/2007 | US20070296343 Electron beam generator for multiple columns |
| 12/27/2007 | DE4409761B4 Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma Means for plasma-assisted evaporation in an arc discharge plasma |
| 12/27/2007 | DE19622607B4 Sputterkathode Sputter cathode |
| 12/27/2007 | DE112004001728T5 Rechteckige gefilterte Dampfplasmaquelle und Verfahren zur Steuerung eines Dampfplasmaflusses Rectangular steam filtered plasma source and method for controlling a vapor plasma flow |
| 12/27/2007 | DE10352606B4 Plasmabehandlungsvorrichtung Plasma treatment apparatus |
| 12/27/2007 | DE102006027820A1 Kammeranordnung zur Verwendung bei der Elektronenstrahlbearbeitung Chamber assembly for use in the electron beam treatment |
| 12/27/2007 | DE102005040267B4 Verfahren zum Herstellen einer mehrschichtigen elektrostatischen Linsenanordnung, insbesondere einer Phasenplatte und derartige Phasenplatte A method for producing a multilayer electrostatic lens arrangement, in particular a phase plate such a phase plate and |
| 12/26/2007 | EP1870924A2 Sputter deposition apparatus and method |
| 12/26/2007 | EP1870691A2 Planar View Sample Preparation |
| 12/26/2007 | EP1869692A1 Plasma processing apparatus |
| 12/26/2007 | EP1869691A1 Gas shower plate for plasma processing apparatus |
| 12/26/2007 | EP1869690A2 Method for operating a pulsed arc source |
| 12/26/2007 | EP1305452A4 Gcib size diagnostics and workpiece processing |
| 12/26/2007 | EP1070335B1 Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field |
| 12/26/2007 | CN101095209A Electron confinement inside magnet of ion implanter |
| 12/26/2007 | CN101094557A Plasma control using dual cathode frequency mixing |
| 12/26/2007 | CN101093801A Plasma doping apparatus |
| 12/26/2007 | CN101093777A Rod shaped probe type DC gas activation device in low pressure |
| 12/26/2007 | CN100358080C Gas distribution apparatus for semiconductor processing |
| 12/26/2007 | CN100357489C Low contamination components for semiconductor processing apparatus and methods for making components |
| 12/25/2007 | US7313494 Semiconductor chip inspection supporting apparatus |
| 12/25/2007 | US7312860 Test pattern, inspection method, and device manufacturing method |
| 12/25/2007 | US7312584 Plasma-generation power-supply device |
| 12/25/2007 | US7312464 Ion implantation apparatus |
| 12/25/2007 | US7312449 Electron beam system and method of manufacturing devices using the system |
| 12/25/2007 | US7312448 Method and apparatus for quantitative three-dimensional reconstruction in scanning electron microscopy |
| 12/25/2007 | US7312447 Electron beam depicting method, mother die manufacturing method, mother die, metallic mold manufacturing method, metallic mold and optical element |
| 12/25/2007 | US7312415 Plasma method with high input power |
| 12/25/2007 | US7311797 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 12/25/2007 | US7311796 Plasma processing apparatus |
| 12/25/2007 | US7311784 Plasma processing device |
| 12/21/2007 | WO2007146395A2 Ion beam apparatus and method employing magnetic scanning |
| 12/21/2007 | WO2007053269A3 Method and system for forming a nitrided germanium-containing layer using plasma processing |
| 12/20/2007 | US20070290703 High Resolution Analytical Probe Station |
| 12/19/2007 | EP1868225A1 Sample carrier and sample holder |
| 12/19/2007 | EP1868224A2 Electron beam holography observation apparatus |
| 12/19/2007 | EP1867751A1 Plasma CVD method, plasma CVD device and electrode |
| 12/19/2007 | EP1866947A1 Termination of secondary frequencies in rf power delivery |
| 12/19/2007 | EP1866140A1 Device for treating surface of a polymolecular formed product |
| 12/19/2007 | EP1660945B1 Modulator circuitry |
| 12/19/2007 | EP1593141B1 End point detection in time division multiplexed etch processes |
| 12/19/2007 | EP1581962B1 Mounting mechanism for plasma extraction aperture |
| 12/19/2007 | CN101090071A 等离子体掺杂方法 Plasma doping method |
| 12/19/2007 | CN101090070A 等离子体掺杂方法 Plasma doping method |
| 12/19/2007 | CN101090069A 等离子体掺杂方法 Plasma doping method |
| 12/19/2007 | CN101090068A 等离子体掺杂方法 Plasma doping method |
| 12/19/2007 | CN101089617A Liquid/gas environment combined with electronic microscopic sample chamber and capable of viewing |
| 12/19/2007 | CN100355933C Arc evaporator with powerful magnetic guide for targets having large surface area |
| 12/18/2007 | USRE39939 Processing system |
| 12/18/2007 | US7309997 Monitor system and method for semiconductor processes |
| 12/18/2007 | US7309843 Plasma-assisted joining |
| 12/13/2007 | WO2007143572A1 Temperature control method for photolithographic substrate |
| 12/13/2007 | WO2007142612A1 Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other sio2-coated materials |
| 12/13/2007 | WO2007142296A1 Ion generating device, and neutron generating apparatus |
| 12/13/2007 | WO2007141174A1 A rotatable sputter target |
| 12/13/2007 | WO2007141173A1 A rotatable sputter target |
| 12/13/2007 | WO2007141032A1 Process and apparatus for selective inducement of a dissociation of molecules with monochromatic light |
| 12/13/2007 | WO2007106395A3 Arc quenching circuit to mitigate ion beam disruption |
| 12/13/2007 | US20070284775 Radiation-curable composite layered sheet or film |
| 12/13/2007 | US20070284541 Oxidative cleaning method and apparatus for electron microscopes using UV excitation in a oxygen radical source |
| 12/13/2007 | US20070284536 High Current Density Particle Beam System |
| 12/13/2007 | US20070284526 Inspection apparatus for circuit pattern |
| 12/13/2007 | US20070284525 Line-width measurement adjusting method and scanning electron microscope |
| 12/13/2007 | US20070284085 Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod |
| 12/13/2007 | US20070284044 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 12/13/2007 | US20070283888 Plasma Reactor for the Treatment of Large Size Substrates |
| 12/13/2007 | DE202007010161U1 Objekthalter Specimen holder |
| 12/13/2007 | DE19860988B4 Energy filter for electron microscope |
| 12/12/2007 | EP1865538A1 Multi-column electron beam exposure device |
| 12/12/2007 | EP1864313A2 Vacuum plasma generator |
| 12/12/2007 | EP1864312A1 Method of measuring beam angle |
| 12/12/2007 | EP1863947A1 Hard material layer |
| 12/12/2007 | EP1509941A4 Low-pressure chamber for scanning electron microscopy in a wet environment |
| 12/12/2007 | EP1277222A4 Uniform charged particle exposure device and method using translatable stage and faraday cup |
| 12/12/2007 | CN200990363Y Electronic gun grid |
| 12/12/2007 | CN101088139A Electrically enhancing the confinement of plasma |
| 12/12/2007 | CN101088138A Weakening focusing effect of acceleration-deceleration column of ion implanter |
| 12/12/2007 | CN101088137A Laser atom probes |
| 12/12/2007 | CN101086964A 等离子体掺杂方法 Plasma doping method |
| 12/12/2007 | CN101086953A Semiconductor substrate processing apparatus, method, and medium |
| 12/12/2007 | CN101086945A Ion beam tuning in an ion implanter |
| 12/12/2007 | CN100355058C Ionized PVD with sequential deposition and etching |
| 12/12/2007 | CN100355039C Plasma processing apparatus |
| 12/12/2007 | CN100355038C Plasma processor and variable impedance apparatus correcting method |
| 12/12/2007 | CN100354757C Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 12/11/2007 | US7307260 Electron beam lens for micro-column electron beam apparatus and method of fabricating the same |
| 12/11/2007 | US7307254 Scanning electron microscope |
| 12/11/2007 | US7307253 Scanning electron microscope |
| 12/11/2007 | US7306896 Electron beam duplication lithography method |