| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/24/2008 | US20080017319 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 01/24/2008 | US20080017111 Semiconductor Manufacturing Device and Method for Manufacturing Semiconductor Devices |
| 01/24/2008 | US20080016941 Calibrating Device On A Silicon Substrate |
| 01/24/2008 | DE10235455B9 Teilchenoptische Vorrichtung und Verfahren zum Betrieb derselben Particle-optical apparatus and method for operating the same |
| 01/24/2008 | DE10008485B4 Hochfrequenz-Anpassnetzwerk High-frequency matching network |
| 01/23/2008 | EP1881523A1 Plasma doping method and plasma doping apparatus |
| 01/23/2008 | EP1881087A1 Winding plasma cvd apparatus |
| 01/23/2008 | EP1451892A4 Plasma production device and method and rf driver circuit |
| 01/23/2008 | EP1322444A4 Method of manufacturing sputter targets with internal cooling channels |
| 01/23/2008 | EP1203513B1 High-speed symmetrical plasma treatment system |
| 01/23/2008 | CN101111926A Optimization of beam utilization |
| 01/23/2008 | CN101111922A Plasma ion implantation system with axial electrostatic confinement |
| 01/23/2008 | CN101111121A Etching machine electrode structure and manufacturing method thereof |
| 01/23/2008 | CN101110347A Double offset frequency plasma body reactor with electrostatic chuck voltage feedback control |
| 01/23/2008 | CN101110346A Array type electron beam etching device and etching method |
| 01/23/2008 | CN101110334A Beam stop for an ion implanter |
| 01/23/2008 | CN101109068A Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles |
| 01/23/2008 | CN100364054C 等离子体掺杂方法及等离子体掺杂装置 Plasma doping method and plasma doping device |
| 01/23/2008 | CN100364049C Electron beam drawing system, method and program, and method for manufacture of semiconductors by drawing directly |
| 01/23/2008 | CN100364035C Procedure and device for the production of a plasma |
| 01/23/2008 | CN100363536C Deposition methods utilizing phased array microwave excitation, and deposition apparatuses |
| 01/22/2008 | USRE40009 Methods and apparatus for adjusting beam parallelism in ion implanters |
| 01/22/2008 | USRE40008 Method and apparatus for controlling ion implantation during vacuum fluctuation |
| 01/22/2008 | US7321232 Charge amount measurement method, shift value measurement method of charged beam, charge amount measuring device and shift value measuring device of charged beam |
| 01/22/2008 | US7321125 Transverse magnetic field voltage isolator |
| 01/22/2008 | US7321124 Corrector for correcting first-order chromatic aberrations of the first degree |
| 01/22/2008 | US7321118 Scanning transmission ion microscope |
| 01/22/2008 | US7320941 Plasma stabilization method and plasma apparatus |
| 01/22/2008 | US7320734 Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage |
| 01/17/2008 | WO2008008156A2 Electron induced chemical etching for device diagnosis |
| 01/17/2008 | WO2008007962A1 Method and device for etching a substrate by means of a plasma |
| 01/17/2008 | WO2008007944A1 Method and device for treating a substrate by means of a plasma |
| 01/17/2008 | WO2007095189A3 Electromagnet with active field containment |
| 01/17/2008 | WO2002104085A3 A closed-drift hall effect plasma vacuum pump for process reactors |
| 01/17/2008 | US20080014748 Method and system for electronic spatial filtering of spectral reflectometer optical signals |
| 01/17/2008 | US20080012337 Vacuum Tight Coupling For Tube Sections |
| 01/17/2008 | US20080011718 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| 01/17/2008 | US20080011716 Plasma Processing Apparatus And Method |
| 01/17/2008 | US20080011425 Plasma Processing Apparatus And Method |
| 01/17/2008 | US20080011422 Plasma Processing System And Apparatus And A Sample Processing Method |
| 01/17/2008 | DE10215660B4 Hochfrequenz-Elektronenquelle, insbesondere Neutralisator High-frequency electron source, in particular neutralizer |
| 01/17/2008 | DE102006032303A1 Surface processing device for laser polishing workpieces comprises an evacuated processing chamber containing a workpiece holder and an electron beam source for producing an electron beam for processing the surface of a workpiece |
| 01/17/2008 | DE10130129B4 Zerstäubungsvorrichtung Sputtering |
| 01/16/2008 | EP1879213A2 Microwave plasma processing apparatus |
| 01/16/2008 | EP1879011A2 Method for separating a minute sample from a work piece |
| 01/16/2008 | EP1878039A1 Plasma amplifier for plasma treatment plant |
| 01/16/2008 | EP1349698A4 Friction fit target assembly for high power sputtering operation |
| 01/16/2008 | CN101106074A Plasma etch reactor |
| 01/16/2008 | CN101106069A Method for extending use life of reaction cavity in plasma etching system |
| 01/16/2008 | CN100362624C Device for controlling D.C. bias on wafer |
| 01/15/2008 | US7319336 Charged particle beam device probe operation |
| 01/15/2008 | US7319295 High-frequency power supply structure and plasma CVD device using the same |
| 01/15/2008 | US7318869 Variable gas conductance control for a process chamber |
| 01/10/2008 | WO2008003425A1 Apparatus for electron beam evaporation |
| 01/10/2008 | WO2008003374A1 Method and device for machining workpieces |
| 01/10/2008 | US20080006781 Electron Beam Drawing Apparatus |
| 01/10/2008 | US20080006778 Lithography system and lithography method using the same |
| 01/10/2008 | DE112006000517T5 Arbeitsstufe, Fokusstrahl-Arbeitsvorrichtung und Fokusstrahl-Arbeitsverfahren Working level, focused beam-working device and focused beam working method |
| 01/09/2008 | EP1876641A1 Plasma reactor with mechanical substrate holder |
| 01/09/2008 | EP1876632A1 Plasma confinement device |
| 01/09/2008 | EP1876631A2 Observational liquid/gas environment combined with specimen chamber of electron microscope |
| 01/09/2008 | EP1875484A1 Magnet system for a spraying cathode |
| 01/09/2008 | EP1649485A4 Laser stimulated atom probe characterization of semiconductor and dielectric structures |
| 01/09/2008 | CN101103432A Electron injection in ion implanter magnets |
| 01/09/2008 | CN101103417A Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| 01/09/2008 | CN101101269A Energy dispersion type radiation detecting system and method of measuring content of object element |
| 01/09/2008 | CN100361265C Tandem etch chamber plasma processing system |
| 01/09/2008 | CN100360947C Method and device for controlling high-voltage discharge measuring instrument |
| 01/09/2008 | CN100360704C Method and system for arc suppression in a plasma processing system |
| 01/08/2008 | US7317350 Transresistance amplifier for a charged particle detector |
| 01/08/2008 | US7316764 Gas supply; ion source that generates current directed onto target |
| 01/08/2008 | US7316761 Apparatus for uniformly etching a dielectric layer |
| 01/08/2008 | US7316199 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber |
| 01/08/2008 | CA2354925C Apparatus and method for coating substrates |
| 01/03/2008 | WO2008002760A1 Phase change alloy etch |
| 01/03/2008 | WO2008001805A1 Diamond electron radiation cathode, electron source, electron microscope, and electron beam exposer |
| 01/03/2008 | WO2008001685A1 Ion implanting apparatus and ion beam deflection angle correcting method |
| 01/03/2008 | WO2008001030A1 Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter |
| 01/03/2008 | WO2008000836A2 Apparatus for accelerating an ion beam |
| 01/03/2008 | WO2008000434A1 Sputtering device |
| 01/03/2008 | WO2008000245A1 Plasma process system with an electrostatic sample holding arrangement and method for decoupling a dc-voltage source |
| 01/03/2008 | WO2007117397A3 Improved detector for charged particle beam instrument |
| 01/03/2008 | WO2007061937A3 Charged particle radiation therapy |
| 01/03/2008 | WO2007030499A3 High-resolution scintillation screen for digital imaging |
| 01/03/2008 | WO2004100231A3 Oblique ion milling of via metallization |
| 01/03/2008 | WO2004053920A3 Humidified imaging with an environmental scanning electron microscope |
| 01/03/2008 | US20080002876 Method and its apparatus for inspecting a pattern |
| 01/03/2008 | US20080000423 System for improving the wafer to wafer uniformity and defectivity of a deposited dielectric film |
| 01/03/2008 | DE4407044B4 Verfahren zur Herstellung einer Maske A process for the production of a mask |
| 01/02/2008 | EP1873809A1 Sputtering device |
| 01/02/2008 | EP1873274A2 PVD cylindrical target |
| 01/02/2008 | EP1872383A2 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy |
| 01/02/2008 | EP1872372A1 Laser irradiated hollow cylinder serving as a lens for ion beams |
| 01/02/2008 | EP1872295A2 Arc detection and handling in radio frequency power applications |
| 01/02/2008 | EP0933444B1 Sheet-form magnetron sputtering device |
| 01/02/2008 | CN101097830A Ion beam irradiation device |
| 01/02/2008 | CN100359626C A particle beam generator |
| 01/01/2008 | USRE39969 Processing system |
| 01/01/2008 | US7315128 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition |
| 01/01/2008 | US7315035 Apparatus and method for doping |