| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/13/2015 | US8933424 Method for measuring transverse beam intensity distribution |
| 01/13/2015 | US8933423 Charged particle beam device and sample production method |
| 01/13/2015 | US8933422 Charged particle beam device |
| 01/13/2015 | US8933414 Focused ion beam low kV enhancement |
| 01/13/2015 | US8933401 System and method for compressive scanning electron microscopy |
| 01/13/2015 | US8933400 Inspection or observation apparatus and sample inspection or observation method |
| 01/13/2015 | US8933399 Mass spectrometry device including self-cleaning unit |
| 01/13/2015 | US8932963 Film deposition method |
| 01/13/2015 | US8932959 Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material |
| 01/13/2015 | US8932430 RF coupled plasma abatement system comprising an integrated power oscillator |
| 01/13/2015 | US8931433 Plasma processing apparatus |
| 01/13/2015 | US8931432 Vacuum processing apparatus |
| 01/08/2015 | WO2015001025A1 Method and system for modifying a substrate using a plasma |
| 01/08/2015 | WO2015000578A1 Target preparation |
| 01/08/2015 | WO2015000577A1 Target, adapted to an indirect cooling device, having a cooling plate |
| 01/08/2015 | WO2015000575A1 Target age compensation method for performing stable reactive sputtering processes |
| 01/08/2015 | US20150012243 Semiconductor Evaluation Device and Computer Program |
| 01/08/2015 | US20150011097 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber |
| 01/08/2015 | US20150011093 Ion beam etching system |
| 01/08/2015 | US20150011088 Methods and apparatus for depositing and/or etching material on a substrate |
| 01/08/2015 | US20150010727 Oxide sputtering target and protective film for optical recording medium |
| 01/08/2015 | US20150010381 Wafer processing chamber and method for transferring wafer in the same |
| 01/08/2015 | US20150009489 Charged-particle microscope with raman spectroscopy capability |
| 01/08/2015 | US20150008825 Microplasma jet devices, arrays, medical devices and methods |
| 01/08/2015 | US20150008343 Electron Beam Data Storage System and Method for High Volume Manufacturing |
| 01/08/2015 | US20150008342 Charged particle beam system and method of operating a charged particle beam system |
| 01/08/2015 | US20150008341 Charged particle beam system and method of operating a charged particle beam system |
| 01/08/2015 | US20150008333 Charged Particle Beam System and Method of Operating a Charged Particle Beam System |
| 01/08/2015 | US20150008332 Charged particle beam system and method of operating a charged particle beam system |
| 01/08/2015 | US20150008331 Charged particle inspection method and charged particle system |
| 01/08/2015 | US20150008323 Device and method for emitting electrons and device comprising such a system for emitting electrons |
| 01/08/2015 | US20150008322 Scanning electron microscope |
| 01/08/2015 | US20150008321 Transmission electron diffraction measurement apparatus and method for measuring transmission electron diffraction pattern |
| 01/08/2015 | US20150008213 Internal split faraday shield for an inductively coupled plasma source |
| 01/08/2015 | US20150008121 Ion milling device |
| 01/08/2015 | US20150008120 In-vacuum rotational device |
| 01/08/2015 | US20150007941 Biasing system for a plasma processing apparatus |
| 01/08/2015 | US20150007940 Plasma processing device and high-frequency generator |
| 01/08/2015 | US20150007857 Cleaning method and substrate processing apparatus |
| 01/07/2015 | EP2822020A1 Apparatus for the treatment of materials and related method |
| 01/07/2015 | EP2820166A1 Coated cutting tool |
| 01/07/2015 | CN204088258U 一种扫描电镜样品台 A scanning electron microscope sample stage |
| 01/07/2015 | CN204088257U 用于调节屏蔽罩内电子枪组件的单色管光偏调节工装 Monochromatic light is used to adjust the inner tube electron gun assembly shield bias adjustment tooling |
| 01/07/2015 | CN104272433A 用于改善注入束和源寿命性能的碳掺杂剂气体和协流 Beam injection to improve the performance and longevity of carbon source dopant gas and co-flow |
| 01/07/2015 | CN104272429A 反应溅射过程 Reactive sputtering process |
| 01/07/2015 | CN104272428A 用于多植入的对位基板的系统与方法 System and method for implantation of multiple bits for the substrate |
| 01/07/2015 | CN104272427A 具有对准传感器和射束测量传感器的带电粒子光刻系统 Having alignment sensor measuring beam and a charged particle lithography system sensors |
| 01/07/2015 | CN104272426A 扫描电子显微镜 Scanning electron microscope |
| 01/07/2015 | CN104272425A 用于产生电子束的方法和装置 Method and apparatus for generating an electron beam |
| 01/07/2015 | CN104272194A 处理诸如晶圆的靶材的光刻系统和方法 Processing such as the target wafer lithography systems and methods |
| 01/07/2015 | CN104272096A 基于高空间分辨率测量材料应变的系统及方法 System and method based on high spatial resolution measurement of material strain |
| 01/07/2015 | CN102522307B 一种利用光电效应增强的射频放电电离装置 A photoelectric effect enhanced ionization device uses radio frequency discharge |
| 01/07/2015 | CN102522305B 等离子体处理装置及聚焦环组件 The plasma processing apparatus and the focus ring assembly |
| 01/07/2015 | CN102460630B 包括静电偏转器的带电粒子光学系统 Comprises an electrostatic deflector of charged-particle optical system |
| 01/07/2015 | CN102308358B 具有自清洁阳极的闭合漂移磁场离子源装置及基材改性修改方法 Closed with a self-cleaning anode drift field ion source device and substrate modification modification method |
| 01/06/2015 | US8928485 Charged corpuscular ray apparatus |
| 01/06/2015 | US8928230 Cold plasma treatment devices and associated methods |
| 01/06/2015 | US8928229 Pulse mode capability for operation of an RF/VHF impedance matching network with a 4 quadrant, VRMS/IRMS responding detector circuitry |
| 01/06/2015 | US8927949 Measuring apparatus, drawing apparatus, and article manufacturing method |
| 01/06/2015 | US8927948 Particle beam system and method for operating the same |
| 01/06/2015 | US8927947 Systems and methods providing electron beam writing to a medium |
| 01/06/2015 | US8927945 Drawing apparatus and method of manufacturing article by controlling drawing on shot region side of boundary of shot regions |
| 01/06/2015 | US8927942 Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions |
| 01/06/2015 | US8927941 Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens |
| 01/06/2015 | US8927932 Scanning transmission electron microscopy for imaging extended areas |
| 01/06/2015 | US8927931 Scanning electron microscope |
| 01/06/2015 | US8927930 Charged particle device |
| 01/06/2015 | US8927400 Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafers |
| 01/06/2015 | US8927351 Method for manufacturing semiconductor device |
| 01/06/2015 | US8927052 Process for deposition and characterization of a coating |
| 01/06/2015 | US8926850 Plasma processing with enhanced charge neutralization and process control |
| 01/06/2015 | US8926790 Plasma processing apparatus |
| 01/06/2015 | US8926757 Plasma process and reactor for treating metallic pieces |
| 01/06/2015 | US8925479 System and method of dosage profile control |
| 01/06/2015 | US8925351 Manufacturing method of top plate of plasma processing apparatus |
| 01/06/2015 | CA2793736C Coating source and process for the production thereof |
| 01/01/2015 | US20150004807 Drawing apparatus, and method of manufacturing article |
| 01/01/2015 | US20150004794 Method of controlling temperature and plasma processing apparatus |
| 01/01/2015 | US20150004721 Plasma processing apparatus and plasma processing method |
| 01/01/2015 | US20150004400 Support assembly for use in semiconductor manufacturing tools with a fusible bond |
| 01/01/2015 | US20150004332 Method of depositing a film, recording medium, and film deposition apparatus |
| 01/01/2015 | US20150003578 Automatic x-ray inspection apparatus for smt inline process |
| 01/01/2015 | US20150002651 Scanning-electron-microscope image processing device and scanning method |
| 01/01/2015 | US20150002021 Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
| 01/01/2015 | US20150002020 Rf/vhf impedance matching, 4 quadrant, dual directional coupler with vrms/irms responding detector circuitry |
| 01/01/2015 | US20150002019 Isolation of microwave sources through bellows |
| 01/01/2015 | US20150002018 Controlling Ion Energy Within A Plasma Chamber |
| 01/01/2015 | US20150002017 Gas diffuser unit, process chamber and wafer processing method |
| 01/01/2015 | US20150002009 Metal hexaboride cold field emitter, method of fabricating same, and electron gun |
| 01/01/2015 | US20150001423 Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device |
| 01/01/2015 | US20150001419 Drawing apparatus, and method of manufacturing article |
| 01/01/2015 | US20150001418 Ion beam measuring device and method of measuring ion beam |
| 01/01/2015 | US20150001417 Blanking apparatus, drawing apparatus, and method of manufacturing article |
| 01/01/2015 | US20150001416 Electron beam diagnostic system using computed tomography and an annular sensor |
| 01/01/2015 | US20150001393 Charged particle beam device and inclined observation image display method |
| 01/01/2015 | US20150001391 Textured Silicon Liners In Substrate Processing Systems |
| 01/01/2015 | US20150001192 Electron beam conditioning |
| 01/01/2015 | US20150001181 Plasma processing apparatus, plasma processing method, and storage medium |
| 01/01/2015 | US20150001180 Process kit for edge critical dimension uniformity control |
| 01/01/2015 | US20150001176 Plan View Sample Preparation |