| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/12/2008 | US7329883 Electron beam lithography device and drawing method using electron beams |
| 02/12/2008 | US7329882 Ion implantation beam angle calibration |
| 02/12/2008 | US7329881 Charged-particle beam system |
| 02/12/2008 | US7329878 Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same |
| 02/12/2008 | US7329868 Charged particle beam apparatus |
| 02/12/2008 | US7329867 Electron beam system and electron beam measuring and observing methods |
| 02/12/2008 | US7329609 Substrate processing method and substrate processing apparatus |
| 02/12/2008 | US7329549 Monitoring method of processing state and processing unit |
| 02/12/2008 | US7329328 Method for etch processing with end point detection thereof |
| 02/12/2008 | CA2362146C Magnetron sputtering method and apparatus |
| 02/12/2008 | CA2353479C Method and apparatus for low energy electron enhanced etching and cleaning of substrates |
| 02/07/2008 | WO2008015159A1 Method and device for coating a substrate with a defined distribution of coating thickness |
| 02/07/2008 | WO2008015016A1 Process and apparatus for the modification of surfaces |
| 02/07/2008 | WO2007115819A8 A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus |
| 02/07/2008 | WO2007080594A3 Method and apparatus for generating ion beam |
| 02/07/2008 | US20080032059 Device and Process for Plasma Coating/Sterilization |
| 02/07/2008 | US20080029716 Apparatus and method for ion beam implantation using ribbon and spot beams |
| 02/07/2008 | US20080029700 Field emission electron gun and electron beam applied device using the same |
| 02/07/2008 | CA2658796A1 Method for the plasma treatment of a surface |
| 02/06/2008 | EP1885059A2 Electron beam facility for processing material and current adding device for rapid actuation of inductivity and image creation device for an electron beam facility for processing material |
| 02/06/2008 | EP1884984A1 Ion analysis system based on analyzer of ion energy distribution using retarded electric field |
| 02/06/2008 | EP1884979A2 Self-passivating plasma resistant material for joining chamber components |
| 02/06/2008 | EP1884978A1 Process and apparatus for the coating of substrates with diamond-like carbon layers |
| 02/06/2008 | EP1883947A1 Hf- plasma source with plurality of out - of- phase electrodes |
| 02/06/2008 | EP1883946A1 Two dimensional stationary beam profile and angular mapping |
| 02/06/2008 | CN201017846Y Plasma generator |
| 02/06/2008 | CN201017845Y Differential feeding media blocking discharging low-temperature plasma device |
| 02/06/2008 | CN101120430A Plasma treating apparatus and electrode member therefor and electrode member manufacturing and recycling method |
| 02/06/2008 | CN101120429A Magnetic enhancement for mechanical confinement of plasma |
| 02/06/2008 | CN101120428A Ion implantation device control method, control system thereof, control program thereof, and ion implantation device |
| 02/06/2008 | CN101120427A Ion beam measurement apparatus and method |
| 02/06/2008 | CN101120426A Method of correction for wafer crystal cut error in semiconductor processing |
| 02/06/2008 | CN101118854A Plasma etching system |
| 02/06/2008 | CN101117706A Ganged scanning of multiple magnetrons, especially two level folded magnetrons |
| 02/06/2008 | CN100367446C Optical window deposition shield for use in a plasma processing system |
| 02/06/2008 | CN100366792C Thin film forming method and film forming device |
| 02/05/2008 | US7327089 Beam plasma source |
| 02/05/2008 | US7327077 Electron tube control grid |
| 02/05/2008 | US7326943 Electron beam irradiating apparatus and irradiating method |
| 02/05/2008 | US7326942 Ion beam system and machining method |
| 02/05/2008 | US7326941 Apparatus and methods for ion beam implantation using ribbon and spot beams |
| 02/05/2008 | US7326940 Exposure apparatus, exposure method and semiconductor device production method |
| 02/05/2008 | US7326928 Electron microscope and a method of imaging objects |
| 02/05/2008 | US7326445 Method and apparatus for manufacturing ultra fine three-dimensional structure |
| 02/05/2008 | US7325511 Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus |
| 01/31/2008 | WO2008013442A1 A multiple beam charged particle optical system |
| 01/31/2008 | WO2008013232A1 Spherical aberration correction moderating type lens, spherical aberration correction lens system, electron spectroscopy device, and optical electron microscope |
| 01/31/2008 | WO2008011903A1 Apparatus and method for processing a wafer |
| 01/31/2008 | WO2007142612B1 Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other sio2-coated materials |
| 01/31/2008 | WO2007016299A3 Atom probe evaporation processes |
| 01/31/2008 | US20080026589 Electrode for plasma processes and method for manufacture and use thereof |
| 01/31/2008 | US20080026133 Monitoring plasma ion implantation systems for fault detection and process control |
| 01/31/2008 | US20080024126 Beam Measuring Equipment and Beam Measuring Method Using the Same |
| 01/31/2008 | US20080023654 Method of reducing transient wafer temperature during implantation |
| 01/31/2008 | US20080023651 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus |
| 01/31/2008 | US20080023642 Electron gun assembly |
| 01/31/2008 | US20080023443 Alternating asymmetrical plasma generation in a process chamber |
| 01/31/2008 | US20080023145 Plasma processing apparatus and method |
| 01/31/2008 | US20080023143 Capacitively coupled plasma reactor with magnetic plasma control |
| 01/31/2008 | US20080023029 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 01/31/2008 | DE10260614B4 Plasmaparametersteuerung unter Verwendung von Lerndaten Plasma parameter control using the learning data |
| 01/31/2008 | DE102007035518A1 Plasma coating device for oblong, cylindrical component, particularly tubular component, has process chamber with one or more pumps for evacuation of process chamber, with oblong transfer chamber |
| 01/31/2008 | DE102007033052A1 Irradiation device for use in the area of radiation processing, comprises electron accelerator, scanning box connected with electron accelerator, and scanning magnet for controlling/regulating the electron beams produced by accelerator |
| 01/31/2008 | DE102006040308A1 Image producing method for use in electron beam device e.g. scanning electron microscope, involves reconducting particle beam to place, and rescanning particle beam over object from place |
| 01/31/2008 | DE102006035793A1 Power adder arrangement for fast controlling of e.g. deflection coil of electron beam cannon, has voltage strips adapted to be connected with output for power supply of inductor and exhibiting resistors connectable in series between strips |
| 01/31/2008 | DE102006034988A1 Ionenquelle zur Erzeugung negativ geladener Ionen Ion source for generating negatively charged ions |
| 01/30/2008 | EP1883111A2 Image pickup device and method of manufacturing the same |
| 01/30/2008 | EP1883096A1 Transfer mechanism for transferring a specimen |
| 01/30/2008 | EP1883095A1 Transfer mechanism for transferring a specimen |
| 01/30/2008 | EP1883094A1 Charged particle beam device and method for inspecting specimen |
| 01/30/2008 | EP1882051A2 Module for a coating system and associated technology |
| 01/30/2008 | EP0981829B1 Electrostatic device for correcting chromatic aberration in a particle-optical apparatus |
| 01/30/2008 | CN101116167A Plasma processing apparatus |
| 01/30/2008 | CN101114565A Analyzing electromagnet |
| 01/30/2008 | CN101114564A Transfer mechanism for transferring a specimen |
| 01/29/2008 | US7323700 Method and system for controlling beam scanning in an ion implantation device |
| 01/29/2008 | US7323697 Wafer alignment method for dual beam system |
| 01/29/2008 | US7323695 Reciprocating drive for scanning a workpiece |
| 01/29/2008 | US7323685 Ion beam processing method |
| 01/29/2008 | US7323655 Inductively coupled plasma reactor for producing nano-powder |
| 01/29/2008 | US7323081 High-frequency plasma processing apparatus |
| 01/29/2008 | US7322313 Plasma processing system |
| 01/24/2008 | WO2008010777A1 A multi-beam ion/electron spectra-microscope |
| 01/24/2008 | WO2008010718A2 Method for sample preparation for cryoelectron microscopy (cem), microreactor and loading platform |
| 01/24/2008 | WO2008009898A1 Ion sources |
| 01/24/2008 | WO2008009892A1 Plasma sources |
| 01/24/2008 | WO2008009889A1 Ion deposition apparatus |
| 01/24/2008 | WO2008009559A2 Device and method for producing and/ or confining a plasma |
| 01/24/2008 | WO2008009558A1 Device and method for producing and confining a plasma |
| 01/24/2008 | WO2008009139A1 Method and system for counting secondary particles |
| 01/24/2008 | WO2007111991A3 Ion implanter with variable scan frequency |
| 01/24/2008 | WO2006103828A8 Method of manufacturing magnetic recording medium, magnetic recording medium and surface treatment apparatus |
| 01/24/2008 | US20080020495 Semiconductor fabricating apparatus with function of determining etching processing state |
| 01/24/2008 | US20080020146 Diffuser plate with slit valve compensation |
| 01/24/2008 | US20080018024 Method and apparatus for imprinting energy ray-setting resin, and discs and semiconductor devices with imprinted resin layer |
| 01/24/2008 | US20080017797 Pattern inspection and measurement apparatus |
| 01/24/2008 | US20080017796 Method and system for ultrafast photoelectron microscope |
| 01/24/2008 | US20080017516 Plasma chamber; electroplated coating of yttrium-containing aluminum oxide and zirconium oxide; exhibit improved corrosion or erosion resistance to energized gases; not easily susceptible to flaking off during operation, thermal cycling |
| 01/24/2008 | US20080017506 Tubular Magnet Assembly |
| 01/24/2008 | US20080017500 Thin-film disposition apparatus |