Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
03/2008
03/20/2008US20080066785 Method of refurbishing a magnet assembly for plasma process chamber
03/20/2008US20080066681 Batch-Type Remote Plasma Processing Apparatus
03/20/2008US20080066647 Al2O3 film formed on the undercoat as a middle layer and high purity Y2O3 plasma sprayed coating as a top coat; chemical resistance, corrosion resistance
03/19/2008EP1900001A2 Methods and apparatus for incorporating nitrogen in oxide films
03/19/2008EP1683177B1 Gas port assembly
03/19/2008CN201038119Y Ion implantation apparatus filament breaker
03/19/2008CN101147431A Device for gaseous plasma sterilization
03/19/2008CN101147227A Cathode and counter-cathode arrangement in an ion source
03/19/2008CN101146398A Plasma processing device and electrode structure thereof
03/19/2008CN101145508A Plasma processing device and method
03/19/2008CN101145507A Plasma processing device
03/19/2008CN101144150A To dimensional magnetron scanning for sputtering onto flat panels
03/19/2008CN100376024C Method for controlling plasma processing system, and automatic programe contro system
03/18/2008US7345436 Apparatus and method for controlling the beam current of a charged particle beam
03/18/2008US7345429 Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities
03/18/2008US7345290 Lens array for electron beam lithography tool
03/18/2008US7345289 Sample support prepared by semiconductor silicon process technique
03/18/2008US7345288 Sample holder and ion-beam processing system
03/18/2008US7344805 Mask and method for producing thereof and a semiconductor device using the same
03/13/2008WO2008029731A1 Electron source
03/13/2008WO2008029696A1 Electron beam dimension measuring device and electron beam dimension measuring method
03/13/2008WO2008003405A3 Method and device for producing an image
03/13/2008WO2007145953A3 Ion beam current uniformity monitor, ion implanter and related method
03/13/2008WO2007067311A3 Ion sources, systems and methods
03/13/2008WO2007067310A3 Ion sources, systems and methods
03/13/2008US20080061250 Ion beam monitoring in an ion implanter using an imaging device
03/13/2008US20080061249 High resolution low dose transmission electron microscopy real-time imaging and manipulation of nano-scale objects in the electron beam
03/13/2008US20080061247 Lithography system
03/13/2008US20080061246 Apparatus for Blanking a Charged Particle Beam
03/13/2008US20080060933 Evacuating a space between a flat face of a magnetron electrode on a first side and a substrate support on a second, chemical vapor deposition where a magnetic field generated by the magnetron electrode causes darker tunnels, the surface to be treated is situated outside of the darker tunnels
03/13/2008US20080060580 Batch-Type Remote Plasma Processing Apparatus
03/13/2008DE102007041160A1 Substratabdeckung, und Einrichtung und Verfahren zum Schreiben mit einem Strahl geladener Teilchen Substrate cover, and device and method for writing with a beam of charged particles
03/13/2008DE102004052994B4 Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung Multibeam modulator for a particle beam and using the multibeam modulator for maskless patterning substrate
03/12/2008EP1898444A1 Plasma etching chamber
03/12/2008EP1898443A1 Asymmetric annular detector
03/12/2008EP1897127A1 A method and apparatus for process control in time division multiplexed (tdm) etch processes
03/12/2008EP1897113A1 A module for coating both sides of a substrate in a single pass
03/12/2008EP1896367A2 Apparatus for measuring a set of electrical characteristics in a plasma
03/12/2008EP1070342B1 Techniques for forming trenches in a silicon layer of a substrate in a high density plasma processing system
03/12/2008CN101142660A Treatment device, treatment device consumable parts management method, treatment system, and treatment system consumable parts management method
03/12/2008CN101140859A Etching apparatus and etching method using the same
03/12/2008CN101140847A An ion beam guide tube
03/12/2008CN100375247C Plasma processing method and plasma processing device
03/12/2008CN100375246C Plasma processing apparatus
03/12/2008CN100375244C Plasma treatment device and plasma treatment method
03/12/2008CN100375218C System and method for removing contaminant particles relative to ion beam
03/12/2008CN100374616C Plasma treating device with protective tube
03/11/2008US7342240 Ion beam current monitoring
03/11/2008US7342239 Ion implanation method and device using thereof
03/11/2008US7342225 Crystallographic metrology and process control
03/11/2008US7341644 Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor
03/06/2008WO2008027090A2 Control of materials and porous magnetic particles
03/06/2008WO2008027059A1 Technique for implementing a variable aperture lens in an ion implanter
03/06/2008WO2008026759A1 Drawing method, drawing device, and information recording medium
03/06/2008WO2008008156A3 Electron induced chemical etching for device diagnosis
03/06/2008WO2007131944A3 Arc source and magnet arrangement
03/06/2008WO2007126966A3 Insulator system for a terminal structure of an ion implantation system
03/06/2008WO2007104504A8 Segmented electrical or optical delay line with interleaved tap for 3d image device readout
03/06/2008WO2007067314A3 Ion sources, systems and methods
03/06/2008US20080054196 Variable shaped electron beam lithography system and method for manufacturing substrate
03/06/2008US20080054195 Substrate cover, and charged particle beam writing apparatus and method
03/06/2008US20080054194 Ion implanter with etch prevention member(s)
03/06/2008US20080054193 Ion beam guide tube
03/06/2008US20080054192 Ion Implantation Device
03/06/2008US20080054187 Charged particle beam scanning method and charged particle beam apparatus
03/06/2008US20080054186 Method of Aberration Correction and Electron Beam System
03/06/2008US20080054184 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
03/06/2008US20080053614 Surface Processing Apparatus
03/06/2008DE102005063142B4 Elektronenmikroskop, insbesondere Transmissions-Elektronenmikroskop Electron microscope, in particular transmission electron microscope
03/05/2008EP1895565A1 Plasma processing apparatus and method
03/05/2008EP1895564A2 Method of aberration correction and electron beam system
03/05/2008EP1894222A1 Dose cup located near bend in final energy filter of serial implanter for closed loop dose control
03/05/2008EP1894221A1 Ion source with multi-piece outer cathode
03/05/2008EP1421606A4 Plasma enhanced atomic layer deposition (peald) equipment and method of forming a conducting thin film using the same thereof
03/05/2008EP1322796A4 High purity sputter targets with target end-of-life indication and method of manufacture
03/05/2008EP1177112A4 Remote plasma generator
03/05/2008EP0876631B1 System for producing 3-dimensional photon crystals
03/05/2008CN101138080A Methods and apparatus for enabling multiple process steps on a single substrate
03/05/2008CN101138065A Gas baffle and distributor for semiconductor processing chamber
03/05/2008CN101137889A Method and apparatus of measuring thin film sample and method and apparatus of fabricating thin film sample
03/05/2008CN101137770A Segmented radio frequency electrode apparatus and method for uniformity control
03/05/2008CN101137764A Single, right-angled end-block
03/05/2008CN101136321A Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition
03/05/2008CN100373557C Etch amount detection method, etching method, and etching system
03/05/2008CN100372971C Switched uniformity control
03/04/2008US7340111 Image evaluation method and microscope
03/04/2008US7339656 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
03/04/2008US7339180 Particle beam current measurement system
03/04/2008US7339179 Technique for providing a segmented electrostatic lens in an ion implanter
03/04/2008US7339167 Charged particle beam apparatus
03/04/2008US7338820 Laser patterning of encapsulated organic light emitting diodes
03/04/2008US7338581 Sputtering apparatus
03/04/2008US7338577 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing
03/04/2008US7338576 Plasma processing device
02/2008
02/28/2008WO2008023559A1 Charged particle beam equipment and method for adjusting axis of aperture
02/28/2008WO2008023558A1 Charged particle beam apparatus
02/28/2008WO2007067328A3 Ion sources, systems and methods
02/28/2008WO2007056190B1 Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
02/28/2008US20080049888 High Brightness - Multiple Beamlets Source for Patterned X-ray Production
02/28/2008US20080048498 Power Delivery Control and Balancing Between Multiple Loads
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