| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/28/2008 | US20080048118 Electron Beam Apparatus and Method for Production of Its Specimen Chamber |
| 02/28/2008 | US20080048117 Scanning Electron Microscope |
| 02/28/2008 | US20080048114 Scanning Type Probe Microscope |
| 02/28/2008 | US20080047607 Controlling The Flow Of Vapors Sublimated From Solids |
| 02/28/2008 | DE102006037144A1 ECR-Plasmaquelle ECR plasma source |
| 02/27/2008 | EP1892748A2 Material processing system and material processing method |
| 02/27/2008 | EP1892742A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 02/27/2008 | EP1892741A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 02/27/2008 | EP1892740A1 Diamond electron emission cathode, electron emission source, electron microscope, and electron beam exposure device |
| 02/27/2008 | EP1892314A1 Circulated cooled target |
| 02/27/2008 | EP1892047A2 Detecting the Endpoint of a Cleaning Process |
| 02/27/2008 | EP1891659A2 Charged beam dump and particle attractor |
| 02/27/2008 | EP1891658A2 Particulate prevention in ion implantation |
| 02/27/2008 | EP1891657A2 Beam stop and beam tuning methods |
| 02/27/2008 | EP1891656A1 Particle detector for secondary ions and direct and or indirect secondary electrons |
| 02/27/2008 | EP1891467A1 Micro-column with simple structure |
| 02/27/2008 | EP1579481A4 An ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
| 02/27/2008 | EP1535324A4 Method of manufacturing cmos devices by the implantation of n- and p-type cluster ions and negative ions |
| 02/27/2008 | EP1198821B1 Plasma etching chamber |
| 02/27/2008 | EP1036210B1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam |
| 02/27/2008 | CN101133473A Data processing method for scanning beam device |
| 02/27/2008 | CN101131910A A method of implanting a substrate and an ion implanter for performing the method |
| 02/27/2008 | CN101131909A Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods |
| 02/27/2008 | CN101131908A Transmission electron microscope slide glass for nano material in-situ structure property test |
| 02/27/2008 | CN100372048C Ion source providing ribbon beam with controllable density profile |
| 02/27/2008 | CN100371491C Pulsed plasma processing method and apparatus |
| 02/26/2008 | US7335896 Emitter for an ion source |
| 02/26/2008 | US7335895 Stacked lens structure and method of use thereof for preventing electrical breakdown |
| 02/26/2008 | US7335894 High current density particle beam system |
| 02/26/2008 | US7335893 Method and device for aligning a charged particle beam column |
| 02/26/2008 | US7335881 Method of measuring dimensions of pattern |
| 02/26/2008 | US7335880 Technique for CD measurement on the basis of area fraction determination |
| 02/26/2008 | US7335282 Sputtering using an unbalanced magnetron |
| 02/21/2008 | WO2008022061A2 Pvd targets and methods for their manufacture |
| 02/21/2008 | WO2008020855A1 Technique for improving performance and extending lifetime of inductively heated cathode ion sources |
| 02/21/2008 | WO2008019644A1 Method and electron microscope for measuring the similarity of two-dimensional images |
| 02/21/2008 | WO2007084628A3 Technique for improving uniformity of a ribbon beam |
| 02/21/2008 | US20080044960 Semiconductor on insulator vertical transistor fabrication and doping process |
| 02/21/2008 | US20080044321 Power supply unit for generating plasma and plasma apparatus including the same |
| 02/21/2008 | US20080042580 Dual mode ion source for ion implantation |
| 02/21/2008 | US20080042078 Techniques for temperature-controlled ion implantation |
| 02/21/2008 | US20080042074 Charged particle beam apparatus and charged particle beam irradiation method |
| 02/21/2008 | US20080042061 Method of alignment for efficient defect review |
| 02/21/2008 | US20080042060 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 02/21/2008 | US20080042058 Method for Separating a Minute Sample from a Work Piece |
| 02/21/2008 | US20080041830 Method for Operating a Vacuum Plasma Process System |
| 02/21/2008 | US20080041820 Apparatus for reducing polymer deposition on a substrate and substrate support |
| 02/21/2008 | DE102006038211A1 Verfahren und Elektronenmikroskop zur Messung der Ähnlichkeit zweidimensionaler Bilder Method and electron microscope to measure the similarity of two-dimensional images |
| 02/20/2008 | EP1890319A1 Method and apparatus for flattening solid surface |
| 02/20/2008 | EP1889946A2 Surface Processing Apparatus |
| 02/20/2008 | EP1889280A1 Sputtering magnetron |
| 02/20/2008 | EP1889279A1 System and method for analyzing power flow in semiconductor plasma generation systems |
| 02/20/2008 | EP1559126B9 Energy filter image generator for electrically charged particles and the use thereof |
| 02/20/2008 | EP0997554B1 Plasma cvd method, plasma cvd apparatus, and electrode |
| 02/20/2008 | CN201025611Y Belt shielding for lining processing room |
| 02/20/2008 | CN101128911A System and process for high-density, low-energy plasma enhanced vapor phase epitaxy |
| 02/20/2008 | CN101128910A Improved method and apparatus for monitoring a microstructure etching process |
| 02/20/2008 | CN101128909A A housing for a micro-column |
| 02/20/2008 | CN101128908A Stage mechanism |
| 02/20/2008 | CN101127300A Monitoring substrate processing using reflected radiation |
| 02/20/2008 | CN101127293A Sample supporter for scanning electronic microscope |
| 02/20/2008 | CN100370059C Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles |
| 02/19/2008 | US7332730 Device and method for imaging a multiple particle beam on a substrate |
| 02/19/2008 | US7332284 Method of determining base sequence of DNA or RNA using heavy element labeling and imaging by transmission electron microscopy |
| 02/19/2008 | US7332039 Plasma processing apparatus and method thereof |
| 02/19/2008 | US7331307 Thermally sprayed member, electrode and plasma processing apparatus using the electrode |
| 02/19/2008 | US7331306 Plasma processing method and apparatus |
| 02/19/2008 | CA2398598C Method and device for coating substrates |
| 02/14/2008 | WO2008017304A2 Ecr plasma source |
| 02/14/2008 | WO2007090537A3 Focusing and positioning auxiliary device for a particle-optical scanning microscope |
| 02/14/2008 | WO2006084143A8 Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery |
| 02/14/2008 | WO2006055348A3 Method of forming coated article using sputtering target(s) and ion source(s) and corresponding apparatus |
| 02/14/2008 | US20080038484 Coatings, and Methods and Devices for the Manufacture Thereof |
| 02/14/2008 | US20080036402 Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge |
| 02/14/2008 | US20080036392 Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge |
| 02/14/2008 | US20080035862 Throughput enhancement for scanned beam ion implanters |
| 02/14/2008 | US20080035860 Dual beam system |
| 02/14/2008 | US20080035856 Electric field lens and ion implanter having the same |
| 02/14/2008 | US20080035855 Particle detector |
| 02/14/2008 | US20080035854 Electron Microscope Phase Enhancement |
| 02/14/2008 | US20080035853 Illumination Condenser for a Particle Optical Projection System |
| 02/14/2008 | US20080035477 Vacuum Coating System for Coating Elongate Substrates |
| 02/13/2008 | EP1887609A1 Apparatus for plasma processing of mono- or bi-dimensional articles |
| 02/13/2008 | EP1886334A2 Plasma resistant seal assembly with replaceable barrier shield |
| 02/13/2008 | EP1885906A1 Deposition chamber desiccation systems and methods of use thereof |
| 02/13/2008 | EP1540665A4 Photolithography mask repair |
| 02/13/2008 | EP1319239B1 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
| 02/13/2008 | EP1252358A4 System and method for depositing inorganic/organic dielectric films |
| 02/13/2008 | EP1108263B1 Elevated stationary uniformity ring |
| 02/13/2008 | CN101124650A Ion beam scanning control methods and systems for ion implantation uniformity |
| 02/13/2008 | CN101124649A Dose uniformity during scanned ion implantation |
| 02/13/2008 | CN101123201A Stage for plasma processing apparatus, and plasma processing apparatus |
| 02/13/2008 | CN101123200A Stage for plasma processing apparatus, and plasma processing apparatus |
| 02/13/2008 | CN101123178A Plasma processing device |
| 02/13/2008 | CN100369213C Plasma processing device and method thereof |
| 02/13/2008 | CN100369195C Emitter for electronic beam project micromovie system and manufacture thereof |
| 02/13/2008 | CN100369192C Semiconductor processing system reaction chamber |
| 02/12/2008 | USRE40046 Processing system |
| 02/12/2008 | US7330244 Method and apparatus for performing limited area spectral analysis |
| 02/12/2008 | US7329889 Electron beam apparatus and method with surface height calculator and a dual projection optical unit |