Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/2008
04/01/2008US7351970 Scanning electron microscope
04/01/2008US7351969 Electron beam inspection system and inspection method and method of manufacturing devices using the system
04/01/2008US7351968 Multi-pixel electron emission die-to-die inspection
04/01/2008US7351967 System and method for inspecting a semiconductor sample
04/01/2008US7351966 High-resolution optical channel for non-destructive navigation and processing of integrated circuits
03/2008
03/27/2008WO2008036192A2 System and magnetic scanning and correction of an ion beam
03/27/2008WO2008005227A3 Automated faraday sensor test system
03/27/2008WO2008000836A3 Apparatus for accelerating an ion beam
03/27/2008WO2007127086A3 Methods and systems for trapping ion beam particles and focusing an ion beam
03/27/2008US20080076269 Process for Forming Thin Film and System for Forming Thin Film
03/27/2008US20080075640 Capable of preventing a generation of micro arc
03/27/2008US20080074658 Method and apparatus for performing limited area spectral analysis
03/27/2008US20080073588 Lithography system and projection method
03/27/2008US20080073587 Sputtering coating of protective layer for charged particle beam processing
03/27/2008US20080073586 Focused ion beam apparatus and method of preparing/observing sample
03/27/2008US20080073585 Ion implanting apparatus
03/27/2008US20080073584 Ion beam current uniformity monitor, ion implanter and related method
03/27/2008US20080073583 Ion beam apparatus and method for aligning same
03/27/2008US20080073582 Ion beam processing apparatus
03/27/2008US20080073581 Ion beam irradiating apparatus and method of adjusting uniformity of a beam
03/27/2008US20080073580 Method and system for identifying events in FIB
03/27/2008US20080073579 Ion beam measuring method and ion implanting apparatus
03/27/2008US20080073578 Terminal structure of an ion implanter
03/27/2008US20080073577 Substrate holding apparatus
03/27/2008US20080073576 Deposition reduction system for an ion implanter
03/27/2008US20080073575 Scan pattern for an ion implanter
03/27/2008US20080073562 Wafer holder and sample producing apparatus using it
03/27/2008US20080073559 Controlling the flow of vapors sublimated from solids
03/27/2008US20080073548 Method and apparatus for simultaneous detection and measurement of charged particles at one or more levels of particle flux for analysis of same
03/27/2008US20080073547 Apparatus for generating a plurality of beamlets
03/27/2008US20080073202 Interference patterning; sliding short circuits
03/27/2008DE102006043895A1 Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen und zugehöriges Verfahren Electron microscope for inspecting and editing of an object with miniaturized structures and associated method
03/27/2008DE102005048677B4 Transmissionselektronenmikroskop und Bildbetrachtungsverfahren unter Verwendung desselben The same transmission electron microscope and image viewing method using
03/27/2008DE10024827B4 Elektrodenanordnung und ihre Verwendung Electrode assembly and their use
03/26/2008EP1903596A2 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
03/26/2008EP1903595A2 Writing data processing control apparatus, writing method, and writing apparatus
03/26/2008EP1903594A2 Charged particle beam instrument and method of detecting charged particles
03/26/2008EP1902456A1 Reactor for carrying out an etching method for a stack of masked wafers and an etching method
03/26/2008EP1595003A4 Apparatus and methods for ionized deposition of a film or thin layer
03/26/2008EP0938741B1 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil
03/26/2008CN101151703A Plasma processing apparatus
03/26/2008CN101151702A Strain relief cutouts in shower plate made from porous ceramic
03/26/2008CN101151701A A method for operating a pulsed arc evaporation source and a vacuum processing equipment with the pulsed arc evaporation source
03/26/2008CN101151700A Method of measuring ion beam position
03/26/2008CN101151663A Magnetic recording medium, its manufacturing method, and surface treatment device
03/26/2008CN101150909A Plasm restraint device
03/26/2008CN101150044A Focus ring and plasma processing apparatus
03/26/2008CN101150039A Gas injection device
03/26/2008CN101149563A Electron beam alignment mark manufacture method and its uses
03/26/2008CN101147910A Ion ultrasonic cleaning method and device thereof
03/25/2008US7348752 Stage apparatus and lithographic apparatus
03/25/2008US7348695 Linear motor, moving stage system, exposure apparatus, and device manufacturing method
03/25/2008US7348580 Particle beam processing apparatus and materials treatable using the apparatus
03/25/2008US7348578 Device and method for electron beam irradiation
03/25/2008US7348577 Method for controlling a vaporizer of ion implantation equipment during indium implantation process
03/25/2008US7348576 Technique for ion beam angle process control
03/25/2008US7348571 Scanning mechanism for scanning probe microscope and scanning probe microscope
03/25/2008US7348570 Unsupported, electron transparent films and related methods
03/25/2008US7348568 Electron beam diagnostic for profiling high power beams
03/25/2008US7348567 Apparatus for generating a plurality of beamlets
03/25/2008US7348559 Defect inspection and charged particle beam apparatus
03/25/2008US7348558 Charged particle beam apparatus and automatic astigmatism adjustment method
03/25/2008US7348557 Scanning particle beam instrument
03/25/2008US7348556 Method of measuring three-dimensional surface roughness of a structure
03/25/2008US7347919 Both magnetic field forming devices and each target are moved with respect to a substrate so that a film of homogeneous quality and thickness distribution is formed; a large area of the targets can be sputtered
03/25/2008US7347353 Method for connecting magnetic substance target to backing plate, and magnetic substance target
03/25/2008US7347006 Processing apparatus and method for removing particles therefrom
03/20/2008WO2008033724A2 Enhanced virtual anode
03/20/2008WO2008033671A1 Integrated deflectors for beam alignment and blanking in charged particle columns
03/20/2008WO2008032971A1 Lens assembly for electron column
03/20/2008WO2008032725A1 Beam machining apparatus and beam observing apparatus
03/20/2008WO2008031380A1 Method for determining the position of a discoidal substrate relative to a coordinate system of an electron beam exposure system
03/20/2008WO2007136809A3 Electrostatic chuck to limit particle deposits thereon
03/20/2008US20080070389 Apparatus and method for doping
03/20/2008US20080070051 Chemical and corrosion resistant protective coatings; multilayer composite comprising a metal alloy undercoatings, yttrium oxide overcoatings which was formed by spraying under depressurization
03/20/2008US20080070032 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
03/20/2008US20080070028 Internal member for plasma-treating vessel and method of producing the same
03/20/2008US20080069966 A protective film of oxides of aluminum and yttrium formed on an inner wall surface of the chamber and the internal exposed surfaces of the apparatus for processing semiconductor wafers; high-corrosion resistance and dielectric property; etching resistance; spraying yttrium, aluminum and amorphous garnet
03/20/2008US20080067446 Method for electron beam proximity effect correction
03/20/2008US20080067445 Focused ION beam apparatus
03/20/2008US20080067444 Ion beam scanning control methods and systems for ion implantation uniformity
03/20/2008US20080067443 Apparatus for Preparing Cross-Sectional Specimen Using Ion Beam
03/20/2008US20080067442 Beam angle adjustment in ion implanters
03/20/2008US20080067441 Charged-particle beam lithography with grid matching for correction of beam shot position deviation
03/20/2008US20080067440 Machining of microstructures
03/20/2008US20080067439 Plasma doping method and plasma doping apparatus
03/20/2008US20080067438 Dose uniformity correction technique
03/20/2008US20080067437 Charged beam processing apparatus
03/20/2008US20080067436 System for magnetic scanning and correction of an ion beam
03/20/2008US20080067435 Beam tuning with automatic magnet pole rotation for ion implanters
03/20/2008US20080067434 Non-uniform ion implantation
03/20/2008US20080067433 System and method of ion beam control in response to a beam glitch
03/20/2008US20080067432 High-temperature ion implantation apparatus and methods of fabricating semiconductor devices using high-temperature ion implantation
03/20/2008US20080067431 Pattern writing apparatus using charged particle beam, and program-recorded readable recording medium
03/20/2008US20080067430 Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams
03/20/2008US20080067416 UV assisted thermal processing
03/20/2008US20080067386 Megavoltage scatter radiation measurement using beam stop array
03/20/2008US20080067385 Method and apparatus for processing a micro sample
03/20/2008US20080067369 High-resolution optical channel for non-destructive navigation and processing of integrated circuits
03/20/2008US20080067147 Processing apparatus and processing method