| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/16/2008 | CN100382249C Method and apparatus for process control in time division multiplexed TDM etch processes |
| 04/16/2008 | CN100382239C Method for electrically discharging substrate, substrate processing apparatus and program |
| 04/16/2008 | CN100382230C Silicon electrode and its production method, method for producing silicon parts and processing semiconductor wafer |
| 04/16/2008 | CN100382226C Ion implantation method and apparatus |
| 04/16/2008 | CN100381799C Method and apparatus for endpoint detection using partial least squares |
| 04/15/2008 | US7359305 Electron beam recorder and electron beam irradiation position detecting method |
| 04/15/2008 | US7358511 Plasma doping method and plasma doping apparatus |
| 04/15/2008 | US7358510 Ion implanter with variable scan frequency |
| 04/15/2008 | US7358509 Ion implanter, and angle measurement apparatus and beam divergence measurement apparatus for ion implanter |
| 04/15/2008 | US7358495 Standard reference for metrology and calibration method of electron-beam metrology system using the same |
| 04/15/2008 | US7358492 Apparatus, method, and computer program product for deconvolution analysis |
| 04/15/2008 | US7358193 Apparatus for forming nanoholes and method for forming nanoholes |
| 04/15/2008 | US7358192 Method and apparatus for in-situ film stack processing |
| 04/15/2008 | US7356900 Manipulator needle portion repairing method |
| 04/10/2008 | WO2008042585A2 Multi-purpose electrostatic lens for an ion implanter system |
| 04/10/2008 | WO2008042128A1 Improved plasma electrode |
| 04/10/2008 | WO2008042094A2 New and improved beam line architecture for ion implanter |
| 04/10/2008 | WO2008010718A3 Method for sample preparation for cryoelectron microscopy (cem), microreactor and loading platform |
| 04/10/2008 | WO2008008159A3 Electron induced chemical etching and deposition for circuit repair |
| 04/10/2008 | WO2008005461A3 Sputter target assemblies having a controlled solder thickness |
| 04/10/2008 | WO2008003526A3 Method and software for irradiating a target volume with a particle beam and device implementing same |
| 04/10/2008 | WO2007136722A3 New and improved ion source |
| 04/10/2008 | WO2007101133A3 Active damping of high speed scanning probe microscope components |
| 04/10/2008 | WO2006099759A3 Vacuum plasma generator |
| 04/10/2008 | WO2006099758A3 Method for operating a pulsed arc source |
| 04/10/2008 | DE10352144B4 Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten Vacuum coating plant for coating elongate substrates |
| 04/10/2008 | DE10260610B4 Vorrichtung und Verfahren zum Ausbilden von Mustern Apparatus and method for forming patterns |
| 04/10/2008 | DE102006043900A1 Plasma arrangement i.e. plasma-lamination device, for laminating e.g. DVD, has control circuit actuating switching unit during occurrence of electric arc or breakdown over outlet and current flow remains over unit during and after actuation |
| 04/10/2008 | DE102005061687B4 Verfahren und Vorrichtung zur Abstandsmessung sowie Verwendung des Verfahrens und der Vorrichtung zur Topographiebestimmung Method and apparatus for distance measurement and use of the method and apparatus for determining the topography |
| 04/09/2008 | EP1909314A1 Processing method an apparatus for removing oxide film |
| 04/09/2008 | EP1909095A1 X-ray photoelectron spectroscopy analysis system for surface analysis and method therefor |
| 04/09/2008 | EP1909092A2 Sample supporting mesh and method of observing a rubber slice |
| 04/09/2008 | EP1908091A1 Method and device for multi-cathode-pvd-coating and substrate having pvd-coating |
| 04/09/2008 | EP1908090A1 Method for the production of magnetron-coated substrates and magnetron sputter source |
| 04/09/2008 | EP1803144B1 An end-block for a rotatable target sputtering apparatus |
| 04/09/2008 | EP1299897B1 Detector for variable pressure areas and an electron microscope comprising a corresponding detector |
| 04/09/2008 | EP1035757B1 Substrate electrode plasma generator and substance/material processing method |
| 04/09/2008 | CN101159217A Leak detection barrel of ion implanter |
| 04/09/2008 | CN100380606C 等离子体处理系统 The plasma processing system |
| 04/09/2008 | CN100380605C Plasma processing apparatus and method, and electrode plate for plasma processing apparatus |
| 04/09/2008 | CN100380582C Mask and producing method, producing method for semiconductor device with this mask |
| 04/09/2008 | CN100380564C Method and apparatus for an improved baffle plate in a plasma processing system |
| 04/09/2008 | CN100379893C Matching box, vacuum device using the same and vacuum processing method |
| 04/08/2008 | USRE40221 Object observation apparatus and object observation |
| 04/08/2008 | US7355379 Coaxial type impedance matching device and impedance detecting method for plasma generation |
| 04/08/2008 | US7355334 Electron beam generator device having carbon nanotube structure with a crosslinked network structure |
| 04/08/2008 | US7355188 Technique for uniformity tuning in an ion implanter system |
| 04/08/2008 | US7355186 Charged particle beam device with cleaning unit and method of operation thereof |
| 04/08/2008 | US7355177 Electron beam device |
| 04/08/2008 | US7355174 Charged particle beam emitting device and method for adjusting the optical axis |
| 04/08/2008 | US7355171 Method and apparatus for process monitoring and control |
| 04/08/2008 | US7354778 Method for determining the end point for a cleaning etching process |
| 04/08/2008 | US7354525 Specimen surface processing apparatus and surface processing method |
| 04/08/2008 | US7354501 Upper chamber for high density plasma CVD |
| 04/08/2008 | US7354500 Mask and apparatus using it to prepare sample by ion milling |
| 04/08/2008 | US7354482 Film deposition device |
| 04/03/2008 | WO2008038684A1 Electron source |
| 04/03/2008 | WO2008037959A1 A method of implanting a substrate and an ion implanter for performing the method |
| 04/03/2008 | WO2008017304A3 Ecr plasma source |
| 04/03/2008 | WO2008010959A9 Beam ablation lithography |
| 04/03/2008 | WO2008002403A3 Scan pattern for an ion implanter |
| 04/03/2008 | WO2007145355A3 Ion beam irradiating apparatus, and method of producing semiconductor device |
| 04/03/2008 | WO2007143110A3 Dose close loop control for ion implantation |
| 04/03/2008 | WO2007142912A3 Non-uniform ion implantation |
| 04/03/2008 | WO2007111822A3 A method of ion beam control for glitch recovery |
| 04/03/2008 | US20080079447 Semiconductor device test method and semiconductor device tester |
| 04/03/2008 | US20080078959 Method for controlling charge amount of ion beam and a wafer applied in the method |
| 04/03/2008 | US20080078958 Method for controlling charge amount of ion beam and a wafer applied in the method |
| 04/03/2008 | US20080078957 Methods for beam current modulation by ion source parameter modulation |
| 04/03/2008 | US20080078956 Broad beam ion implantation architecture |
| 04/03/2008 | US20080078955 Methods for rapidly switching off an ion beam |
| 04/03/2008 | US20080078954 Beam line architecture for ion implanter |
| 04/03/2008 | US20080078953 Technique for improving ion implantation throughput and dose uniformity |
| 04/03/2008 | US20080078952 Technique for improving ion implantation based on ion beam angle-related information |
| 04/03/2008 | US20080078951 Multi-purpose electrostatic lens for an ion implanter system |
| 04/03/2008 | US20080078950 Implanting with improved uniformity and angle control on tilted wafers |
| 04/03/2008 | US20080078949 Technique for improved ion beam transport |
| 04/03/2008 | US20080078947 Beam shot position correction coefficient computation/updating technique for ultrafine pattern fabrication using variable shaped beam lithography |
| 04/03/2008 | US20080078933 Electron Beam Exposure or System Inspection Or Measurement Apparatus And Its Method And Height Detection Apparatus |
| 04/03/2008 | US20080078249 Probe system, ultrasound system and method of generating ultrasound |
| 04/03/2008 | DE19730993B4 Vakuumbeschichtungsvorrichtung zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Partikelstrom Vacuum coater for coating substrates on all sides by rotating the substrates in the particle flow |
| 04/03/2008 | DE10241433B4 Steuerschaltung zum Steuern einer Elektronenemissionsvorrichtung Control circuit for controlling an electron emission device |
| 04/03/2008 | DE102006058098B3 Cathode for scanning electron microscope, has wire section split up at end that is divided into two parts attached to electrodes, and pointed radiating region formed at another end of wire section |
| 04/03/2008 | DE102006027820B4 Kammeranordnung zur Verwendung bei der Elektronenstrahlbearbeitung Chamber assembly for use in the electron beam treatment |
| 04/02/2008 | EP1906439A2 Etching method and semiconductor device fabrication method |
| 04/02/2008 | EP1906433A1 Plasma discharge film-forming apparatus and method |
| 04/02/2008 | EP1815493B1 Vacuum processing chamber for very large area substrates |
| 04/02/2008 | CN101155460A Frequency monitoring to detect plasma process abnormality |
| 04/02/2008 | CN101153855A Sample bench |
| 04/02/2008 | CN100378924C Plasma etching reactor |
| 04/02/2008 | CN100378923C Magnetron plasma processing apparatus |
| 04/02/2008 | CN100378920C Ion mixing device and porous electrode for ion mixing device |
| 04/02/2008 | CN100378915C Method for measuring parallel beam injection angle |
| 04/02/2008 | CN100378245C Sputtering apparatus |
| 04/01/2008 | USH2212 Method and apparatus for producing an ion-ion plasma continuous in time |
| 04/01/2008 | US7353141 Method and system for monitoring component consumption |
| 04/01/2008 | US7351986 Method and apparatus for reducing cross contamination of species during ion implantation |
| 04/01/2008 | US7351984 Controlling the characteristics of implanter ion-beams |
| 04/01/2008 | US7351983 Focused ion beam system |
| 04/01/2008 | US7351971 Charged-particle beam instrument and method of detection |