| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/30/2008 | EP1915768A1 Microwave plasma reactor |
| 04/30/2008 | EP1262093B1 Apparatus for fixing a sheet-shaped electrode of a plasma polymerizing apparatus |
| 04/30/2008 | DE10331137B4 Detektorsystem für ein Rasterelektronenmikroskop und Rasterelektronenmikroskop mit einem entsprechenden Detektorsystem Detector system for a scanning electron microscope and scanning electron microscope with an appropriate detector system |
| 04/30/2008 | DE10203543B4 Vorrichtung zur Erzeugung eines APG-Plasmas Device for generating a APG-plasma |
| 04/30/2008 | CN101170865A Plasm suspending reference probe |
| 04/30/2008 | CN101170054A Device and method for processing substrate and method for supplying plasma |
| 04/30/2008 | CN101170052A Apparatus for controlling plasma etching process |
| 04/30/2008 | CN100385640C Anodized substrate support |
| 04/30/2008 | CN100385620C Electrode subassembly |
| 04/30/2008 | CN100385605C Ion implantation system and ion source |
| 04/30/2008 | CN100385595C Method for preparing transmission electron microscope test piece |
| 04/29/2008 | US7365456 Positioning apparatus and charged-particle-beam exposure apparatus |
| 04/29/2008 | US7365348 Adjusting device of an apparatus for generating a beam of charged particles |
| 04/29/2008 | US7365347 Ion implantation apparatus for use in manufacturing of semiconductor device |
| 04/29/2008 | US7365346 Ion-implanting apparatus, ion-implanting method, and device manufactured thereby |
| 04/29/2008 | US7365342 Device for operating gas in vacuum or low-pressure environment and for observation of the operation |
| 04/29/2008 | US7365339 Ion source |
| 04/29/2008 | US7365338 Apparatus for generating a plurality of beamlets |
| 04/29/2008 | US7365325 Method and apparatus for observing a specimen |
| 04/29/2008 | US7365324 Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| 04/29/2008 | US7365323 Environmental scanning electron microcope |
| 04/29/2008 | US7365321 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 04/29/2008 | US7365320 Methods and systems for process monitoring using x-ray emission |
| 04/29/2008 | US7365306 Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same |
| 04/29/2008 | US7364798 Internal member for plasma-treating vessel and method of producing the same |
| 04/29/2008 | US7363876 Multi-core transformer plasma source |
| 04/29/2008 | US7363802 Measurement device for electron microscope |
| 04/24/2008 | WO2008046553A1 Device and method for locally producing microwave plasma |
| 04/24/2008 | WO2008046552A1 Device and method for producing microwave plasma with a high plasma density |
| 04/24/2008 | WO2008046551A1 Device and method for producing high power microwave plasma |
| 04/24/2008 | WO2006110253A8 Quantitative transmission/emission detector system and methods of detecting concealed radiation sources |
| 04/24/2008 | US20080097627 Monitoring method of processing state and processing unit |
| 04/24/2008 | US20080093565 Charged particle beam system and its specimen holder |
| 04/24/2008 | US20080093561 Dual-Mode Electron Beam Column |
| 04/24/2008 | US20080093551 Electric charged particle beam microscopy and electric charged particle beam microscope |
| 04/24/2008 | US20080093341 RF Plasma Reactor Having a Distribution Chamber with at Least One Grid |
| 04/24/2008 | US20080093215 Batch-Type Remote Plasma Processing Apparatus |
| 04/24/2008 | CA2666131A1 Device and method for locally producing microwave plasma |
| 04/24/2008 | CA2666125A1 Device and method for producing microwave plasma with a high plasma density |
| 04/24/2008 | CA2666117A1 Device and method for producing high power microwave plasma |
| 04/24/2008 | CA2663016A1 Mass spectrometer |
| 04/23/2008 | EP1914788A1 Substrate stage and plasma processing apparatus |
| 04/23/2008 | EP1914787A1 Detection device and inspection device |
| 04/23/2008 | EP1914786A2 Charged particle beam system |
| 04/23/2008 | EP1914785A2 Aberration corrector and method of aberration correction |
| 04/23/2008 | EP1913624A1 Sputtering target with slow-sputter layer under target material |
| 04/23/2008 | EP1913623A1 Maskless lithography system with improved reliability |
| 04/23/2008 | EP1913603A1 Treatment station for particle bombardment of a patient and a particle therapy installation |
| 04/23/2008 | EP1913362A2 Atom probe evaporation processes |
| 04/23/2008 | EP1590825B1 Method and device for producing corpuscular radiation systems |
| 04/23/2008 | EP1362361B1 Particle beam system comprising a mirror corrector |
| 04/23/2008 | EP1048071B1 Integrated circuit rewiring using gas-assisted focused ion beam (fib) etching |
| 04/23/2008 | CN101167155A Tilted plasma doping |
| 04/23/2008 | CN101167154A Ion source for use in an ion implanter |
| 04/23/2008 | CN101167153A Apparatus and methods for two-dimensional ion beam profiling |
| 04/23/2008 | CN101165867A Monitoring substrate processing using reflected radiation |
| 04/23/2008 | CN101165855A Substrate stage and plasma processing apparatus |
| 04/23/2008 | CN100383908C Defect and conductivity processing method for conductive nano-structure |
| 04/23/2008 | CN100383276C Cathode sputterion device with permanent magnet structure |
| 04/22/2008 | US7361915 Beam current stabilization utilizing gas feed control loop |
| 04/22/2008 | US7361914 Means to establish orientation of ion beam to wafer and correct angle errors |
| 04/22/2008 | US7361913 Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control |
| 04/22/2008 | US7361912 Doping method, doping apparatus, and control system for doping apparatus |
| 04/22/2008 | US7361909 Method and apparatus for correcting drift during automated FIB processing |
| 04/22/2008 | US7361905 Substrate processing apparatus and maintenance method therefor |
| 04/22/2008 | US7361898 Scanning electron microscope and CD measurement calibration standard specimen |
| 04/22/2008 | US7361897 Imaging apparatus for high probe currents |
| 04/22/2008 | US7361896 Scanning electron microscope and a method for adjusting a focal point of an electron beam of said scanning electron microscope |
| 04/22/2008 | US7361895 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus |
| 04/22/2008 | US7361894 Method of forming a sample image and charged particle beam apparatus |
| 04/22/2008 | US7361892 Method to increase low-energy beam current in irradiation system with ion beam |
| 04/22/2008 | US7361891 Pressure-flow reducer for aerosol focusing devices |
| 04/22/2008 | US7361600 Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 04/22/2008 | US7361287 Method for etching structures in an etching body by means of a plasma |
| 04/22/2008 | US7361228 Showerheads for providing a gas to a substrate and apparatus |
| 04/17/2008 | WO2008045458A2 Sensor for ion implanter |
| 04/17/2008 | WO2008044856A1 An electron column using a magnetic lens layer having permanent magnets |
| 04/17/2008 | WO2008044479A1 Electron beam lithography system and electron beam lithography |
| 04/17/2008 | WO2008044030A1 Workpiece height adjustment in an electron beam lithography machine |
| 04/17/2008 | WO2008044025A1 Reduction in stage movement reaction force in an electron beam lithography machine |
| 04/17/2008 | WO2007145712A3 Slider bearing for use with an apparatus comprising a vacuum chamber |
| 04/17/2008 | US20080088067 Target for vaporizing under an electron beam, a method of fabricating it, a thermal barrier and a coating obtained from a target, and a mechanical part including such a coating |
| 04/17/2008 | US20080087846 Sensor for Ion Implanter |
| 04/17/2008 | US20080087822 High-density fib-sem tomography via real-time imaging |
| 04/17/2008 | US20080087808 Method and system for controlling beam scanning in an ion implantation device |
| 04/17/2008 | US20080087541 End-Block for a Rotatable Target Sputtering Apparatus |
| 04/17/2008 | US20080087220 Plasma Processing Apparatus and Multi-Chamber System |
| 04/17/2008 | US20080087219 Dual mode ion source for ion implantation |
| 04/17/2008 | DE112006001198T5 Synchrone Unterabtastung für Hochfrequenz-Spannungs- und Strom-Messungen Synchronous sub-scan for high frequency voltage and current measurements |
| 04/17/2008 | DE102006043898A1 Plasma system i.e. plasma coating device, for sputtering or coating of e.g. DVD, has control circuit shifting source into idle condition lasting for time period that is allowed after each interruption, and achieves current limiting value |
| 04/16/2008 | EP1912483A1 Plasma generator and film forming method employing same |
| 04/16/2008 | EP1912247A1 Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers |
| 04/16/2008 | EP1912246A2 Power supply antenna and power supply method |
| 04/16/2008 | EP1910891A1 Inspection equipment for fine pattern and morphology using microcolumn |
| 04/16/2008 | EP1606872B1 Power supply unit for a gas discharge process |
| 04/16/2008 | EP1161309A4 A method for a repetitive ion beam processing with a by carbon containing ion beam |
| 04/16/2008 | CN101162689A Focus ring and plasma processing apparatus |
| 04/16/2008 | CN101162685A Apparatus and method to improve uniformity and reduce local effect of process chamber |
| 04/16/2008 | CN101162679A Ion injector |
| 04/16/2008 | CN100382276C Substrate mounting table, substrate processing apparatus and substrate processing method |