| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/14/2008 | EP1921053A1 Method for preparing yttria parts and plasma reactor parts comprising yttria |
| 05/14/2008 | EP1920453A2 Method for the production of a multilayer electrostatic lens array |
| 05/14/2008 | EP1920214A1 Real-time monitoring and controlling sputter target erosion |
| 05/14/2008 | EP1508152A4 Particle beam processing apparatus and materials treatable using the apparatus |
| 05/14/2008 | EP0958400B1 Method and apparatus for plasma deposition of a thin film onto the interior surface of a container |
| 05/14/2008 | CN101180699A Termination of secondary frequencies in RF power delivery |
| 05/14/2008 | CN101179897A System and method for generating ions and radicals |
| 05/14/2008 | CN101179045A Mounting device, plasma processing apparatus and plasma processing method |
| 05/14/2008 | CN101179023A Gas distribution control system, polysilicon gate etching and silicon chip shallow groove isolation etching method |
| 05/14/2008 | CN101179010A Process chamber having gate slit opening and closing apparatus |
| 05/14/2008 | CN101179005A Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof |
| 05/14/2008 | CN101179000A Plasma source and uses thereof |
| 05/14/2008 | CN100388434C Substrate supporting structure for semiconductor processing, and plasma processing device |
| 05/14/2008 | CN100388433C Pressure control method and plasma processing device |
| 05/14/2008 | CN100388425C Air supply system of shower in water cold plasma |
| 05/14/2008 | CN100388409C Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 05/13/2008 | US7372052 Electron beam method and apparatus for reducing or patterning the birefringence of halogenated optical materials |
| 05/13/2008 | US7372051 Electric charged particle beam microscopy, electric charged particle beam microscope, critical dimension measurement and critical dimension measurement system |
| 05/13/2008 | US7372050 Method of preventing charging, and apparatus for charged particle beam using the same |
| 05/13/2008 | US7372047 Charged particle system and a method for measuring image magnification |
| 05/13/2008 | US7372028 Sample electrification measurement method and charged particle beam apparatus |
| 05/13/2008 | US7371467 Process chamber component having electroplated yttrium containing coating |
| 05/13/2008 | US7371285 Motorized chamber lid |
| 05/08/2008 | WO2008054391A1 Method and apparatus for preventing instabilities in radio-frequency plasma processing |
| 05/08/2008 | WO2008053667A1 Structure estimation system, structure estimation method, and program |
| 05/08/2008 | WO2008053271A1 Deposition of amorphous silicon films by electron cyclotron resonance |
| 05/08/2008 | WO2008053140A1 Mechanical scanner for ion implanter |
| 05/08/2008 | WO2008053139A2 Shaped apertures in an ion implanter |
| 05/08/2008 | WO2008053138A1 Ion beam diagnostics |
| 05/08/2008 | WO2008053137A1 Substrate scanner apparatus |
| 05/08/2008 | WO2008052708A1 Film deposition of amorphous films by electron cyclotron resonance |
| 05/08/2008 | WO2008052707A1 Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance |
| 05/08/2008 | WO2008052706A1 Method of forming a film by deposition from a plasma |
| 05/08/2008 | WO2008052705A1 Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma |
| 05/08/2008 | WO2008052704A1 Device for forming a film by deposition from a plasma |
| 05/08/2008 | WO2008052703A1 Method and apparatus for forming a film by deposition from a plasma |
| 05/08/2008 | WO2008036192A3 System and magnetic scanning and correction of an ion beam |
| 05/08/2008 | WO2008034092A3 System and method for detecting non-cathode arcing in a plasma generation apparatus |
| 05/08/2008 | WO2008021334A3 Throughput enhancement for scanned beam ion implanters |
| 05/08/2008 | WO2008017780A3 Method and device for the cold-plasma deposition of a boundary layer and machine using such a device |
| 05/08/2008 | WO2008014915A3 Method for the plasma treatment of a surface |
| 05/08/2008 | WO2008009559A9 Device and method for producing and/ or confining a plasma |
| 05/08/2008 | WO2007142910A3 Producing soi structure using high-purity ion shower |
| 05/08/2008 | US20080109755 Scanning electron microscope with measurement function |
| 05/08/2008 | US20080105833 Ion implantation device with a dual pumping mode and method thereof |
| 05/08/2008 | US20080105830 Gas Discharge Lamp, System and Method for the Hardening of Materials Hardenable by Uv Light as Well as Material Hardened by Uv Light |
| 05/08/2008 | US20080105660 Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
| 05/08/2008 | DE112006001006T5 Bearbeitungsverfahren mit einem fokussierten Ionenstrahl und Einrichtung zur Durchführung des Verfahrens Processing methods using a focused ion beam, and means for carrying out the method |
| 05/08/2008 | DE102007049735A1 Sputter cathode has co-located power supply and liquid coolant in block for high vacuum coating assembly |
| 05/07/2008 | EP1919264A1 Device for forming a film by deposition from a plasma |
| 05/07/2008 | EP1918981A2 Protective layer for charged-particle-beam processing |
| 05/07/2008 | EP1918978A2 Mask etch plasma reactor with cathode providing a uniform distribution of etch rate |
| 05/07/2008 | EP1918971A2 Method and apparatus for photomask plasma etching |
| 05/07/2008 | EP1918970A1 Method and apparatus for photomask plasma etching |
| 05/07/2008 | EP1918969A1 Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution |
| 05/07/2008 | EP1918968A1 Mask etch plasma reactor with variable process gas distribution |
| 05/07/2008 | EP1918967A1 Method of forming a film by deposition from a plasma |
| 05/07/2008 | EP1918966A1 Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma |
| 05/07/2008 | EP1918965A1 Method and apparatus for forming a film by deposition from a plasma |
| 05/07/2008 | EP1918964A2 Method for measuring information transfer limit in transmission electron microscope, and transmission electron microscope using the same |
| 05/07/2008 | EP1918963A2 Charged particle beam processing using a cluster source |
| 05/07/2008 | EP1918414A1 Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance |
| 05/07/2008 | EP1917843A1 Method and apparatus for creating a plasma |
| 05/07/2008 | EP1917675A2 Selection of wavelenghts for end point in a time division multiplexed process |
| 05/07/2008 | EP1917674A1 Optical emission interferometry for pecvd using a gas injection hole |
| 05/07/2008 | EP1230664B1 Processing systems |
| 05/07/2008 | CN101176185A Reflectron |
| 05/07/2008 | CN101176184A Synchronous undersampling for high-frequency voltage and current measurements |
| 05/07/2008 | CN101176183A Method and apparatus for flattening solid surface |
| 05/07/2008 | CN101175867A 硬材料层 Hard material layers |
| 05/07/2008 | CN101174552A Apparatus for semiconductor process |
| 05/07/2008 | CN101174542A Gas injection apparatus |
| 05/07/2008 | CN101174534A Ion implanter |
| 05/07/2008 | CN101174097A Mask etch plasma reactor with variable process gas distribution |
| 05/07/2008 | CN101174096A Mask etch plasma reactor with cathode providing a uniform distribution of etch rate |
| 05/07/2008 | CN101172859A Method for preparing yttria parts and plasma reactor parts comprising yttria |
| 05/06/2008 | US7369213 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same |
| 05/06/2008 | US7368876 Plasma processing apparatus |
| 05/06/2008 | US7368739 Multilayer detector and method for sensing an electron beam |
| 05/06/2008 | US7368738 Advanced pattern definition for particle-beam exposure |
| 05/06/2008 | US7368737 Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method |
| 05/06/2008 | US7368736 Charged beam exposure apparatus and method for manufacturing mask and semiconductor device |
| 05/06/2008 | US7368734 Ion beam measuring method and ion implanting apparatus |
| 05/06/2008 | US7368729 Method, apparatus and system for specimen fabrication by using an ion beam |
| 05/06/2008 | US7368727 Atomic level ion source and method of manufacture and operation |
| 05/06/2008 | US7368713 Method and apparatus for inspecting semiconductor device |
| 05/06/2008 | US7368041 Plasma density distribution above the target cathode is controlled by interacting a control anode with the electron trap in a control segment area of the plasma loop; magnetron sputter-coating the substrate by the magnetron sputter-source then takes place |
| 05/06/2008 | US7367281 Plasma antenna |
| 05/06/2008 | CA2411174C A process and apparatus for plasma activated deposition in a vacuum |
| 05/02/2008 | WO2008050670A1 Method of controlling electron beam focusing of pierce type electron gun and control device therefor |
| 05/02/2008 | WO2008050079A1 Multi-directional mechanical scanning in an ion implanter |
| 05/02/2008 | WO2008049634A1 Dual magnetron sputtering power supply and magnetron sputtering apparatus |
| 05/02/2008 | WO2008049463A1 Method and apparatus for manufacturing cleaned substrates or clean substrates which are further processed |
| 05/02/2008 | WO2005001877B1 Magnetic enhancement for mechanical confinement of plasma |
| 05/02/2008 | CA2664516A1 Method and apparatus for manufacturing cleaned substrates or clean substrates which are further processed |
| 05/01/2008 | US20080099696 Shaped apertures in an ion implanter |
| 04/30/2008 | EP1916696A1 Charged particle detector assembly, charged particle beam apparatus and method for generating an image |
| 04/30/2008 | EP1916695A1 Charged particle beam apparatus and method for operating it |
| 04/30/2008 | EP1916694A1 Adjustable aperture element for particle beam device, method of operating and manufacturing thereof |
| 04/30/2008 | EP1915769A1 Method of treating a gas stream |