| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/03/2008 | CA2303148C Charged particle beam emitting assembly |
| 05/29/2008 | WO2008064178A2 Method and system for proximity effect and dose correction for a particle beam writing device |
| 05/29/2008 | WO2008064155A2 Stencil design and method for cell projection particle beam lithography |
| 05/29/2008 | WO2008062670A1 Electron beam irradiation system |
| 05/29/2008 | WO2008062513A1 Electron-beam exposing device, and electron-beam exposing method |
| 05/29/2008 | WO2008061784A1 Decentralized plasma arc control |
| 05/29/2008 | WO2008061775A1 Method for operating a plasma process and plasma system |
| 05/29/2008 | WO2008061680A1 Method for identifying an arc discharge in a plasma process and arc discharge identification apparatus |
| 05/29/2008 | WO2008061603A2 Phase plate, image producing method and electron microscope |
| 05/29/2008 | WO2007067296A8 Ion sources, systems and methods |
| 05/29/2008 | US20080121820 Projection electronic microscope for reducing geometric aberration and space charge effect |
| 05/29/2008 | US20080121811 Method and apparatus for extending equipment uptime in ion implantation |
| 05/29/2008 | US20080121804 Method for inspecting substrate, substrate inspecting system and electron |
| 05/29/2008 | US20080121801 Deicing of radiation detectors in analytical instruments |
| 05/29/2008 | US20080121791 Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same |
| 05/29/2008 | US20080121180 Substrate Processing Apparatus and Reaction Container |
| 05/29/2008 | DE102006055510A1 Phasenplatte, Bilderzeugungsverfahren und Elektronenmikroskop Phase plate, image forming method and electron microscope |
| 05/28/2008 | EP1926352A1 High frequency power supply device and high frequency power supplying method |
| 05/28/2008 | EP1926122A1 Method of detecting arcing in a plasma process and arc detection device |
| 05/28/2008 | EP1925016A1 Plasma processing apparatus |
| 05/28/2008 | EP1925015A1 Plant for plasma treatment of endless materials |
| 05/28/2008 | EP1535314A4 High rate deposition at low pressures in a small batch reactor |
| 05/28/2008 | CN101189699A Technique for ion beam angle process control |
| 05/28/2008 | CN101189698A Two dimensional stationary beam profile and angular mapping |
| 05/28/2008 | CN101189697A Plasma resistant seal assembly with replaceable barrier shield |
| 05/28/2008 | CN101189696A Technique for ion beam angle spread control |
| 05/28/2008 | CN101189372A Controlled growth of a nanostructure on a substrate, and electron emission devices based on the same |
| 05/28/2008 | CN101188189A Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distribution |
| 05/28/2008 | CN101188059A DC combination electric field and ion stream density measuring system |
| 05/28/2008 | CN100390957C Substrate supporting member and substrate processing apparatus |
| 05/28/2008 | CN100390943C Thin-film shaper and shaping method thereof |
| 05/28/2008 | CN100390922C Evaluation of chamber components having textured coatings |
| 05/27/2008 | US7378671 Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus |
| 05/27/2008 | US7378670 Shielding assembly for a semiconductor manufacturing apparatus and method of using the same |
| 05/27/2008 | US7378356 Couples pulsed DC at a particular frequency to the target through a filter which filters effects of a bias power applied to the substrate, protecting the pulsed DC power supply. |
| 05/27/2008 | US7378304 Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
| 05/27/2008 | US7378003 Thin-film magnetic recording head manufacture using selective imaging |
| 05/27/2008 | US7378001 Magnetron sputtering |
| 05/27/2008 | US7377992 Method and apparatus for detecting end point |
| 05/27/2008 | US7377228 System for and method of gas cluster ion beam processing |
| 05/22/2008 | WO2008061224A1 Sample support structure and methods |
| 05/22/2008 | WO2008060624A2 Apparatus and method for scanning capacitance microscopy and spectroscopy |
| 05/22/2008 | WO2008060326A2 Deicing of radiation detectors in analytical instruments |
| 05/22/2008 | WO2008060237A1 Electron rotation camera |
| 05/22/2008 | WO2008059070A2 Method for regulating nanoscale electron beam induced depositions |
| 05/22/2008 | WO2008058491A2 Scanning electron microscope |
| 05/22/2008 | WO2008042094A3 New and improved beam line architecture for ion implanter |
| 05/22/2008 | US20080116926 Semiconductor probe having resistive tip and method of fabricating the same |
| 05/22/2008 | US20080116398 Method and system for proximity effect and dose correction for a particle beam writing device |
| 05/22/2008 | US20080116397 Stencil design and method for cell projection particle beam lithography |
| 05/22/2008 | US20080116376 Charged particle beam apparatus |
| 05/22/2008 | US20080116368 Luminous Body, Electron Beam Detector Using the Same, Scanning Electron Microscope, and Mass Analysis Device |
| 05/22/2008 | US20080116058 Filtered cathodic arc deposition method and apparatus |
| 05/21/2008 | EP1923902A1 Magnetron sputtering source, sputter coating system and method for coating a substrate |
| 05/21/2008 | EP1923901A2 Plasma confinement baffle and flow equalizer for enhanced magnetic control of plasma radial distribution |
| 05/21/2008 | EP1923483A1 Deposition of amorphous silicon films by electron cyclotron resonance |
| 05/21/2008 | EP1923482A1 Method and apparatus for automation of PTF measurement in sputter targets |
| 05/21/2008 | EP1922744A1 Portable die cleaning apparatus and method thereof |
| 05/21/2008 | EP1520292A4 Software synchronization of multiple scanning probes |
| 05/21/2008 | CN201063957Y Improved structure of air supply system in plasma processing apparatus |
| 05/21/2008 | CN101183566A Semiconductor probe having resistive tip and method of fabricating the same |
| 05/21/2008 | CN100389639C Dry etching device |
| 05/21/2008 | CN100389489C Low energy dosage monitoring using wafer impregnating machine |
| 05/21/2008 | CN100389476C Scan type ion gun |
| 05/20/2008 | US7375479 Apparatus for processing an object with high position accurancy |
| 05/20/2008 | US7375356 Electron-beam exposure system |
| 05/20/2008 | US7375355 Ribbon beam ion implanter cluster tool |
| 05/20/2008 | US7375354 Ion implanting method and apparatus |
| 05/20/2008 | US7375329 Scanning electron microscope |
| 05/20/2008 | US7375325 Method for preparing a sample for electron microscopic examinations, and sample supports and transport holders used therefor |
| 05/20/2008 | US7375323 Electron beam apparatus with aberration corrector |
| 05/20/2008 | US7374648 Single piece coil support assemblies, coil constructions and methods of assembling coil constructions |
| 05/20/2008 | US7374636 Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor |
| 05/20/2008 | US7374620 Substrate processing apparatus |
| 05/20/2008 | US7373899 Plasma processing apparatus using active matching |
| 05/15/2008 | WO2008058246A2 Ion implantation device with a dual pumping mode and method thereof |
| 05/15/2008 | WO2008055993A1 Plasma source with plurality of out of phase electrodes |
| 05/15/2008 | WO2008055617A1 Device for the pre-treatment of substrates |
| 05/15/2008 | WO2008010959A3 Beam ablation lithography |
| 05/15/2008 | WO2008005137A3 Methods and apparatus for beam density measurement in two dimensions |
| 05/15/2008 | WO2007100873A3 Hybrid wafer -holding pin |
| 05/15/2008 | WO2003003302A8 Three-dimensional imaging of single particles |
| 05/15/2008 | US20080113519 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrate |
| 05/15/2008 | US20080113149 Surface processing apparatus |
| 05/15/2008 | US20080113104 removing an oxide film from the surfaces of wafers, by conveying the wafer into vessels, then supplying nitrogen flouride gas, allowing the gas to react with the oxide film, to form a reaction-product film, heating to evaporate and remove the reaction-product film; sublimation; surface treatment |
| 05/15/2008 | US20080111084 Column simultaneously focusing a particle beam and an optical beam |
| 05/15/2008 | US20080111072 Method and Apparatus for Analyzing Sample |
| 05/15/2008 | US20080110760 improved corrosion or erosion resistance to corrosive energized gases; anodizing exposed surface of the metal alloy to form yttrium aluminum oxide; YAG; wafers, displays, panels; plasma deposition |
| 05/15/2008 | US20080110747 Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 05/15/2008 | US20080110745 efficient and simple; No complex movement of diaphragms are necessary; modifying the beam characteristics or by pulsing the ion beam; machining silicon wafer and an aluminum layer |
| 05/15/2008 | DE19803712B4 Einrichtung zur Steuerung von in der Halbleiterindustrie vorgesehenen Fertigungsmaschinen Means for controlling provided in the semiconductor industry, manufacturing machinery |
| 05/15/2008 | DE10336881B4 Hochfrequenzanregungsanordnung mit einer Begrenzungsschaltung High-frequency excitation system with a limiting circuit |
| 05/15/2008 | DE102006052549A1 Polarized ions production arrangement for air filtering in clean room, has ionizer load, which is unloaded and/or reloaded in connection at apex reaching purposefully by resistance in sloping and/or following zero point with polarity change |
| 05/14/2008 | EP1921659A2 System and method for control of electromagnetic radiation in PECVD discharge processes |
| 05/14/2008 | EP1921658A2 System and method for shielding during PECVD deposition processes |
| 05/14/2008 | EP1921657A2 System and Method for Generating Ions and Radicals |
| 05/14/2008 | EP1921656A1 Method and device for plasma-aided chemical vapour deposition |
| 05/14/2008 | EP1921655A1 Plasma source with plurality of out of phase electrodes |
| 05/14/2008 | EP1921180A1 Plasma discharge processing device and production method of gas barrier film |
| 05/14/2008 | EP1921178A1 Film deposition of amorphous films by electron cyclotron resonance |