| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/17/2008 | US7388215 Pattern drawing method, stamper manufacturing method, and pattern drawing apparatus |
| 06/17/2008 | US7388211 Semi-closed observational environment for electron microscope |
| 06/17/2008 | US7388198 Electron microscope |
| 06/17/2008 | US7387738 Providing a substrate, electrodes that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy toand/or electrodes to generate electrons; contacting substrate with negatively charged reducing gas to reduce metal oxides |
| 06/17/2008 | US7387081 Plasma reactor including helical electrodes |
| 06/17/2008 | CA2326202C Method and apparatus for deposition of biaxially textured coatings |
| 06/12/2008 | WO2008070025A1 Methods for monitoring ion implant process in bond and cleave, silicon-on-insulator (soi) wafer manufacturing |
| 06/12/2008 | WO2008069110A1 Spin-polarization ion beam generator, scattering spectroscope using the spin-polarization ion beam, and specimen processing device |
| 06/12/2008 | WO2008068815A1 Electron beam exposure device |
| 06/12/2008 | WO2008068806A1 Rf electron gun |
| 06/12/2008 | WO2008067969A1 Vacuum coating unit for homogeneous pvd coating |
| 06/12/2008 | WO2008042668A3 Technique for improving ion implantation throughput and dose uniformity |
| 06/12/2008 | WO2007089650A3 Electrospray deposition: devices and methods thereof |
| 06/12/2008 | US20080136309 Ion source |
| 06/12/2008 | US20080135778 Specimen kit and fabricating method thereof |
| 06/12/2008 | US20080135776 Magnetic monitoring of a faraday cup for an ion implanter |
| 06/12/2008 | US20080135755 Scanning Electron Microscope |
| 06/12/2008 | US20080135752 Probe-Holding Apparatus, Sample-Obtaining Apparatus, Sample-Processing Apparatus, Sample-Processsing Method and Sample-Evaluating Method |
| 06/12/2008 | US20080135748 Spherical Aberration Corrected Electrostatic Lens, Input Lens, Electron Spectrometer, Photoemission Electron Microscope And Measuring System |
| 06/12/2008 | US20080135742 Hyperthermal neutral beam source and method of operating |
| 06/12/2008 | US20080135519 Plasma processing apparatus and control method thereof |
| 06/12/2008 | DE112006002257T5 Plasmabehandlungsvorrichtung, Elektrodenglied für eine Plasmabehandlungsvorrichtung, Verfahren zum Herstellen eines Elektrodenglieds und Recycling-Verfahren Plasma treating apparatus, electrode member for a plasma treatment apparatus, method for manufacturing an electrode member and recycling process |
| 06/11/2008 | EP1930720A1 Sample inspection method, sample inspection apparatus, and sample holder |
| 06/11/2008 | EP1929621A1 Movement platform for carrier with 5 degrees of freedom |
| 06/11/2008 | EP1929505A1 Detector for electron column and method for detecting electrons for electron column |
| 06/11/2008 | EP1929504A1 Method for changing energy of electron beam in electron column |
| 06/11/2008 | CN201072741Y Acoustic control light emitting diode loop induction lamp |
| 06/11/2008 | CN101199036A Confined plasma with adjustable electrode area ratio |
| 06/11/2008 | CN101197271A Gas injection apparatus |
| 06/11/2008 | CN101197270A Gas distribution apparatus |
| 06/11/2008 | CN101197249A Reaction cavity lining and reaction cavity including the same |
| 06/11/2008 | CN101197241A A method of implanting a substrate and an ion implanter for performing the method |
| 06/11/2008 | CN101197239A Hall type ion source |
| 06/11/2008 | CN100394543C Gas supply member and plasma processing apparatus |
| 06/11/2008 | CN100394535C High-density plasma processing apparatus |
| 06/10/2008 | US7385209 Micromachining process, system and product |
| 06/10/2008 | US7385208 Systems and methods for implant dosage control |
| 06/10/2008 | US7385207 Movable inclination-angle measuring apparatus for ion beam, and method of use |
| 06/10/2008 | US7385206 Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method |
| 06/10/2008 | US7385205 Method and device for aligning a charged particle beam column |
| 06/10/2008 | US7385198 Method and apparatus for measuring the physical properties of micro region |
| 06/10/2008 | US7385196 Method and scanning electron microscope for measuring width of material on sample |
| 06/10/2008 | US7385195 Semiconductor device tester |
| 06/10/2008 | US7385194 Charged particle beam application system |
| 06/10/2008 | US7385183 Substrate processing apparatus using neutralized beam and method thereof |
| 06/10/2008 | US7384876 Method and apparatus for determining consumable lifetime |
| 06/10/2008 | US7384875 Method of manufacturing semiconductor device using flexible tube |
| 06/10/2008 | US7384710 Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device |
| 06/10/2008 | US7384696 Corrosion resistant member and method for manufacturing the same |
| 06/05/2008 | WO2008067563A2 Adaptive controller for ion source |
| 06/05/2008 | WO2008067213A2 Techniques for low temperature ion implantation |
| 06/05/2008 | WO2008065635A2 A plasma system and measurement method |
| 06/05/2008 | WO2008042647A3 Technique for improved damage control in a plasma doping (plad) ion implantation |
| 06/05/2008 | US20080131336 For film formation, etching, surface modification, organic contamination removal, cleaning, hydrophobicity, hydrophilicity; includes a pair of parallel long-sized electrodes, in which processing gas is introducing from an opening, plasma thus generated is blown off the electrodes from another opening |
| 06/05/2008 | US20080129180 Ion sources for ion implantation apparatus |
| 06/05/2008 | US20080128640 Partial ion implantation apparatus and method using bundled beam |
| 06/05/2008 | US20080128639 Ion implantation apparatus and method for obtaining non-uniform ion implantation energy |
| 06/05/2008 | US20080128634 Method and apparatus for surface potential reflection electron mask lithography |
| 06/05/2008 | US20080128089 Plasma processing apparatus |
| 06/05/2008 | DE19628952B4 Vorrichtung zur Erzeugung von Plasma A device for generating plasma |
| 06/05/2008 | DE102007058103A1 High energy ion beam precision modifies the profile or surface micro-roughness of an optical lens or mirror used in micro-lithography |
| 06/05/2008 | DE102007056242A1 Pattern e.g. mask, writing device for use on target workpiece, has deflection plate to deflect electron beam with charged particles based on electron beam irradiation time, and aperture to block deflection of electron beam by plate |
| 06/04/2008 | EP1928017A1 Plasma reactor substrate mounting surface texturing |
| 06/04/2008 | EP1928010A1 Magnetic confinement of a plasma |
| 06/04/2008 | EP1928009A1 Arc detection system, plasma power supply and arc detection method |
| 06/04/2008 | EP1927124A2 Method and device for the plasma treatment of the interior of hollow bodies |
| 06/04/2008 | EP1926840A1 Apparatus and process for surface treatment of substrate using an activated reactive gas |
| 06/04/2008 | CN101194340A Improvement of etch rate uniformity using the independent movement of electrode pieces |
| 06/04/2008 | CN101194339A Gas controlling device |
| 06/04/2008 | CN101194338A Hihg frequency-plasma source with plurality of out-of-phase electrodes |
| 06/04/2008 | CN101194337A Particle detector for secondary ions and direct and or indirect secondary electrons |
| 06/04/2008 | CN101192511A Vacuum processing device |
| 06/04/2008 | CN101192500A Hollow type cathode discharging device |
| 06/04/2008 | CN101192499A Ion implantation apparatus |
| 06/04/2008 | CN101192497A Ion source |
| 06/04/2008 | CN101192490A Surface conductive electronic emission element and electronic source applying same |
| 06/04/2008 | CN101191776A Focused ion beam microscope sample stage and method of use thereof |
| 06/04/2008 | CN100392839C Method for monitoring ion disposing process |
| 06/04/2008 | CN100392824C Method and apparatus for generating gas plasma and method of manufacturing semiconductor |
| 06/04/2008 | CN100392804C Semiconductor processing equipment having tiled ceramic liner |
| 06/04/2008 | CN100392800C Plasma chamber having multiple RF source frequencies |
| 06/04/2008 | CN100392792C Linear drive system for use in plasma processing system |
| 06/04/2008 | CN100392791C Techniques for improving etch rate uniformity |
| 06/03/2008 | US7382711 Method and apparatus for constant linear velocity electron beam substrate processing |
| 06/03/2008 | US7382098 Plasma producing apparatus and doping apparatus |
| 06/03/2008 | US7381978 Contact opening metrology |
| 06/03/2008 | US7381977 Ion beam profiler |
| 06/03/2008 | US7381976 Monochromatic fluid treatment systems |
| 06/03/2008 | US7381969 Load lock control |
| 06/03/2008 | US7381968 Charged particle beam apparatus and specimen holder |
| 06/03/2008 | US7381967 Non-axisymmetric charged-particle beam system |
| 06/03/2008 | US7381950 Characterizing dimensions of structures via scanning probe microscopy |
| 06/03/2008 | US7381949 Method and apparatus for simultaneously depositing and observing materials on a target |
| 06/03/2008 | US7381943 Neutral particle beam processing apparatus |
| 06/03/2008 | US7381661 Method for the production of a substrate with a magnetron sputter coating and unit for the same |
| 06/03/2008 | US7381657 Biased pulse DC reactive sputtering of oxide films |
| 06/03/2008 | US7381650 Method and apparatus for process control in time division multiplexed (TDM) etch processes |
| 06/03/2008 | US7381311 Filtered cathodic-arc plasma source |
| 06/03/2008 | US7381292 Inductively coupled plasma generating apparatus incorporating serpentine coil antenna |
| 06/03/2008 | US7381290 Microwave plasma generator |