| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/02/2008 | EP1939924A2 Electron beam physical vapor deposition apparatus and processes |
| 07/02/2008 | EP1939923A2 Specimen holder for electron microscope |
| 07/02/2008 | EP1939321A1 Sputtering apparatus and film forming method |
| 07/02/2008 | EP1843863A4 Method and apparatus for cleaning and surface conditioning objects with plasma |
| 07/02/2008 | CN100399516C Method for etching medium material |
| 07/02/2008 | CN100399014C Electronic microscope with high time resolution |
| 07/01/2008 | US7394640 Electrostatic chuck and substrate fixing method using the same |
| 07/01/2008 | US7394202 Ion implantation system and control method |
| 07/01/2008 | US7394080 Mask superposition for multiple exposures |
| 07/01/2008 | US7394079 Architecture for ribbon ion beam ion implanter system |
| 07/01/2008 | US7394075 Preparation of integrated circuit device samples for observation and analysis |
| 07/01/2008 | US7394071 Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate |
| 07/01/2008 | US7394068 Mask inspection apparatus, mask inspection method, and electron beam exposure system |
| 07/01/2008 | US7393765 Low temperature CVD process with selected stress of the CVD layer on CMOS devices |
| 07/01/2008 | US7393561 Depositing material on substrate by atomic layer processing including injecting series of gases sequentially into reactant chamber without purging one gas from chamber prior to injection of another gas |
| 07/01/2008 | US7392760 Microwave-excited plasma processing apparatus |
| 06/26/2008 | WO2008077018A1 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 06/26/2008 | WO2008076629A2 Inductively-coupled plasma source |
| 06/26/2008 | WO2008075960A1 Plasma generator and method for cleaning an object |
| 06/26/2008 | WO2008074604A1 Device and method for generating a plasma beam |
| 06/26/2008 | WO2008074404A1 Sputtering target arrangement |
| 06/26/2008 | WO2008074312A2 Arrangement and method for the removal of contaminants or modification of surfaces of substrates by means of electric arc discharge |
| 06/26/2008 | WO2008074302A1 Electron microscope and a method for measuring the defocus variation or the limit resolution |
| 06/26/2008 | WO2008045458A3 Sensor for ion implanter |
| 06/26/2008 | WO2008039745A3 Terminal structure of an ion implanter |
| 06/26/2008 | WO2005008707A3 Improved tip for nanoscanning electron microscope |
| 06/26/2008 | US20080151237 Interferometric endpoint determination in a substrate etching process |
| 06/26/2008 | US20080150557 Charged particle beam device probe operation |
| 06/26/2008 | US20080149856 Techniques for reducing contamination during ion implantation |
| 06/26/2008 | US20080149833 Electron Microscope and Combined Illumination Lens |
| 06/26/2008 | US20080149830 Ameliorating charge trap in inspecting samples using scanning electron microscope |
| 06/26/2008 | US20080149829 Scanning probe microscope with automatic probe replacement function |
| 06/26/2008 | US20080149828 Low terahertz source and detector |
| 06/26/2008 | US20080149690 Removal of Surface Oxides by Electron Attachment for Wafer Bumping Applications |
| 06/26/2008 | DE10297788B4 Deposition apparatus for manufacturing semiconductor device, e.g. Schottky barrier metal oxide semiconductor field effect transistor, comprises first and second chambers, pumping portions, gas injecting portions, and connecting portion |
| 06/26/2008 | DE102007059994A1 Test specimen carrying method for e.g. transmission electron microscope, involves etching gripping section of test specimen-carrier mechanism with particle beam, so that gripping surface is parallel to gripping surface of test specimen |
| 06/26/2008 | DE102006061978A1 Elektronenmikroskop und Verfahren zur Messung der Defokusstreuung Electron microscope and method for measuring the defocus |
| 06/26/2008 | DE102006059162A1 Teilchenoptische Anordnung Particle-optical arrangement |
| 06/25/2008 | EP1936953A2 A tdi detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus |
| 06/25/2008 | EP1936659A1 Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers |
| 06/25/2008 | EP1936658A2 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 06/25/2008 | EP1936657A2 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 06/25/2008 | EP1936656A1 Plasma generator and method for cleaning an object |
| 06/25/2008 | EP1936655A2 Methods and apparatus for alignment of ion beam systems using beam current sensors |
| 06/25/2008 | EP1936653A1 Gas field ion source for multiple applications |
| 06/25/2008 | EP1936363A2 Sample inspection apparatus, sample inspection method, and sample inspection system |
| 06/25/2008 | EP1935000A1 A method to deposit a coating by sputtering |
| 06/25/2008 | EP1933992A2 Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation |
| 06/25/2008 | CN101208767A A module for coating both sides of a substrate in a single pass |
| 06/25/2008 | CN101207061A Substrate mounting table and method for manufacturing same, substrate processing apparatus, and fluid supply mechanism |
| 06/25/2008 | CN101207014A Method and apparatus for preventing arcing at ports exposed to a plasma in plasma processing chambers |
| 06/25/2008 | CN101207003A Inner lining of wafer processing chamber and wafer processing chamber containing said inner lining |
| 06/25/2008 | CN101207001A Exhaust device and reaction chamber containing the same |
| 06/25/2008 | CN101206999A Inner lining and reaction chamber containing the same |
| 06/25/2008 | CN101206990A Method for detecting plasma distribution density in responses chamber |
| 06/25/2008 | CN101204904A Method of producing colored 3D concrete graphic in transparent or semi-transparent solid material |
| 06/25/2008 | CN100397589C Plasma etching chamber and plasma etching system using same |
| 06/25/2008 | CN100397588C Plasma processing device |
| 06/25/2008 | CN100397578C Ion implantation apparatus and method for implanting ions by using the same |
| 06/25/2008 | CN100397572C Electronic beam focusing equipment and electronic beam projection micro shadow system using the same equipment |
| 06/25/2008 | CN100397570C Vacuum processing apparatus and method operation thereof |
| 06/25/2008 | CN100397567C Plasma reaction chamber |
| 06/25/2008 | CN100397550C Swinging retarding immersion type lens electron optics focusing, deflection and signal collection system |
| 06/25/2008 | CN100397549C System and method for fast focal length alterations |
| 06/25/2008 | CN100396814C Device for connecting energy and medium of coating means with a plurality of cavities |
| 06/25/2008 | CN100396812C Method for connecting magnetic substance target to backing plate, and magnetic substance target |
| 06/24/2008 | US7391599 Low voltage modular room ionization system |
| 06/24/2008 | US7391039 Semiconductor processing method and system |
| 06/24/2008 | US7391038 Technique for isocentric ion beam scanning |
| 06/24/2008 | US7391037 Apparatus for generating a plurality of beamlets |
| 06/24/2008 | US7391023 Lithography tool image quality evaluating and correcting |
| 06/24/2008 | US7389741 Apparatus of fabricating a display device |
| 06/19/2008 | WO2008073747A1 Techniques for confining electrons in an ion implanter |
| 06/19/2008 | WO2008071303A2 Particle-optical arrangement |
| 06/19/2008 | US20080147229 Method And Apparatus For Monitoring A Microstructure Etching Process |
| 06/19/2008 | US20080144472 Electron beam recorder and electron beam irradiation position detecting method |
| 06/19/2008 | US20080143260 Vacuum Plasma Generator |
| 06/19/2008 | US20080142931 Method of Impurity Introduction, Impurity Introduction Apparatus and Semiconductor Device Produced with Use of the Method |
| 06/19/2008 | US20080142733 Substrate processing apparatus and method |
| 06/19/2008 | US20080142712 Defect inspection and charged particle beam apparatus |
| 06/19/2008 | US20080142702 Gas field ion source for multiple applications |
| 06/19/2008 | US20080142359 Self-ionized and capacitively-coupled plasma for sputtering and resputtering |
| 06/19/2008 | US20080141764 Method of observing and method of working diamond stylus for working of atomic force microscope |
| 06/18/2008 | EP1933364A2 Method and apparatus for preventing arcing at ports exposed to a plasma in plasma processing chambers |
| 06/18/2008 | EP1933363A2 A plasma reactor control by translating desired values of M Plasma Parameters to values of N Chamber Parameters |
| 06/18/2008 | EP1933362A1 Arc detection system, plasma power supply and arc detection method |
| 06/18/2008 | EP1933361A2 Device and method for measurement of beam angle and divergence normal to plane of scanned beam or ribbon beam |
| 06/18/2008 | EP1932166A2 Ultraviolet radiation lamp and source module and treatment system containing same |
| 06/18/2008 | EP1931813A2 Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths |
| 06/18/2008 | CN101203935A Sputtering magnetron |
| 06/18/2008 | CN101203934A System and method for analyzing power flow in semiconductor plasma generation systems |
| 06/18/2008 | CN101203933A Profile adjustment in plasma ion implanter |
| 06/18/2008 | CN101203932A Methods and apparatus for transient state interference recovery in stationary-beam ion implantation process using fast ion beam control |
| 06/18/2008 | CN101202206A Reaction chamber inner lining and reaction chamber containing the inner lining |
| 06/18/2008 | CN101202197A Ionization arrangement |
| 06/18/2008 | CN101201595A Plasma reactor control by translating desired values of m plasma parameters to values of n chamber parameters |
| 06/18/2008 | CN100395790C Method for speculating traffic state by flowing car data and systme for speculating and providing traffic state |
| 06/17/2008 | US7389203 Method and apparatus for deciding cause of abnormality in plasma processing apparatus |
| 06/17/2008 | US7388217 Particle-optical projection system |
| 06/17/2008 | US7388216 Pattern writing and forming method |