Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2008
07/17/2008WO2008085405A1 Method of reducing particle contamination for ion implanters
07/17/2008WO2008084537A1 Electron gun and electron beam exposure device
07/17/2008WO2008084212A2 Apparatus support structure
07/17/2008WO2008084202A2 Apparatus support
07/17/2008WO2008067563A3 Adaptive controller for ion source
07/17/2008WO2008042585A3 Multi-purpose electrostatic lens for an ion implanter system
07/17/2008WO2007067318A3 Ion sources, systems and methods
07/17/2008DE112006002412T5 Ionenquelle und Plasma-Bearbeitungsvorrichtung Ion source and plasma processing apparatus
07/17/2008DE10242538B4 Verfahren zur Regelung der Elektronenstrahlleistung von Elektronenquellen Method for controlling the electron beam power of electron sources
07/17/2008DE10235981B4 Teilchenoptische Vorrichtung und Elektronenmikroskop A particle-optical and electron microscope
07/17/2008DE102008003114A1 Evaporating material evaporating method, involves utilizing energy supplied from outside for evaporation of material, and increasing energy of steam particles of evaporating material by supplying plasma, which is produced by magnetron
07/17/2008DE102005061663B4 Ionenimplantationsvorrichtung An ion implantation apparatus
07/16/2008EP1944790A2 Improvements relating to ion implanters
07/16/2008EP1944388A1 Magnet structure for magnetron sputtering system, cathode electrode unit and magnetron sputtering system
07/16/2008EP1944387A1 System and method for restoring or regenerating an article
07/16/2008EP1943662A1 Lithography system, sensor and measuring method
07/16/2008EP1943661A1 Charged particle inspection method and charged particle system
07/16/2008EP1943660A1 Charged particle beam exposure system
07/16/2008EP1943561A1 Lithography system and projection method
07/16/2008EP1358363B1 Diamond coatings on reactor wall and method of manufacturing thereof
07/16/2008EP1190434B1 Real-time prediction of proximity resist heating and correction of raster scan electron beam lithography
07/16/2008CN101223624A Ion source and plasma processing device
07/16/2008CN101222814A Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor
07/16/2008CN101222813A Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor
07/16/2008CN101221905A Silicon slice etching equipment
07/16/2008CN101221904A Silicon slice etching equipment and method for controlling cavity top cover lifting
07/16/2008CN101221882A Adapter of transmission electron microscope example bench, its substrate and manufacturing method thereof
07/16/2008CN101221881A Impedance matching method and device
07/16/2008CN101221356A Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution
07/16/2008CN101221245A Correlated measuring method for ion average velocity of orienting plasma beam
07/16/2008CN101221106A Nano material drawing device in scanning electron microscope driven by piezoelectric ceramic piece
07/16/2008CN101221105A Stress test grid of nano material used for transmission electron microscopy
07/16/2008CN100402697C Device for carrying out a plasma-assisted process
07/15/2008US7400839 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device
07/15/2008US7399987 Planar electron emitter (PEE)
07/15/2008US7399980 Systems and methods for beam angle adjustment in ion implanters
07/15/2008US7399966 Scanning electron microscope
07/15/2008US7399965 Method of detecting array of liquid crystal display and apparatus thereof
07/15/2008US7399964 Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system
07/15/2008US7399385 Alternating current rotatable sputter cathode
07/15/2008US7399154 Vacuum processing system being able to carry process object into and out of vacuum chamber
07/10/2008WO2008083301A1 Apparatus and method for plasma arc coating
07/10/2008WO2008083023A1 Method and apparatuses for providing electrical contact for plasma processing applications
07/10/2008WO2008083020A2 Technique for using an improved shield ring in plasma-based ion implantation
07/10/2008WO2008082000A1 Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure
07/10/2008WO2008080244A1 Method for the production of a directional layer by means of cathode sputtering, and a device for carrying out the method
07/10/2008WO2008061603A3 Phase plate, image producing method and electron microscope
07/10/2008WO2008059070A3 Method for regulating nanoscale electron beam induced depositions
07/10/2008WO2008058491A3 Scanning electron microscope
07/10/2008US20080164408 Power Supply for an Ion Implantation System
07/10/2008DE112006001555T5 Ladungspartikel-Strahlvorrichtung und Verfahren zum Erzeugen eines Ladungspartikel-Strahlabbilds Charged particle beam device and method for generating a charged particle beam image,
07/10/2008DE10235456B4 Elektronenmikroskopiesystem Electron system
07/10/2008DE102008003943A1 Ionenstrahlbereitstellungsvorrichtung Ion beam delivery apparatus
07/10/2008DE102007033443A1 Method for determining the extension of cross-section of electron beam, involves deviating electron beam along axis by deviation device and determining proportionality factor between deviation current of device and deviation course
07/09/2008EP1941531A2 Electron-optical corrector for an aplanatic imaging system
07/09/2008EP1941530A2 Beam blanker driver system and method
07/09/2008EP1941529A2 Electrostatic deflection system with impedance matching for high positioning accuracy
07/09/2008EP1941528A2 Particle -optical component
07/09/2008EP1941527A2 Electron beam source for use in electron gun
07/09/2008EP1941157A2 Microwave combustion system for internal combustion engines
07/09/2008EP1941071A2 Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof
07/09/2008CN201083670Y Transmission electron microscope one-dimensional nano material test slide
07/09/2008CN101218658A Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery
07/09/2008CN101217097A A transmission electron microscope measurement support grid based on phase change materials
07/09/2008CN101217096A A quick RF automatic impedance matching method
07/09/2008CN100401491C Envelope follower end point detection in time division multiplexed processes
07/09/2008CN100401481C Plasma processing method and apparatus
07/09/2008CN100401471C Plasma processing chamber, potential controlling apparatus, method, program and storage medium
07/09/2008CN100401451C Dual frequency plasma etch reactor with independent plasma density/chemistry and ion energy control
07/09/2008CN100401450C Hollow anode plasma reactor and method
07/09/2008CN100401449C A method of implanting a substrate and an ion implanter for performing the method
07/09/2008CN100401013C Displacement meter and displacement measuring method
07/08/2008US7397052 Method and apparatus for specimen fabrication
07/08/2008US7397051 Method and apparatus for specimen fabrication
07/08/2008US7397050 Method and apparatus for specimen fabrication
07/08/2008US7397047 Technique for tuning an ion implanter system
07/08/2008US7397046 Method for implanter angle verification and calibration
07/08/2008US7397040 Lithographic apparatus, device manufacturing method, and device manufactured thereby
07/08/2008US7397031 Method of inspecting a circuit pattern and inspecting instrument
07/08/2008US7397030 Integrated local and global optical metrology for samples having miniature features
07/08/2008US7396746 Methods for stable and repeatable ion implantation
07/08/2008US7396481 Etching method of organic insulating film
07/08/2008US7396480 Method for front end of line fabrication
07/08/2008US7396432 Composite shadow ring assembled with dowel pins and method of using
07/08/2008US7395779 Plasma processing apparatus
07/03/2008WO2008080002A2 Method of diffusion-bond powder metallurgy sputtering target
07/03/2008WO2008079921A1 Ion implantation with a collimator magnet and a neutral filter magnet
07/03/2008WO2008078636A1 Ion injecting device, and ion injecting method
07/03/2008WO2008078161A2 Computerized plant for producing structures made of resin, composites, or the like
07/03/2008WO2008058246A3 Ion implantation device with a dual pumping mode and method thereof
07/03/2008WO2008042664A3 Technique for improved ion beam transport
07/03/2008US20080160789 Laser patterning of encapsulated organic light emitting diodes
07/03/2008US20080158537 Optical switching in lithography system
07/03/2008US20080158536 Optical switching in lithography system
07/03/2008US20080157007 Active particle trapping for process control
07/03/2008US20080156770 Method of Fabricating Grabbing Face of Sample Grabbing Portion
07/03/2008US20080156441 Plasma processing apparatus and electrode plate, electrode supporting body, and shield ring thereof
07/03/2008US20080156440 Surface processing apparatus
07/03/2008DE112005000720T5 Verfahren und Vorrichtung zur Ionenfragmentierung durch Elektroneneinfang Method and apparatus for ion fragmentation by electron
07/02/2008EP1939925A1 Cathodic arc evaporation device and method of igniting said arc