Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2008
08/07/2008US20080185952 Apparatus for Producing Secondary Electrons, a Secondary Electrode, and an Acceleration Electrode
08/07/2008US20080185537 In situ surface contamination removal for ion implanting
08/07/2008US20080184934 Plasma reactor for the treatment of large size substrates
08/06/2008EP1953798A2 Process kit for substrate processing chamber
08/06/2008EP1953797A2 A method of processing workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
08/06/2008EP1953796A2 Plasma reactor with ion distribution uniformity controller employing plural VHF sources
08/06/2008EP1953795A2 Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
08/06/2008EP1953793A1 Specimen holder, specimen inspection apparatus, specimen inspection method, and method of fabricating specimen holder
08/06/2008EP1953792A2 Apparatus for observing a sample with a particle beam and an optical microscope
08/06/2008EP1953791A1 Apparatus for observing a sample with a particle beam and an optical microscope
08/06/2008EP1953790A1 Method for thinning a sample and sample carrier for performing said method
08/06/2008EP1953789A1 Method for thinning a sample and sample carrier for performing said method
08/06/2008EP1953124A1 Graphite member for beam-line internal member of ion implantation apparatus
08/06/2008EP1951407A1 Microwave plasma abatement apparatus
08/06/2008CN201096521Y Non-contact type plasma temperature and electron density measuring apparatus
08/06/2008CN101238540A Methods and apparatus for incorporating nitrogen in oxide films
08/06/2008CN101238539A Dose cup located near bend in final energy filter of serial implanter for closed loop dose control
08/06/2008CN101238538A Beam stop and beam tuning methods
08/06/2008CN101236892A Ion beam apparatus having plasma sheath controller
08/06/2008CN101236891A Plasma processing device
08/06/2008CN101236888A Vaccuum processing apparatus
08/06/2008CN100409726C Plasma processing device
08/06/2008CN100409446C Image pickup device and manufacturing method thereof
08/06/2008CN100409414C Gas switching device, gas supply source system, method for control gas flow and method for etching silicon
08/05/2008US7408643 Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples
08/05/2008US7408329 Power supply unit for gas discharge processes
08/05/2008US7408225 Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms
08/05/2008US7408186 Controlled alignment catalytically grown nanostructures
08/05/2008US7408178 Method for the removal of a microscopic sample from a substrate
08/05/2008US7408175 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
08/05/2008US7408172 Charged particle beam apparatus and charged particle beam irradiation method
08/05/2008US7407565 Method and apparatus for ionized plasma deposition
08/05/2008US7406925 Plasma processing method and apparatus
07/2008
07/31/2008WO2008092089A1 Honeycomb structure and method of using the structure
07/31/2008WO2008091729A2 Technique for improving the performance and extending the lifetime of an ion source with gas dilution
07/31/2008WO2008090380A1 Improved particle beam generator
07/31/2008WO2008089950A1 Mems sensor for in situ tem atomic force microscopy
07/31/2008WO2008065635A3 A plasma system and measurement method
07/31/2008WO2008021654A3 Exhaust assembly for a plasma processing system and method
07/31/2008US20080179546 Ion beam apparatus having plasma sheath controller
07/31/2008US20080179536 Changed particle beam emitting device and method for adjusting the optical axis
07/31/2008US20080179518 Microreactor for a Transmission Electron Microscope and Heating Element and Method of Manufacture Thereof
07/31/2008US20080179517 Sample dimension measuring method and scanning electron microscope
07/31/2008US20080179005 Plasma processing apparatus and control method thereof
07/31/2008US20080178906 Bare aluminum baffles for resist stripping chambers
07/31/2008DE102008004568A1 Ion beam device for use in semiconductor manufacturing device, has plasma shell control unit e.g. porous material layer, with ion extraction opening that is smaller than ion extraction opening of grid structure
07/30/2008EP1950789A1 Phase plate for electron microscope, and its manufacturing method
07/30/2008EP1950786A2 Cold field emitter
07/30/2008EP1949409A1 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering
07/30/2008EP1949408A1 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering
07/30/2008EP1949407A2 Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
07/30/2008EP1949406A1 Down-stream plasma etching with deflectable plasma beam
07/30/2008EP1949405A2 Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases
07/30/2008EP1949404A2 Charged particle radiation therapy
07/30/2008EP1948846A1 Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a pet hollow body
07/30/2008EP1157454A4 Power supply with flux-controlled transformer
07/30/2008CN101233792A Plasma generator and film forming method employing same
07/30/2008CN101233598A Plasma amplifier for plasma treatment plant
07/30/2008CN101233597A Charged beam dump and particle attractor
07/30/2008CN101232770A Device for medium to block discharging plasma body jet current
07/30/2008CN101231943A Plasma processing apparatus and method
07/30/2008CN101231932A Manipulator for rotating and translating a sample holder
07/30/2008CN101231252A Method and device for eliminating energy jitter of electronic microscope electron energy loss spectrum
07/30/2008CN100407363C 在综合处理系统中用于等离子搀杂和离子注入的方法和装置 Methods and apparatus for integrated processing system, etc. In the ion doping and ion implantation
07/29/2008US7405521 Multiple frequency plasma processor method and apparatus
07/29/2008US7404991 Device and control method for micro wave plasma processing
07/29/2008US7404879 Ionized physical vapor deposition apparatus using helical self-resonant coil
07/29/2008US7404874 Method and apparatus for treating wafer edge region with toroidal plasma
07/29/2008US7404806 Hemo-aide
07/24/2008WO2008089178A2 Plasma source with liner for reducing metal contamination
07/24/2008WO2008088970A1 Technique for reducing magnetic fields at an implant location
07/24/2008WO2008087386A1 Charged particle analyser system and method
07/24/2008US20080173828 Ion implantation device and method for implanting ions
07/24/2008US20080173815 Electron beam apparatus and device production method using the electron beam apparatus
07/24/2008US20080173814 Electron beam inspection system and inspection method and method of manufacturing devices using the system
07/24/2008US20080173403 Plasma stabilization method and plasma apparatus
07/24/2008DE19643710B4 Vorrichtung zur Versorgung eines Verbrauchers mit einer gepulsten elektrischen Spannung für eine Werkstückbehandlung in einer Gasentladung Device for supplying a consumer with a pulsed electric voltage for a workpiece treatment in a gas discharge
07/23/2008EP1947675A1 Manipulator for rotating and translating a sample holder
07/23/2008EP1947674A1 Electron gun, electron beam exposure system and exposure method
07/23/2008EP1946623A2 Method and device for igniting and generating an expanding diffuse microwave plasma and method and device for plasma treating surfaces and substances by using this plasma
07/23/2008EP1946351A2 Ion implanter with contaminant collecting surface
07/23/2008EP1945832A1 Dual mode ion source for ion implantation
07/23/2008EP1620915A4 Plasma production device and method and rf driver circuit with adjustable duty cycle
07/23/2008EP1341718B1 Method and device for electronic cyclotron resonance plasma deposit of single-wall carbon nanotubes and resulting nanotubes
07/23/2008EP1192637B1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers
07/23/2008EP0995345B1 Gas excitation device with surface wave plasma
07/23/2008CN101228618A Method and apparatus for process control in time division multiplexed (TDM) etch processes
07/23/2008CN101228608A Maskless lithography system with improved reliability
07/23/2008CN101227790A Plasma jet apparatus
07/23/2008CN101226120A Micro drafting device for testing test piece material nano metric mechanical properties
07/23/2008CN100405878C Plasma etching device
07/23/2008CN100405557C Plasma treatment device
07/23/2008CN100405537C Plasma reaction device
07/23/2008CN100405533C Microwave-excited plasma processing apparatus
07/23/2008CN100405526C Ion implantation apparatus and method
07/22/2008US7403089 Magnet assemblies
07/22/2008US7402821 Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase
07/22/2008US7402820 Ion beam contamination determination
07/22/2008US7402350 Highly tetrahedral amorphous carbon coatings and systems and methods for their production
07/17/2008WO2008086527A2 Electron beam lithography method and apparatus using a dynamically controlled photocathode