| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/26/2008 | US7417235 Particle detector for secondary ions and direct and or indirect secondary electrons |
| 08/26/2008 | US7417234 Spatial-phase locking of energy beams for determining two-dimensional location and beam shape |
| 08/26/2008 | US7415940 Plasma processor |
| 08/21/2008 | WO2008101254A2 Power source arrangement for multiple-target sputtering system |
| 08/21/2008 | WO2008100824A1 Multi-step plasma doping with improved dose control |
| 08/21/2008 | WO2008100318A1 Current-based method and apparatus for detecting and classifying arcs |
| 08/21/2008 | WO2008100139A1 Substrate plasma treatment using magnetic mask device |
| 08/21/2008 | WO2008099501A1 Electronic microscope, and observing method |
| 08/21/2008 | WO2008099220A2 Methods and apparatus for forming diamond-like coatings |
| 08/21/2008 | WO2008099218A1 Ion beam accelerating apparatus with electrodes mounted in a movable mount |
| 08/21/2008 | WO2008078161A3 Computerized plant for producing structures made of resin, composites, or the like |
| 08/21/2008 | WO2008058491B1 Scanning electron microscope |
| 08/21/2008 | WO2007146322A3 Magnetic analyzer apparatus and method for ion implantation |
| 08/21/2008 | US20080201091 Sample electrification measurement method and charged particle beam apparatus |
| 08/21/2008 | US20080198467 Standard Component For Length Measurement, Method For Producing The Same, and Electron Beam Metrology System Using The Same |
| 08/21/2008 | US20080197295 Device And Method For Producing Resist Profiled Elements |
| 08/21/2008 | US20080197281 Electron Microscopic Method and Electron Microscope Using Same |
| 08/21/2008 | US20080197017 Target/Backing Plate Constructions, and Methods of Forming Them |
| 08/21/2008 | US20080196829 Processes for chemically affecting reactive materials with X-rays |
| 08/21/2008 | DE102007007923A1 Phasenschiebendes Element und Teilchenstrahlgerät mit phasenschiebenden Element Phase shift end element and particle beam with phase-shifting element |
| 08/21/2008 | DE10120405B4 Vorrichtung zur Erzeugung eines Niedertemperatur-Plasmas An apparatus for generating a low temperature plasma |
| 08/20/2008 | EP1959475A2 Phase shifting element and particle beam device with phase shifting element |
| 08/20/2008 | EP1958232A1 Medium pressure plasma system for removal of surface layers without substrate loss |
| 08/20/2008 | EP1958231A1 Corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration |
| 08/20/2008 | EP1958227A1 Radiation lamp and radiation source module incorporating same |
| 08/20/2008 | EP1559124A4 Method and apparatus for stabilizing of the glow plasma discharges |
| 08/20/2008 | EP1323338A4 Electrode for glow-discharge atmospheric plasma treatment |
| 08/20/2008 | EP1225794B1 Matching device and plasma processing apparatus |
| 08/20/2008 | EP1095393B1 System and method to correct for distortion caused by bulk heating in a substrate |
| 08/20/2008 | CN101248707A Method and apparatus for creating a plasma |
| 08/20/2008 | CN101248507A Selection of wavelenghts for end point in a time division multiplexed process |
| 08/20/2008 | CN101248506A Method of treating a gas stream |
| 08/20/2008 | CN101248505A Apparatus and method for controlled particle beam manufacturing |
| 08/20/2008 | CN101248207A Adhesive containing powder-fiber |
| 08/20/2008 | CN101246964A Stainless steel double-polar plate surface modifying method for proton exchange film fuel battery |
| 08/20/2008 | CN101246809A Monitoring coupon and monitoring method for ion implantation technique |
| 08/20/2008 | CN100412560C Imaging device and method |
| 08/19/2008 | US7414355 Charged particle beam extraction and formation apparatus |
| 08/19/2008 | US7414250 Cryogenic variable temperature vacuum scanning tunneling microscope |
| 08/19/2008 | US7414249 Broad energy-range ribbon ion beam collimation using a variable-gradient dipole |
| 08/19/2008 | US7413998 Biased pulse DC reactive sputtering of oxide films |
| 08/19/2008 | US7413872 comprising an environmental chamber, a holder for a sample or a carrier, and at least one blotting element to which a medium for absorbing liquid is or can be attached, both disposed in the environmental chamber, and a cooling medium |
| 08/19/2008 | US7413673 Method for adjusting voltage on a powered Faraday shield |
| 08/19/2008 | US7413639 Energy and media connection for a coating installation comprising several chambers |
| 08/14/2008 | WO2008098084A1 High pressure charged particle beam system |
| 08/14/2008 | WO2008076629A3 Inductively-coupled plasma source |
| 08/14/2008 | WO2008034092A8 System and method for detecting non-cathode arcing in a plasma generation apparatus |
| 08/14/2008 | WO2006050495A3 Method and apparatus for the automated process of in-situ lift-out |
| 08/14/2008 | US20080194086 Method of Introducing Impurity |
| 08/14/2008 | US20080193684 Method for Producing Grained Plastic Moldings and Plastic Moldings |
| 08/14/2008 | US20080191153 System For Delivery Of Reagents From Solid Sources Thereof |
| 08/14/2008 | US20080191151 Method and apparatus for specimen fabrication |
| 08/14/2008 | US20080191144 Non-axisymmetric charged-particle beam system |
| 08/13/2008 | EP1956645A1 Shower plate and plasma treatment apparatus using shower plate |
| 08/13/2008 | EP1956634A1 Method and apparatus for in-situ sample preparation |
| 08/13/2008 | EP1956633A2 Particle-optical apparatus for simultaneous observing a sample with particles and photons |
| 08/13/2008 | EP1956632A1 Particle-optical apparatus for simultaneous observing a sample with particles and photons |
| 08/13/2008 | EP1956631A2 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
| 08/13/2008 | EP1956630A1 Achromatic mass separator |
| 08/13/2008 | EP1955357A1 Ion implantation beam angle calibration |
| 08/13/2008 | EP1955356A2 Ion sources, systems and methods |
| 08/13/2008 | EP1955355A2 Ion sources, systems and methods |
| 08/13/2008 | EP1955354A2 Ion sources, systems and methods |
| 08/13/2008 | EP1955353A2 Ion sources, systems and methods |
| 08/13/2008 | EP1955352A2 Means to establish orientation of ion beam to wafer and correct angle errors |
| 08/13/2008 | EP1955350A2 Ion sources, systems and methods |
| 08/13/2008 | EP1955349A2 Ion sources, systems and methods |
| 08/13/2008 | EP1955348A2 Ion sources, systems and methods |
| 08/13/2008 | EP1474264A4 A plasma processing apparatus and method |
| 08/13/2008 | EP1444726A4 Method and apparatus for the etching of photomask substrates using pulsed plasma |
| 08/13/2008 | EP1386522A4 Rf power process apparatus and methods |
| 08/13/2008 | EP1190436B1 Plasma processor with coil responsive to variable amplitude rf envelope |
| 08/13/2008 | EP1125317B1 Chamber liner for semiconductor process chambers |
| 08/13/2008 | EP1092229B1 Multiple coil antenna for inductively-coupled plasma generation systems |
| 08/13/2008 | CN101243536A Non-intrusive plasma monitoring system for arc detection and prevention for blanket CVD films |
| 08/13/2008 | CN101243535A Optical emission interferometry for PECVD using a gas injection hole |
| 08/13/2008 | CN101243534A Microwave plasma reactor |
| 08/13/2008 | CN101243533A Thermal management of inductively coupled plasma reactors |
| 08/13/2008 | CN101243532A Detector for electron column and method for detecting electrons for electron column |
| 08/13/2008 | CN101243531A Method for changing energy of electron beam in electron column |
| 08/13/2008 | CN101241846A Techniques for improving etch rate uniformity |
| 08/13/2008 | CN101241845A Silicon parts for plasma reaction chamber |
| 08/13/2008 | CN101241844A In-situ dry clean chamber for front end of line fabrication |
| 08/13/2008 | CN101241829A 转换的均匀性控制 Conversion uniformity control |
| 08/13/2008 | CN101241026A Particle-optical apparatus for simultaneous observing a sample with particles and photons |
| 08/13/2008 | CN100411118C High pressure wafer-less auto clean for etch applications |
| 08/13/2008 | CN100411088C Apparatus using hybrid coupled plasma |
| 08/13/2008 | CN100410421C Duo-step plasma cleaning of chamber residues |
| 08/12/2008 | US7411192 Focused ion beam apparatus and focused ion beam irradiation method |
| 08/12/2008 | US7411191 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 08/12/2008 | US7411190 Inspection system, inspection method, and process management method |
| 08/12/2008 | US7411188 Method and system for non-destructive distribution profiling of an element in a film |
| 08/12/2008 | US7410552 Electron cyclotron resonance equipment with variable flare angle of horn antenna |
| 08/07/2008 | WO2008093676A1 E-gun deposition device and film formation method using e-gun deposition device |
| 08/07/2008 | WO2008092936A2 Method and apparatus for measuring process parameters of a plasma etch process |
| 08/07/2008 | WO2008073734A3 Magnetic monitoring of a faraday cup for an ion implanter |
| 08/07/2008 | WO2008073734A2 Magnetic monitoring of a faraday cup for an ion implanter |
| 08/07/2008 | WO2008069766A3 Apparatus and method for surface finishing of metals and metalloids, metal oxides and metalloid oxides, and metal nitrides and metalloid nitrides |
| 08/07/2008 | WO2008054949A3 Oxygen conditioning of plasma vessels |
| 08/07/2008 | WO2007097920A3 High sensitivity slitless ion source mass spectrometer for trace gas leak detection |