| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/10/2008 | CN201112359Y Gas flow guiding device and etching system with the same |
| 09/10/2008 | CN201112325Y Xenon feeding device |
| 09/10/2008 | CN101263575A Method for operating a pulsed arc source |
| 09/10/2008 | CN101261952A Substrate carrying bench and substrate treatment device |
| 09/10/2008 | CN101261933A Vacuum container, pressure-resisting containing and sealing method thereof |
| 09/10/2008 | CN101261206A Material nanometer dynamic performance test two freedom degree loading unit |
| 09/10/2008 | CN100418188C Refurbishment of a coated chamber component |
| 09/10/2008 | CN100418187C Plasma processing device, annular element and plasma processing method |
| 09/09/2008 | US7423390 Electron beam generator for multiple columns |
| 09/09/2008 | US7423277 Ion beam monitoring in an ion implanter using an imaging device |
| 09/09/2008 | US7423267 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 09/09/2008 | US7423264 Atomic force microscope |
| 09/09/2008 | US7423263 Planar view sample preparation |
| 09/09/2008 | US7422986 Deposition methods utilizing microwave excitation |
| 09/09/2008 | US7422654 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 09/09/2008 | US7421973 System and method for performing SIMOX implants using an ion shower |
| 09/04/2008 | WO2008106499A2 Rigid rf transmission line with easy removal section |
| 09/04/2008 | WO2008106448A2 Ion sources and methods of operating an electromagnet of an ion source |
| 09/04/2008 | WO2008104394A1 Method for producing a particle radiation source |
| 09/04/2008 | WO2008104393A2 Device for the field emission of particles and production method |
| 09/04/2008 | WO2008074312A3 Arrangement and method for the removal of contaminants or modification of surfaces of substrates by means of electric arc discharge |
| 09/04/2008 | US20080215260 Charged Particle Beam Apparatus |
| 09/04/2008 | US20080213504 Plasma Film-Forming Apparatus and Plasma Film-Forming Method |
| 09/04/2008 | US20080211349 Stage Mechanism, Electron Microscope Having the Stage Mechanism and Method of Controlling Positioning of Stage Mechanism |
| 09/04/2008 | US20080210888 Exposure apparatus, exposure method and device manufacturing method |
| 09/04/2008 | US20080210887 Charged Particle System |
| 09/04/2008 | US20080210883 Liquid metal ion gun |
| 09/04/2008 | US20080210869 Apparatus for observing a sample with a particle beam and an optical microscope |
| 09/04/2008 | US20080210867 Scanning Electron Microscope and Calibration of Image Distortion |
| 09/04/2008 | US20080210863 Device For Obtaining the Image and/or Spectra of Electron Energy Loss |
| 09/04/2008 | US20080210549 cyclically moving the magnetic field pattern along a sputter surface; moving substrate along sputter surface and varying an amount of material deposited per time unit; magnetron source is cyclically and phase-locked with the magnetic field pattern; reduced material flow masking |
| 09/04/2008 | US20080210548 magnetron source; producing magnetron sputter coated workpieces; a controlling magnetic field is superimposed onto the tunnel-form magnetic field; magnetic field and/or the electric field is varied under control; tunnel-shaped arc magnet field |
| 09/04/2008 | DE102008010123A1 Vielstrahl-Ablenkarray-Einrichtung für maskenlose Teilchenstrahl-Bearbeitung Multiple-beam Ablenkarray device for maskless particle beam processing |
| 09/04/2008 | DE102007010463A1 Device for field emission of particles for particle-optical device, particularly electron microscope or ion microscope, comprises particle emitter, arranged in vacuum chamber with field emitter tip for emission of particles |
| 09/04/2008 | DE102007010462A1 Method for manufacturing micro-mechanical micromechanical particle radiation source, involves fixing surface layer made of electrical semi-conducting or conducting material on surface of substrate |
| 09/04/2008 | DE102007010297A1 Field emission source i.e. field emission cathode, for use in electron beam system, has nanowires provided on substrate, and field emission structure automatically transferring emission during failure of field emission structure |
| 09/03/2008 | EP1965407A2 Transmission electron microscope provided with electronic spectroscope |
| 09/03/2008 | EP1964152A2 Sputtering targets and methods for depositing a film containing tin and niobium |
| 09/03/2008 | EP1964151A1 Method and apparatus for producing a magnetic-field system |
| 09/03/2008 | EP1964150A1 Improved sputter target utilization |
| 09/03/2008 | EP1964149A2 Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems |
| 09/03/2008 | EP1964148A2 Flourine based cleaning of an ion source |
| 09/03/2008 | EP1836718B1 Microplasma array |
| 09/03/2008 | EP0977906A4 Metered gas control in a substrate processing apparatus |
| 09/03/2008 | CN101256944A Plasma processing apparatus |
| 09/03/2008 | CN101256942A Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current |
| 09/03/2008 | CN101256940A Gas supply system and integrated unit for semiconductor manufacturing device |
| 09/03/2008 | CN101256937A Method and apparatus for controlling gas flow to a processing chamber |
| 09/03/2008 | CN101256936A Method and apparatus for controlling gas flow to a processing chamber |
| 09/03/2008 | CN101256935A Method and apparatus for controlling gas flow to a processing chamber |
| 09/03/2008 | CN100416773C Plasma processing method and apparatus |
| 09/03/2008 | CN100416772C Plasma processing apparatus |
| 09/03/2008 | CN100416759C Processing chamber, flat display device production device, plasma treatment method using same |
| 09/03/2008 | CN100416757C Plasma etching device exhaustring ring |
| 09/03/2008 | CN100416756C Plasma etching apparatus |
| 09/03/2008 | CN100416744C Chamber configuration for confining plasma |
| 09/03/2008 | CN100416414C Method for drawing sub-micron ultraviolet luminous pattern on zinc oxide film |
| 09/03/2008 | CN100415636C Method for fabricating three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstructure |
| 09/02/2008 | US7420668 Wafer surface inspection apparatus and wafer surface inspection method |
| 09/02/2008 | US7420379 Semiconductor device test method and semiconductor device tester |
| 09/02/2008 | US7420184 Particle-optical apparatus with temperature switch |
| 09/02/2008 | US7420181 Liquid metal ion gun |
| 09/02/2008 | US7420179 Electron microscope |
| 09/02/2008 | US7420168 Scanning electron microscope and CD measurement calibration standard specimen |
| 09/02/2008 | US7420164 Objective lens, electron beam system and method of inspecting defect |
| 09/02/2008 | US7419613 Method and device for plasma-etching organic material film |
| 09/02/2008 | US7419567 Plasma processing apparatus and method |
| 09/02/2008 | US7419566 Plasma reactor |
| 09/02/2008 | CA2471987C Plasma surface processing apparatus |
| 08/28/2008 | WO2008103453A1 Pulsed plasma system with pulsed reaction gas replenish for etching semiconductor structures |
| 08/28/2008 | WO2008102635A1 Charged particle beam apparatus and charged particle optical system adjusting method |
| 08/28/2008 | WO2008102435A1 Electron gun, electron beam exposure apparatus and electron beam exposure method |
| 08/28/2008 | WO2008102062A2 Method and arrangement for photon ablation of a target |
| 08/28/2008 | WO2008101714A2 High throughput sem tool |
| 08/28/2008 | WO2008101713A2 High throughput sem tool |
| 08/28/2008 | WO2008085107A3 Method for precoding using a block diagonal matrix |
| 08/28/2008 | WO2008036529A3 Techniques for temperature-controlled ion implantation |
| 08/28/2008 | US20080206452 Quartz component for plasma processing apparatus and restoring method thereof |
| 08/28/2008 | US20080204695 EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment |
| 08/28/2008 | US20080203330 Shielding assembly for semiconductor manufacturing apparatus and method of using the same |
| 08/28/2008 | DE10362116B4 Verfahren zur Präparation einer Probe für elektronenmikroskopische Untersuchungen, sowie dabei verwendeter Greifer A method of preparing a sample for electron microscopy, as well as used therein gripper |
| 08/28/2008 | DE102008006032A1 Ionenabtastvorrichtungen in eine Polarität schnell umschaltenden Ionenquellen Ionenabtastvorrichtungen in a fast switching polarity ion sources |
| 08/28/2008 | DE102007057950A1 Work-piece e.g. optical lens surface, holding device for e.g. ion radiating processing device, has support carrier for holding work-piece carrier in position at stop unit using elastic unit |
| 08/27/2008 | EP1962321A1 Plasma gun |
| 08/27/2008 | EP1961032A1 Ion beam angle measurement systems and methods for ion implantation systems |
| 08/27/2008 | EP1961031A1 System and method of electron beam writing |
| 08/27/2008 | EP1625610B1 Plasma ashing apparatus comprising an endpoint detection system |
| 08/27/2008 | EP0977904B1 Plasma processing system utilizing combined anode/ion source |
| 08/27/2008 | CN101253600A Ultraviolet radiation lamp and source module and treatment system containing same |
| 08/27/2008 | CN101252805A Simple atmosphere pressure suspending electrode cold plasma fluid generator |
| 08/27/2008 | CN101252073A Thermal drive deforming transmission electric mirror grid and one-dimensional nano material deforming method |
| 08/27/2008 | CN101251464A Wireless control system for micro-nano sample in electronic microscope |
| 08/27/2008 | CN101251463A Control system for micro-nano sample in electronic microscope |
| 08/27/2008 | CN100414673C Plasma apparatus |
| 08/27/2008 | CN100414672C Plasma processing method and plasma processing device |
| 08/26/2008 | US7417444 Method and apparatus for inspecting integrated circuit pattern |
| 08/26/2008 | US7417242 Method of measuring ion beam position |
| 08/26/2008 | US7417241 Ion implantation method and method for manufacturing semiconductor device |
| 08/26/2008 | US7417240 Apparatus for producing secondary electrons, a secondary electrode, and an acceleration electrode |
| 08/26/2008 | US7417236 Sheet beam-type testing apparatus |