| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/30/2008 | US7430496 Method and apparatus for using a pressure control system to monitor a plasma processing system |
| 09/30/2008 | US7429741 Faraday system and ion implantation apparatus comprising the faraday system |
| 09/30/2008 | US7429733 Method and sample for radiation microscopy including a particle beam channel formed in the sample source |
| 09/30/2008 | US7429543 Method for the production of a substrate |
| 09/30/2008 | US7429306 Plasma processing system |
| 09/25/2008 | WO2008115339A1 Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam |
| 09/25/2008 | WO2008114684A1 Energy analyzer, 2-dimensional display type energy analyzer, and photoelectron microscope |
| 09/25/2008 | WO2008114422A1 Beam drawing device |
| 09/25/2008 | WO2008113571A1 Gas distribution system |
| 09/25/2008 | WO2007109103A3 Method and system for optimizing alignment performance in a fleet of exposure tools |
| 09/25/2008 | US20080233756 Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles |
| 09/25/2008 | US20080230725 Crystallization apparatus, crystallization method, device, and light modulation element |
| 09/25/2008 | US20080230694 Beam Optical Component Having a Charged Particle Lens |
| 09/25/2008 | DE19732093B4 Korpuskularstrahlgerät Charged particle beam |
| 09/25/2008 | DE112004000057B4 Plasmabehandlungsapparat und Plasmabehandlungsverfahren Plasma processing apparatus and plasma processing method |
| 09/25/2008 | DE102008002798A1 Device for heating, melting and/or vaporizing a material in the form of metal, metal oxide, organic materials and compounds comprises an inductor for producing atoms , molecules or clusters of materials |
| 09/25/2008 | DE102004052580B4 Vorrichtung und Verfahren zum Zuführen von Vorstufengasen zu einer Implantationsanlage Apparatus and method for supplying precursor gases into a implanter |
| 09/25/2008 | DE102004039468B4 Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma An apparatus for generating excited and / or ionized particles in a plasma |
| 09/24/2008 | EP1973146A2 Gas flow diffuser |
| 09/24/2008 | EP1973141A1 Sputter cathode assembly and sputter coating device |
| 09/24/2008 | EP1973140A2 Plasma species and uniformity control through pulsed VHF operation |
| 09/24/2008 | EP1973139A2 Apparatus and method of temperature control during cleaving processes for manufacture of thick film materials |
| 09/24/2008 | EP1972185A2 Side-specific treatment of textiles using plasmas |
| 09/24/2008 | EP1971999A2 Excimer radiation lamp assembly, and source module and fluid treatment system containing same |
| 09/24/2008 | EP1971448A1 Method and apparatus for treating a surface, in particular in order to free it of impurities |
| 09/24/2008 | EP1866140A4 Device for treating surface of a polymolecular formed product |
| 09/24/2008 | EP1825491B1 Ion source with substantially planar design |
| 09/24/2008 | EP1678075A4 Etch masks based on template-assembled nanoclusters |
| 09/24/2008 | EP1057202B1 Method and device for exposing a substrate to light |
| 09/24/2008 | CN201122570Y Multi-example loading combination device of scanning electronic microscope |
| 09/24/2008 | CN201122096Y Example bench for viewing silicon slice example section |
| 09/24/2008 | CN101273431A A method to deposit a coating by sputtering |
| 09/24/2008 | CN101273430A Apparatus for the removal of a set of byproducts from a substrate edge and methods therefor |
| 09/24/2008 | CN100421214C Showerhead assembly and apparatus for manufacturing semiconductor device having the same |
| 09/24/2008 | CN100421211C Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
| 09/24/2008 | CN100421207C Plasma processor coil |
| 09/24/2008 | CN100421206C Ion beam irradiation apparatus and insulating spacer for the same |
| 09/23/2008 | US7426900 Integrated electrostatic inductive coupling for plasma processing |
| 09/18/2008 | WO2008111365A1 Scanning electron microscope having length measuring function and sample dimension length measuring method |
| 09/18/2008 | WO2008110547A1 Novel plasma system for improved process capability |
| 09/18/2008 | WO2008091729A3 Technique for improving the performance and extending the lifetime of an ion source with gas dilution |
| 09/18/2008 | WO2008080002A3 Method of diffusion-bond powder metallurgy sputtering target |
| 09/18/2008 | US20080224374 Sample holding mechanism and sample working/observing apparatus |
| 09/18/2008 | US20080224159 shaping and crosslinking thermoplastic elastomers, to form lenses or reflectors having an increased heat deflection and distortion temperature, a lower coefficient of thermal expansion and improved mechanical properties |
| 09/18/2008 | US20080223725 Process chamber component having electroplated yttrium containing coating |
| 09/18/2008 | US20080223715 Coating of Optical Substrates Using Closed Field System |
| 09/18/2008 | DE102008013753A1 Probenverschiebungsverfahren in Ladungsteilchenstrahlgerät und Ladungsteilchenstrahlgerät sowie Probe für Transmissionselektronenmikroskop Samples shift method in charged particle and charged particle beam and sample for transmission electron |
| 09/18/2008 | DE102008013511A1 Vorrichtung zum Bearbeiten und Beobachten von Proben sowie Verfahren zum Bearbeiten und Beobachten von Querschnitten Apparatus for working and observing samples and method for processing and monitoring of cross-sections |
| 09/18/2008 | DE102007010873A1 Objektivlinse Objective lens |
| 09/18/2008 | DE102006043900B4 Vorrichtung und Verfahren zum Betrieb einer Plasmaanlage Apparatus and method for operating a plasma system |
| 09/18/2008 | DE102005002537B4 Vorrichtung für einen Strahl geladener Teilchen zum Messen eines Abbildungsvergrösserungsfehlers Device for a charged particle beam for measuring an imaging magnification error |
| 09/18/2008 | DE10157224B4 Parameterüberwachungsvorrichtung für eine Hochspannungskammer in einem Halbleiterwaferverarbeitungssystem Parameter monitoring device for a high-voltage chamber in a semiconductor wafer processing system |
| 09/17/2008 | EP1970936A2 Image forming method and electron microscope |
| 09/17/2008 | EP1970935A1 Lens coil cooling of a magnetic lens |
| 09/17/2008 | EP1970465A2 Method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index |
| 09/17/2008 | EP1970464A1 Cathode evaporation machine |
| 09/17/2008 | EP1969613A1 Method of manufacturing at least one sputter-coated substrate and sputter source |
| 09/17/2008 | EP1711644A4 Compensation of spacing between magnetron and sputter target |
| 09/17/2008 | EP1702344A4 Stabilizing plasma and generator interactions |
| 09/17/2008 | EP1697556A4 Rotating sputtering magnetron |
| 09/17/2008 | EP1609165B1 Ion beam incident angle detector for ion implant systems |
| 09/17/2008 | EP1585999A4 Methods and apparatus for preparing specimens for microscopy |
| 09/17/2008 | EP1356496B1 Apparatus for evaporation of materials for coating objects |
| 09/17/2008 | EP1269803B1 Plasma accelerator arrangement |
| 09/17/2008 | CN201117619Y Demountable arc-discharging chamber |
| 09/17/2008 | CN101268538A Method and device for the plasma treatment of the interior of hollow bodies |
| 09/17/2008 | CN101266909A Information acquisition apparatus, cross section evaluating apparatus and cross section evaluating method |
| 09/17/2008 | CN100419944C Plasma treating coil |
| 09/17/2008 | CN100419886C Pattern drawing apparatus, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium |
| 09/17/2008 | CN100419411C Scanning device with buffer for tunnel scanning microscope |
| 09/16/2008 | US7425716 Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to a large area electron beam |
| 09/16/2008 | US7425712 Method of operating liquid in the vacuum or low-pressure environment and observing the operation and device for the operation and observation |
| 09/16/2008 | US7425708 Secondary electron detector unit for a scanning electron microscope |
| 09/16/2008 | US7425704 Inspection method and apparatus using an electron beam |
| 09/16/2008 | US7425703 Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evaluation method, a device manufacturing method using the same method, and a resist pattern or processed wafer evaluation method |
| 09/16/2008 | US7425702 Charged particle beam apparatus |
| 09/16/2008 | US7425701 Electron-beam device and detector system |
| 09/16/2008 | US7425694 Time-resolved measurement apparatus |
| 09/16/2008 | US7425093 Thermography test method and apparatus for bonding evaluation in sputtering targets |
| 09/12/2008 | WO2008109406A1 Membrane supports with reinforcement features |
| 09/12/2008 | WO2008107705A1 Apparatus |
| 09/12/2008 | WO2008106956A2 Voltage supply for a sputtering system |
| 09/12/2008 | WO2008071303A3 Particle-optical arrangement |
| 09/12/2008 | WO2008067213A3 Techniques for low temperature ion implantation |
| 09/12/2008 | WO2005084087A3 Methods and apparatus for generating high-density plasmas with ionizational instabilities |
| 09/11/2008 | US20080220596 Delivery of Low Pressure Dopant Gas to a High Voltage Ion Source |
| 09/11/2008 | US20080217554 Charged particle beam writing apparatus and charged particle beam writing method |
| 09/11/2008 | US20080217535 Method of forming a sample image and charged particle beam apparatus |
| 09/11/2008 | US20080217241 Corrugated substrate containing nonwoven, synthetic fabric; nanofibers deposited on one side of substrate by spinning |
| 09/11/2008 | US20080217170 Sputtering system |
| 09/11/2008 | DE102007011230A1 Magnetronplasmaanlage Magnetronplasmaanlage |
| 09/10/2008 | EP1968188A1 Class D amplifier assembly |
| 09/10/2008 | EP1968099A1 Thin film deposited on a substrate and deposition system for such thin film |
| 09/10/2008 | EP1968098A1 Suction device for plasma coating chamber |
| 09/10/2008 | EP1968094A2 Non-axisymmetric charged-particle beam system |
| 09/10/2008 | EP1966815A2 Particle-optical component |
| 09/10/2008 | EP1835347A4 Image producing methods and image producing devices |
| 09/10/2008 | EP1497846B1 Device for treating surfaces of containers with plasma |
| 09/10/2008 | EP1367609B1 High-voltage electric apparatus |
| 09/10/2008 | CN201112360Y Reaction cavity |