Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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10/15/2008 | EP1981077A2 Surface treatment method and surface treatment apparatus |
10/15/2008 | EP1981073A2 Surface treatment method and surface treatment apparatus |
10/15/2008 | EP1981060A2 Ion Implantation Apparatus and Method of Converging/Shaping Ion Beam Used Therefor |
10/15/2008 | EP1981059A2 Ion implanation apparatus |
10/15/2008 | EP1981058A2 Ion implantation apparatus and ion implantation method |
10/15/2008 | EP1979927A1 Redeposition technique for membrane attachment |
10/15/2008 | EP1979926A2 Focusing and positioning auxiliary device for a particle-optical scanning microscope |
10/15/2008 | EP1979925A2 Method and apparatus for generating ion beam |
10/15/2008 | EP1979400A1 Method for surface treatment by plasma and surface treatment apparatus |
10/15/2008 | EP1979106A1 Method and device for the continuous plasma treatment of materials, in particular for the descaling of a metal strand |
10/15/2008 | EP1614137B1 Secondary electron detector unit for a scanning electron microscope |
10/15/2008 | EP1436601A4 Method for sample separation and lift-out |
10/15/2008 | EP1042782B1 Vacuum treatment system |
10/15/2008 | CN201134408Y Ion beam source device capable of implanting into vacuum chamber |
10/15/2008 | CN101286471A Polluting device for anti-slipping sheet |
10/15/2008 | CN101286469A Structure for preventing gap formation and plasma processing apparatus |
10/15/2008 | CN101286448A Plasma doping method |
10/15/2008 | CN101285167A Ion beam emission source for outputting single ionic energy |
10/15/2008 | CN100426471C Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus,and c |
10/15/2008 | CN100426446C Ion beam system and method for reducing foreign pollution to substrate thereof |
10/14/2008 | US7436120 Compensation of magnetic fields |
10/14/2008 | US7435980 Electron beam irradiation device |
10/14/2008 | US7435979 Optical device and method of manufacture |
10/14/2008 | US7435978 System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device |
10/14/2008 | US7435977 Ion beam angle measurement systems and methods for ion implantation systems |
10/14/2008 | US7435976 Ion beam device |
10/14/2008 | US7435974 Electron microscope and specimen stage positioning control method for the electron microscope |
10/14/2008 | US7435971 Ion source |
10/14/2008 | US7435970 Beam current meter |
10/14/2008 | US7435960 Charged particle beam apparatus |
10/14/2008 | US7435958 Electron beam apparatus and method for production of its specimen chamber |
10/14/2008 | US7435956 Apparatus and method for inspection and testing of flat panel display substrates |
10/14/2008 | US7435954 Electron microscope, methods to determine the contact point and the contact of the probe |
10/14/2008 | US7435926 Methods and array for creating a mathematical model of a plasma processing system |
10/14/2008 | US7435517 Electron beam lithography system wherein the exposure is controlled in order to obtain resulting pattern after processing; allows reliable correction of the illumination parameters of an e-beam lithographic system by considering the influence of the fogging effect |
10/14/2008 | US7434537 Device for the coating of objects |
10/09/2008 | WO2008121630A1 Melting furnace including wire-discharge ion plasma electron emitter |
10/09/2008 | WO2008121549A1 Techniques for improving the performance and extending the lifetime of an ion source with gas mixing |
10/09/2008 | WO2008121547A2 Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
10/09/2008 | WO2008120412A1 Electron gun and electron beam exposure system |
10/09/2008 | WO2008120341A1 Electron gun and electron beam exposure system |
10/09/2008 | WO2008119687A1 Apparatus for generating a plasma |
10/09/2008 | WO2008101254A3 Power source arrangement for multiple-target sputtering system |
10/09/2008 | WO2007145849A3 Beam angle adjustment in ion implanters |
10/09/2008 | US20080246404 Vehicle headlight beam controls |
10/09/2008 | US20080245974 Method of introducing material into a substrate by gas-cluster ion beam irradiation |
10/09/2008 | US20080245969 Method and Apparatus for Creating a Plasma |
10/09/2008 | DE10208044B4 Verfahren und Anordnung zum Überwachen eines Herstellungsprozesses Method and arrangement for monitoring a manufacturing process |
10/09/2008 | CA2680546A1 Melting furnace including wire-discharge ion plasma electron emitter |
10/08/2008 | EP1978542A1 Method and device for suppressing arch discharges when operating a plasma processor |
10/08/2008 | EP1978355A1 Liquid medium for preventing charge-up in electron microscope and method of observing sample using the same |
10/08/2008 | EP1978127A1 Spattering device and film forming method |
10/08/2008 | EP1581963B1 Mid span support for a magnetic array of a cylindrical magnetron sputter device |
10/08/2008 | EP1349682B1 Low temperature sputter target/backing plate joining technique and assemblies made thereby |
10/08/2008 | EP1171901B1 Multi-column fib for nanofabrication applications |
10/08/2008 | CN101281860A Semiconductor manufacturing apparatus and manufacturing method of semiconductor device |
10/08/2008 | CN101281859A Etching reaction system |
10/08/2008 | CN100425106C Plasma-assisted decrystallization |
10/08/2008 | CN100424849C Electrostatically clamped edge ring for plasma processing |
10/08/2008 | CN100424832C Method and apparatus for plasma etching |
10/08/2008 | CN100424811C Upper electrode plate with deposition shield in a plasma processing system |
10/07/2008 | US7432515 Charged particle beam lithography apparatus and method |
10/07/2008 | US7432514 Method and apparatus for surface potential reflection electron mask lithography |
10/07/2008 | US7431857 Plasma generation and control using a dual frequency RF source |
10/07/2008 | US7431796 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment |
10/07/2008 | US7430985 Plasma processing equipment |
10/07/2008 | US7430984 Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
10/07/2008 | CA2465879C Plasma processing apparatus |
10/07/2008 | CA2432068C Plasma generator |
10/02/2008 | WO2008118683A1 Electrostatic chuck with separated electrodes |
10/02/2008 | WO2008117358A1 Electron beam device |
10/02/2008 | WO2008053139A3 Shaped apertures in an ion implanter |
10/02/2008 | WO2008033724A3 Enhanced virtual anode |
10/02/2008 | WO2007097920B1 High sensitivity slitless ion source mass spectrometer for trace gas leak detection |
10/02/2008 | US20080241412 Producing equipment capable of handling large scale semiconductor production; such as plasma spray formation of smooth, uniform thick film of yttrium oxide or yttrium aluminum garnet on quartz, glass and/or aluminum substrate |
10/02/2008 | US20080237493 Electron beam lithography system |
10/02/2008 | US20080237483 Carbon nanotube electron gun |
10/02/2008 | US20080237464 Transmission electron microscope micro-grid and method for making the same |
10/02/2008 | US20080237463 Monochromator and scanning electron microscope using the same |
10/02/2008 | US20080237456 Method And Apparatus For Observing A Specimen |
10/02/2008 | US20080237186 Plasma processing apparatus and method thereof |
10/02/2008 | US20080236489 Plasma Processing Apparatus |
10/02/2008 | DE102008015305A1 Verfahren zum maskenlosen Belichten mit Teilchenstrahlen A method for maskless exposure to particle beams |
10/01/2008 | EP1976346A1 Apparatus for generating a plasma |
10/01/2008 | EP1975986A1 Plasma processing equipment |
10/01/2008 | EP1975974A2 Specimen stage-moving device for charged-particle beam system |
10/01/2008 | EP1975274A1 Method for manufacturing a heat insulated, highly transparent layer system and layer system produced according to this method |
10/01/2008 | EP0831679B1 Power supply for multielectrode discharge |
10/01/2008 | CN101277580A Plasma processing apparatus of substrate and plasma processing method thereof |
10/01/2008 | CN101277579A Plasma processing device, plasma processing method and storage medium |
10/01/2008 | CN101276775A Surface processing method for mounting stage |
10/01/2008 | CN101276748A Plasma doping method and plasma doping apparatus |
10/01/2008 | CN101276738A Plama processing apparatus |
10/01/2008 | CN101276737A Susbtrate processing apparatus and substrate processing method |
10/01/2008 | CN101276724A Transmission electronic mirror micro grid and preparing method thereof |
10/01/2008 | CN100423208C Dielectric etch method with high source and low bombardment plasma providing high etch rates |
10/01/2008 | CN100423196C Helical resonator type plasma processing apparatus |
10/01/2008 | CN100423183C Umbilical cord facilities connection for an ion beam implanter |
10/01/2008 | CN100423170C Electron beam generating and controlling device |
10/01/2008 | CN100422382C Tubular workpiece internal surface modifying method and its special-purpose device |