| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 11/05/2008 | CN100431129C Vacuum plasma processor and method of operating same |
| 11/05/2008 | CN100431097C Top electrode, plasma processing device and method |
| 11/05/2008 | CN100431087C Plasma implantation system and method with target movement |
| 11/05/2008 | CN100431086C Capacitively coupled plasma reactor with magnetic plasma control |
| 11/04/2008 | US7446479 High-density plasma source |
| 11/04/2008 | US7446474 Hetero-junction electron emitter with Group III nitride and activated alkali halide |
| 11/04/2008 | US7446320 Electronically-variable immersion electrostatic lens |
| 11/04/2008 | US7446313 Scanning electron microscope |
| 11/04/2008 | CA2343562C Plasma source |
| 11/04/2008 | CA2163967C Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
| 10/30/2008 | WO2008130509A1 Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities |
| 10/30/2008 | WO2008130507A2 Plasma source with segmented magnetron cathode |
| 10/30/2008 | WO2008128532A2 Nanorobot module automation and exchange |
| 10/30/2008 | WO2008079742A3 Prevention of film deposition on pecvd process chamber wall |
| 10/30/2008 | WO2008042779A3 Applicators and cooling systems for a plasma device |
| 10/30/2008 | US20080268645 Method for front end of line fabrication |
| 10/30/2008 | US20080265180 Ion beam inspection apparatus, ion beam inspecting method, semiconductor manufacturing apparatus, and ion source apparatus |
| 10/30/2008 | US20080264905 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 10/30/2008 | US20080264786 Alternating current rotatable sputter cathode |
| 10/30/2008 | US20080264784 Media Injector |
| 10/30/2008 | DE10213043B4 Rohrmagnetron und seine Verwendung Tubular magnetron and its use |
| 10/30/2008 | DE102006034988B4 Ionenquelle zur Erzeugung negativ geladener Ionen Ion source for generating negatively charged ions |
| 10/29/2008 | EP1984975A2 Method and apparatus for producing plasma |
| 10/29/2008 | EP1984934A1 Radio frequency ion guide |
| 10/29/2008 | CN201142313Y Collector of scanning electron microscope example bench |
| 10/29/2008 | CN101297244A 光刻系统和投影方法 Projection lithography system and method |
| 10/29/2008 | CN101296881A Graphite member for beam-line internal member of ion implantation apparatus |
| 10/29/2008 | CN101296554A Plasma processing device and electric pole plate thereof |
| 10/29/2008 | CN101296553A Plasma processing apparatus |
| 10/29/2008 | CN101296549A Plasma processing apparatus and method for manufacturing the same |
| 10/29/2008 | CN101295629A Methods to eliminate M-shape etch rate profile in inductively coupled plasma reactor |
| 10/29/2008 | CN100429749C Neutral particle beam lithography |
| 10/29/2008 | CN100429740C ICP coil capable of adjusting local coupling strength |
| 10/29/2008 | CN100429739C Plasma processing apparatus and plasma processing method |
| 10/28/2008 | US7443496 Apparatus and method for testing defects |
| 10/28/2008 | US7442951 Reticle for use in rapid determination of average intrafield scanning distortion having transmissivity of a complementary alignment attribute being different than the transmissivity of at least one alignment attribute |
| 10/28/2008 | US7442947 Electron-beam exposure system and electron-beam exposure method |
| 10/28/2008 | US7442946 Nonuniform ion implantation apparatus and method using a wide beam |
| 10/28/2008 | US7442944 Ion beam implant current, spot width and position tuning |
| 10/28/2008 | US7442942 Charged particle beam apparatus |
| 10/28/2008 | US7442941 Ion generator |
| 10/28/2008 | US7442931 Method and system for ultrafast photoelectron microscope |
| 10/28/2008 | US7442928 Charged particle beam apparatus |
| 10/28/2008 | US7442923 Scanning electron microscope |
| 10/28/2008 | US7442273 Apparatus using hybrid coupled plasma |
| 10/28/2008 | US7442272 Apparatus for manufacturing semiconductor device |
| 10/23/2008 | WO2008126068A1 A plasma system |
| 10/23/2008 | WO2008125692A1 Triangulating design data and encoding design intent for microlithographic printing |
| 10/23/2008 | WO2008125397A1 Vacuum arc vaporization source, and an arc vaporization chamber with a vacuum arc vaporization source |
| 10/23/2008 | WO2008103454A3 Pulsed plasma system for etching semiconductor structures |
| 10/23/2008 | US20080258081 Removable liners for charged particle beam systems |
| 10/23/2008 | US20080258073 Method and apparatus for simultaneously depositing and observing materials on a target |
| 10/23/2008 | US20080258068 Device and method for generating an x-ray point source by geometric confinement |
| 10/23/2008 | US20080257863 Plasma processing apparatus and method for stabilizing inner wall of processing chamber |
| 10/23/2008 | US20080257498 Plasma processing apparatus |
| 10/23/2008 | DE112006003026T5 Sputtering Target und Verfahren/Vorrichtung zum Kühlen des Targets Sputtering target and process / apparatus for cooling the target |
| 10/23/2008 | DE112006003022T5 Sputtering Target und Mittel zum Kühlen des Targets Sputtering target, and means for cooling the target |
| 10/22/2008 | EP1983565A2 Surface treatment method and surface treatment apparatus |
| 10/22/2008 | EP1983549A2 Beam Processing Apparatus |
| 10/22/2008 | EP1983548A1 Emitter chamber, charged particle apparatus and method for operating same |
| 10/22/2008 | EP1983543A1 Gun chamber, charged particle beam apparatus and method of operating same |
| 10/22/2008 | EP1982348A1 Short pulse atmospheric pressure glow discharge method and apparatus |
| 10/22/2008 | EP1982347A1 Device for coupling between a plasma antenna and a power signal generator |
| 10/22/2008 | EP1982346A1 Device for sustaining differential vacuum degrees for electron column |
| 10/22/2008 | EP1393340B1 Ion gun |
| 10/22/2008 | EP1230665B1 Plasma processing system with dynamic gas distribution control |
| 10/22/2008 | CN101292059A Cleaning means for large area pecvd devices using a remote plasma source |
| 10/22/2008 | CN101290873A Hollow anode plasma reactor and method |
| 10/22/2008 | CN101290869A Plasma treatment apparatus and short circuit of high frequency current |
| 10/22/2008 | CN100428413C Ion injection simulation method |
| 10/22/2008 | CN100428397C Electronic optical lens barrel and production method therefor |
| 10/22/2008 | CN100427883C A system and method for determining a cross sectional feature of a structural element using a reference structural element |
| 10/21/2008 | US7439529 High current density ion source |
| 10/21/2008 | US7439526 Beam neutralization in low-energy high-current ribbon-beam implanters |
| 10/21/2008 | US7439525 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 10/21/2008 | US7439506 Method and an apparatus of an inspection system using an electron beam |
| 10/21/2008 | US7439505 Scanning electron microscope |
| 10/21/2008 | US7439504 Pattern inspection method and apparatus using electron beam |
| 10/21/2008 | US7439503 Charged particle beam irradiation method, method of manufacturing semiconductor device and charged particle beam apparatus |
| 10/21/2008 | US7439502 Electron beam apparatus and device production method using the electron beam apparatus |
| 10/21/2008 | US7439500 Analyzing system and charged particle beam device |
| 10/21/2008 | US7439188 Reactor with heated and textured electrodes and surfaces |
| 10/21/2008 | US7438822 Apparatus and method for shielding a wafer from charged particles during plasma etching |
| 10/21/2008 | US7438765 Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods |
| 10/16/2008 | WO2008124555A1 Techniques for low-temperature ion implantation |
| 10/16/2008 | WO2008124554A1 Techniques for forming shallow junctions |
| 10/16/2008 | WO2008124418A1 Tuning an ion implanter for optimal performance |
| 10/16/2008 | WO2008123550A1 Beam processing apparatus and beam monitoring apparatus |
| 10/16/2008 | WO2008123421A1 Ion implanting apparatus |
| 10/16/2008 | WO2008123391A2 Apparatus and method for plasma doping |
| 10/16/2008 | WO2008123338A1 Component for charged particle device and method for manufacturing the component |
| 10/16/2008 | WO2008083020A3 Technique for using an improved shield ring in plasma-based ion implantation |
| 10/16/2008 | WO2008079349A9 Systems and methods for utilizing scanning probe shape characterization |
| 10/16/2008 | US20080253792 Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device |
| 10/16/2008 | US20080251736 Charged Particle Gun |
| 10/16/2008 | US20080251017 Fastening Unit for Ignition Units and Device for Carbon Deposition |
| 10/16/2008 | US20080251015 Substrate Processing Apparatus and Reaction Container |
| 10/16/2008 | US20080251014 Substrate Processing Apparatus and Reaction Container |
| 10/16/2008 | DE112006003027T5 Sputtering Target und Verfahren - Vorrichtung zum Kühlen des Targets Sputtering target and process - means for cooling the target |
| 10/16/2008 | DE102004026344B4 Verfahren zum Herstellen einer hydrophoben Beschichtung, Vorrichtung zum Durchführen des Verfahrens und Substrat mit einer hydrophoben Beschichtung A method for producing a hydrophobic coating apparatus for performing the method and substrate with a hydrophobic coating |