Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2008
11/26/2008CN100437883C Plasma surface treatment method and device for carrying out said method
11/26/2008CN100437882C 电子束曝光系统 Electron beam exposure system
11/26/2008CN100436763C Plasma-assisted engine exhausting process
11/25/2008US7458057 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern
11/25/2008US7456413 Apparatus for evacuating a sample
11/25/2008US7456403 Charged particle beam device
11/25/2008US7456401 Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method
11/25/2008US7456031 Exposure device, exposure method, and semiconductor device manufacturing method
11/25/2008US7455893 Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD
11/25/2008US7455790 Emission spectroscopic processing apparatus and plasma processing method using it
11/25/2008US7455748 Magnetic enhancement for mechanical confinement of plasma
11/20/2008WO2008141147A1 Microscopy support structures
11/20/2008WO2008140273A2 Magnetic deflector for an electron column
11/20/2008WO2008140080A1 Electron source
11/20/2008WO2008138573A1 Circuit and method for reducing electrical energy stored in a lead inductance for fast extinction of plasma arcs
11/20/2008WO2008033448A3 Systems and methods for beam angle adjustment in ion implanters
11/20/2008US20080284344 Power supply unit for gas discharge processes
11/20/2008US20080283778 Apparatus for ion beam fabrication
11/20/2008DE112007000113T5 Kathode für ein Vakuum-Sputter-System A cathode for a vacuum sputtering system
11/20/2008DE102008023248A1 Ion source i.e. anode layer ion source, for e.g. coating in vacuum, has cathode arrangement with emission gap having endless basic shape that superimposes lateral substructure for enlargement of elongate length of emission gap
11/20/2008DE102007021897A1 Device for carrying out an electron beam process comprises a separating element which is fixed within a working chamber using detachable fixing elements
11/19/2008EP1993119A1 Charged particle beam emitting device and method for operating a charged particle beam emitting device
11/19/2008EP1993118A2 Pattern definition device having distinct counter-electrode array plate
11/19/2008EP1993074A1 Image evaluation system and charged particle beam microscope
11/19/2008EP1992004A2 Active damping of high speed scanning probe microscope components
11/19/2008CN201153346Y Long-life microwave discharging inner conductor
11/19/2008CN201153345Y Low-polluting plasma discharge cavity
11/19/2008CN101310360A Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases
11/19/2008CN101308784A Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor
11/19/2008CN101308779A Stepped upper electrode for plasma processing uniformity
11/19/2008CN101308776A Normal pressure plasma cleaning device
11/19/2008CN101308775A Method and system for introducing process fluid through a chamber component
11/19/2008CN101308773A System for manufacturing flat display
11/19/2008CN101308771A Gas flow diffuser
11/19/2008CN101308770A In-situ dose monitoring using optical emission spectroscopy
11/19/2008CN101308756A Method for enhancing inner insulation property of scanning electron microscope body
11/19/2008CN101308754A Kaufman ion source of novel magnetic circuit structure
11/19/2008CN100435263C Fiber containing carbon, device using same and method of manufacturing thereof
11/19/2008CN100434196C Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
11/18/2008US7453075 Charged particle beam exposure system
11/18/2008US7453074 Ion implanter with ionization chamber electrode design
11/18/2008US7453073 Method and equipment for specimen preparation
11/18/2008US7453072 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
11/18/2008US7453069 Bushing unit with integrated conductor in ion accelerating device and related method
11/18/2008US7453063 Calibration substrate and method for calibrating a lithographic apparatus
11/18/2008US7453062 Energy-filtering cathode lens microscopy instrument
11/18/2008US7452824 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
11/18/2008US7452477 Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface
11/18/2008US7451638 Harmonic cantilevers and imaging methods for atomic force microscopy
11/18/2008CA2331404C Methods and apparatus for inactivating contaminants in biological fluid
11/13/2008WO2008136858A2 Techniques for removing molecular fragments from an ion implanter
11/13/2008WO2008136130A1 Plasma generation device, and method and apparatus for forming film using the same
11/13/2008WO2008136029A1 Apparatus for the cold plasma treatment of a continuous web material
11/13/2008WO2008135008A1 Short-cycle low-pressure plasma system
11/13/2008WO2008048598A3 Technique for matching performance of ion implantation devices using an in-situ mask
11/13/2008WO2007109906A8 Method and apparatus for nanopowder and micropowder production using axial injection plasma spray
11/13/2008US20080280065 Method and Device for Generating a Low-Pressure Plasma and Applications of the Low-Pressure Plasma
11/13/2008US20080277597 Removable liners for charged particle beam systems
11/13/2008US20080277062 Plasma Processor
11/13/2008US20080276727 Mems Nanoindenter
11/13/2008DE102008020145A1 Ion source e.g. duoplasmatron, for manufacturing e.g. microprocessor, has gas volume-control valve provided in position to determine gas pressure conditions in vacuum chamber, and gas supply mechanism for guiding gases into chamber
11/12/2008EP1990103A1 Process for wafer backside polymer removal and wafer front side photoresist removal
11/12/2008EP1989723A2 Phase plate, image producing method and electron microscope
11/12/2008CN101305443A Ion implanter with contaminant collecting surface
11/12/2008CN101303965A Method and apparatus for eliminating migration of etching pattern
11/12/2008CN101303963A Method and apparatus for eliminating migration of etching pattern
11/12/2008CN101303956A Ion beam detection device, ion beam detection method, semiconductor manufacturing device and ion source device
11/12/2008CN101302610A Process chamber component having yttrium-aluminum coating
11/12/2008CN101301994A Electron beam-ion beam micro-nanometer process composite system
11/12/2008CN100433236C Use of pulsed votage in a plasma reactor
11/12/2008CN100432640C Method and apparatus for measuring beam spot of scanning light
11/11/2008US7449692 Charged particle beam apparatus
11/11/2008US7449691 Detecting apparatus and device manufacturing method
11/11/2008US7449689 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method
11/11/2008US7449220 Method for manufacturing a plate-shaped workpiece
11/06/2008WO2008133882A1 Factory-alignable compact cantilever probe
11/06/2008WO2008133876A2 Cooling shield for substrate processing chamber
11/06/2008WO2008133796A1 Method and system for ion beam profiling
11/06/2008WO2008133275A1 Surface emission type electron source and drawing device
11/06/2008WO2008132734A2 Focused ion beam deep nano- patterning method
11/06/2008US20080273283 Low voltage modular room ionization system
11/06/2008US20080272300 Charged particle beam apparatus
11/06/2008US20080272089 Monitoring etching of a substrate in an etch chamber
11/06/2008US20080271998 Device for Carbon Deposition
11/06/2008US20080271849 Hollow anode plasma reactor and method
11/06/2008US20080271748 Method of and Arrangement for Removing Contaminants from a Substrate Surface Using an Atmospheric Pressure Glow Plasma
11/06/2008US20080271676 Plasma treatment method and plasma treatment apparatus
11/06/2008DE102008019484A1 Hochfrequenz-, Hochspannungs-Elektronenschalter High frequency, high voltage electron switch
11/06/2008DE102007021386A1 Kurztaktniederdruckplasmaanlage Short-cycle low pressure plasma system
11/05/2008EP1988565A2 Methods to eliminate m-shape etch rate profile in inductively coupled plasma reactor
11/05/2008EP1988187A2 Apparatus and method which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
11/05/2008EP1987489A1 Apparatus, method and simulation objetcs for simulation of the image formation in a transmission electron microscope
11/05/2008EP1552543B1 Method for toolmatching and troubleshooting a plasma processing system
11/05/2008EP1393546B1 A socket contact and feed-through device
11/05/2008EP1235945B1 Rotating magnet array and sputter source
11/05/2008CN101300658A Redundant anode sputtering method and system
11/05/2008CN101300657A Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
11/05/2008CN101300656A Lithography system, sensor and measuring method
11/05/2008CN101300373A Method for monitoring a plasma, device for carrying out this method, use of this method for depositing a film onto a PET hollow body
11/05/2008CN101299416A Substrate support, substrate processing device and method of placing a substrate
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