Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2008
12/09/2008US7462846 Apparatus for measuring a position of an ion beam profiler and a method for its use
12/09/2008US7462845 Removable liners for charged particle beam systems
12/09/2008US7462844 Method, system, and apparatus for improving doping uniformity in high-tilt ion implantation
12/09/2008US7462843 Apparatus and methods for ion beam implantation
12/09/2008US7462839 Detector for variable pressure areas and an electron microscope comprising a corresponding detector
12/09/2008US7462830 Method and apparatus for observing inside structures, and specimen holder
12/09/2008US7462829 Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
12/09/2008US7462335 Optical monitoring and control system and method for plasma reactors
12/09/2008US7462293 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
12/09/2008US7462089 Compacting the mixture of copper and iron metal powder and yttrium oxide in a mold, baking the compacted mixture, forging to form an electrode, and mechanically processing the electrode to a finish member
12/09/2008US7461614 Method and apparatus for improved baffle plate
12/04/2008WO2008147184A2 Atmospheric pressure glow discharge plasma method and system using heated substrate
12/04/2008WO2008145951A1 Protein layers and their use in electron microscopy
12/04/2008WO2008031076A3 Atomic force microscope
12/04/2008US20080296516 Method and apparatus for specimen fabrication
12/04/2008US20080296514 System and method for noninvasively monitoring conditions of a subject
12/04/2008US20080296510 Ion Implantation System and Ion Implantation System
12/04/2008US20080296498 In-situ STEM sample preparation
12/04/2008US20080296497 Method and apparatus for specimen fabrication
12/04/2008US20080296472 Dosage accuracy monitoring systems of implanters
12/04/2008US20080295966 Electrode Assembly For The Removal Of Surface Oxides By Electron Attachment
12/04/2008US20080295965 Plasma processing apparatus
12/04/2008DE19628949B4 Vorrichtung zur Erzeugung von Plasma A device for generating plasma
12/04/2008DE10257147B4 Leistungsversorgungsvorrichtung zum Erzeugen von Hochfrequenzleistung für eine Plasmaerzeugungsvorrichtung The power supply apparatus for generating high-frequency power to a plasma generating device
12/04/2008DE10236738B4 Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren Electron system and electron microscopy methods
12/04/2008DE102008016645A1 Vorrichtung mit geladenem Partikelstrahl A device with a charged particle beam
12/04/2008DE10045958B4 Vorrichtung zum Leiten eines gasförmigen Mediums in eine und/oder aus einer Prozeßkammer Means for conducting a gaseous medium into and / or out of a process chamber
12/03/2008EP1998356A2 In-Situ STEM Sample Preparation
12/03/2008EP1998207A2 Charged particle instrument equipped with optical microscope
12/03/2008EP1998206A2 Sample carrier for use in a charged particle instrument, method of using it and apparatus equipped to use such
12/03/2008EP0938740B1 Particle controlling method and plasma processing chamber
12/03/2008CN201160064Y Hall type ion source
12/03/2008CN201159705Y Transmission electron microscope carrier net of nano material in-situ stress test
12/03/2008CN201159704Y Micro-stretching device of test piece material nano dimension mechanical property test
12/03/2008CN101317245A Ion implantation beam angle calibration
12/03/2008CN101315880A Gas distribution device and plasma processing apparatus adopting the same
12/03/2008CN101315877A Substrate processing sytstem and apparatus
12/03/2008CN101315875A Plasma generator and workpiece processing apparatus using the same
12/03/2008CN101315860A Dosage accuracy monitoring systems of implanters
12/03/2008CN101315859A Sample carrier for use in a charged particle instrument, method of using it and apparatus equipped to use such
12/03/2008CN100441066C Plasma excitation system
12/03/2008CN100441065C Plasma processor appts. and method, and antenna
12/03/2008CN100440451C Substrate processing apparatus
12/03/2008CN100440448C Plasma processing device and plasma generating method
12/03/2008CN100440419C Faraday shields and plasma wafer processing
12/03/2008CN100439562C Process chamber component having electroplated yttrium containing coating
12/03/2008CN100439237C Inductively coupled plasma reactor for producing nano-powder
12/02/2008US7460981 Methods and systems for determining a presence of macro and micro defects on a specimen
12/02/2008US7459712 Method and apparatus of measuring pattern dimension and controlling semiconductor device process having an error revising unit
12/02/2008US7459706 Installation and method for sterilising objects by low-energy electron bombardment
12/02/2008US7459705 Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
12/02/2008US7459704 Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms
12/02/2008US7459702 Apparatus and method for polishing gemstones and the like
12/02/2008US7459683 Charged particle beam device with DF-STEM image valuation method
12/02/2008US7459681 Scanning electron microscope
12/02/2008US7459321 Method of storing a data bit in a fast-write alloy
12/02/2008US7459246 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
12/02/2008US7459187 Uniform thickness achieved by rotating the rotor around the axis almost perpendicular to the base material-conveying direction in the state where it faces, via a narrow gap; gas is dragged into gap by rotation of the rotor and blown out onto the base material surface.
12/02/2008US7459098 Dry etching apparatus, dry etching method, and plate and tray used therein
12/02/2008US7458247 Vacuum apparatus including a particle monitoring unit, particle monitoring method, and program
11/2008
11/27/2008WO2008143242A1 Ion beam control apparatus and method
11/27/2008WO2008101714A3 High throughput sem tool
11/27/2008WO2008101713A3 High throughput sem tool
11/27/2008WO2008087384A3 Charged particle analyser and method
11/27/2008WO2008086527A3 Electron beam lithography method and apparatus using a dynamically controlled photocathode
11/27/2008WO2008079349A3 Systems and methods for utilizing scanning probe shape characterization
11/27/2008WO2007149727A3 Method and apparatus for extracting ions from an ion source for use in ion implantation
11/27/2008US20080293832 Solid sample, solid sample fabricating method, and solid sample fabricating apparatus
11/27/2008US20080290326 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process
11/27/2008US20080290290 Heating stage for a micro-sample
11/27/2008US20080290275 Electron beam device
11/27/2008DE202008004128U1 Geschlitzte Elektrode und Plasmaapparatur, die dieselbe verwendet Slotted electrode and plasma apparatus that uses the same
11/27/2008DE10335504B4 Elektronenstrahlgerät mit Präparathalter Electron beam device with specimen holder
11/27/2008DE102007024353A1 Monochromator und Strahlquelle mit Monochromator Monochromator beam source with monochromator
11/27/2008DE102007024090A1 Device for plasma treatment of surfaces, has electrical generator and multiple plasma producers, where plasma producers are connected or disconnected together at individual output voltage of generators
11/27/2008DE102004019061B4 Selektiver Absorber zur Umwandlung von Sonnenlicht in Wärme, ein Verfahren und eine Vorrichtung zu dessen Herstellung Selective absorber for the conversion of sunlight into heat, a method and apparatus for its production
11/26/2008EP1995818A1 Circuit and method for reducing electrical energy stored in a lead inductance for fast extinction of plasma arcs
11/26/2008EP1995759A2 Multipoint voltage and curent probe systme
11/26/2008EP1995758A2 Monochromator and charged particle beam source with monochromator
11/26/2008EP1995584A2 Solid sample, solid sample fabricating method and solid sample fabricating apparatus
11/26/2008EP1994546A2 High sensitivity slitless ion source mass spectrometer for trace gas leak detection
11/26/2008EP1994544A2 Aberration-correcting cathode lens microscopy instrument
11/26/2008EP1994447A1 Lithography system and projection method
11/26/2008EP1632006A4 Antenna for producing uniform process rates
11/26/2008EP1623457B1 Endpoint detection in time division multiplexed processes using an envelope follower algorithm
11/26/2008EP1561234B1 Spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements
11/26/2008EP1269511B1 Plasma reactor with overhead rf electrode tuned to the plasma
11/26/2008CN101313383A Radiation lamp and radiation source module incorporating same
11/26/2008CN101312144A Chuck assembly and high density plasma device possessing the assembly
11/26/2008CN101312143A Carrying bench and plasma treating device using the same
11/26/2008CN101312122A Workpiece processing apparatus
11/26/2008CN100438718C Adaptively plasma source for generating uniform plasma
11/26/2008CN100437972C Stress free etch processing in combination with a dynamic liquid meniscus
11/26/2008CN100437931C Electric liquid chamber and method of processing substrate in the chamber
11/26/2008CN100437930C Stepped upper electrode for plasma processing uniformity
11/26/2008CN100437901C Particle sticking prevention apparatus and plasma processing apparatus
11/26/2008CN100437897C Method and apparatus for controlling the volume of a plasma
11/26/2008CN100437886C Magnetron sputtering
11/26/2008CN100437885C Highly efficient compact capacitance coupled plasma reactor/generator and method
11/26/2008CN100437884C An atmospheric pressure plasma assembly