Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
02/2015
02/03/2015US8946630 Automatic filtering of SEM images
02/03/2015US8946629 Inspection apparatus
02/03/2015US8946628 Electron beam interference device and electron beam interferometry
02/03/2015US8946627 Three-dimensional mapping using scanning electron microscope images
02/03/2015US8946058 Method and apparatus for plasma dicing a semi-conductor wafer
02/03/2015US8946030 Method for forming dummy gate
02/03/2015US8945413 Etching method, etching apparatus, and ring member
02/03/2015US8945342 Surface wave plasma generating antenna and surface wave plasma processing apparatus
02/03/2015US8945340 Plasma processing apparatus, and maintenance method and assembling method of the same
02/03/2015US8944003 Remote plasma system and method
01/2015
01/29/2015WO2015011975A1 Charged particle beam device enabling facilitated ebsd detector analysis of desired position and control method thereof
01/29/2015WO2015011967A1 Charged particle beam apparatus
01/29/2015US20150032245 Etch Rate Modeling and Use Thereof with Multiple Parameters for In-Chamber and Chamber-to-Chamber Matching
01/29/2015US20150031213 Plasma processing apparatus and plasma processing method
01/29/2015US20150028972 Methods and systems for plasma deposition and treatment
01/29/2015US20150028966 Elastic wave filter device and manufacturing method of the same
01/29/2015US20150028744 Etch Rate Modeling and Use Thereof for In-Chamber and Chamber-to-Chamber Matching
01/29/2015US20150028232 Multi-Part Mask For Implanting Workpieces
01/29/2015US20150028230 Method for charged-particle multi-beam exposure
01/29/2015US20150028225 Method for manufacturing a tem-lamella and assembly having a tem-lamella protective structure
01/29/2015US20150028223 Arrangement and method for transporting radicals
01/29/2015US20150028221 Methods of ion source fabrication
01/29/2015US20150028220 Electron exit window foil
01/29/2015US20150028205 System for in situ reactivation of fluorescence marker
01/29/2015US20150028204 Inspection apparatus and inspection method
01/29/2015US20150028203 Inspection of a lithographic mask that is protected by a pellicle
01/29/2015US20150027883 Facing target sputtering apparatus
01/29/2015US20150027876 Sputtering system and method of fabricating display device using the same
01/29/2015US20150027637 Plasma processing apparatus
01/29/2015US20150027635 Plasma processing apparatus
01/29/2015DE102014010685A1 Vorrichtung zur korrektur sphärischer aberration, verfahren zur korrektur sphärischer aberration und ladungsteilchenstrahl-instrument Apparatus for correction of spherical aberration, spherical aberration correction process for and charged particle instrument
01/29/2015DE102013107454A1 Elektronenstrahlprozessanordnung, Auswertevorrichtung, Verfahren zum Betreiben eines Elektronenstrahlverdampfers; Electron beam process arrangement, evaluation, method of operating an electron beam evaporator; und Verfahren zum Kalibrieren einer Elektronenstrahlprozessanordnung and method for calibrating an electron beam process arrangement
01/29/2015DE102013012225A1 Verfahren zur TEM-Lamellen-Herstellung und Anordnung für TEM-Lamellen-Schutzvorrichtung A method for TEM lamella preparation and arrangement for TEM lamellae protection device
01/29/2015DE102013011491A1 Verfahren zum Betreiben eines Partikelstrahlmikroskops und Partikelstrahlmikroskop Method for operating a particle beam microscope, and particle beam microscope
01/28/2015EP2830083A1 Method for charged-particle multi-beam exposure
01/28/2015EP2828708A2 Arrangement and method for transporting radicals
01/28/2015CN204130495U 一种磁场增强型线性大面积离子源 One kind of large-scale magnetic field enhanced linear ion source
01/28/2015CN104321701A 用于运输自由基的装置和方法 Apparatus and method for transport of radicals
01/28/2015CN104321461A 微波等离子体化学气相沉积装置 Microwave plasma chemical vapor deposition apparatus
01/28/2015CN104321459A 形成层的方法 The method of forming a layer
01/28/2015CN104319221A 用于对称和/或同心的射频匹配网络的方法和设备 Methods and apparatus for symmetrical and / or concentric RF matching network
01/28/2015CN104319220A 一种用于电子显微镜的定量纳米加热台 A method for quantitative electron microscopy nano heating station
01/28/2015CN103608890B 台装置以及台装置的控制方法 Station device and a control method table means
01/28/2015CN102747330B 用阴极溅射制作方向层的方法及其实施装置 Orientation layers produced by cathode sputtering method and an apparatus for
01/28/2015CN102668014B 带电粒子线显微镜以及该带电粒子显微镜的控制方法 Charged particle microscope and a control method of the charged particle microscope
01/28/2015CN102568992B 等离子体处理装置 Plasma processing apparatus
01/28/2015CN102376559B 等离子体处理方法和等离子体处理装置 The plasma processing method and a plasma processing apparatus
01/27/2015US8942464 Pattern measuring apparatus, and pattern measuring method and program
01/27/2015US8941082 Dual sided workpiece handling
01/27/2015US8941077 Deceleration apparatus for ribbon and spot beams
01/27/2015US8941072 Silicon drift diode detector configured to switch between pulse height measurement mode and current measurement mode
01/27/2015US8941057 Probe and method for obtaining three-dimensional compositional maps of a biological sample
01/27/2015US8941037 Substrate processing apparatus, focus ring heating method, and substrate processing method
01/27/2015US8940592 Memories and methods of forming thin-film transistors using hydrogen plasma doping
01/27/2015US8940128 Plasma processing apparatus
01/27/2015US8940098 Method for distributing gas for a bevel etcher
01/27/2015US8939108 Processing system
01/22/2015WO2015009864A1 System and method for balancing consumption of targets in pulsed dual magnetron sputtering (dms) processes
01/22/2015WO2015009257A1 A method for obtaining bacteria anti-fouling biomaterial
01/22/2015WO2015008561A1 Activation chamber and kit used in treatment device for lowering electron affinity, treatment device that contains said kit and is used to lower electronic affinity, photocathode electron-beam source, electron gun containing photocathode electron-beam source, free-electron laser accelerator, transmission electron microscope, scanning electron microscope, electron-beam holography microscope, electron-beam lithography device, electron-beam diffraction device, and electron-beam scanning device
01/22/2015WO2015007858A1 Cleaning method for thin-film processing applications and apparatus for use therein
01/22/2015WO2015007653A1 Plasma-chemical coating apparatus
01/22/2015WO2015006844A1 Installation and process for the treatment of metallic pieces by a plasma reactor
01/22/2015US20150024594 Cooled pin lifter paddle for semiconductor substrate processing apparatus
01/22/2015US20150024582 Method of making a gas distribution member for a plasma processing chamber
01/22/2015US20150024523 A method for producing an rfid transponder by etching
01/22/2015US20150024515 Systems, methods, and apparatus for minimizing cross coupled wafer surface potentials
01/22/2015US20150024155 Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
01/22/2015US20150023837 Tungsten Sintered Compact Sputtering Target and Tungsten Film Formed Using Same Target
01/22/2015US20150022807 Universal sample holder
01/22/2015US20150021495 Charged particle beam drawing apparatus and drawing chamber
01/22/2015US20150021493 Pattern Definition Device Having Multiple Blanking Arrays
01/22/2015US20150021476 Magnetic lens for focusing a beam of charged particles
01/22/2015US20150021475 Automated slice milling for viewing a feature
01/22/2015US20150021474 Switchable multi perspective detector, optics therefore and method of operating thereof
01/22/2015US20150021473 Methods and systems for plasma deposition and treatment
01/22/2015US20150021324 Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
01/22/2015US20150021294 Plasma processing apparatus and operational method thereof
01/22/2015US20150021177 Sputtering device
01/22/2015US20150021176 Sputtering device
01/22/2015US20150021175 Magnetic Material Sputtering Target and Manufacturing Method for Same
01/22/2015US20150021174 High-Purity Titanium Ingots, Manufacturing Method Therefor, and Titanium Sputtering Target
01/22/2015US20150021173 Sputtering device
01/22/2015US20150021172 Thin film forming apparatus
01/22/2015US20150021168 Inline deposition control apparatus and method of inline deposition control
01/22/2015US20150021167 System and method for balancing consumption of targets in pulsed dual magnetron sputtering (dms) processes
01/22/2015US20150021166 Sputtering apparatus and method
01/22/2015US20150021164 Sputtering device and method for producing long film with thin layer
01/22/2015US20150020972 Process condition sensing device and method for plasma chamber
01/22/2015US20150020971 Mixed mode pulsing etching in plasma processing systems
01/22/2015US20150020970 Plasma processing method and apparatus
01/22/2015US20150020969 Air Cooled Faraday Shield and Methods for Using the Same
01/22/2015US20150020735 Methods and systems for plasma deposition and treatment
01/21/2015EP2827359A1 Cleaning method for thin-film processing applications and apparatus for use therein
01/21/2015EP2827358A1 Pattern definition device having multiple blanking arrays
01/21/2015EP2827357A1 Magnetic lens for focusing a beam of charged particles
01/21/2015EP2827356A1 Magnetic lens for focusing a beam of charged particles
01/21/2015EP2826057A1 Mini rotatable sputter devices for sputter deposition
01/21/2015EP2825685A1 Sputtering targets and associated sputtering methods for forming hermetic barrier layers
01/21/2015CN204118097U 一种晶硅太阳能电池的反应离子刻蚀设备 A crystalline silicon solar cells by reactive ion etching apparatus
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