| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 01/21/2015 | CN104303257A 用于tem观察的薄片的制备 Preparation of sheet for tem observed |
| 01/21/2015 | CN104303256A 带电粒子涡旋波生成 Vortex wave of charged particles generated |
| 01/21/2015 | CN104302084A 空气冷却的法拉第屏蔽罩和使用该屏蔽罩的方法 Faraday shield and the shield method using an air-cooled |
| 01/21/2015 | CN104299929A 用于原位晶片边缘和背侧等离子体清洁的系统和方法 Situ plasma cleaning wafer edge and the backside of a system and method for |
| 01/21/2015 | CN104299889A 混合特征蚀刻和倒角蚀刻的系统 Mixing characteristics etching and etching systems chamfer |
| 01/21/2015 | CN104299882A 一种粉体材料表面等离子体处理装置 One kind of powder material surface plasma processing apparatus |
| 01/21/2015 | CN104299881A 等离子刻蚀设备 Plasma etching equipment |
| 01/21/2015 | CN104299880A 等离子体处理装置及等离子体处理装置的运行方法 Method of operating a plasma processing apparatus and plasma processing apparatus |
| 01/21/2015 | CN104299879A 感应耦合等离子体处理装置 Inductively coupled plasma processing apparatus |
| 01/21/2015 | CN104299878A 等离子蚀刻装置 Plasma etching apparatus |
| 01/21/2015 | CN104299877A 一种改善48所m42300-1/um型等离子体刻蚀机刻蚀效果的辅助工艺 An improvement of 48 m42300-1 / um type of auxiliary craft plasma etcher etching effect |
| 01/21/2015 | CN104299876A 一种用于电极杆固定的支架 An electrode rod fixed bracket for |
| 01/21/2015 | CN104299875A 一种电感耦合等离子体处理装置 An inductor coupled plasma processing apparatus |
| 01/21/2015 | CN104299874A 一种等离子体处理装置 A plasma processing apparatus |
| 01/21/2015 | CN104299873A 一种调节多磁极运动控制的方法 A motion control method of multi-pole adjustment |
| 01/21/2015 | CN104299872A 用于聚焦带电粒子束的磁透镜 A charged particle beam for focusing magnetic lens |
| 01/21/2015 | CN104299871A 离子源系统和离子束流系统 Ion source and ion beam systems |
| 01/21/2015 | CN104299870A 一种线圈支撑装置及等离子体加工设备 In which the coil support device and a plasma processing apparatus |
| 01/21/2015 | CN102738039B 测量装置以及等离子体处理装置 Measuring apparatus and a plasma processing apparatus |
| 01/21/2015 | CN102592936B 聚焦环和具有该聚焦环的基板处理装置 The substrate processing apparatus of the focus ring and focus ring has |
| 01/21/2015 | CN102439693B 工作件处理系统 Work piece handling system |
| 01/21/2015 | CN102437003B 聚焦环组合、imp溅射设备 Focus ring combination, imp sputtering equipment |
| 01/21/2015 | CN102422198B 使用光学显微镜和粒子束显微镜的序列来显微检查对象 Using an optical microscope and the particle beam microscope to microscopic inspection target sequence |
| 01/21/2015 | CN102292792B 离子注入中的增强型低能离子束传输 Low energy ion beam transport enhanced ion implantation |
| 01/21/2015 | CN102257592B 具有减小的扫描场效应的离子注入 Having a reduced scanning field effect ion implantation |
| 01/21/2015 | CN102212798B 适应热膨胀的喷头装备 Accommodate thermal expansion of the nozzle equipment |
| 01/21/2015 | CN101228608B 具有改善的可靠性的无掩模光刻系统 Having improved reliability maskless lithography system |
| 01/20/2015 | US8937286 Solid scintillator and electron beam detector using the same |
| 01/20/2015 | US8937283 Specimen observation method and device using secondary emission electron and mirror electron detection |
| 01/20/2015 | US8937281 Method for examining a sample by using a charged particle beam |
| 01/20/2015 | US8937017 Method and apparatus for etching |
| 01/20/2015 | US8937004 Apparatus and method for controllably implanting workpieces |
| 01/20/2015 | US8937003 Technique for ion implanting a target |
| 01/20/2015 | US8936696 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 01/20/2015 | US8935990 Low contamination components for semiconductor processing apparatus and methods for making components |
| 01/15/2015 | WO2015006065A1 High reliability, long lifetime, negative ion source |
| 01/15/2015 | WO2015005888A1 Plasma-arc device for forming coatings |
| 01/15/2015 | WO2015005569A1 Device and method for acquiring particle beam discharge image |
| 01/15/2015 | WO2015004981A1 Electron gun and electron microscope |
| 01/15/2015 | WO2015003806A1 Target for the reactive sputter deposition of electrically insulating layers |
| 01/15/2015 | US20150016709 Pattern Sensing Device and Semiconductor Sensing System |
| 01/15/2015 | US20150015140 Plasma generation device with microstrip resonator |
| 01/15/2015 | US20150015139 Microwave plasma processing apparatus and microwave supplying method |
| 01/15/2015 | US20150014549 Charged particle beam writing apparatus and charged particle beam writing method |
| 01/15/2015 | US20150014531 Scanning electron microscope |
| 01/15/2015 | US20150014530 Charged particle beam apparatus |
| 01/15/2015 | US20150014529 Charged particle beam device |
| 01/15/2015 | US20150014528 Method of operating a particle beam microscope and a particle beam microscope |
| 01/15/2015 | US20150014527 Scanning Charged Particle Microscope, Image Acquisition Method, and Electron Detection Method |
| 01/15/2015 | US20150014276 Plasma processing method |
| 01/15/2015 | US20150014275 Switchable ion gun with improved gas inlet arrangement |
| 01/15/2015 | US20150014158 Magnetic field generation apparatus and sputtering apparatus |
| 01/15/2015 | US20150014157 Oxide sintered compact and sputtering target, as well as its production processes |
| 01/15/2015 | US20150014156 Sputtering target and process for producing same |
| 01/15/2015 | US20150014155 Ferromagnetic Material Sputtering Target Containing Chromium Oxide |
| 01/15/2015 | US20150014151 Method of fabricating sputtering target, sputtering target using the method, and method of manufacturing organic light-emitting display apparatus using the sputtering target |
| 01/15/2015 | US20150013913 Microwave plasma processing apparatus |
| 01/15/2015 | US20150013912 Microwave plasma processing apparatus, slot antenna, and semiconductor device |
| 01/15/2015 | US20150013911 Microwave plasma processing apparatus, slot antenna, and semiconductor device |
| 01/15/2015 | US20150013908 Etching apparatus |
| 01/15/2015 | US20150013907 Microwave plasma processing apparatus, slot antenna, and semiconductor device |
| 01/15/2015 | DE112013002323T5 Ladungsteilchenstrahlvorrichtung Charged particle |
| 01/15/2015 | DE112013001852T5 Rasterelektronenmikroskop Scanning electron microscope |
| 01/15/2015 | DE102014008290A1 Mittel und Verfahren zur Probenpräparation Means and methods for sample preparation |
| 01/15/2015 | DE102013011674A1 Verfahren zur Erstellung von Elementverteilungsbildern mit einem Transmissionselektronenmikroskop Process for the production of elemental distribution images using a transmission electron microscope |
| 01/14/2015 | EP2824691A1 Deposition of thick magnetizable films for magnetic devices |
| 01/14/2015 | EP2824690A2 Method of operating a particle beam microscope and a particle beam microscope |
| 01/14/2015 | EP2824448A1 Sample holder for electron backscatter diffraction |
| 01/14/2015 | EP2824445A1 Charged-particle microscope with Raman spectroscopy capability |
| 01/14/2015 | EP2823504A1 Analyser arrangement for particle spectrometer |
| 01/14/2015 | EP2823361A2 Lithography system and method for processing a target, such as a wafer |
| 01/14/2015 | EP2823290A1 System and process for measuring strain in materials at high spatial resolution |
| 01/14/2015 | CN204102853U 一种离子束流密度测量装置 An ion beam current density measuring device |
| 01/14/2015 | CN204102852U 等离子真空泵 Plasma vacuum pump |
| 01/14/2015 | CN1808683B 电子源、以及包括这种电子源的带电粒子设备 Electron source, and comprising such an electron source device charged particles |
| 01/14/2015 | CN104285273A 离子植入系统以及处理基板的方法 Ion implantation system and method for processing a substrate |
| 01/14/2015 | CN104285272A 生成带电粒子涡旋波 Charged particles generated vortex wave |
| 01/14/2015 | CN104282530A 包括等温处理区的等离子体处理设备 Isothermal plasma processing apparatus includes a processing zone |
| 01/14/2015 | CN104282523A 基板处理装置 Substrate processing apparatus |
| 01/14/2015 | CN104282522A 具有离子加速器的双室等离子体蚀刻器 Ion accelerator with a dual-chamber plasma etcher |
| 01/14/2015 | CN104282521A 离子束蚀刻系统 Ion beam etching system |
| 01/14/2015 | CN104282520A 等离子体处理装置和等离子体分布调整方法 Apparatus and plasma processing method to adjust the plasma distribution |
| 01/14/2015 | CN104282519A 等离子体处理装置的清洁方法 The cleaning method of a plasma processing apparatus |
| 01/14/2015 | CN104282518A 等离子体处理装置的清洁方法 The cleaning method of a plasma processing apparatus |
| 01/14/2015 | CN104282517A 带电粒子束系统和操作带电粒子束系统的方法 The charged particle beam system and method for operating the charged particle beam system |
| 01/14/2015 | CN104282516A 带电粒子束系统及操作带电粒子束系统的方法 Charged particle beam system and method for operating the charged particle beam system |
| 01/14/2015 | CN104282515A 带电粒子束系统及操作带电粒子束系统的方法 Charged particle beam system and method for operating the charged particle beam system |
| 01/14/2015 | CN104281185A 射频控制系统及方法、反应腔室、等离子体加工设备 RF control system and method, the reaction chamber, the plasma processing equipment |
| 01/14/2015 | CN104280377A 具有拉曼光谱能力的带电粒子显微镜 Raman spectra of charged particles have the ability microscope |
| 01/14/2015 | CN102693893B 一种利用调频的方式改善高频放电等离子体均匀性的方法 Way to improve a use FM frequency discharge plasma uniformity methods |
| 01/14/2015 | CN102610470B 磁控管和半导体设备 Magnetron and semiconductor equipment |
| 01/14/2015 | CN102592934B 用于超浅结注入的离子源装置 Ion source means for injecting USJ |
| 01/14/2015 | CN102592929B 一种用于产生高亮度飞秒电子脉冲的电子枪装置 Electron gun means for generating a high brightness electron femtosecond pulses |
| 01/14/2015 | CN102394209B 样本厚度的测量和终点确定 Measuring the thickness of the sample is determined and the end |
| 01/14/2015 | CN102110571B 等离子体加工装置 The plasma processing apparatus |
| 01/13/2015 | US8934006 Charged-particle microscope and method for controlling same |
| 01/13/2015 | US8933630 Arc chamber with multiple cathodes for an ion source |
| 01/13/2015 | US8933629 Method for controlling ion energy in radio frequency plasmas |
| 01/13/2015 | US8933628 Inductively coupled plasma source with phase control |
| 01/13/2015 | US8933425 Apparatus and methods for aberration correction in electron beam based system |