| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 01/15/2009 | WO2009007448A2 Magnetron co-sputtering device |
| 01/15/2009 | WO2008132734A3 Focused ion beam deep nano- patterning method |
| 01/15/2009 | WO2008123391A3 Apparatus and method for plasma doping |
| 01/15/2009 | WO2008032856A3 Plasma generator and work processing apparatus provided with the same |
| 01/15/2009 | US20090014725 Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device |
| 01/15/2009 | US20090014651 Charged particle beam equipments, and charged particle beam microscope |
| 01/14/2009 | EP2015343A2 High temperature cathode for plasma etching |
| 01/14/2009 | EP2015342A2 Charged particle beam equipments, and charged particle beam microscope |
| 01/14/2009 | EP2013894A1 High power impulse magnetron sputtering vapour deposition |
| 01/14/2009 | EP2013893A2 Methods and systems for trapping ion beam particles and focusing an ion beam |
| 01/14/2009 | EP1210724B1 Method of determining etch endpoint using principal components analysis of optical emission spectra |
| 01/14/2009 | CN201181693Y Upper electrode of semiconductor etching equipment |
| 01/14/2009 | CN201181274Y Wireless controlling mechanism for micro-nano sample under electronic microscope |
| 01/14/2009 | CN201181273Y Controlling mechanism for micro-nano sample under electronic microscope |
| 01/14/2009 | CN101346796A Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 01/14/2009 | CN101346795A Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 01/14/2009 | CN101346032A Barometric pressure microwave plasma generation device |
| 01/14/2009 | CN101346030A Controllable multi-component cathode arc plasma forming apparatus and method |
| 01/14/2009 | CN101345184A Plasma processing apparatus, gas dispensing device and gas delivery method |
| 01/14/2009 | CN100452945C Decoupling reactive ion etching chamber containing multiple processing platforms |
| 01/14/2009 | CN100452944C Plasma processing device |
| 01/13/2009 | US7476880 Writing a circuit design pattern with shaped particle beam flashes |
| 01/13/2009 | US7476879 Placement effects correction in raster pattern generator |
| 01/13/2009 | US7476878 Techniques for reducing effects of photoresist outgassing |
| 01/13/2009 | US7476877 Wafer charge monitoring |
| 01/13/2009 | US7476875 Contact opening metrology |
| 01/13/2009 | US7476872 Method and apparatus for observing inside structures, and specimen holder |
| 01/13/2009 | US7476869 Gas distributor for ion source |
| 01/13/2009 | US7476868 Apparatus and method for generating ions of an ion implanter |
| 01/13/2009 | US7476858 Particle detection auditing system and method |
| 01/13/2009 | US7476857 Tool-to-tool matching control method and its system for scanning electron microscope |
| 01/13/2009 | US7476856 Sample dimension-measuring method and charged particle beam apparatus |
| 01/13/2009 | US7476855 Beam tuning with automatic magnet pole rotation for ion implanters |
| 01/13/2009 | US7476301 Procedure and device for the production of a plasma |
| 01/08/2009 | WO2009003552A2 Treatment system for flat substrates |
| 01/08/2009 | WO2008136029A8 Apparatus for the cold plasma treatment of a continuous web material |
| 01/08/2009 | WO2008130507A3 Plasma source with segmented magnetron cathode |
| 01/08/2009 | WO2008014332A3 Methods and apparatuses for directing an ion beam source |
| 01/08/2009 | US20090008578 Method and apparatus for specimen fabrication |
| 01/08/2009 | US20090008577 Conformal Doping Using High Neutral Density Plasma Implant |
| 01/08/2009 | US20090008551 Electron beam apparatus with aberration corrector |
| 01/08/2009 | US20090008363 Plasma processing apparatus and a plasma processing method |
| 01/08/2009 | US20090008245 Method for Connecting Magnetic Substance Target to Backing Plate, and Magnetic Substance Target |
| 01/08/2009 | US20090008033 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 01/08/2009 | DE10232179B4 PVD-Verfahren PVD-method |
| 01/08/2009 | DE102008030052A1 Schreibverfahren mit einem geladenen Teilchenstrahl The writing method using a charged particle beam |
| 01/08/2009 | DE102004019060B4 Vorrichtung zum Einbringen einer Lichtbogenquelle in eine Beschichtungsanlage für große Substrate oder Bänder Device for inserting an arc source in a coating system for large substrates or tapes |
| 01/08/2009 | CA2688522A1 Treatment system for flat substrates |
| 01/07/2009 | EP2012342A2 Hybrid etch chamber with decoupled plasma controls |
| 01/07/2009 | EP2012341A1 Modular gas ion source |
| 01/07/2009 | EP2010312A1 Method and apparatus for nanopowder and micropowder production using axial injection plasma spray |
| 01/07/2009 | EP1856303B1 Single, right-angled end-block |
| 01/07/2009 | EP1497635A4 Specimen holding apparatus |
| 01/07/2009 | EP1230667B1 Method and apparatus for controlling the volume of a plasma |
| 01/07/2009 | EP1214459B1 Pulsed plasma processing method and apparatus |
| 01/07/2009 | EP1147241B1 Diffusion bonded sputter target assembly and method of making same |
| 01/07/2009 | CN201177870Y DC combination electric field and ion stream density measuring system |
| 01/07/2009 | CN101341570A Technique for providing an inductively coupled radio frequency plasma flood gun |
| 01/07/2009 | CN101340968A Microwave plasma abatement apparatus |
| 01/07/2009 | CN101339895A Gas distribution device and plasma processing apparatus applying the same |
| 01/07/2009 | CN100449708C Substrate processing apparatus |
| 01/06/2009 | US7474604 Electron beam recorder, electron beam irradiation position detecting method and electron beam irradiation position controlling method |
| 01/06/2009 | US7473913 Gantry system for a particle therapy facility |
| 01/06/2009 | US7473910 Electron beam lithography apparatus |
| 01/06/2009 | US7473909 Use of ion induced luminescence (IIL) as feedback control for ion implantation |
| 01/06/2009 | US7473638 Plasma-enhanced cyclic layer deposition process for barrier layers |
| 01/06/2009 | US7473332 Method for processing semiconductor |
| 01/02/2009 | DE112006003519T5 Verfahren und Vorrichtung für Downstream Gasdissoziation Method and apparatus for downstream gas dissociation |
| 12/31/2008 | WO2009002736A2 High voltage insulator for preventing instability in an ion implanter due to triple-junction breakdown |
| 12/31/2008 | WO2009002692A2 Cathode having electron production and focusing grooves, ion source and related method |
| 12/31/2008 | WO2009000933A1 Method and device for the treatment of a semiconductor substrate |
| 12/31/2008 | WO2009000932A1 Method and device for the treatment of a semiconductor substrate |
| 12/31/2008 | WO2009000930A1 Arrangement and method for processing a substrate |
| 12/31/2008 | WO2008118738A3 Apparatus and methods of forming a gas cluster ion beam using a low-pressure source |
| 12/31/2008 | EP2009670A1 Sputtering Device, Magnetron Electrode and Electrode Arrangement |
| 12/31/2008 | EP2008294A1 Electron-optical corrector for aplanatic imaging systems |
| 12/31/2008 | EP2007923A1 Etching process |
| 12/31/2008 | EP1941531B1 Electron-optical corrector for an aplanatic imaging system |
| 12/31/2008 | EP0871795B1 A scalable helicon wave plasma processing device with a non-cylindrical source chamber |
| 12/31/2008 | CN101335193A Hybrid etch chamber with decoupled plasma controls |
| 12/31/2008 | CN101335192A Substrate processing apparatus and shower head |
| 12/31/2008 | CN101335176A Local ion infusion device and method |
| 12/31/2008 | CN101333666A Plasma generating method, cleaning method, substrate processing method |
| 12/31/2008 | CN100447952C Ion doping device, ion doping method and semiconductor device |
| 12/31/2008 | CN100447935C Apparatus and methods for minimizing arcing in a plasma processing chamber |
| 12/31/2008 | CN100447934C Vacuum cathode arc straight tube filter |
| 12/31/2008 | CN100447297C Microwave plasma processing method |
| 12/31/2008 | CN100447289C Plasma-assisted nitrogen surface treatment |
| 12/30/2008 | US7471035 Internal conductively-heated cathode |
| 12/30/2008 | US7470918 Method and apparatus for processing a micro sample |
| 12/30/2008 | US7470915 Detector system of secondary and backscattered electrons for a scanning electron microscope |
| 12/30/2008 | US7470901 Charged particle spectrometer and detector therefor |
| 12/30/2008 | US7470627 Wafer area pressure control for plasma confinement |
| 12/30/2008 | US7470626 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure |
| 12/30/2008 | US7470329 Method and system for nanoscale plasma processing of objects |
| 12/30/2008 | US7469715 Chamber isolation valve RF grounding |
| 12/30/2008 | US7469654 Plasma processing device |
| 12/30/2008 | CA2268659C Rectangular cathodic arc source and method of steering an arc spot |
| 12/25/2008 | US20080318432 Reactor with heated and textured electrodes and surfaces |
| 12/25/2008 | US20080315464 Method of manufacturing a composite filter media |