| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/04/2009 | CN101361409A Work piece processing system and plasma body generating apparatus |
| 02/04/2009 | CN101361160A Ion beam angle measurement systems and methods for ion implantation systems |
| 02/04/2009 | CN101361159A Ion sources, systems and methods |
| 02/04/2009 | CN101361158A Ion sources, systems and methods |
| 02/04/2009 | CN101361157A Ion sources, systems and methods |
| 02/04/2009 | CN101361156A Charged particle radiation therapy |
| 02/04/2009 | CN101361153A Ion sources, systems and methods |
| 02/04/2009 | CN101359613A Tft array detection device |
| 02/04/2009 | CN101359583A Plasma processing apparatus of batch type |
| 02/04/2009 | CN101359580A Substrate processing apparatus having a sensing unit |
| 02/04/2009 | CN100459059C Plasma processing method and apparatus |
| 02/04/2009 | CN100459028C Substrate board treatment device and reaction container |
| 02/04/2009 | CN100459027C Monitoring substrate processing using reflected radiation |
| 02/03/2009 | US7486773 Megavoltage scatter radiation measurement using beam stop array |
| 02/03/2009 | US7485880 Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method |
| 02/03/2009 | US7485874 Apparatus for manufacturing semiconductor substrates |
| 02/03/2009 | US7485204 ECR plasma source and ECR plasma device |
| 02/03/2009 | US7484473 Suspended gas distribution manifold for plasma chamber |
| 02/03/2009 | CA2336594C Vacuum tight coupling for tube sections |
| 01/29/2009 | WO2009014811A2 Ice layers in charged particle systems and methods |
| 01/29/2009 | WO2009014698A1 Methods and apparatus for measuring thickness of etching residues on a substrate |
| 01/29/2009 | WO2009013422A2 Reconfigurable logic cell made up of double-gate mosfet transistors |
| 01/29/2009 | WO2009012974A1 Method for the protection of high-frequency amplifiers of a plasma supply device and plasma supply device |
| 01/29/2009 | WO2009012973A2 Method for the protection of high-frequency amplifiers of a plasma supply device and plasma supply device |
| 01/29/2009 | WO2009012969A2 Plasma supply arrangement |
| 01/29/2009 | WO2009012966A1 Method for operation of a plasma supply device and a plasma supply device |
| 01/29/2009 | WO2009012868A1 Plasma supply system |
| 01/29/2009 | WO2009012867A2 Plasma supply device |
| 01/29/2009 | WO2009012866A1 Plasma supply device |
| 01/29/2009 | WO2009012863A1 Measurement method and measurement device for a plasma supply device |
| 01/29/2009 | WO2009012849A1 Plasma supply device and method for operation of a full bridge of a plasma supply device |
| 01/29/2009 | WO2009012848A1 Method and arrangement for measurement of parameters of a plasma supply device |
| 01/29/2009 | WO2009012826A1 Radio-frequency power supply arrangement, in particular a plasma supply device and method for operation of a radio-frequency power supply arrangement |
| 01/29/2009 | WO2009012825A1 Radio-frequency power supply arrangement, in particular a plasma supply device and method for operation of a radio-frequency power supply device |
| 01/29/2009 | WO2009012804A1 Method for determining the wave delay time between at least one inverter in a plasma power supply device and a load connected thereto |
| 01/29/2009 | WO2009012803A1 Method for operating at least one inverter in a plasma power supply device, and a plasma power supply device |
| 01/29/2009 | WO2009012735A1 Plasma supply device |
| 01/29/2009 | WO2008140273A3 Magnetic deflector for an electron column |
| 01/29/2009 | WO2008133876A3 Cooling shield for substrate processing chamber |
| 01/29/2009 | WO2008106448A3 Ion sources and methods of operating an electromagnet of an ion source |
| 01/29/2009 | WO2008092936A3 Method and apparatus for measuring process parameters of a plasma etch process |
| 01/29/2009 | US20090026912 Intensity modulated electron beam and application to electron beam blanker |
| 01/29/2009 | US20090026390 Techniques for plasma injection |
| 01/29/2009 | US20090025877 Flat panel display manufacturing apparatus |
| 01/29/2009 | US20090025632 Vacuum treatment installation for the production of a disk-shaped workpiece based on a dielectric substrate |
| 01/28/2009 | EP2019415A1 Multi-beam source |
| 01/28/2009 | EP2019414A1 Magnetic lens assembly |
| 01/28/2009 | EP2019413A1 Electrostatic lens assembly |
| 01/28/2009 | EP2019412A2 Gas field ion source for multiple applications |
| 01/28/2009 | EP2018653A2 Arc source and magnet arrangement |
| 01/28/2009 | EP1627413B1 A high density plasma reactor |
| 01/28/2009 | CN201188414Y Window for monitoring gas reaction chamber |
| 01/28/2009 | CN101355005A Electron beam generating apparatus for generating flat-plate shape plasma |
| 01/28/2009 | CN101355004A Plasma reactor with reduced electrical skew using electrical bypass elements |
| 01/28/2009 | CN100456427C Method and device for controlling ion implantation |
| 01/28/2009 | CN100456416C Method and apparatus for tuning ion implanters |
| 01/27/2009 | US7483560 Method for measuring three dimensional shape of a fine pattern |
| 01/27/2009 | US7482757 Inductively coupled high-density plasma source |
| 01/27/2009 | US7482598 Techniques for preventing parasitic beamlets from affecting ion implantation |
| 01/27/2009 | US7482586 Methods for sample preparation and observation, charged particle apparatus |
| 01/27/2009 | US7482283 Thin film forming method and thin film forming device |
| 01/27/2009 | US7481944 Etch amount detection method, etching method, and etching system |
| 01/27/2009 | US7481904 Plasma device |
| 01/27/2009 | US7481903 Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism |
| 01/27/2009 | US7481886 Plasma process system and plasma process method |
| 01/27/2009 | CA2499235C Method of cleaning ion source, and corresponding apparatus/system |
| 01/27/2009 | CA2487135C Fragmentation methods for mass spectrometry |
| 01/27/2009 | CA2314039C Uv radiation system having materials for selectively attenuating radiation |
| 01/22/2009 | WO2009011574A1 Lithography system, method of clamping and wafer table |
| 01/22/2009 | WO2009011406A1 Device for monitoring device for introducing gas for analysis device |
| 01/22/2009 | WO2009010792A2 Plasma reactor |
| 01/22/2009 | WO2008147184A3 Atmospheric pressure glow discharge plasma method and system using heated substrate |
| 01/22/2009 | WO2008071734A3 Arc suppression and pulsing in high power impulse magnetron sputtering (hipims) |
| 01/22/2009 | WO2008071732A3 Rf substrate bias with high power impulse magnetron sputtering (hipims) |
| 01/22/2009 | US20090020698 Charged particle beam apparatus, and sample processing and observation method |
| 01/22/2009 | DE10235981B9 Teilchenoptische Vorrichtung und Elektronenmikroskop A particle-optical and electron microscope |
| 01/21/2009 | EP2016610A1 A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus |
| 01/21/2009 | EP2016609A1 Electrode systems and methods of using electrodes |
| 01/21/2009 | EP2016204A2 Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement |
| 01/21/2009 | EP1678736A4 Plasma immersion ion implantation using conductive mesh |
| 01/21/2009 | EP1121705B1 Electric supply unit for plasma installations |
| 01/21/2009 | CN201185171Y Electrode capable of improving plasma evenness |
| 01/21/2009 | CN101351865A Method of manufacturing at least one sputter-coated substrate and sputter source |
| 01/21/2009 | CN101351076A Apparatus for processing plasma |
| 01/21/2009 | CN101350303A Dielectric etch method with high density and low bombardment energy plasma providing high etch rates |
| 01/21/2009 | CN101348902A Diffuser plate with slit valve compensation |
| 01/21/2009 | CN100455158C Plasma process apparatus and its processor |
| 01/21/2009 | CN100455144C Plasma-assisted heat treatment |
| 01/21/2009 | CN100454495C Semiconductor manufacturing equipment |
| 01/21/2009 | CN100454145C Method of charged particle beam lithography and equipment for charged particle beam lithography |
| 01/21/2009 | CN100453695C Microwave plasma processing device and plasma processing gas supply member |
| 01/20/2009 | US7480571 Apparatus and methods for improving the stability of RF power delivery to a plasma load |
| 01/20/2009 | US7479644 Ion beam diagnostics |
| 01/20/2009 | US7479643 Ion implantation ion source, system and method |
| 01/20/2009 | US7479632 E-beam vision system for monitoring and control |
| 01/20/2009 | US7478609 Plasma process apparatus and its processor |
| 01/15/2009 | WO2009009212A1 Methods and apparatus for the production of group iv nanoparticles in a flow-through plasma reactor |
| 01/15/2009 | WO2009008549A1 Device and method for introducing gas for analysis device |
| 01/15/2009 | WO2009008254A1 Electron source |
| 01/15/2009 | WO2009007668A1 Transmission electron microscope |