| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/25/2009 | CN101373694A Ion implantation apparatus |
| 02/24/2009 | US7495245 Apparatus and method for controlled particle beam manufacturing |
| 02/24/2009 | US7495243 Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium |
| 02/24/2009 | US7495242 Apparatus and method for controlled particle beam manufacturing |
| 02/24/2009 | US7495241 Ion beam irradiation apparatus and insulating spacer for the same |
| 02/24/2009 | US7495216 Electron beam apparatus for work function measurements |
| 02/24/2009 | US7494941 Manufacturing method of semiconductor device, and substrate processing apparatus |
| 02/24/2009 | US7494905 Method for preparing a source material including forming a paste for ion implantation |
| 02/24/2009 | US7494561 Plasma processing apparatus and method, and electrode plate for plasma processing apparatus |
| 02/19/2009 | WO2009022603A1 Method and apparatus for correcting photomask defect |
| 02/19/2009 | WO2009022184A2 Low impedance plasma |
| 02/19/2009 | WO2009002736A3 High voltage insulator for preventing instability in an ion implanter due to triple-junction breakdown |
| 02/19/2009 | WO2008096211A3 Measurement of critical dimensions of semiconductor wafers |
| 02/19/2009 | WO2008056158A3 Component mounting in movement-sensitive equipment |
| 02/19/2009 | WO2008047079A3 Electron beam influencing in an electron beam lithography machine |
| 02/19/2009 | US20090045338 Inspection method and apparatus using an electron beam |
| 02/19/2009 | US20090045336 Scanning probe microscopy cantilever, corresponding manufacturing method, scanning probe microscope, and scanning method |
| 02/19/2009 | US20090044910 Plasma Processing Apparatus |
| 02/19/2009 | US20090044909 Plasma processing apparatus |
| 02/18/2009 | EP2026376A2 Electrical supply unit for plasma systems |
| 02/18/2009 | EP2026375A2 Electrical supply unit for plasma systems |
| 02/18/2009 | EP2026374A2 Plasma processing apparatus, plasma processing method and storage medium |
| 02/18/2009 | EP2026373A1 Positioning device for positioning an aperture in an ion beam |
| 02/18/2009 | EP2025775A1 Photon induced cleaning of a reaction chamber |
| 02/18/2009 | EP2024987A1 Temperature control method for photolithographic substrate |
| 02/18/2009 | EP2024750A2 Compact scanning electron microscope |
| 02/18/2009 | EP2024733A2 Compact scanning electron microscope |
| 02/18/2009 | EP2024732A2 User interface for an electron microscope |
| 02/18/2009 | EP2024530A1 A rotatable sputter target |
| 02/18/2009 | EP1799876B1 Flat end-block for carrying a rotatable sputtering target |
| 02/18/2009 | CN101371328A Methods and apparatus for ion beam angle measurement in two dimensions |
| 02/18/2009 | CN101371327A Technique for improving uniformity of a ribbon beam |
| 02/18/2009 | CN101371326A Ion sources, systems and methods |
| 02/18/2009 | CN101370957A Cathode evaporator |
| 02/18/2009 | CN101370350A Plasma processing system, antenna, and use of plasma processing system |
| 02/18/2009 | CN101370349A Plasma processing apparatus, plasma processing method and storage medium |
| 02/18/2009 | CN101369518A Plasma species and uniformity control through pulsed VHF operation |
| 02/18/2009 | CN101369515A Reaction cavity |
| 02/18/2009 | CN101369509A Improvements relating to ion implanters |
| 02/18/2009 | CN101369508A Detaching device for insulating sleeve of ion implanter |
| 02/18/2009 | CN100463120C Plasma igniting method and substrate processing method |
| 02/18/2009 | CN100463112C Apparatus for semiconductor device |
| 02/18/2009 | CN100463099C Ion source |
| 02/18/2009 | CN100462475C Apparatus and method for plasma processing |
| 02/17/2009 | US7492105 Method of detecting an arc in a glow-discharge device and apparatus for controlling a high-frequency arc discharge |
| 02/17/2009 | US7491953 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions |
| 02/17/2009 | US7491952 Method for controlling charge amount of ion beam and a wafer applied in the method |
| 02/17/2009 | US7491946 Electrostatic deflection system for corpuscular radiation |
| 02/17/2009 | US7491945 Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device |
| 02/17/2009 | US7491933 Electron beam apparatus |
| 02/17/2009 | US7491918 Electron beam detection device and electron tube |
| 02/17/2009 | US7491908 Plasma processing device and ashing method |
| 02/17/2009 | US7491649 Plasma processing apparatus |
| 02/17/2009 | US7491429 Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG) |
| 02/12/2009 | WO2009020208A1 Radial multipolar type layout lens, and charged particle optical system device using the lens |
| 02/12/2009 | WO2009020151A1 Composite focused ion beam apparatus, and machining monitoring method and machining method using composite focused ion beam apparatus |
| 02/12/2009 | WO2009020150A1 Composite focused ion beam apparatus, and machining monitoring method and machining method using composite focused ion beam apparatus |
| 02/12/2009 | WO2009019805A1 Secondary electron detector |
| 02/12/2009 | WO2009019156A2 Method and device for the plasma-aided treatment of surfaces |
| 02/12/2009 | US20090041951 gas flows through gap adjacent to confinement ring to provide physical confinement of plasma |
| 02/12/2009 | US20090041333 Scanning electron microscope |
| 02/12/2009 | US20090039289 Positioning device for positioning an aperture plate in an Ion Beam |
| 02/12/2009 | US20090039262 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 02/12/2009 | US20090039261 Pattern Inspection Method and Pattern Inspection System |
| 02/12/2009 | US20090039259 Scanning electron microscope |
| 02/12/2009 | DE102005049066B4 Elektronenstrahl-Einrichtung und Verfahren zum Herstellen einer Halbleitervorrichtung Electron beam device and method of manufacturing a semiconductor device |
| 02/12/2009 | DE102005019100B4 Magnetsystem für eine Zerstäubungskathode Magnet system for a sputtering cathode |
| 02/11/2009 | EP2023373A2 Charged particle beam apparatus and irradiation method |
| 02/11/2009 | EP2023372A1 Electrostatic Lens Unit |
| 02/11/2009 | EP2022088A2 Producing soi structure using high-purity ion shower |
| 02/11/2009 | EP2022073A1 Front plate for an ion source |
| 02/11/2009 | CN201194232Y Plasma body etching machine |
| 02/11/2009 | CN201194213Y Pore type electrode having uniform electric field distribution |
| 02/11/2009 | CN101366095A Ion sources, systems and methods |
| 02/11/2009 | CN101365290A Semiconductor apparatus using an ion beam |
| 02/11/2009 | CN101365289A Device and method for injecting ion on inner surface of hollow cathode coupling positive voltage bias voltage tube |
| 02/11/2009 | CN100460892C System for measuring electronic beam scan uniformity |
| 02/10/2009 | US7488961 Charged particle beam irradiation method and charged particle beam apparatus |
| 02/10/2009 | US7488960 Apparatus and method for controlled particle beam manufacturing |
| 02/10/2009 | US7488959 Apparatus and method for partial ion implantation |
| 02/10/2009 | US7488938 Charge-control method and apparatus for electron beam imaging |
| 02/10/2009 | US7488937 Method and apparatus for the improvement of material/voltage contrast |
| 02/10/2009 | US7487740 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates |
| 02/05/2009 | WO2009018460A2 High-bandwidth actuator drive for scanning probe microscopy |
| 02/05/2009 | WO2009018244A1 Method and system for increasing throughput during location specific processing of a plurality of substrates |
| 02/05/2009 | WO2009017981A1 Apparatus and methods for treating a workpiece using a gas cluster ion beam |
| 02/05/2009 | WO2009017291A1 Scanning micrometer using heterodyne interferometer |
| 02/05/2009 | WO2009016331A2 Pattern writing on a rotating substrate |
| 02/05/2009 | WO2009015615A1 A device providing a live three-dimensional image of a specimen |
| 02/05/2009 | WO2008150822A3 Charge transport materials for luminescent applications |
| 02/05/2009 | WO2008128536A3 Anode for producing a plasma by way of electric arc discharges |
| 02/05/2009 | WO2008128535A3 Arrangement for producing coatings on substrates in vacuo |
| 02/05/2009 | WO2008128532A3 Nanorobot module automation and exchange |
| 02/05/2009 | US20090032726 Ion implanter having combined hybrid and double mechanical scan architecture |
| 02/05/2009 | US20090032710 Scanning electron microscope |
| 02/05/2009 | US20090032708 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 02/05/2009 | US20090032143 Electron beam enhanced nitriding system |
| 02/04/2009 | EP2020674A2 Electron microscope with electron spectrometer |
| 02/04/2009 | EP2020673A2 Aberration correction system |
| 02/04/2009 | CN201191595Y Thermal drive deforming transmission electric mirror grid |