| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/11/2009 | CN101383314A Substrate table substrate processing apparatus and temperature control method |
| 03/11/2009 | CN101383278A Plasma body restraint apparatus and plasma body processing device |
| 03/11/2009 | CN101383272A Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection |
| 03/11/2009 | CN101383269A Recycling method of monitoring tablet |
| 03/11/2009 | CN101383266A Reaction cavity |
| 03/11/2009 | CN101383261A Scanning electron microscope |
| 03/11/2009 | CN101381861A Film formation method |
| 03/11/2009 | CN100468677C Method for nitride spacer etch process and etching endpoint detection system |
| 03/11/2009 | CN100468632C Water-cooling plasma shower |
| 03/11/2009 | CN100468630C Method and equipment for forming crystalline silicon thin film |
| 03/11/2009 | CN100468613C Method and apparatus for removing material from a substrate surface |
| 03/11/2009 | CN100468611C Method and apparatus for cleaning of native oxide with hydrogen-containing radicals |
| 03/11/2009 | CN100468606C One-dimensional mechanical scaning device of ion implantation apparatus |
| 03/11/2009 | CN100468605C Adjustable implantation angle workpiece support structure for an ion beam implanter |
| 03/11/2009 | CN100468604C System and method for removing particles entrained in ion beam |
| 03/11/2009 | CN100467662C High peak power plasma pulsed supply with arc handling capacity |
| 03/11/2009 | CA2601631A1 Picking out specific difference between two dna that come from the same parts of the body but express different regulatory or phenotype features via observing the entire strands to strands as one big comparison and where most everything is almost the same except single or little groups of genes |
| 03/10/2009 | US7501644 Apparatus and method for controlled particle beam manufacturing |
| 03/10/2009 | US7501643 Method for controlling charge amount of ion beam and a wafer applied in the method |
| 03/10/2009 | US7501638 Charged particle beam emitting device and method for operating a charged particle beam emitting device |
| 03/10/2009 | US7501600 Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 03/10/2009 | US7501214 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 03/10/2009 | US7501161 Placing a substrate on a substrate holder of a plasma chamber; positioning a cover frame adjacent and below a perimeter of the substrate; employing the cover frame to reduce arcing during plasma processing within the plasma chamber; display and/or semiconductor device manufacturing |
| 03/10/2009 | US7500445 Method and apparatus for cleaning a CVD chamber |
| 03/05/2009 | WO2009029560A1 Terminal structures of an ion implanter having insulated conductors with dielectric fins |
| 03/05/2009 | WO2009028065A1 Ion implantation device, substrate clamping mechanism, and ion implantation method |
| 03/05/2009 | WO2009027905A2 Sputtering system |
| 03/05/2009 | WO2009027156A1 System for analysing a low pressure gas by optical emission spectroscopy |
| 03/05/2009 | WO2008107189A3 Objective lens |
| 03/05/2009 | WO2008009559A3 Device and method for producing and/ or confining a plasma |
| 03/05/2009 | US20090059774 Method of storing a data bit in a phase change alloy material with an electron beam |
| 03/05/2009 | US20090057573 Techniques for terminal insulation in an ion implanter |
| 03/05/2009 | US20090057556 Method and apparatus of an inspection system using an electron beam |
| 03/05/2009 | US20090057555 Scanning electron microscope |
| 03/05/2009 | US20090057133 Method and Apparatus for Reactive Solid-Gas Plasma Deposition |
| 03/05/2009 | US20090056626 Apparatus for cyclical depositing of thin films |
| 03/05/2009 | DE10339404B4 Anordnung zur Analyse der Elektronenspin-Polarisation in parallel abbildenden Elektronenmikroskopen Arrangement for the analysis of the electron spin polarization in parallel imaging electron microscopes |
| 03/05/2009 | DE102007040921A1 Vorrichtung zur Messung eines Teilchenstroms An apparatus for measuring a particle flow |
| 03/04/2009 | EP2031633A1 Gas ion source with high mechanical stability |
| 03/04/2009 | EP2031088A2 Wet clean process for recovery of chamber parts |
| 03/04/2009 | EP2031084A2 Sputtering method and apparatus |
| 03/04/2009 | EP2030226A1 Plasma etching chamber |
| 03/04/2009 | EP2030221A1 Insert piece for an end-block of a sputtering installation |
| 03/04/2009 | EP2030220A2 Dose close loop control for ion implantation |
| 03/04/2009 | EP2030219A2 Beam angle adjustment in ion implanters |
| 03/04/2009 | EP2029789A1 Vacuum coating apparatus |
| 03/04/2009 | EP1943660B1 Charged particle beam exposure system |
| 03/04/2009 | EP1878039B1 Plasma amplifier for plasma treatment plant |
| 03/04/2009 | EP1357583B1 Sheet-fed treating device |
| 03/04/2009 | CN101379585A Device for sustaining differential vacuum degrees for electron column |
| 03/04/2009 | CN101379584A Particle-optical component |
| 03/04/2009 | CN101379583A Flourine based cleaning of an ion source |
| 03/04/2009 | CN101378616A Atmosphere plasma cylindrical microwave excitation cavity |
| 03/04/2009 | CN101378615A Microwave plasma flare waveguide excitation cavity |
| 03/04/2009 | CN101378031A Substrate carrier plateform and substrate processing device |
| 03/04/2009 | CN101378007A Plasma processing apparatus |
| 03/04/2009 | CN101378003A Alternate gas delivery and evacuation system for plasma processing apparatuses |
| 03/04/2009 | CN101377994A Filament for electromagnetic biprism deflexion electron beam and preparation method thereof |
| 03/04/2009 | CN100466879C Neutral particle beam processing apparatus |
| 03/04/2009 | CN100466193C Plasma processing device and ashing method |
| 03/04/2009 | CN100466162C Edge flow faceplate used for improving CVD film properties |
| 03/04/2009 | CN100466161C Gas distribution apparatus used for semiconductor processing |
| 03/04/2009 | CN100466155C Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
| 03/04/2009 | CN100466154C Device for the treatment of a web-type material in a plasma-assisted process |
| 03/04/2009 | CN100466153C Method and apparatus for an improved deposition shield in a plasma processing system |
| 03/04/2009 | CN100466152C Electrode for plasma processes and method for manufacture and application method thereof |
| 03/04/2009 | CN100466151C An extractor for an microcolumn, an alignment method for an extractor aperture and an electon emitter |
| 03/03/2009 | US7498592 Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams |
| 03/03/2009 | US7498591 Critical dimension effects correction in raster pattern generator |
| 03/03/2009 | US7498590 Scan pattern for an ion implanter |
| 03/03/2009 | US7498586 Ion source control system |
| 03/03/2009 | US7498585 Method and apparatus for simultaneous detection and measurement of charged particles at one or more levels of particle flux for analysis of same |
| 03/03/2009 | US7497964 Plasma igniting method and substrate processing method |
| 02/26/2009 | WO2009026521A1 Sealing between vacuum chambers |
| 02/26/2009 | WO2009026340A2 Insulated conducting device with multiple insulation segments |
| 02/26/2009 | WO2009025394A2 Plasma processing device |
| 02/26/2009 | WO2009025393A2 Plasma processing device and plasma discharge state monitoring device |
| 02/26/2009 | WO2009025392A2 Plasma processing device and method of monitoring plasma discharge state in plasma processing device |
| 02/26/2009 | WO2009024669A2 Device for providing a high energy x-ray beam |
| 02/26/2009 | WO2009024533A1 Apparatus and method for producing epitaxial layers |
| 02/26/2009 | WO2009024347A1 Device and method for generating plasma by low-frequency inductive excitation |
| 02/26/2009 | WO2009002692A3 Cathode having electron production and focusing grooves, ion source and related method |
| 02/26/2009 | US20090053835 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring |
| 02/26/2009 | US20090050825 Sealing between vacuum chambers |
| 02/26/2009 | US20090050822 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus |
| 02/26/2009 | US20090050803 Charged particle beam device |
| 02/26/2009 | DE19964580B4 Verfahren zum Überprüfen eines Objektbelichtungsmusters A method for checking an object exposure pattern |
| 02/26/2009 | DE102008035297A1 Aberrationskorrektureinrichtung für Ladungsteilchenstrahlen in einem optischen System einer Ladungsteilchenstrahlvorrichtung und Ladungsteilchenstrahlvorrichtung mit der Aberrationskorrektureinrichtung Aberration corrector for charged particle in an optical system of a charged and charged particle beam with the aberration corrector |
| 02/26/2009 | DE10119766B4 RF Plasma Reaktor RF plasma reactor |
| 02/26/2009 | CA2703499A1 Apparatus and method for producing epitaxial layers |
| 02/25/2009 | EP2028288A1 Target in the shape of a cylinder for cathodic arc coating with continuous groove to control arc |
| 02/25/2009 | EP2027601A2 Method and apparatus for extracting ions from an ion source for use in ion implantation |
| 02/25/2009 | EP2027594A2 Apparatus and method for controlled particle beam manufacturing |
| 02/25/2009 | EP1421608A4 Method and system for single ion implantation |
| 02/25/2009 | EP1187187B1 Plasma processing apparatus |
| 02/25/2009 | CN101375366A Improved sputter target utilization |
| 02/25/2009 | CN101375363A Diamond electron radiation cathode, electron source, electron microscope, and electron beam exposer |
| 02/25/2009 | CN101374381A Method and system for matching radio frequency impedance |
| 02/25/2009 | CN101373731A Electrostatic chuck apparatus and temperature control method thereof |
| 02/25/2009 | CN101373702A Cavity inner lining and reaction cavity |