Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/2009
04/01/2009CN100474521C Temperature controlled hot edge ring assembly, and device comprising the same and the use thereof
04/01/2009CN100474508C Plasma treatment apparatus
04/01/2009CN100474495C Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing
04/01/2009CN100474494C In-process wafer charge monitor and control system for ion implanter
04/01/2009CN100473974C Time-resolved measurement apparatus
03/2009
03/31/2009US7511289 Working method utilizing irradiation of charged particle beam onto sample through passage in gas blowing nozzle
03/31/2009US7511288 Ion implantation device
03/31/2009US7511287 Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases
03/31/2009US7511283 Ultraviolet disinfection device
03/31/2009US7511281 Ultraviolet light treatment chamber
03/31/2009US7511272 Method for controlling charged particle beam, and charged particle beam apparatus
03/31/2009US7511271 Scanning electron microscope
03/31/2009US7510667 Plasma processing method and apparatus
03/31/2009US7510666 Time continuous ion-ion plasma
03/26/2009WO2009039261A1 Method and apparatus for surface processing of a substrate using an energetic particle beam
03/26/2009WO2009036722A2 Device for the plasma treatment of workpieces
03/26/2009WO2009036579A1 Apparatus for plasma supported coating of the inner surface of tube-like packaging containers made of plastics with the assistance of a non-thermal reactive ambient pressure beam plasma
03/26/2009WO2008104393A3 Device for the field emission of particles and production method
03/26/2009US20090081848 Wafer bonding activated by ion implantation
03/26/2009US20090081415 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process
03/26/2009US20090078888 Method and Apparatus For Detecting and Adjusting Substrate Height
03/26/2009US20090078869 Magnetic electron microscope
03/26/2009US20090078867 Method and system for generating and reviewing a thin sample
03/26/2009US20090078375 Plasma Processing Apparatus And Method
03/26/2009DE10215369B4 Kathodenzerstäubungsgerät zur Ausbildung eines Metallfilms unter Verwendung eines Magnetfeldes A sputtering cathode apparatus for forming a metal film using a magnetic field
03/26/2009DE102008040160A1 Treating optical elements by plasma, which is ignited to exist on surface of optical element to be treated and is present in cavity, for microlithography system, comprises forming a side from the cavity through the surface to be treated
03/25/2009EP2039801A1 Method for forming thin film
03/25/2009EP2038912A1 Apparatus for electron beam evaporation
03/25/2009EP1641956B1 Rotating tubular sputter target assembly
03/25/2009EP1618587B1 Beam uniformity and angular distribution measurement system
03/25/2009EP1549923A4 Fragmentation methods for mass spectrometry
03/25/2009EP1491255A4 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
03/25/2009CN101394948A Method and device for the continuous plasma treatment of materials, in particular for the descaling of a metal strand
03/25/2009CN101394705A Apparatus for generating atmosphere pressure microwave glow plasma
03/25/2009CN101393947A Process and device for coating silver on molybdenum foil used for solar cell paddle of aerospace aircraft
03/25/2009CN101393092A Method for making scanning electron microscope example for assembling nanometer line array in aluminum oxide template
03/25/2009CN100471993C Apparatus for treating surfaces of a substrate with atmospheric pressure plasma
03/24/2009US7509105 Radio frequency excitation arrangement including a limiting circuit
03/24/2009US7508093 Modular current supply
03/24/2009US7507978 Beam line architecture for ion implanter
03/24/2009US7507962 Electron-beam device and detector system
03/24/2009US7507959 Method for charging substrate to a potential
03/24/2009US7507956 Charged particle beam energy width reduction system for charged particle beam system
03/24/2009US7507678 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrate
03/24/2009US7507672 Plasma etching system and method
03/24/2009US7506610 Plasma processing apparatus and method
03/24/2009US7506609 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber
03/24/2009CA2438098C Magnetic field for small closed-drift thruster
03/19/2009WO2009036365A2 Method and apparatus of automatic scanning probe imaging
03/19/2009WO2009018460A3 High-bandwidth actuator drive for scanning probe microscopy
03/19/2009WO2009007448A3 Magnetron co-sputtering device
03/19/2009WO2008155087A3 Plasma reactor, and method for the production of monocrystalline diamond layers
03/19/2009WO2008153785A3 Substrate cleaning chamber and components
03/19/2009WO2008052080A3 Method of data encoding, compression, and transmission enabling maskless lithography
03/19/2009US20090077696 Methods, Systems and Computer Program Products for Measuring Critical Dimensions of Fine Patterns Using Scanning Electron Microscope Pictures and Secondary Electron Signal Profiles
03/19/2009US20090077528 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern
03/19/2009US20090074632 Plasma processing apparatus
03/19/2009US20090072139 Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
03/19/2009US20090071605 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
03/19/2009DE10262286B4 Leistungsversorgungsvorrichtung zum Erzeugen von Hochfrequenzleistung für eine Plasmaerzeugungsvorrichtung The power supply apparatus for generating high-frequency power to a plasma generating device
03/18/2009EP2037512A1 Method of manufacturing magneto-resistive device and apparatus for manufacturing the same
03/18/2009EP2037137A2 Stage device
03/18/2009EP2036140A1 Phase change alloy etch
03/18/2009EP2036113A1 Method for controlling a reactive high-power pulsed magnetron sputter process and corresponding device
03/18/2009EP2036112A2 Apparatus for accelerating an ion beam
03/18/2009EP1361604B1 Device and method for treatment
03/18/2009EP1210723B1 Shaped and low density focused ion beams
03/18/2009CN101390187A Plasma immersion ion source with low effective antenna voltage
03/18/2009CN101390186A Aberration-correcting cathode lens microscopy instrument
03/18/2009CN101389179A Plasmer processing device, plasmer processing method and storage medium
03/18/2009CN101389178A Substrate processing apparatus having electrode member
03/18/2009CN101388317A Scanning electronic microscope
03/17/2009US7505879 Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
03/17/2009US7504644 Method and devices for producing corpuscular radiation systems
03/17/2009US7504627 Electron beam inspection apparatus
03/17/2009US7504626 Scanning electron microscope and apparatus for detecting defect
03/17/2009US7504619 Energetic neutral particle lithographic apparatus and process
03/17/2009US7504338 Method of pattern etching a silicon-containing hard mask
03/17/2009US7504182 Scanning beam of metallic ions over defect to dope to reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched
03/17/2009US7504040 Plasma processing apparatus and plasma processing method
03/17/2009US7504006 To sputter depositing a liner material such as tantalum or tantalum nitride, by combining long-throw sputtering, self-ionized plasma sputtering and capacitively-coupled plasma resputtering in one chamber
03/12/2009WO2009032565A1 Techniques for terminal insulation in an ion implanter
03/12/2009WO2009012867A3 Plasma supply device
03/12/2009WO2009010792A3 Plasma reactor
03/12/2009WO2008102062A3 Method and arrangement for photon ablation of a target
03/12/2009US20090068845 Low contamination components for semiconductor processing apparatus and methods for making components
03/12/2009US20090068823 Plasma Ion Doping Method and Apparatus
03/12/2009US20090068356 High productivity plasma processing chamber
03/12/2009US20090065741 Apparatus and method for the application of a material layer to display devices
03/12/2009US20090065711 Charged particle beam exposure system
03/11/2009EP2034504A1 Diamond electron radiation cathode, electron source, electron microscope, and electron beam exposer
03/11/2009EP2033207A1 Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other sio2-coated materials
03/11/2009EP2033206A2 Slider bearing for use with an apparatus comprising a vacuum chamber
03/11/2009EP1661171A4 Multiple frequency plasma etch reactor
03/11/2009EP1402560B1 Configurable plasma volume etch chamber
03/11/2009CN201207370Y Kaufman ion source of novel magnetic circuit structure
03/11/2009CN101385114A Cathode for a vacuum sputtering system
03/11/2009CN101385113A Ion implanting apparatus
03/11/2009CN101385112A Electromagnet with active field containment
03/11/2009CN101384747A Dual mode ion source for ion implantation