Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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04/01/2009 | CN100474521C Temperature controlled hot edge ring assembly, and device comprising the same and the use thereof |
04/01/2009 | CN100474508C Plasma treatment apparatus |
04/01/2009 | CN100474495C Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
04/01/2009 | CN100474494C In-process wafer charge monitor and control system for ion implanter |
04/01/2009 | CN100473974C Time-resolved measurement apparatus |
03/31/2009 | US7511289 Working method utilizing irradiation of charged particle beam onto sample through passage in gas blowing nozzle |
03/31/2009 | US7511288 Ion implantation device |
03/31/2009 | US7511287 Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases |
03/31/2009 | US7511283 Ultraviolet disinfection device |
03/31/2009 | US7511281 Ultraviolet light treatment chamber |
03/31/2009 | US7511272 Method for controlling charged particle beam, and charged particle beam apparatus |
03/31/2009 | US7511271 Scanning electron microscope |
03/31/2009 | US7510667 Plasma processing method and apparatus |
03/31/2009 | US7510666 Time continuous ion-ion plasma |
03/26/2009 | WO2009039261A1 Method and apparatus for surface processing of a substrate using an energetic particle beam |
03/26/2009 | WO2009036722A2 Device for the plasma treatment of workpieces |
03/26/2009 | WO2009036579A1 Apparatus for plasma supported coating of the inner surface of tube-like packaging containers made of plastics with the assistance of a non-thermal reactive ambient pressure beam plasma |
03/26/2009 | WO2008104393A3 Device for the field emission of particles and production method |
03/26/2009 | US20090081848 Wafer bonding activated by ion implantation |
03/26/2009 | US20090081415 Controlled alignment of catalytically grown nanostructures in a large-scale synthesis process |
03/26/2009 | US20090078888 Method and Apparatus For Detecting and Adjusting Substrate Height |
03/26/2009 | US20090078869 Magnetic electron microscope |
03/26/2009 | US20090078867 Method and system for generating and reviewing a thin sample |
03/26/2009 | US20090078375 Plasma Processing Apparatus And Method |
03/26/2009 | DE10215369B4 Kathodenzerstäubungsgerät zur Ausbildung eines Metallfilms unter Verwendung eines Magnetfeldes A sputtering cathode apparatus for forming a metal film using a magnetic field |
03/26/2009 | DE102008040160A1 Treating optical elements by plasma, which is ignited to exist on surface of optical element to be treated and is present in cavity, for microlithography system, comprises forming a side from the cavity through the surface to be treated |
03/25/2009 | EP2039801A1 Method for forming thin film |
03/25/2009 | EP2038912A1 Apparatus for electron beam evaporation |
03/25/2009 | EP1641956B1 Rotating tubular sputter target assembly |
03/25/2009 | EP1618587B1 Beam uniformity and angular distribution measurement system |
03/25/2009 | EP1549923A4 Fragmentation methods for mass spectrometry |
03/25/2009 | EP1491255A4 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma |
03/25/2009 | CN101394948A Method and device for the continuous plasma treatment of materials, in particular for the descaling of a metal strand |
03/25/2009 | CN101394705A Apparatus for generating atmosphere pressure microwave glow plasma |
03/25/2009 | CN101393947A Process and device for coating silver on molybdenum foil used for solar cell paddle of aerospace aircraft |
03/25/2009 | CN101393092A Method for making scanning electron microscope example for assembling nanometer line array in aluminum oxide template |
03/25/2009 | CN100471993C Apparatus for treating surfaces of a substrate with atmospheric pressure plasma |
03/24/2009 | US7509105 Radio frequency excitation arrangement including a limiting circuit |
03/24/2009 | US7508093 Modular current supply |
03/24/2009 | US7507978 Beam line architecture for ion implanter |
03/24/2009 | US7507962 Electron-beam device and detector system |
03/24/2009 | US7507959 Method for charging substrate to a potential |
03/24/2009 | US7507956 Charged particle beam energy width reduction system for charged particle beam system |
03/24/2009 | US7507678 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrate |
03/24/2009 | US7507672 Plasma etching system and method |
03/24/2009 | US7506610 Plasma processing apparatus and method |
03/24/2009 | US7506609 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber |
03/24/2009 | CA2438098C Magnetic field for small closed-drift thruster |
03/19/2009 | WO2009036365A2 Method and apparatus of automatic scanning probe imaging |
03/19/2009 | WO2009018460A3 High-bandwidth actuator drive for scanning probe microscopy |
03/19/2009 | WO2009007448A3 Magnetron co-sputtering device |
03/19/2009 | WO2008155087A3 Plasma reactor, and method for the production of monocrystalline diamond layers |
03/19/2009 | WO2008153785A3 Substrate cleaning chamber and components |
03/19/2009 | WO2008052080A3 Method of data encoding, compression, and transmission enabling maskless lithography |
03/19/2009 | US20090077696 Methods, Systems and Computer Program Products for Measuring Critical Dimensions of Fine Patterns Using Scanning Electron Microscope Pictures and Secondary Electron Signal Profiles |
03/19/2009 | US20090077528 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern |
03/19/2009 | US20090074632 Plasma processing apparatus |
03/19/2009 | US20090072139 Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device |
03/19/2009 | US20090071605 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor |
03/19/2009 | DE10262286B4 Leistungsversorgungsvorrichtung zum Erzeugen von Hochfrequenzleistung für eine Plasmaerzeugungsvorrichtung The power supply apparatus for generating high-frequency power to a plasma generating device |
03/18/2009 | EP2037512A1 Method of manufacturing magneto-resistive device and apparatus for manufacturing the same |
03/18/2009 | EP2037137A2 Stage device |
03/18/2009 | EP2036140A1 Phase change alloy etch |
03/18/2009 | EP2036113A1 Method for controlling a reactive high-power pulsed magnetron sputter process and corresponding device |
03/18/2009 | EP2036112A2 Apparatus for accelerating an ion beam |
03/18/2009 | EP1361604B1 Device and method for treatment |
03/18/2009 | EP1210723B1 Shaped and low density focused ion beams |
03/18/2009 | CN101390187A Plasma immersion ion source with low effective antenna voltage |
03/18/2009 | CN101390186A Aberration-correcting cathode lens microscopy instrument |
03/18/2009 | CN101389179A Plasmer processing device, plasmer processing method and storage medium |
03/18/2009 | CN101389178A Substrate processing apparatus having electrode member |
03/18/2009 | CN101388317A Scanning electronic microscope |
03/17/2009 | US7505879 Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus |
03/17/2009 | US7504644 Method and devices for producing corpuscular radiation systems |
03/17/2009 | US7504627 Electron beam inspection apparatus |
03/17/2009 | US7504626 Scanning electron microscope and apparatus for detecting defect |
03/17/2009 | US7504619 Energetic neutral particle lithographic apparatus and process |
03/17/2009 | US7504338 Method of pattern etching a silicon-containing hard mask |
03/17/2009 | US7504182 Scanning beam of metallic ions over defect to dope to reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
03/17/2009 | US7504040 Plasma processing apparatus and plasma processing method |
03/17/2009 | US7504006 To sputter depositing a liner material such as tantalum or tantalum nitride, by combining long-throw sputtering, self-ionized plasma sputtering and capacitively-coupled plasma resputtering in one chamber |
03/12/2009 | WO2009032565A1 Techniques for terminal insulation in an ion implanter |
03/12/2009 | WO2009012867A3 Plasma supply device |
03/12/2009 | WO2009010792A3 Plasma reactor |
03/12/2009 | WO2008102062A3 Method and arrangement for photon ablation of a target |
03/12/2009 | US20090068845 Low contamination components for semiconductor processing apparatus and methods for making components |
03/12/2009 | US20090068823 Plasma Ion Doping Method and Apparatus |
03/12/2009 | US20090068356 High productivity plasma processing chamber |
03/12/2009 | US20090065741 Apparatus and method for the application of a material layer to display devices |
03/12/2009 | US20090065711 Charged particle beam exposure system |
03/11/2009 | EP2034504A1 Diamond electron radiation cathode, electron source, electron microscope, and electron beam exposer |
03/11/2009 | EP2033207A1 Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other sio2-coated materials |
03/11/2009 | EP2033206A2 Slider bearing for use with an apparatus comprising a vacuum chamber |
03/11/2009 | EP1661171A4 Multiple frequency plasma etch reactor |
03/11/2009 | EP1402560B1 Configurable plasma volume etch chamber |
03/11/2009 | CN201207370Y Kaufman ion source of novel magnetic circuit structure |
03/11/2009 | CN101385114A Cathode for a vacuum sputtering system |
03/11/2009 | CN101385113A Ion implanting apparatus |
03/11/2009 | CN101385112A Electromagnet with active field containment |
03/11/2009 | CN101384747A Dual mode ion source for ion implantation |