| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/16/2009 | WO2009047442A1 Device for very high frequency plasma assisted cvd under atmospheric pressure, and applications thereof |
| 04/16/2009 | WO2009046702A2 Device and method for forming coatings on substrates inside vacuum chambers |
| 04/16/2009 | WO2009025392A3 Plasma processing device and method of monitoring plasma discharge state in plasma processing device |
| 04/16/2009 | WO2008132734A9 Focused ion beam deep nano- patterning method |
| 04/16/2009 | WO2008121547A3 Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
| 04/16/2009 | WO2007139561A3 Receiver array using shared electron beam |
| 04/16/2009 | WO2006011954A3 Diagnostic plasma measurement device having patterned sensors and features |
| 04/16/2009 | US20090095621 Support assembly |
| 04/16/2009 | US20090095423 Apparatus and method for plasma etching |
| 04/16/2009 | US20090095421 Etch amount detection method, etching method, and etching system |
| 04/16/2009 | US20090095334 Showerhead assembly |
| 04/16/2009 | US20090095217 Plasma treatment system and cleaning method of the same |
| 04/16/2009 | US20090095055 Method for Differentially Pumping Endblock Seal Cavity |
| 04/16/2009 | DE102007049816B3 Korrektor Proofreader |
| 04/16/2009 | DE102007024353B4 Monochromator und Strahlquelle mit Monochromator Monochromator beam source with monochromator |
| 04/16/2009 | DE102004060068B4 Mikrowellenplasmaquelle Microwave plasma source |
| 04/15/2009 | EP2048691A2 Device for beam processing of workpieces, ion beam processing device |
| 04/15/2009 | EP2048690A2 Charged particle beam reflector device and electron microscope |
| 04/15/2009 | EP2048429A1 Illuminating device, illuminating method, light detector and light detecting method |
| 04/15/2009 | EP2047497A2 Ion source for generating negatively charged ions |
| 04/15/2009 | EP2046506A2 Method for the plasma treatment of a surface |
| 04/15/2009 | EP1774559B1 Electrostatic lens for ion beams |
| 04/15/2009 | EP1606543B1 Universal vacuum coupling for cylindrical target |
| 04/15/2009 | CN201222007Y Electron microscope sample box |
| 04/15/2009 | CN101410931A Coating apparatus |
| 04/15/2009 | CN101410930A Insulator system for a terminal structure of an ion implantation system |
| 04/15/2009 | CN101410929A Ion implanter with variable scan frequency |
| 04/15/2009 | CN101410897A Disc master exposure device and method for adjusting same |
| 04/15/2009 | CN100479111C Plasma processing apparatus |
| 04/15/2009 | CN100479109C Device and method for plasma processing, and slow-wave plate |
| 04/15/2009 | CN100479108C Plasma process device |
| 04/15/2009 | CN100479101C Plasma doping apparatus |
| 04/14/2009 | US7519942 Pattern specification method and pattern specification apparatus |
| 04/14/2009 | US7518130 Ion beam blocking component and ion beam blocking device having the same |
| 04/14/2009 | US7518111 Magnetic electron microscope |
| 04/14/2009 | US7517803 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers |
| 04/14/2009 | US7517618 Mask, exposure method and production method of semiconductor device |
| 04/09/2009 | WO2009046306A1 Accelerator particle beam apparatus and method for low contaminate processing |
| 04/09/2009 | WO2009045121A1 Corpuscular optical image-forming system |
| 04/09/2009 | WO2009044871A1 Electron source and electron beam apparatus |
| 04/09/2009 | WO2009044564A1 Electron source and electron beam device |
| 04/09/2009 | WO2009043824A2 Device for deflecting or guiding in a particle beam |
| 04/09/2009 | WO2009043190A1 Deposition of active films |
| 04/09/2009 | WO2009043145A1 Method and devices for assessing the threat status of an article at a security check point |
| 04/09/2009 | WO2009022184A3 Low impedance plasma |
| 04/09/2009 | WO2009016331A3 Pattern writing on a rotating substrate |
| 04/09/2009 | WO2008065353A3 Error source identification in dot arrays |
| 04/09/2009 | DE10230164B4 Verfahren zur Herstellung eines Körpers für einen Induktionsmagneten zur Verwendung bei der Erzeugung eines hoch-dichten Plasmas sowie Halbleiterherstellungsgrät, das einen nach diesem Verfahren hergestellten Induktionsmagneten verwendet A method of producing a body for an induction magnet for use in generating a high-density plasma and Halbleiterherstellungsgrät that uses an induction magnet manufactured according to this method |
| 04/09/2009 | DE102008048785A1 Magnetronanordnung mit abgeschirmter Targethalterung Magnetron with shielded target holder |
| 04/09/2009 | DE102004004844B4 Vorrichtung zum Beschichten eines Substrats mit einer Absorberanordnung Apparatus for coating a substrate with an absorber assembly |
| 04/09/2009 | CA2697586A1 Method and devices for assessing the threat status of an article at a security check point |
| 04/08/2009 | EP2045353A1 Capacitive-coupled magnetic neutral line plasma sputtering system |
| 04/08/2009 | EP2044816A2 Device and method for producing and/ or confining a plasma |
| 04/08/2009 | EP2044611A2 Sputter target assemblies having a controlled solder thickness |
| 04/08/2009 | EP2044610A1 Plasma sources |
| 04/08/2009 | EP2044609A1 Ion deposition apparatus |
| 04/08/2009 | EP2044608A1 Ion sources |
| 04/08/2009 | CN201217686Y Ionic beam emission source capable of emitting singular ion energy |
| 04/08/2009 | CN101405830A High sensitivity slitless ion source mass spectrometer for trace gas leak detection |
| 04/08/2009 | CN101404242A Method and apparatus for cleaning a substrate |
| 04/08/2009 | CN101404238A Novel electronic gun with oil-immersing water-cooling apparatus |
| 04/08/2009 | CN100477107C Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus and method for processing substrate |
| 04/08/2009 | CN100477105C Substrate processor and method for manufacturing device |
| 04/08/2009 | CN100477078C Substrate processing apparatus and substrate processing method |
| 04/08/2009 | CN100477067C Software synchronization of multiple scanning probes |
| 04/08/2009 | CN100476408C Time resolution measurement device and position detection electron multiplier |
| 04/07/2009 | US7514683 Scanning electron microscope |
| 04/07/2009 | US7514682 Electron anti-fogging baffle used as a detector |
| 04/07/2009 | US7514681 Electrical process monitoring using mirror-mode electron microscopy |
| 04/07/2009 | US7513982 Two dimensional magnetron scanning for flat panel sputtering |
| 04/07/2009 | US7513971 Flat style coil for improved precision etch uniformity |
| 04/07/2009 | US7513954 Plasma processing apparatus and substrate mounting table employed therein |
| 04/07/2009 | US7513215 Systems and methods for the production of highly tetrahedral amorphous carbon coatings |
| 04/07/2009 | US7513214 Plasma processing method and apparatus |
| 04/07/2009 | US7513141 Method for differentially pumping endblock seal cavity |
| 04/02/2009 | WO2009040504A1 Method of producing a dopant gas species |
| 04/02/2009 | WO2009040406A2 Method and arrangement for redundant anode sputtering having a dual anode arrangement |
| 04/02/2009 | WO2009019156A3 Method and device for the plasma-aided treatment of surfaces |
| 04/02/2009 | WO2008152464A3 Detection device for electron microscope |
| 04/02/2009 | WO2008084212A3 Apparatus support structure |
| 04/02/2009 | WO2008084202A3 Apparatus support |
| 04/02/2009 | WO2006007336A3 Atmospheric glow discharge with concurrent coating deposition |
| 04/02/2009 | WO2004095532A3 A barrier layer for a processing element and a method of forming the same |
| 04/02/2009 | DE102004014323B4 Verfahren und Anordnung zur Herstellung von Gradientenschichten oder Schichtenfolgen durch physikalische Vakuumzerstäubung Method and apparatus for the production of gradient layers or layer sequences by physical sputtering |
| 04/02/2009 | DE102004002508B4 Anordnung zur Steuerung und Regelung des Ionenstrahlprofils von Breitionenstrahlquellen durch getaktete Beamletsteuerung Arrangement for the control and regulation of the ion beam profile of broad ion beam sources by clocked Beamletsteuerung |
| 04/01/2009 | EP2043139A2 Method of preventing etch profile bending and bowing in high aspect ratio openings by treating a polymer formed on the opening sidewalls |
| 04/01/2009 | EP2043138A2 Method of processing an object having an oxide film on its surface and apparatus for performing said method |
| 04/01/2009 | EP2043131A2 Minute sample processing method |
| 04/01/2009 | EP2043130A2 Multipole coils |
| 04/01/2009 | EP2041797A2 Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device |
| 04/01/2009 | EP2041771A2 Method and device for producing an image |
| 04/01/2009 | EP2041770A1 Method and device for machining workpieces |
| 04/01/2009 | EP2041756A2 A multi-source plasma focused ion beam system |
| 04/01/2009 | EP2041331A1 Method for depositing electrically insulating layers |
| 04/01/2009 | EP2040800A2 Method and software for irradiating a target volume with a particle beam and device implementing same |
| 04/01/2009 | CN201215800Y Upper electrode for semiconductor etching device |
| 04/01/2009 | CN101401191A Methods of implanting ions and ion sources used for same |
| 04/01/2009 | CN101401187A Technique for monitoring and controlling a plasma process |
| 04/01/2009 | CN101399170A Inductively coupled plasma processing apparatus |
| 04/01/2009 | CN101399147A Ion implantation method |