| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/30/2009 | DE102007048559A1 Vorrichtung zur Strahlbearbeitung von Werkstücken, Ionenstrahlbearbeitungsanlage Apparatus for beam machining of workpieces, ion beam machining system |
| 04/30/2009 | DE102005045622B4 Verfahren und Anordnungen zum Nachweis der Elektronen-Spinpolarisation Methods and arrangements for the detection of the electron spin polarization |
| 04/30/2009 | CA2700575A1 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma |
| 04/29/2009 | EP2053631A1 Method and device for plasma treatment of moving substrates |
| 04/29/2009 | EP2053630A2 Capacitively coupled plasma reactor |
| 04/29/2009 | EP2052403A1 Method and device for coating a substrate with a defined distribution of coating thickness |
| 04/29/2009 | EP2052360A1 Method and electron microscope for measuring the similarity of two-dimensional images |
| 04/29/2009 | EP1849180A4 Ac-excited microcavity discharge device and method |
| 04/29/2009 | EP1511876B1 Sputtering cathode adapter |
| 04/29/2009 | EP1208583B1 Plasma reactor for treating substrates having large surfaces |
| 04/29/2009 | CN201230400Y Atmosphere pressure microwave plasma producing device |
| 04/29/2009 | CN201229915Y Pressure clamping type cathode construction for metal vapor vacuum arc ionic source |
| 04/29/2009 | CN101421823A Aberration evaluation pattern,aberration evaluation method,aberration correction method,electron beam drawing apparatus,electron microscope,master,stamper |
| 04/29/2009 | CN101421815A Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems |
| 04/29/2009 | CN101421814A Ion beam scanning control methods and systems for ion implantation uniformity |
| 04/29/2009 | CN101421056A System, method and apparatus for self-cleaning dry etch |
| 04/29/2009 | CN101419907A High temperature cathode for plasma etching |
| 04/29/2009 | CN100484361C Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure |
| 04/29/2009 | CN100483620C Plasma processing device |
| 04/28/2009 | US7526747 Inspection method and inspection system using charged particle beam |
| 04/28/2009 | US7526408 Measurement system and method and computer program for processing measurement data |
| 04/28/2009 | US7525893 Electron beam recorder and electron beam irradiation position detecting method |
| 04/28/2009 | US7525314 Method and device for active compensation of magnetic and electromagnetic disturbance fields |
| 04/28/2009 | US7525109 Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system |
| 04/28/2009 | US7525108 Focused ion beam apparatus for specimen fabrication |
| 04/28/2009 | US7525106 Exposure apparatus, pressure control method for the same, and device manufacturing method |
| 04/28/2009 | US7525104 Particle beam irradiation method and particle beam irradiation apparatus used for the same |
| 04/28/2009 | US7525091 Charged particle beam system and a method for inspecting a sample |
| 04/28/2009 | US7524397 Lower electrode design for higher uniformity |
| 04/28/2009 | US7524395 Plasma chamber having plasma source coil and method for etching the wafer using the same |
| 04/23/2009 | WO2009052453A2 Plasma doping system with charge control |
| 04/23/2009 | WO2009051597A1 Toroidal plasma chamber for high gas flow rate process |
| 04/23/2009 | WO2009051333A1 A scanning electron microscope |
| 04/23/2009 | WO2009026340A3 Insulated conducting device with multiple insulation segments |
| 04/23/2009 | WO2009025393A8 Plasma processing device and plasma discharge state monitoring device |
| 04/23/2009 | WO2009012973A3 Method for the protection of high-frequency amplifiers of a plasma supply device and plasma supply device |
| 04/23/2009 | WO2008096211A4 Measurement of critical dimensions of semiconductor wafers |
| 04/23/2009 | WO2007038601A3 Nanoloom for controlling polymer assembly |
| 04/23/2009 | WO2007027965A3 Delivery of low pressure dopant gas to a high voltage ion source |
| 04/23/2009 | US20090104781 Plasma processing apparatus, ring member and plasma processing method |
| 04/23/2009 | US20090104376 Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition |
| 04/23/2009 | US20090101816 Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| 04/23/2009 | DE19900437B4 Verfahren und Vorrichtung zur Ionenimplantation in Festkörpern und/oder zur Beschichtung von Festkörperoberflächen sowie die Verwendung von Verfahren und Vorrichtung Method and apparatus for ion implantation in solids and / or for the coating of solid surfaces and the use of methods and apparatus |
| 04/23/2009 | DE112005000735B4 Siliciumelektrodenplatte für ein Plasmaätzen mit überlegener Haltbarkeit Silicon electrode plate for plasma etching with superior durability |
| 04/23/2009 | DE102007046783A1 Vorrichtung zur Ablenkung oder Einlenkung eines Teilchenstrahls Device for deflecting or inwardness of a particle |
| 04/23/2009 | DE102004025890B4 Substratinspektionsvorrichtung, Substratinspektionsverfahren und Verwendung des Verfahrens zum Herstellen einer Halbleitereinrichtung Substrate inspection device, substrate inspection method and use of the method for manufacturing a semiconductor device |
| 04/22/2009 | EP2051282A2 Metal film production apparatus |
| 04/22/2009 | EP2051281A2 Motorized manipulator for positioning a TEM specimen |
| 04/22/2009 | EP2051280A1 Motorized manipulator for positioning a TEM specimen |
| 04/22/2009 | EP2051279A2 Corrector |
| 04/22/2009 | EP2051278A1 Energy filter for cold field emission electron beam apparatus |
| 04/22/2009 | EP2050839A2 Method and apparatus for production of metal film |
| 04/22/2009 | EP2050121A2 Method and device for the cold-plasma deposition of a boundary layer and machine using such a device |
| 04/22/2009 | EP2050120A2 Ecr plasma source |
| 04/22/2009 | EP2050119A1 Method and device for etching a substrate by means of a plasma |
| 04/22/2009 | EP2050118A1 A multiple beam charged particle optical system |
| 04/22/2009 | EP1579368A4 Method and apparatus for monitoring a material processing system |
| 04/22/2009 | EP1347804A4 Ion implantation system and control method |
| 04/22/2009 | EP1245036A4 Ion implantation ion source, system and method |
| 04/22/2009 | CN201226335Y Electronic microscope |
| 04/22/2009 | CN101416270A Ion implanter |
| 04/22/2009 | CN101416269A Architecture for ribbon ion beam ion implanter system |
| 04/22/2009 | CN101415292A Honeycomb medium countercheck discharging low-temperature plasma generator |
| 04/22/2009 | CN101414545A Faraday apparatus for angle measurement of parallel beam |
| 04/22/2009 | CN101414537A Tunable multi-zone gas injection system |
| 04/22/2009 | CN101414536A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414535A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414534A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414533A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414129A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414128A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414127A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414126A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414125A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101414124A 电子束曝光系统 Electron beam exposure system |
| 04/22/2009 | CN101413113A Vertical plasma processing apparatus and use method thereof |
| 04/22/2009 | CN100481531C Luminous body, and electronic beam detector, scanning type electron microscope, quality analysis device comprising the same |
| 04/22/2009 | CN100481342C System and method for processing wafer using single frequency RF power in plasma processing chamber |
| 04/22/2009 | CN100481308C Apparatus and method for use of optical system with a plasma processing system |
| 04/22/2009 | CN100481307C Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| 04/22/2009 | CN100481306C Ion source device for low-energy ion beam material preparing method |
| 04/21/2009 | US7523009 Control of instruments |
| 04/21/2009 | US7521700 Raster frame beam system for electron beam lithography |
| 04/21/2009 | US7521699 Apparatus and method for doping |
| 04/21/2009 | US7521698 Apparatus and method for interlocking a power supply to ion implantation equipment, method and apparatus for generating an interlocking signal, method and apparatus for interrupting an ion implantation process, and an interlocking system |
| 04/21/2009 | US7521695 Scanning electron microscope |
| 04/21/2009 | US7521692 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus |
| 04/21/2009 | US7521691 Magnetic monitoring of a Faraday cup for an ion implanter |
| 04/21/2009 | US7521689 Deflector for equipment of electron beam lithography and equipment of electron beam lithography |
| 04/21/2009 | US7521687 Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate |
| 04/21/2009 | US7521679 Inspection method and inspection system using charged particle beam |
| 04/21/2009 | US7521678 Charged particle beam apparatus, charged particle beam focusing method, microstructure measuring method, microstructure inspecting method, semiconductor device manufacturing method, and program |
| 04/21/2009 | US7521677 Method and device for distance measurement |
| 04/21/2009 | US7521370 Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias power |
| 04/21/2009 | US7521026 Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor |
| 04/21/2009 | US7520957 Lid assembly for front end of line fabrication |
| 04/21/2009 | US7520246 Power supply antenna and power supply method |
| 04/21/2009 | US7520245 Plasma processing apparatus |
| 04/21/2009 | US7520244 Plasma treatment apparatus |
| 04/21/2009 | CA2401251C High frequency matching network |