| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/20/2009 | CN101435074A Substrate processing apparatus |
| 05/20/2009 | CN100490052C Multiple cathode pulse arc plasma source device |
| 05/20/2009 | CN100489155C Method and apparatus for treating a substrate |
| 05/20/2009 | CN100489148C Cathode for vacuum sputtering treatment machine |
| 05/19/2009 | US7535552 Moving/guiding apparatus and exposure apparatus using the same |
| 05/19/2009 | US7535220 Beam measuring equipment and beam measuring method using the same |
| 05/19/2009 | US7535000 Method and system for identifying events in FIB |
| 05/19/2009 | US7534363 Method for providing uniform removal of organic material |
| 05/19/2009 | US7533628 Volume-optimized reactor for simultaneously coating eyeglasses on both sides |
| 05/19/2009 | CA2518521C Method of operating liquid in the vacuum or low-pressure environment and observing the operation and device for the operation and observation |
| 05/19/2009 | CA2518520C Device for operating gas in vacuum or low-pressure environment and for observation of the operation |
| 05/19/2009 | CA2401220C High frequency plasma beam source |
| 05/14/2009 | WO2009061485A1 Plasma electron flood for ion beam implanter |
| 05/14/2009 | WO2009060762A1 Electron beam source, electron beam irradiator and x-ray tube employing the electron beam source, x-ray irradiator in which the x-ray tube is arranged, and method for manufacturing electron beam source |
| 05/14/2009 | WO2009059817A1 Sputter coating device and coating method |
| 05/14/2009 | WO2009059807A1 Method for depositing electrically insulating layers |
| 05/14/2009 | WO2009059640A1 Electrode arrangement with movable shield |
| 05/14/2009 | WO2009027596A3 Ionic emission micronic source |
| 05/14/2009 | US20090126051 Method and System for Sample Preparation |
| 05/14/2009 | US20090123735 Low contamination components for semiconductor processing apparatus and methods for making components |
| 05/14/2009 | US20090123663 High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said method |
| 05/14/2009 | US20090121148 High Brightness Solid State Ion Beam Generator, its use, and Method for Making such a Generator |
| 05/14/2009 | US20090121134 Tool-To-Tool Matching Control Method And its System For Scanning Electron Microscope |
| 05/14/2009 | US20090121122 Techniques for measuring and controlling ion beam angle and density uniformity |
| 05/14/2009 | US20090120790 Low contamination components for semiconductor processing apparatus and methods for making components |
| 05/14/2009 | US20090120580 Disturbance-Free, Recipe-Controlled Plasma Processing System And Method |
| 05/14/2009 | DE19911944B4 Vorrichtung zum Abbilden eines Bereichs einer Probe An apparatus for imaging a region of a sample |
| 05/13/2009 | EP2058836A1 Sputter coating device and coating method |
| 05/13/2009 | EP2058835A1 Autofocussing method |
| 05/13/2009 | EP2058834A1 Spherical aberration correction moderating type lens, spherical aberration correction lens system, electron spectroscopy device, and optical electron microscope |
| 05/13/2009 | EP2057661A1 Process and apparatus for the modification of surfaces |
| 05/13/2009 | EP2057629A1 Drawing method, drawing device, and information recording medium |
| 05/13/2009 | EP2057300A2 Ion source with recess in electrode |
| 05/13/2009 | EP1240659B1 Arrangement for coupling microwave energy into a treatment chamber |
| 05/13/2009 | CN201238415Y Plasma excitation component and plasma processing apparatus including the same |
| 05/13/2009 | CN201238024Y Inside insulation structure of scanning electron microscope drawtube |
| 05/13/2009 | CN101432841A Methods and systems for trapping ion beam particles and focusing an ion beam |
| 05/13/2009 | CN101432840A Front plate for an ion source |
| 05/13/2009 | CN101431854A Plasma processing apparatus |
| 05/13/2009 | CN101431009A Shower plate and substrate processing apparatus |
| 05/13/2009 | CN101431003A Exhaustion ring and plasma processing device |
| 05/13/2009 | CN100487871C Etching method |
| 05/13/2009 | CN100487858C Array type electron beam etching device and etching method |
| 05/13/2009 | CN100487857C In-situ dry clean chamber for front end of line fabrication |
| 05/12/2009 | US7532322 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 05/12/2009 | US7531819 Fluorine based cleaning of an ion source |
| 05/12/2009 | US7531812 Method and system for the directional detection of electrons in a scanning electron microscope |
| 05/12/2009 | US7531799 Charged particle beam column |
| 05/12/2009 | US7531797 Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method |
| 05/12/2009 | US7531796 Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods |
| 05/12/2009 | US7531293 Radiation sensitive self-assembled monolayers and uses thereof |
| 05/12/2009 | US7531061 Gas temperature control for a plasma process |
| 05/12/2009 | US7530359 Plasma treatment system and cleaning method of the same |
| 05/07/2009 | WO2009056781A1 Machining of microstructures |
| 05/07/2009 | WO2009056564A1 Device and method for crystal orientation measurement by means of ion-blocking pattern and a focused ion probe |
| 05/07/2009 | WO2009056173A1 Method for manufacturing a treated surface and vacuum plasma sources |
| 05/07/2009 | WO2009012969A3 Plasma supply arrangement |
| 05/07/2009 | US20090114853 Manufacturing system for semiconductor device capable of controlling variation in electrical property of element in wafer surface and method for manufacturing the semiconductor device |
| 05/07/2009 | US20090114851 Fib milling of copper over organic dielectrics |
| 05/07/2009 | US20090114815 Plasma electron flood for ion beam implanter |
| 05/07/2009 | US20090113739 Dual carbon nanotubes for critical dimension metrology on high aspect ratio semiconductor wafer patterns |
| 05/07/2009 | DE102006055510B4 Phasenplatte, Bilderzeugungsverfahren und Elektronenmikroskop Phase plate, image forming method and electron microscope |
| 05/06/2009 | EP2056332A1 Displacement correction of a sample stage for an eucentric rotation in a charged particle microscope |
| 05/06/2009 | EP2056331A2 Sample preparing device and sample posture shifting method |
| 05/06/2009 | EP2055397A2 In-situ chamber cleaning method |
| 05/06/2009 | EP2054916A2 Throughput enhancement for scanned beam ion implanters |
| 05/06/2009 | EP1948846B1 Method of monitoring a plasma and use of this method for depositing a film onto a PET hollow body |
| 05/06/2009 | EP1305453B1 Ring-shaped high-density plasma source and method |
| 05/06/2009 | EP1029340B1 Apparatus and method for secondary electron emission microscope |
| 05/06/2009 | CN101427350A Methods of implanting ions and ion sources used for same |
| 05/06/2009 | CN101427184A 光刻系统和投影方法 Projection lithography system and method |
| 05/06/2009 | CN101426327A Plasma jet device |
| 05/06/2009 | CN101425450A Gas supply device, substrate processing apparatus and substrate processing method |
| 05/06/2009 | CN101424878A Method for making high W/N ratio T-shaped gate by once electron beam exposure |
| 05/06/2009 | CN100485848C Method for preparing transmission electron microscope test piece |
| 05/05/2009 | US7528550 Ion implantation system and control method |
| 05/05/2009 | US7528395 Radiation source, lithographic apparatus and device manufacturing method |
| 05/05/2009 | US7528392 Techniques for low-temperature ion implantation |
| 05/05/2009 | US7528390 Broad beam ion implantation architecture |
| 05/05/2009 | US7528389 Profile adjustment in plasma ion implanter |
| 05/05/2009 | US7527713 Variable quadruple electromagnet array in plasma processing |
| 05/05/2009 | US7527706 Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate for plasma processing apparatus |
| 05/05/2009 | US7527016 Plasma processing apparatus |
| 04/30/2009 | WO2009054966A1 Double plasma ion source |
| 04/30/2009 | WO2009053678A1 Improvements relating to ion implanters |
| 04/30/2009 | WO2009053614A2 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma |
| 04/30/2009 | WO2009053479A2 Application of high power magnetron sputtering to through silicon via metallization |
| 04/30/2009 | WO2009053235A1 Method and device for the plasma treatment of running metal substrates |
| 04/30/2009 | WO2009052874A1 Dual magnetron sputtering power supply and magnetron sputtering apparatus |
| 04/30/2009 | WO2009052544A1 Ion implantation device |
| 04/30/2009 | WO2009036365A9 Method and apparatus of automatic scanning probe imaging |
| 04/30/2009 | WO2009027905A3 Sputtering system |
| 04/30/2009 | WO2008136858A3 Techniques for removing molecular fragments from an ion implanter |
| 04/30/2009 | WO2006002315A3 Electron beam enhanced nitriding system (ebens) |
| 04/30/2009 | US20090111280 Method for removing oxides |
| 04/30/2009 | US20090111264 Plasma-enhanced cyclic layer deposition process for barrier layers |
| 04/30/2009 | US20090111036 Scanning beam of metallic ions over defect to dope, reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |
| 04/30/2009 | US20090108200 Method and System of Performing Three-Dimensional Imaging Using An Electron Microscope |
| 04/30/2009 | US20090108199 System and method to determine focus parameters during an electron beam inspection |
| 04/30/2009 | DE102007051444A1 Strip-shaped substrate etching method, involves producing magnetic field in such manner that electrical flux lines run in closed area perpendicular to operating direction in plasma area close to edge in substrate area |