Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/2009
06/10/2009CN201256139Y Special fixture for scanning electronic microscope
06/10/2009CN201256138Y Ion beam leading out system for ionic source
06/10/2009CN101452805A Processing container an plasma processing device
06/10/2009CN100497724C Vacuum electric arc deposition equipment
06/09/2009US7546016 Optical elements formed by inducing changes in the index of refraction by utilizing electron beam radiation
06/09/2009US7544959 In situ surface contamination removal for ion implanting
06/09/2009US7544958 Contamination reduction during ion implantation
06/09/2009US7544957 Non-uniform ion implantation
06/09/2009US7544937 Charged particle beam device for high spatial resolution and multiple perspective imaging
06/09/2009US7544936 Method and device for observing a specimen in a field of view of an electron microscope
06/09/2009US7544397 Recording media having protective overcoats of highly tetrahedral amorphous carbon and methods for their production
06/09/2009US7544334 Device for sterilizing objects
06/09/2009US7544276 Biased pulse DC reactive sputtering of oxide films
06/09/2009US7544269 Method and apparatus for electron density measurement
06/09/2009US7543546 Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
06/04/2009WO2009070265A1 Control of arbitrary scan path of a rotating magnetron
06/04/2009WO2009070120A1 Lp-regularization of sparse representations applied to structure determination methods in molecular biology/structural chemistry
06/04/2009WO2009069335A1 Electron emitting source and manufacturing method of electron emitting source
06/04/2009WO2009068904A1 Particle beam apparatus
06/04/2009WO2009068784A1 Method and device for producing a homogeneous discharge on non-insulating substrates
06/04/2009WO2009068763A2 Method, device and system for measuring nanoscale deformations
06/04/2009WO2009040406A3 Method and arrangement for redundant anode sputtering having a dual anode arrangement
06/04/2009WO2009025393A3 Plasma processing device and plasma discharge state monitoring device
06/04/2009WO2007061426A3 Laser-accelerated proton therapy units and superconducting eletromagnetig systems for same
06/04/2009WO2007021855A3 Atmospheric process and system for controlled and rapid removal of polymers from high aspect ratio holes
06/04/2009US20090140174 Impurity Introducing Apparatus and Impurity Introducing Method
06/04/2009US20090139658 Plasma processing apparatus
06/04/2009US20090139449 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate
06/03/2009EP2065915A1 Diamond electron source and method for manufacturing the same
06/03/2009EP2064728A2 System and magnetic scanning and correction of an ion beam
06/03/2009EP1402242B1 Using scatterometry to develop real time etch image
06/03/2009CN101449354A New and improved ion source
06/03/2009CN101446773A Maskless photon-electron spot-grid array printer
06/03/2009CN100496182C Discharging power source, sputtering power source, and sputtering device
06/03/2009CN100495635C A grid of transmission electronic microscope driven by thermal dual metal sheets
06/03/2009CN100495634C Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method
06/03/2009CN100495413C A method for adjoining adjacent coatings on a processing element
06/03/2009CN100495073C Beam measuring equipment and beam measuring method using the same, emission device and material
06/03/2009CN100495072C Ion beam measuring method and ion implanting apparatus
06/03/2009CN100494487C Film-forming apparatus and film-forming method
06/02/2009US7541601 Ion beam irradiating apparatus and method of adjusting uniformity of a beam
06/02/2009US7541597 Automatic cleaning of ion sources
06/02/2009US7541580 Detector for charged particle beam instrument
06/02/2009US7540923 Shower head structure for processing semiconductor
05/2009
05/28/2009WO2009065938A1 Atom probe with a high acceptance
05/28/2009WO2009065303A1 Plasma confinement device and semiconductor processing apparatus using the same
05/28/2009WO2009036722A3 Device for the plasma treatment of workpieces
05/28/2009WO2009003552A3 Treatment system for flat substrates
05/28/2009US20090134343 Tracking control method and electron beam writing system
05/28/2009US20090134121 Plasma processing apparatus and method
05/28/2009US20090133838 Plasma Processor Apparatus
05/28/2009US20090133630 Batch-Type Remote Plasma Processing Apparatus
05/28/2009DE102007055010A1 Verfahren und Generatorschaltung zur Erzeugung von Plasmen mittels Hochfrequenzanregung A method and generator circuit for generating plasma by high frequency excitation
05/27/2009EP2063450A1 Method for obtaining a scanning transmission image of a sample in a particle-optical apparatus
05/27/2009EP2063449A1 Method for obtaining a scanning transmission image of a sample in a particle-optical apparatus
05/27/2009EP2063221A1 Electron beam dimension measuring device and electron beam dimension measuring method
05/27/2009EP2062283A2 Enhanced virtual anode
05/27/2009EP2062278A2 System and method for managing power supplied to a plasma chamber
05/27/2009CN201247756Y Target disc
05/27/2009CN201247755Y Microscope objective device
05/27/2009CN101443878A Electrode systems and methods of using electrodes
05/27/2009CN101443877A Optical device for generating high current density picture composition electrified particle beam
05/27/2009CN101442873A Equipment and method for processing plasma
05/27/2009CN101442872A Electrode assemblies and plasma processing chambers incorporating the same
05/27/2009CN101441986A Surface treatment device and manufacture method of lower electrode assembly body of the device
05/27/2009CN101441983A Plasma confinement apparatus and semiconductor processing equipment applying the same
05/27/2009CN101441982A Chamber lining and plasma processing apparatus
05/27/2009CN101441970A Sample platform for observing silicon chip sample of scanning electron microscope
05/27/2009CN101440484A Induction coupling plasma processing apparatus and method
05/27/2009CN100492600C Plasma processing apparatus
05/27/2009CN100492598C Method and equipment for etching substrate characteristic using alternative deposit/etching procedure
05/27/2009CN100492584C Ion beam incident angle detector for ion implant systems
05/26/2009US7539340 Apparatus and method for three-dimensional coordinate measurement
05/26/2009US7538333 Contactless charge measurement of product wafers and control of corona generation and deposition
05/26/2009US7538332 Method of Z-lift electrostatic nanolithography
05/26/2009US7538323 Interferometer
05/26/2009US7538320 Ion detection device and method with compressing ion-beam shutter
05/26/2009US7537940 Method of manufacturing electronic device capable of controlling threshold voltage and ion implanter controller and system that perform the method
05/26/2009US7537708 Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface
05/26/2009US7537676 Cathode apparatus to selectively bias pallet during sputtering
05/26/2009US7537672 Apparatus for plasma processing
05/22/2009WO2009064397A2 Directed-energy systems and methods for disrupting electronic circuits
05/22/2009WO2009062929A2 Beam device and system comprising a particle beam device and an optical microscope
05/22/2009WO2009062845A2 Method and generator circuit for production of plasmas by means of radio-frequency excitation
05/22/2009WO2009025394A3 Plasma processing device
05/21/2009US20090126629 Film-forming system and film-forming method
05/20/2009EP2061068A1 System for processing an object
05/20/2009EP2061067A2 Beam device and system comprising a particle beam device and an optical microscope
05/20/2009EP2061066A2 System and method for processing an object with a charged particle beam
05/20/2009EP2061064A1 Electron source
05/20/2009EP2060898A2 Method and system for sample preparation
05/20/2009EP1695038A4 Controlling the flow of vapors sublimated from solids
05/20/2009DE102007054392A1 Selbstadaptivität von Rasterelektronenmikroskopen Self-adaptivity of scanning electron microscopes
05/20/2009CN201242995Y Plasma generator for sterilizing gas
05/20/2009CN101437605A Method and apparatus for nanopowder and micropowder production using axial injection plasma spray
05/20/2009CN101437354A Plasma processing apparatus
05/20/2009CN101437352A Plasma relay apparatus
05/20/2009CN101436523A Detection system and method for accurately measuring ion beam spot width
05/20/2009CN101436506A Motorized manipulator for positioning a tem specimen
05/20/2009CN101435075A Plasma processing gas supply member