| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/22/2009 | EP2080425A1 Device for forming a film by deposition from a plasma |
| 07/22/2009 | EP2080424A1 Device and method for producing microwave plasma with a high plasma density |
| 07/22/2009 | EP2080216A1 Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma |
| 07/22/2009 | EP2080215A1 Device and method for locally producing microwave plasma |
| 07/22/2009 | EP2080214A1 Device and method for producing high power microwave plasma |
| 07/22/2009 | EP2080213A2 Sensor for ion implanter |
| 07/22/2009 | EP2080212A1 An electron column using a magnetic lens layer having permanent magnets |
| 07/22/2009 | EP1579023A4 Plasma-assisted melting |
| 07/22/2009 | EP1501959A4 Plasma-assisted enhanced coating |
| 07/22/2009 | EP1501631A4 Plasma-assisted formation of carbon structures |
| 07/22/2009 | EP1424537B1 Recording device of information recording medium original disk |
| 07/22/2009 | CN101490794A Plasma sources |
| 07/22/2009 | CN101490793A Plant for plasma treatment of endless materials |
| 07/22/2009 | CN101490792A Ion deposition apparatus |
| 07/22/2009 | CN101490791A Beam angle adjustment in ion implanters |
| 07/22/2009 | CN100517553C System and method for inductive coupling of an expanding thermal plasma |
| 07/22/2009 | CN100515648C Electron beam wselding method and its welded structural unit |
| 07/21/2009 | US7564049 Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method |
| 07/21/2009 | US7564043 MCP unit, MCP detector and time of flight mass spectrometer |
| 07/21/2009 | US7564042 Ion beam apparatus having plasma sheath controller |
| 07/21/2009 | US7563380 Providing a substrate, electrodes that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy toand/or electrodes to generate electrons; contacting substrate with negatively charged reducing gas to reduce metal oxides |
| 07/21/2009 | US7563328 Method and apparatus for gas injection system with minimum particulate contamination |
| 07/21/2009 | CA2545600C Device for operating gas in vacuum or low-pressure environment and for observation of the operation |
| 07/16/2009 | US20090181545 Dry-etching method and apparatus |
| 07/16/2009 | US20090181527 Graphite Member for Beam-Line Internal Member of Ion Implantation Apparatus |
| 07/16/2009 | US20090179161 Ion sources, systems and methods |
| 07/16/2009 | US20090178920 Multi-cathode ionized physical vapor deposition system |
| 07/16/2009 | US20090178917 Method of sputtering a high-k dielectric material |
| 07/16/2009 | US20090178614 Film-forming apparatus |
| 07/15/2009 | EP2079104A1 Method of planarizing solid surface with gas cluster ion beam and solid surface planarizing apparatus |
| 07/15/2009 | EP2079102A1 Method for flattening solid surface with gas cluster ion beam, and solid surface flattening device |
| 07/15/2009 | EP1501649A4 Plasma-assisted sintering |
| 07/15/2009 | CN101484968A Sputter target assemblies having a controlled solder thickness |
| 07/15/2009 | CN101484967A Methods and apparatus for beam density measurement in two dimensions |
| 07/15/2009 | CN101484966A Apparatus for electron beam evaporation |
| 07/15/2009 | CN101484965A Apparatus for accelerating an ion beam |
| 07/15/2009 | CN100514569C Method for determining of performing plasma etching on wafer surface of terminals |
| 07/15/2009 | CN100514541C Method and apparatus for monitoring parts in a material processing system |
| 07/15/2009 | CN100513633C Coating device with rotatable magnetrons covering large area |
| 07/15/2009 | CN100513632C Thin film forming device and thin film forming method |
| 07/14/2009 | US7561015 Magnet secured in a two part shell |
| 07/14/2009 | US7560713 Correction lens system for a particle beam projection device |
| 07/14/2009 | US7560712 Ion implanter with etch prevention member(s) |
| 07/14/2009 | US7560705 Workpiece handling scan arm for ion implantation system |
| 07/14/2009 | US7560703 Integrated segmented scintillation detector |
| 07/14/2009 | US7560376 Method for adjoining adjacent coatings on a processing element |
| 07/14/2009 | US7559557 Sealing between vacuum chambers |
| 07/14/2009 | CA2444766C Method and apparatus for sequential plasma treatment |
| 07/09/2009 | WO2009085954A2 Rf electron source for ionizing gas clusters |
| 07/09/2009 | WO2009085939A1 Improved high tilt implant angle performance using in-axis tilt |
| 07/09/2009 | WO2009085165A2 Ionization gauge having electron multiplier cold emmission source |
| 07/09/2009 | WO2009083733A1 Improvements relating to ion implanters |
| 07/09/2009 | WO2009083726A1 Improvements relating to ion implanters |
| 07/09/2009 | WO2009064397A3 Directed-energy systems and methods for disrupting electronic circuits |
| 07/09/2009 | US20090176168 Exposure data preparation method and exposure method |
| 07/09/2009 | US20090173444 Surface processing apparatus |
| 07/09/2009 | DE102007063649A1 Verfahren zum Erzeugen von Strukturen in einem Resistmaterial und Elektronenstrahlbelichtungsanlagen A method for producing patterns in a resist material, and electron beam exposure systems |
| 07/09/2009 | DE102006059162B4 Teilchenoptische Anordnung Particle-optical arrangement |
| 07/08/2009 | EP2077574A1 Method of controlling electron beam focusing of pierce type electron gun and control device therefor |
| 07/08/2009 | EP2076916A1 Dual magnetron sputtering power supply and magnetron sputtering apparatus |
| 07/08/2009 | EP1738388A4 Method and apparatus for improved processing with a gas-cluster ion beam |
| 07/08/2009 | EP1550144A4 System for and method of gas cluster ion beam processing |
| 07/08/2009 | CN201270237Y Wireless electronic microscope and image receiving apparatus thereof |
| 07/08/2009 | CN100511619C Membrane processing method and processor |
| 07/08/2009 | CN100511600C Multiple frequency plasma etch reactor |
| 07/08/2009 | CN100511583C Plasma processing device |
| 07/08/2009 | CN100511569C Planetary magnetron |
| 07/08/2009 | CN100511568C Method and apparatus for operating and observing high voltage cavity in vacuum or low voltage environment |
| 07/08/2009 | CN100511567C Transmission electron microscope slide glass for nano material in-situ structure property test |
| 07/08/2009 | CN100510164C System and apparatus for control of sputter deposition process |
| 07/07/2009 | US7557591 System and method for determining the state of a film in a plasma reactor using an electrical property |
| 07/07/2009 | US7557364 Charge neutralizing device |
| 07/07/2009 | US7557363 Closed loop dose control for ion implantation |
| 07/07/2009 | US7557362 Ion sources and methods for generating an ion beam with a controllable ion current density distribution |
| 07/07/2009 | US7557346 Scanning electron microscope |
| 07/07/2009 | US7556749 A single crystal needle of tungsten or molybdenum with a covering of an oxide of barium and another metal, barium aluminum oxide (BaAl12O19); low voltage; acceleration voltage of <1 kV, CD SEM or DR SEM; brightness; semiconductor wafer inspection; scanning/transmission electron microscope; lithography |
| 07/07/2009 | US7556741 Method for producing a solar cell |
| 07/07/2009 | US7556740 Method for producing a solar cell |
| 07/07/2009 | US7556718 Plasma vapor deposition; etching; semiconductors; integrated circuits |
| 07/02/2009 | WO2009081897A1 Filming treatment jig, plasma cvd apparatus, and metal plate and osmium film forming method |
| 07/02/2009 | WO2009080943A1 Apparatus and method for treating a surface by means of a dielectric barrier discharge in a gas, enabling two substrates to be treated simultaneously |
| 07/02/2009 | WO2009080825A2 Apparatus and method for investigating and/or modifying a sample |
| 07/02/2009 | WO2009080751A1 Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus |
| 07/02/2009 | WO2009080707A2 Methods and systems for removing a material from a sample |
| 07/02/2009 | WO2009080430A1 Linear electron source, evaporator using linear electron source, and appliccations of electron sources |
| 07/02/2009 | WO2009080411A1 Linear electron source, evaporator using linear electron source, and applications of electron sources |
| 07/02/2009 | WO2009080312A1 Linear electron source, evaporator using linear electron source, and applications of electron sources |
| 07/02/2009 | US20090166567 Method of performing ion implantation |
| 07/02/2009 | DE19943053B4 Plasmaanlage, insbesondere zur Herstellung von Halbleiterbauelementen A plasma plant, in particular for the production of semiconductor devices |
| 07/02/2009 | DE19628954B4 Vorrichtung zur Erzeugung von Plasma A device for generating plasma |
| 07/02/2009 | DE10211332B4 Vorrichtung und Verfahren zur Aktivierung von Gasen im Vakuum sowie Verwendung der Vorrichtung Apparatus and method for activation of gases in the vacuum as well as using the apparatus |
| 07/02/2009 | DE102007062054A1 Röhre, insbesondere Elektronenröhre Tube, electron tube in particular |
| 07/02/2009 | DE102007061418A1 Method for generating hollow cathode arc discharge plasma in a working vacuum chamber and regulating material steam particles exposed to the hollow cathode arc discharge plasma, by reducing gas flow through the hollow cathode |
| 07/02/2009 | DE102007058443A1 Korrektor für axialen und außeraxialen Strahlengang Corrector for axial and off-axial beam path |
| 07/01/2009 | EP2075823A1 Current change limiting device |
| 07/01/2009 | EP2075822A2 Plasma reactor for treating substrates having large surfaces |
| 07/01/2009 | EP2075821A2 Sample holder, method for observation and inspection, and apparatus for observation and inspection |
| 07/01/2009 | EP2074645A2 Improved atmospheric pressure plasma electrode |
| 07/01/2009 | EP2074644A1 Improved plasma electrode |
| 07/01/2009 | EP2074643A1 Current-based method and apparatus for detecting and classifying arcs |