| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/01/2009 | EP1502480A4 Plasma-assisted heat treatment |
| 07/01/2009 | EP1502012A4 Plasma-assisted engine exhaust treatment |
| 07/01/2009 | CN101473406A Method for controlling a reactive high-power pulsed magnetron sputter process and corresponding device |
| 07/01/2009 | CN101473405A Insert piece for an end-block of a sputtering installation |
| 07/01/2009 | CN101473404A Apparatus and method for cleaning, etching, activation and subsequent treatment of glass surfaces, glass surfaces coated by metal oxides, and surfaces of other SiO2-coated materials |
| 07/01/2009 | CN101473403A Current-based method and apparatus for detecting and classifying arcs |
| 07/01/2009 | CN100508689C Plasma processing device |
| 07/01/2009 | CN100508134C Plasma processing method and plasma processing apparatus |
| 07/01/2009 | CN100508108C Small volume process chamber with hot inner surfaces |
| 07/01/2009 | CN100508103C Method and apparatus for an improved bellows shield in a plasma processing system |
| 07/01/2009 | CN100508102C Langmuir probe plasma diagnostic method based on virtual instrument |
| 06/30/2009 | US7554108 Forming a semiconductor device feature using acquired parameters |
| 06/30/2009 | US7554106 Partial ion implantation apparatus and method using bundled beam |
| 06/30/2009 | US7554104 Bolt and semiconductor manufacturing apparatus |
| 06/30/2009 | US7554095 Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate |
| 06/30/2009 | US7554094 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| 06/30/2009 | US7553773 Pressure control method and processing device |
| 06/30/2009 | US7553679 Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current |
| 06/25/2009 | WO2009079285A1 Silicon carbide focus ring for plasma etching system |
| 06/25/2009 | WO2009079195A1 Ion beam imaging |
| 06/25/2009 | WO2009079054A2 Radio frequency atomic magnetometer |
| 06/25/2009 | WO2009052453A3 Plasma doping system with charge control |
| 06/25/2009 | US20090162572 Systems and Methods for the Production of Highly Tetrahedral Amorphous Carbon Coatings |
| 06/25/2009 | US20090161719 Linear electron source, evaporator using linear electron source, and applications of electron sources |
| 06/25/2009 | US20090159440 Batch-Type Remote Plasma Processing Apparatus |
| 06/25/2009 | DE102008060270A1 Gasfeldionisations-Ionenquelle, Rasterladungsteilchenmikroskop, Einstellverfahren für die optische Achse und Probenbetrachtungsverfahren Gasfeldionisations ion source Rasterladungsteilchenmikroskop, for adjusting the optical axis and sample observation method |
| 06/25/2009 | DE10004824B4 Verfahren zur Herstellung von Substraten, Magnetronquelle, Sputterbeschichtungskammer und Verwendung des Verfahrens A process for the production of substrates, magnetron Sputterbeschichtungskammer and use of the method |
| 06/24/2009 | EP2073250A2 Transmission electron microscope |
| 06/24/2009 | EP2073249A1 Linear electron source, evaporator using linear electron source, and applications of electron sources |
| 06/24/2009 | EP2073248A1 Linear electron source, evaporator using linear electron source, and applications of electron sources |
| 06/24/2009 | EP2073243A1 Linear electron source, evaporator using linear electron source, and applications of electron sources |
| 06/24/2009 | CN101467228A Ion beam irradiating apparatus, and method of producing semiconductor device |
| 06/24/2009 | CN101467227A Ion beam current uniformity monitor, ion implanter and related method |
| 06/24/2009 | CN100505976C Plasma-assisted joining |
| 06/24/2009 | CN100505975C Plasma-assisted coating |
| 06/24/2009 | CN100505140C Ion implanting apparatus and ion implanting method |
| 06/24/2009 | CA2646522A1 Current change limiting device |
| 06/23/2009 | US7550982 Semiconductor device test method for comparing a first area with a second area |
| 06/23/2009 | US7550811 Image pickup device and method of manufacturing the same |
| 06/23/2009 | US7550751 Ion beam scanning control methods and systems for ion implantation uniformity |
| 06/23/2009 | US7550750 Method and apparatus for processing a micro sample |
| 06/23/2009 | US7550744 Chamberless substrate handling |
| 06/23/2009 | US7550743 Chamberless substrate handling |
| 06/23/2009 | US7550740 Focused ION beam apparatus |
| 06/23/2009 | US7550723 Atom probe apparatus and method for working sample preliminary for the same |
| 06/23/2009 | US7550180 utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means to treat the surface of a treatment target substrate; good efficiency; low cost |
| 06/23/2009 | CA2399951C Method and apparatus for inductively coupled plasma treatment |
| 06/23/2009 | CA2391911C Plasma processing apparatus with an electrically conductive wall |
| 06/18/2009 | WO2009075629A1 Plasma activated chemical vapour deposition method and apparatus therefor |
| 06/18/2009 | WO2009053614A3 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma |
| 06/18/2009 | WO2009046702A3 Device and method for forming coatings on substrates inside vacuum chambers |
| 06/18/2009 | WO2009036365A3 Method and apparatus of automatic scanning probe imaging |
| 06/18/2009 | US20090158236 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 06/18/2009 | US20090155489 generally applicable to rectangular (or square) large area plasma processing equipment, which is used in but not limited to LCD, Plasma Display and Solar Cell production) or any other reactor using electromagnetic waves (RF, VHF) for processing |
| 06/18/2009 | US20090152462 Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method |
| 06/17/2009 | EP2071188A1 Device for the deposition of non-evaporable getters (NEGs) and method of deposition using said device |
| 06/17/2009 | EP1665319A4 Shaped sputter shields for improved ion column operation |
| 06/17/2009 | CN101461032A A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus |
| 06/17/2009 | CN101461031A Temperature control method for photolithographic substrate |
| 06/17/2009 | CN101461030A Surface treatments for spiral bevel gear sets |
| 06/17/2009 | CN101461029A Methods and apparatus for downstream dissociation of gases |
| 06/17/2009 | CN101461028A Scan pattern for an ion implanter |
| 06/17/2009 | CN101461027A Dose close loop control for ion implantation |
| 06/17/2009 | CN101461026A Slider bearing for use with an apparatus comprising a vacuum chamber |
| 06/17/2009 | CN101460002A Method and apparatus for producing uniform processing rates |
| 06/17/2009 | CN101457338A Cleaning of native oxide with hydrogen-containing radicals |
| 06/17/2009 | CN100501907C Ion implantation high temperature target |
| 06/17/2009 | CN100501906C Film forming liquid for preparing micro-sieve film and method of use thereof |
| 06/16/2009 | US7547900 Techniques for providing a ribbon-shaped gas cluster ion beam |
| 06/16/2009 | US7547899 Charged beam dump and particle attractor |
| 06/16/2009 | US7547898 Particulate prevention in ion implantation |
| 06/16/2009 | US7547897 High-temperature ion implantation apparatus and methods of fabricating semiconductor devices using high-temperature ion implantation |
| 06/16/2009 | US7547619 Method of introducing impurity, device and element |
| 06/16/2009 | US7547460 Ion implanter optimizer scan waveform retention and recovery |
| 06/11/2009 | WO2009073316A2 Method and apparatus for controlling a gas cluster ion beam formed from gas mixture |
| 06/11/2009 | WO2009073292A1 Process and aparatus for atmospheric pressure plasma enhanced chemical vapor deposition |
| 06/11/2009 | WO2009072081A1 A method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source |
| 06/11/2009 | WO2009071815A2 Equipment for producing semiconductors and corresponding pumping device and substrate holder |
| 06/11/2009 | WO2009071667A1 Reactive sputtering with hipims |
| 06/11/2009 | WO2009043317A3 Ionisation detector for environmental scanning electron microscope |
| 06/11/2009 | WO2008088971A3 Techniques for providing ion source feed materials |
| 06/11/2009 | WO2006127736A3 Silicon substrates with thermal oxide windows for transmission electron microscopy |
| 06/11/2009 | US20090148624 Plasma cvd apparatus and method |
| 06/11/2009 | US20090145554 Procedure and device for the production of a plasma |
| 06/11/2009 | US20090145360 Method and apparatus for cleaning a cvd chamber |
| 06/11/2009 | CA2705577A1 Process and aparatus for atmospheric pressure plasma enhanced chemical vapor deposition |
| 06/10/2009 | EP2068349A1 Stage device and exposure device |
| 06/10/2009 | EP2068345A1 High resolution gas field ion column with reduced sample load |
| 06/10/2009 | EP2068344A2 Particle optical corrector for axial and off-axis beam path |
| 06/10/2009 | EP2068343A1 Charged particle source with automated tip formation |
| 06/10/2009 | EP2068339A1 Electron source |
| 06/10/2009 | EP2068160A2 Apparatus and method for observing defects in semiconductor wafers |
| 06/10/2009 | EP1949404A4 Charged particle radiation therapy |
| 06/10/2009 | EP1910891A4 Inspection equipment for fine pattern and morphology using microcolumn |
| 06/10/2009 | EP1350264A4 Method for forming a pattern and a semiconductor device |
| 06/10/2009 | EP1339895B1 Method and device for treating the surface of electrically insulating substrates |
| 06/10/2009 | EP1256123B1 Low input power schottky emitter |
| 06/10/2009 | DE202009003715U1 Schnellverschlusstür für Vakuumanwendungen Quick release door for vacuum applications |
| 06/10/2009 | DE102005005709B4 Einrichtung zur Bearbeitung von Materialoberflächen Means for processing of material surfaces |
| 06/10/2009 | DE102004014584B4 Hochfrequenz-Quadrupolsysteme mit Potentialgradienten High-frequency quadrupole with potential gradient |