| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/12/2009 | CN101506885A Drawing method, drawing apparatus, and information recording medium |
| 08/12/2009 | CN101506839A Method and electron microscope for measuring the similarity of two-dimensional images |
| 08/12/2009 | CN101505574A Plasma processing apparatus |
| 08/12/2009 | CN101504906A Ion beam guide tube |
| 08/12/2009 | CN101503295A SiC material comprising combination of alpha-SiC and beta-SiC and two-part plasma chamber cathode manufactured using the same |
| 08/12/2009 | CN100526984C Particle-optical device for object irradiation |
| 08/11/2009 | US7573053 Polarized pulsed front-end beam source for electron microscope |
| 08/11/2009 | US7573052 Exposure apparatus, exposure method, and device manufacturing method |
| 08/11/2009 | US7573051 Ion beam guide tube |
| 08/11/2009 | US7573050 Column simultaneously focusing a particle beam and an optical beam |
| 08/11/2009 | US7573049 Wafer alignment method for dual beam system |
| 08/11/2009 | US7573047 Wafer holder and sample producing apparatus using it |
| 08/11/2009 | US7573046 Thermal field emission electron gun with reduced arcing |
| 08/11/2009 | US7573031 Methods for SEM inspection of fluid containing samples |
| 08/11/2009 | US7572337 Blocker plate bypass to distribute gases in a chemical vapor deposition system |
| 08/11/2009 | US7571697 Plasma processor coil |
| 08/06/2009 | WO2009096785A1 Method and apparatus for plasma surface treatment of a moving substrate |
| 08/06/2009 | WO2009095496A1 Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement |
| 08/06/2009 | WO2008099220A3 Methods and apparatus for forming diamond-like coatings |
| 08/06/2009 | US20090197357 High-temperature ion implantation apparatus and methods of fabricating semiconductor devices using high-temperature ion implantation |
| 08/06/2009 | US20090197012 Plasma cvd apparatus |
| 08/06/2009 | US20090194690 Inspection Method And Inspection System Using Charged Particle Beam |
| 08/06/2009 | US20090194413 Multi-cathode ionized physical vapor deposition system |
| 08/06/2009 | US20090194412 Multi-cathode ionized physical vapor deposition system |
| 08/06/2009 | DE102009007156A1 Magnetronsputtereinrichtung mit bewegbarem Magnetfeld Magnetron sputtering with movable magnetic field |
| 08/05/2009 | EP2084729A2 Ion beam scanning control methods and systems for ion implantation uniformity |
| 08/05/2009 | CN201285757Y Integration type plasma treatment mechanism |
| 08/05/2009 | CN101501813A Process and apparatus for the modification of surfaces |
| 08/05/2009 | CN101501812A Throughput enhancement for scanned beam ion implanters |
| 08/05/2009 | CN101500370A Plasma processing apparatus |
| 08/05/2009 | CN101499407A Gas dispensing device and semiconductor process plant employing the same |
| 08/05/2009 | CN101499399A Substrate plasma processing apparatus and plasma processing method |
| 08/05/2009 | CN101499398A Method for obtaining a scanning transmission image of a sample in a particle-optical apparatus |
| 08/05/2009 | CN100524678C Plasma equipment containing plasma measurer |
| 08/05/2009 | CN100524645C Method of etching a silicon-containing dielectric material |
| 08/05/2009 | CN100524641C Plasma processing device |
| 08/05/2009 | CN100524628C Ion injection uniformity control system and control method |
| 08/05/2009 | CN100524603C Shallow-angle interference process and apparatus for determining real-time etching rate |
| 08/05/2009 | CN100524602C High voltage automatic discharge device for ion implanter |
| 08/05/2009 | CN100524601C Method and device for aligning a charged particle beam column |
| 08/05/2009 | CN100524581C Field emission device |
| 08/05/2009 | CN100524026C 光刻系统 Lithography system |
| 08/05/2009 | CN100523290C Surface treatment method and device |
| 08/05/2009 | CN100523288C High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and device for carrying out said method |
| 08/05/2009 | CN100523282C Sputter source, sputtering device, and sputtering method |
| 08/05/2009 | CN100523281C Sputter arrangement with a magnetron and a target |
| 08/04/2009 | US7569842 Method for correcting electron beam exposure data |
| 08/04/2009 | US7569838 Electron beam inspection system and inspection method and method of manufacturing devices using the system |
| 08/04/2009 | US7569835 Gating grid and method of manufacture |
| 08/04/2009 | US7569834 High resolution charged particle projection lens array using magnetic elements |
| 08/04/2009 | US7569833 Apparatus for generating a plurality of beamlets |
| 08/04/2009 | US7569819 Electron beam system and method of operating the same |
| 08/04/2009 | US7569817 Scanning probe apparatus |
| 08/04/2009 | US7569497 Method and apparatus for forming insulating layer |
| 08/04/2009 | US7569256 Plasma CVD apparatus and dry cleaning method of the same |
| 08/04/2009 | US7569154 Plasma processing method, plasma processing apparatus and computer storage medium |
| 08/04/2009 | US7569125 Shields usable with an inductively coupled plasma reactor |
| 07/30/2009 | WO2009094414A1 Ion source gas reactor |
| 07/30/2009 | WO2009093247A1 System and method for material analysis of a microscopic element |
| 07/30/2009 | WO2009092729A2 Apparatus, carrier and method for the plasma treatment of molds |
| 07/30/2009 | WO2009071815A3 Equipment for producing semiconductors and corresponding pumping device and substrate holder |
| 07/30/2009 | US20090189096 Apparatus and methods for ion beam implantation using ribbon and spot beams |
| 07/30/2009 | US20090189075 Inspection method and inspection system using charged particle beam |
| 07/30/2009 | US20090188526 Process of cleaning a semiconductor manufacturing system and method of manufacturing a semiconductor device |
| 07/30/2009 | DE19860704B4 Verfahren zur Überprüfung zumindest eines Teils eines Halbleiterwafers mit einem Rasterelektronenmikroskop Method for checking at least a portion of a semiconductor wafer with a scanning electron microscope |
| 07/30/2009 | DE112006003970T5 Vorrichtung und Verfahren zum Prozessieren eines Wafers Apparatus and method for processing a wafer |
| 07/30/2009 | DE102009004392A1 Datenerzeugungsverfahren für Halbleitervorrichtung und Elektronenstrahlbelichtungssystem Data forming method for the semiconductor device and electron beam exposure system |
| 07/30/2009 | DE102007010873B4 Objektivlinse Objective lens |
| 07/29/2009 | EP2082414A1 Reduction in stage movement reaction force in an electron beam lithography machine |
| 07/29/2009 | EP2082413A2 Scanning electron microscope |
| 07/29/2009 | EP2081700A1 Method and apparatus for manufacturing cleaned substrates or clean substrates which are further processed |
| 07/29/2009 | EP1797220A4 Rf ground switch for plasma processing system |
| 07/29/2009 | EP1501632A4 Plasma-assisted carburizing |
| 07/29/2009 | EP1312695B1 Sputtering target producing few particles, backing plate provided with the target, and a method of producing the target |
| 07/29/2009 | CN201282104Y Novel electronic gun with oil immerson water cooling device |
| 07/29/2009 | CN101496129A A multiple beam charged particle optical system |
| 07/29/2009 | CN101494151A Magnetic control cathode assembly for cleaning one-dimensional linear plasma with high efficiency |
| 07/29/2009 | CN100521103C Plasma processing apparatus and method |
| 07/29/2009 | CN100521063C Automatic beam-leading method for ion source |
| 07/29/2009 | CN100521062C Particle-optical device and detection means |
| 07/29/2009 | CN100520382C Plasma monitoring method, plasma monitor and plasma treatment appts. |
| 07/28/2009 | US7567037 High frequency power supply device and plasma generator |
| 07/28/2009 | US7566892 Electron beam apparatus and method for production of its specimen chamber |
| 07/28/2009 | US7566886 Throughput enhancement for scanned beam ion implanters |
| 07/28/2009 | US7566883 Thermal transfer sheet for ion source |
| 07/28/2009 | US7566872 Scanning electron microscope |
| 07/28/2009 | US7566379 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| 07/28/2009 | US7566368 Method and apparatus for an improved upper electrode plate in a plasma processing system |
| 07/28/2009 | US7565880 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same |
| 07/28/2009 | US7565879 Plasma processing apparatus |
| 07/23/2009 | WO2009091943A1 In-vacuum protective liners |
| 07/23/2009 | WO2009089794A1 Plasma processing equipment and gas distribution apparatus thereof |
| 07/23/2009 | WO2009068763A3 Method, device and system for measuring nanoscale deformations |
| 07/23/2009 | US20090186469 Apparatus and method for doping |
| 07/23/2009 | US20090186282 Contamination prevention in extreme ultraviolet lithography |
| 07/23/2009 | US20090183983 Insert piece for an end-block of a sputtering installation |
| 07/23/2009 | DE102008043819A1 Nachführsteuerverfahren und Elektronenstrahlschreibsystem Nachführsteuerverfahren and electron beam writing system |
| 07/22/2009 | EP2081212A1 Double-Coating Device with one Process Chamber |
| 07/22/2009 | EP2081211A1 Improving abrasion resistance of surfaces |
| 07/22/2009 | EP2080817A1 Method and apparatus for chamber cleaning by in-situ plasma excitation |