| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/27/2009 | US20090215205 Shower head structure for processing semiconductor |
| 08/27/2009 | US20090211896 Cathode and Counter-Cathode Arrangement in an Ion Source |
| 08/27/2009 | DE20122901U1 RF Plasma Reaktor RF plasma reactor |
| 08/27/2009 | DE102008009640A1 Prozessierungssystem Processing system |
| 08/26/2009 | EP2092547A1 Method and apparatus for preventing instabilities in radio-frequency plasma processing |
| 08/26/2009 | EP2092546A2 Component mounting in movement-sensitive equipment |
| 08/26/2009 | EP1889279B1 System and method for analyzing power flow in semiconductor plasma generation systems |
| 08/26/2009 | EP1766653B1 Charged particle beam exposure system |
| 08/26/2009 | EP1287543B1 Through-the-lens sample neutralizing electron beam for focused ion beam system |
| 08/26/2009 | EP0824604B1 Apparatus for reducing arcing during sputtering |
| 08/26/2009 | CN101518162A Plasma generator and work processing apparatus provided with the same |
| 08/26/2009 | CN101517691A Ecr plasma source |
| 08/26/2009 | CN101515545A Plasma processing apparatus and plasma processing method |
| 08/26/2009 | CN101515538A Sealing structure for processing reaction chamber by semiconductor |
| 08/26/2009 | CN100533659C Vaccuum processing apparatus |
| 08/26/2009 | CN100533658C Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition |
| 08/26/2009 | CN100533652C Plasma processing apparatus |
| 08/26/2009 | CN100533651C Plasma apparatus and method for processing a substrate |
| 08/26/2009 | CN100533650C Ion source control system |
| 08/26/2009 | CN100533649C Cathode and counter cathode arrangement in an ion source |
| 08/26/2009 | CN100533642C Ion source with modified gas delivery |
| 08/26/2009 | CN100532637C Capacitively coupled plasma reactor with plasma of uniform radial distribution |
| 08/26/2009 | CN100532631C Vacuum-coating machine with motor-driven rotary cathode |
| 08/25/2009 | US7579605 Multi-purpose electrostatic lens for an ion implanter system |
| 08/25/2009 | US7579604 Beam stop and beam tuning methods |
| 08/25/2009 | US7579602 Ion implantation with a collimator magnet and a neutral filter magnet |
| 08/25/2009 | US7579591 Method and apparatus for analyzing sample |
| 08/25/2009 | US7578946 Plasma processing system and plasma processing method |
| 08/25/2009 | US7578944 Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same |
| 08/25/2009 | US7578908 Sputter coating system |
| 08/20/2009 | WO2009102687A1 Method and apparatus for plasma process performance matching in multiple wafer chambers |
| 08/20/2009 | WO2009100985A1 Multiple grooved vacuum coupling |
| 08/20/2009 | WO2009100877A1 An electron beam unit and method for adjusting electron beams generated by an electron beam unit |
| 08/20/2009 | WO2009100753A1 Low-voltage field emission scanning electron microscope |
| 08/20/2009 | US20090206757 Plasma reactor and plasma reaction apparatus |
| 08/20/2009 | US20090206281 Vapor delivery system useful with ion sources and vaporizers for use in such system |
| 08/20/2009 | US20090206271 Focussing mask |
| 08/20/2009 | US20090205782 Plasma processing apparatus |
| 08/20/2009 | DE102004014582B4 Ionenoptische Phasenvolumenkomprimierung Ion optical phase volume compression |
| 08/19/2009 | EP2091306A1 Spin-polarization ion beam generator, scattering spectroscope using the spin-polarization ion beam, and specimen processing device |
| 08/19/2009 | EP2091067A1 Apparatus for treating a substrate |
| 08/19/2009 | EP2091066A2 Processing system |
| 08/19/2009 | EP2091065A1 Low-voltage field emission scanning electron microscope |
| 08/19/2009 | EP2091064A1 Electron beam device |
| 08/19/2009 | EP2091063A2 Electron beam observation device using a pre-specimen magnetic field as image-forming lens and specimen observation method |
| 08/19/2009 | EP2091062A1 TEM with aberration corrector and phase plate |
| 08/19/2009 | EP2090673A1 Sputter coating device |
| 08/19/2009 | EP2089894A2 A plasma system and measurement method |
| 08/19/2009 | EP1735811A4 Method and system for ultrafast photoelectron microscope |
| 08/19/2009 | CN201294215Y Bias voltage type plasma source and plasma processing mechanism containing the same |
| 08/19/2009 | CN101512717A An electron column using a magnetic lens layer |
| 08/19/2009 | CN101512716A Method and apparatus for extracting ions from an ion source for use in ion implantation |
| 08/19/2009 | CN101510506A Ion implantation method and apparatus |
| 08/19/2009 | CN101510505A Ion implantation method and apparatus |
| 08/19/2009 | CN101510492A Tem with aberration corrector and phase plate |
| 08/19/2009 | CN100530548C Systems and methods for implant dosage control, and wafer implantation method by using ion beam |
| 08/19/2009 | CN100530532C Plasma processing apparatus and plasma processing method |
| 08/19/2009 | CN100530530C Plasma processing apparatus and plasma processing method |
| 08/19/2009 | CN100530529C Double offset frequency plasma body reactor with electrostatic chuck voltage feedback control |
| 08/19/2009 | CN100530510C An electrodeless RF induction coupled plasma dischargable atomic source |
| 08/19/2009 | CN100530509C Electron cyclotron resonance (ECR) plasma source having a linear plasma discharge opening |
| 08/19/2009 | CN100530508C Method and apparatus for VHF plasma processing with load mismatch reliability and stability |
| 08/19/2009 | CN100530507C Vacuum processing system capable of carrying processed object in and out from vacuum room |
| 08/19/2009 | CN100529726C Particle-optical apparatus with a permanent-magnetic lens and an electrostatic lens |
| 08/19/2009 | CN100529172C Laser drilled surfaces for substrate processing chambers |
| 08/19/2009 | CN100529168C Method of producing flat panels for display of film transistor or plasma |
| 08/18/2009 | US7576917 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
| 08/18/2009 | US7576342 Ion beam delivery equipment and ion beam delivery method |
| 08/18/2009 | US7576340 Focused ion beam processing method |
| 08/18/2009 | US7576339 Ion implantation apparatus and method for obtaining non-uniform ion implantation energy |
| 08/18/2009 | US7576337 Power supply for an ion implantation system |
| 08/18/2009 | US7576325 Electron microscopic method and electron microscope using same |
| 08/18/2009 | US7575987 Method of plasma doping |
| 08/18/2009 | US7575661 Reactive sputtering method |
| 08/18/2009 | US7574974 Device for production of a plasma sheet |
| 08/18/2009 | US7574932 Sample holding mechanism and sample working/observing apparatus |
| 08/13/2009 | WO2009099521A1 Plasma immersion ion implantation using an electrode with edge-effect suppression by a downwardly curving edge |
| 08/13/2009 | WO2009099486A1 Radio frequency power delivery system |
| 08/13/2009 | WO2009099461A1 Method of making ceramic reactor components and ceramic reactor component made therefrom |
| 08/13/2009 | WO2009098788A1 Manufacturing method of electron source |
| 08/13/2009 | WO2009097927A1 Device and method for treating formed parts by means of high-energy electron beams |
| 08/13/2009 | WO2009097859A1 A method for performing electron beam lithography |
| 08/13/2009 | US20090203199 Ion beam irradiating apparatus, and method of producing semiconductor device |
| 08/13/2009 | US20090200949 Plasma processing system with locally-efficient inductive plasma coupling |
| 08/13/2009 | US20090200494 Techniques for cold implantation of carbon-containing species |
| 08/13/2009 | US20090200493 Methods for in situ surface treatment in an ion implantation system |
| 08/13/2009 | US20090200463 Charged Particle Beam Device With Retarding Field Analyzer |
| 08/13/2009 | US20090200159 Reactive sputtering method |
| 08/13/2009 | US20090200158 High power impulse magnetron sputtering vapour deposition |
| 08/13/2009 | DE102008007662A1 Vorrichtung und Verfahren zur Behandlung von Formteilen mittels energiereicher Elektronenstrahlen Apparatus and method for treatment of moldings by high-energy electron beams |
| 08/12/2009 | EP2088615A1 Charged particle beam device |
| 08/12/2009 | EP2088614A1 Beam current calibration system |
| 08/12/2009 | EP2088613A1 Dual mode gas field ion source |
| 08/12/2009 | EP2088612A1 Method of heating or cleaning a web or foil |
| 08/12/2009 | EP2088424A1 Device for monitoring device for introducing gas for analysis device |
| 08/12/2009 | EP2087778A2 Inductive plasma source with high coupling efficiency |
| 08/12/2009 | EP2087503A1 Device for the pre-treatment of substrates |
| 08/12/2009 | EP2087502A1 Method and apparatus for forming a film by deposition from a plasma |
| 08/12/2009 | CN201289835Y Value electric ion emitter |
| 08/12/2009 | CN101506927A Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter |