Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2009
10/14/2009CN100550272C Process for endpoint detection in processing chambers
10/14/2009CN100550271C Showerhead electrode design for semiconductor processing reactor
10/14/2009CN100550270C High resolution atom probe
10/13/2009US7602484 Method and apparatus for performing limited area spectral analysis
10/13/2009US7601976 Dual beam system
10/13/2009US7601972 Inspection system by charged particle beam and method of manufacturing devices using the system
10/13/2009US7601971 Charged beam gun
10/13/2009US7601969 Illumination condenser for a particle optical projection system
10/13/2009US7601956 Method for measuring diffraction patterns from a transmission electron microscopy to determine crystal structures and a device therefor
10/13/2009US7601953 Systems and methods for a gas field ion microscope
10/13/2009US7601619 Method and apparatus for plasma processing
10/13/2009US7601469 Plasma etching chamber and method for manufacturing photomask using the same
10/13/2009US7601405 DLC coating system and process and apparatus for making coating system
10/13/2009US7601241 Plasma processing apparatus and plasma processing method
10/13/2009US7601240 Disturbance-free, recipe-controlled plasma processing system and method
10/08/2009WO2009123311A1 Diffraction image capturing method and charged particle beam device
10/08/2009WO2009122964A1 Ion implanter, ion implantation method and program
10/08/2009WO2009122555A1 Manufacturing method of semiconductor device, method for adjusting ion beam, and ion implantation apparatus
10/08/2009WO2009122145A2 Phase plate for electron microscope
10/08/2009WO2009080707A3 Methods and systems for removing a material from a sample
10/08/2009US20090252886 System and method for nanotube growth via ion implantation using a catalytic transmembrane
10/08/2009US20090250626 Liquid sanitization device
10/08/2009US20090250444 Microwave plasma processing device
10/08/2009DE102009014067A1 Plasmabearbeitungsvorrichtung The plasma processing apparatus
10/07/2009EP2107593A2 Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film
10/07/2009EP2107592A2 Apparatus for mass-producing sulicon-based thin film and method for mass-producing silicon-based thin film
10/07/2009EP2107591A1 Multistage gas cascade amplifier
10/07/2009EP2107590A2 Aberration corrector for transmission electron microscope
10/07/2009EP2106677A1 Rf power amplifier stability network
10/07/2009EP2106555A2 Method for s/tem sample analysis
10/07/2009EP2106457A1 Method for the production of a directional layer by means of cathode sputtering, and a device for carrying out the method
10/07/2009EP1673488B1 Modular device for surface coating
10/07/2009EP1438734B1 Methods and apparatus for plasma doping and ion implantation in an integrated processing system
10/07/2009EP1359236B1 Sputter film forming method
10/07/2009EP1183707B1 Apparatus and methods for secondary electron emission microscopy with dual beam
10/07/2009CN101553897A New and improved beam line architecture for ion implanter
10/07/2009CN101553074A 顶板 Roof
10/07/2009CN101552183A Plasma processing apparatus
10/07/2009CN101552182A Marginal ring mechanism used in semiconductor manufacture technology
10/06/2009US7598498 Electric field lens and ion implanter having the same
10/06/2009US7598497 Charged particle beam scanning method and charged particle beam apparatus
10/06/2009US7598496 Charged-particle beam system
10/06/2009US7598492 Charged particle microscopy using super resolution
10/06/2009US7598471 Method of electric discharge machining a cathode for an electron gun
10/01/2009WO2009119504A1 Electrostatic lens for charged particle radiation
10/01/2009WO2009119074A1 Spin polarized electron source
10/01/2009WO2009119060A1 Ion source
10/01/2009US20090246655 Electron beam writing apparatus and method
10/01/2009US20090242808 Techniques for improved uniformity tuning in an ion implanter system
10/01/2009US20090242800 Electron-beam dimension measuring apparatus and electron-beam dimension measuring method
10/01/2009US20090242795 Cryo-charging specimen holder for electron microscope
10/01/2009US20090242791 Two-grid ion energy analyzer and methods of manufacturing and operating
10/01/2009US20090242790 Ion energy analyzer and methods of manufacturing and operating
10/01/2009US20090242741 Solid-state image capturing apparatus, manufacturing method for the solid-state image capturing apparatus, and electronic information device
10/01/2009DE102008016923A1 Vorrichtung zur Plasmabehandlung von Werkstücken Apparatus for plasma treatment of workpieces
10/01/2009DE102007048559B4 Vorrichtung zur Strahlbearbeitung von Werkstücken, Ionenstrahlbearbeitungsanlage Apparatus for beam machining of workpieces, ion beam machining system
09/2009
09/30/2009EP2105944A1 Environmental cell for a particle-optical apparatus
09/30/2009EP2105943A2 Environmental cell for a particle-optical apparatus
09/30/2009EP2105727A1 Scanning electron microscope comprising a film for holding a sample and a dish for receiving sample material from a damaged film
09/30/2009EP2104864A2 Method for creating s/tem sample and sample structure
09/30/2009EP1982347B1 Device for coupling between a plasma antenna and a power signal generator
09/30/2009CN201319363Y Electronic microscope with directly-inserted display screen device
09/30/2009CN101546702A Plasma processing device and insulation cover plate
09/30/2009CN101546685A Plasma processing apparatus and plasma etching method
09/30/2009CN101546134A Electron beam writing apparatus and method
09/30/2009CN100546098C Distributor and distribution method, plasma handling system and method, and method for manufacturing LCD
09/29/2009US7595488 Method and apparatus for specifying working position on a sample and method of working the sample
09/29/2009US7595482 Standard component for length measurement, method for producing the same, and electron beam metrology system using the same
09/29/2009US7595098 Method and apparatus for depositing material on a substrate
09/29/2009US7595096 Method of manufacturing vacuum plasma treated workpieces
09/29/2009US7594479 Plasma CVD device and discharge electrode
09/24/2009WO2009117412A1 Specimen holder used for mounting samples in electron microscopes
09/24/2009WO2009117077A2 Method and apparatus allowing simultaneous direct observation and electron capture of scintillation images in an electron microscope
09/24/2009WO2009116634A1 Microstructure inspection method, microstructure inspection apparatus, and microstructure inspection program
09/24/2009WO2009115838A2 Specimen holder assembly
09/24/2009WO2009115135A1 Method for controlling ion energy in radio frequency plasmas
09/24/2009WO2009085165A3 Ionization gauge having electron multiplier cold emmission source
09/24/2009WO2009073316A3 Method and apparatus for controlling a gas cluster ion beam formed from gas mixture
09/24/2009WO2008015700A3 A method for nanopositioning object and device thereof
09/24/2009US20090238443 Pattern measurement methods and pattern measurement equipment
09/24/2009US20090236547 Extraction electrode system for high current ion implanter
09/24/2009US20090236540 Stage and electron microscope apparatus
09/24/2009US20090236521 Method and system for ultrafast photoelectron microscope
09/24/2009US20090236218 Method for depositing multilayer coatings
09/24/2009DE102008009410A1 Elektronenstrahlvorrichtung und Verfahren zum Justieren eines Elektronenstrahls, der von einer Elektronenstrahlvorrichtung erzeugt wird An electron beam apparatus and method for adjusting an electron beam generated by an electron beam device
09/24/2009DE102004011118B4 Extraktionselektrode mit Lochblendenmuster für eine Plasmastrahlquelle Extraction electrode aperture pattern for a plasma beam source
09/24/2009CA2718546A1 Specimen holder assembly
09/23/2009EP2102907A2 High-z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels
09/23/2009EP2102889A2 Rf substrate bias with high power impulse magnetron sputtering (hipims)
09/23/2009EP2102888A2 Arc suppression and pulsing in high power impulse magnetron sputtering (hipims)
09/23/2009EP2102887A1 Plasma generator and method for cleaning an object
09/23/2009EP2102886A1 Electron microscope and a method for measuring the defocus variation or the limit resolution
09/23/2009CN101542677A Device for the pre-treatment of substrates
09/23/2009CN101542676A Method and device for etching a substrate by means of a plasma
09/23/2009CN101542675A Ion beam accelerating apparatus with electrodes mounted in a movable mount
09/23/2009CN101541140A Plasma treatment equipment and shielding ring thereof
09/23/2009CN100543920C Charged particle beamlet exposure system
09/23/2009CN100543582C Pattern size correcting device and pattern size correcting method
09/22/2009US7594216 Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
09/22/2009US7592612 Method and apparatus for surface potential reflection electron mask lithography